JP2009511988A5 - - Google Patents

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Publication number
JP2009511988A5
JP2009511988A5 JP2008535640A JP2008535640A JP2009511988A5 JP 2009511988 A5 JP2009511988 A5 JP 2009511988A5 JP 2008535640 A JP2008535640 A JP 2008535640A JP 2008535640 A JP2008535640 A JP 2008535640A JP 2009511988 A5 JP2009511988 A5 JP 2009511988A5
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JP
Japan
Prior art keywords
design
identifying
constraints
constrained
tolerance band
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JP2008535640A
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English (en)
Japanese (ja)
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JP5243958B2 (ja
JP2009511988A (ja
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Priority claimed from US11/163,264 external-priority patent/US7266798B2/en
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Publication of JP2009511988A publication Critical patent/JP2009511988A/ja
Publication of JP2009511988A5 publication Critical patent/JP2009511988A5/ja
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Publication of JP5243958B2 publication Critical patent/JP5243958B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008535640A 2005-10-12 2006-10-11 マスク・レイアウトの設計する方法、該設計のためのプログラム、設計パラメータを伝達する方法、および、これらの方法を実現するプログラムならびにシステム Expired - Fee Related JP5243958B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/163,264 2005-10-12
US11/163,264 US7266798B2 (en) 2005-10-12 2005-10-12 Designer's intent tolerance bands for proximity correction and checking
PCT/US2006/039701 WO2007047298A1 (en) 2005-10-12 2006-10-11 Designer's intent tolerance bands for proximity correction and checking

Publications (3)

Publication Number Publication Date
JP2009511988A JP2009511988A (ja) 2009-03-19
JP2009511988A5 true JP2009511988A5 (enExample) 2009-04-30
JP5243958B2 JP5243958B2 (ja) 2013-07-24

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ID=37912233

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008535640A Expired - Fee Related JP5243958B2 (ja) 2005-10-12 2006-10-11 マスク・レイアウトの設計する方法、該設計のためのプログラム、設計パラメータを伝達する方法、および、これらの方法を実現するプログラムならびにシステム

Country Status (7)

Country Link
US (2) US7266798B2 (enExample)
EP (1) EP1952289A4 (enExample)
JP (1) JP5243958B2 (enExample)
KR (1) KR101006264B1 (enExample)
CN (1) CN101288080B (enExample)
TW (1) TW200725348A (enExample)
WO (1) WO2007047298A1 (enExample)

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US8415077B2 (en) 2010-08-13 2013-04-09 International Business Machines Corporation Simultaneous optical proximity correction and decomposition for double exposure lithography
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US9330223B2 (en) 2012-09-28 2016-05-03 International Business Machines Corporation Optical rule checking for detecting at risk structures for overlay issues
US9250535B2 (en) 2013-03-15 2016-02-02 International Business Machines Corporation Source, target and mask optimization by incorporating countour based assessments and integration over process variations
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CN113050389B (zh) * 2021-03-30 2022-12-02 长鑫存储技术有限公司 光刻工艺条件添加方法及装置、设计系统、介质和设备

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KR970003508A (ko) * 1995-06-30 1997-01-28 김주용 반도체소자의 제조방법
JP3466852B2 (ja) * 1997-02-18 2003-11-17 株式会社東芝 半導体装置の製造方法
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