JP2009512777A5 - - Google Patents

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Publication number
JP2009512777A5
JP2009512777A5 JP2008515718A JP2008515718A JP2009512777A5 JP 2009512777 A5 JP2009512777 A5 JP 2009512777A5 JP 2008515718 A JP2008515718 A JP 2008515718A JP 2008515718 A JP2008515718 A JP 2008515718A JP 2009512777 A5 JP2009512777 A5 JP 2009512777A5
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JP
Japan
Prior art keywords
target
axial length
along
ring
outer periphery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008515718A
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English (en)
Japanese (ja)
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JP2009512777A (ja
JP5420240B2 (ja
Filing date
Publication date
Priority claimed from US11/150,337 external-priority patent/US20060278519A1/en
Application filed filed Critical
Publication of JP2009512777A publication Critical patent/JP2009512777A/ja
Publication of JP2009512777A5 publication Critical patent/JP2009512777A5/ja
Application granted granted Critical
Publication of JP5420240B2 publication Critical patent/JP5420240B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2008515718A 2005-06-10 2006-05-15 円筒状マグネトロンの適応性のある固定 Expired - Fee Related JP5420240B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/150,337 US20060278519A1 (en) 2005-06-10 2005-06-10 Adaptable fixation for cylindrical magnetrons
US11/150,337 2005-06-10
PCT/US2006/018854 WO2006135528A2 (en) 2005-06-10 2006-05-15 Adaptable fixation for cylindrical magnetrons

Publications (3)

Publication Number Publication Date
JP2009512777A JP2009512777A (ja) 2009-03-26
JP2009512777A5 true JP2009512777A5 (https=) 2009-07-02
JP5420240B2 JP5420240B2 (ja) 2014-02-19

Family

ID=37523145

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008515718A Expired - Fee Related JP5420240B2 (ja) 2005-06-10 2006-05-15 円筒状マグネトロンの適応性のある固定

Country Status (8)

Country Link
US (1) US20060278519A1 (https=)
EP (1) EP1896628A4 (https=)
JP (1) JP5420240B2 (https=)
KR (1) KR20080042042A (https=)
CN (1) CN101374971A (https=)
RU (1) RU2007148905A (https=)
TW (1) TWI427174B (https=)
WO (1) WO2006135528A2 (https=)

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US8500972B2 (en) * 2008-04-14 2013-08-06 Angstrom Sciences, Inc. Cylindrical magnetron
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US20100101946A1 (en) * 2008-10-24 2010-04-29 Applied Materials, Inc. Rotatable sputter target backing cylinder, rotatable sputter target, methods of producing and restoring a rotatable sputter target, and coating installation
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EP2180502A1 (en) * 2008-10-24 2010-04-28 Applied Materials, Inc. Rotatable sputter target backing cylinder, rotatable sputter target, method of producing a rotatable sputter target, and coating installation
US8951394B2 (en) 2010-01-29 2015-02-10 Angstrom Sciences, Inc. Cylindrical magnetron having a shunt
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DE102010040267B4 (de) * 2010-09-03 2014-07-17 Von Ardenne Anlagentechnik Gmbh Sputtereinrichtung mit rohrförmigem Target
US9765726B2 (en) * 2013-03-13 2017-09-19 Federal-Mogul Cylinder liners with adhesive metallic layers and methods of forming the cylinder liners
DE102013103472B4 (de) 2013-04-08 2018-08-09 VON ARDENNE Asset GmbH & Co. KG Vakuumbetriebskomponente und Vakuumprozessanordnung
WO2016202468A1 (de) * 2015-06-16 2016-12-22 Schneider Gmbh & Co. Kg Vorrichtung, verfahren und verwendung zur beschichtung von linsen
SE1650144A1 (en) * 2016-02-05 2017-08-06 Impact Coatings Ab Device for a physical vapor deposition (pvd) process
DE102016125273A1 (de) 2016-12-14 2018-06-14 Schneider Gmbh & Co. Kg Anlage, Verfahren und Träger zur Beschichtung von Brillengläsern
US20190333746A1 (en) * 2018-04-26 2019-10-31 Keihin Ramtech Co., Ltd. Sputtering Cathode, Sputtering Cathode Assembly, and Sputtering Apparatus
CN113463044B (zh) * 2021-06-10 2023-02-03 芜湖映日科技股份有限公司 一种真空绑定靶材的设备
CN115691853B (zh) * 2022-09-26 2024-01-23 中国核动力研究设计院 一种用于研究堆同位素辐照生产的辐照靶件及组装方法

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