JP2009511283A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2009511283A5 JP2009511283A5 JP2008534863A JP2008534863A JP2009511283A5 JP 2009511283 A5 JP2009511283 A5 JP 2009511283A5 JP 2008534863 A JP2008534863 A JP 2008534863A JP 2008534863 A JP2008534863 A JP 2008534863A JP 2009511283 A5 JP2009511283 A5 JP 2009511283A5
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- monocyclic
- nitrogen carrier
- hydrocarbon
- nitrile
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005049393.9 | 2005-10-15 | ||
| DE102005049393.9A DE102005049393B4 (de) | 2005-10-15 | 2005-10-15 | Verfahren zur Herstellung eines beschichteten Substratkörpers, Substratkörper mit einer Beschichtung und Verwendung des beschichteten Substratkörpers |
| PCT/DE2006/001755 WO2007045209A1 (de) | 2005-10-15 | 2006-10-07 | Verfahren zur herstellung eines beschichteten substratkörpers, substratkörper mit einer beschichtung und verwendung des beschichteten substratkörpers |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009511283A JP2009511283A (ja) | 2009-03-19 |
| JP2009511283A5 true JP2009511283A5 (enExample) | 2009-09-10 |
| JP5184364B2 JP5184364B2 (ja) | 2013-04-17 |
Family
ID=37800013
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008534863A Expired - Fee Related JP5184364B2 (ja) | 2005-10-15 | 2006-10-07 | 被覆された基材成形体の製造法、被覆を有する基材成形体及び被覆された基材成形体の使用 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US8012535B2 (enExample) |
| EP (1) | EP1934382A1 (enExample) |
| JP (1) | JP5184364B2 (enExample) |
| CN (1) | CN101305112B (enExample) |
| DE (1) | DE102005049393B4 (enExample) |
| WO (1) | WO2007045209A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1897970B2 (en) * | 2006-09-05 | 2016-06-15 | Tungaloy Corporation | Coated cutting tool and method for producing the same |
| CN103108716B (zh) * | 2010-09-07 | 2015-07-01 | 住友电工硬质合金株式会社 | 表面被覆切削工具 |
| CN102847962B (zh) * | 2011-06-29 | 2016-05-04 | 三菱综合材料株式会社 | 硬质包覆层发挥优异的耐崩刀性的表面包覆切削工具 |
| DE102011087715A1 (de) | 2011-12-05 | 2013-07-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Hartstoffbeschichtete körper aus metall, hartmetall, cermet oder keramik sowie verfahren zur herstellung derartiger körper |
| EP3000913B1 (en) | 2014-09-26 | 2020-07-29 | Walter Ag | Coated cutting tool insert with MT-CVD TiCN on TiAI(C,N) |
| WO2016114157A1 (ja) * | 2015-01-14 | 2016-07-21 | 宇部興産株式会社 | 金属炭窒化膜又は半金属炭窒化膜の製造方法、金属炭窒化膜又は半金属炭窒化膜及び金属炭窒化膜又は半金属炭窒化膜の製造装置 |
| JP2016130337A (ja) * | 2015-01-14 | 2016-07-21 | 宇部興産株式会社 | 金属又は半金属炭窒化膜の製造方法 |
| JP2016138325A (ja) * | 2015-01-29 | 2016-08-04 | 宇部興産株式会社 | 金属又は半金属炭窒化膜の製造方法 |
| US11939670B2 (en) | 2018-09-28 | 2024-03-26 | Corning Incorporated | Low temperature methods for depositing inorganic particles on a metal substrate and articles produced by the same |
| JP7141601B2 (ja) * | 2019-12-19 | 2022-09-26 | 株式会社タンガロイ | 被覆切削工具 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3846162A (en) * | 1968-10-21 | 1974-11-05 | Texas Instruments Inc | Metal carbonitride coatings |
| US3771976A (en) | 1971-01-08 | 1973-11-13 | Texas Instruments Inc | Metal carbonitride-coated article and method of producing same |
| FR2216276B1 (enExample) * | 1973-02-06 | 1976-11-05 | Roussel Uclaf | |
| FR2216273B1 (enExample) * | 1973-02-06 | 1977-07-22 | Roussel Uclaf | |
| CH590339A5 (enExample) | 1974-02-07 | 1977-08-15 | Ciba Geigy Ag | |
| CA1047899A (en) * | 1974-02-07 | 1979-02-06 | Diethelm Bitzer | Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides |
| US4196233A (en) * | 1974-02-07 | 1980-04-01 | Ciba-Geigy Corporation | Process for coating inorganic substrates with carbides, nitrides and/or carbonitrides |
| DD276603A3 (de) * | 1984-12-03 | 1990-03-07 | Akad Wissenschaften Ddr | Verschleissfester ueberzug, insbesondere fuer werkzeuge, und verfahren zu seiner herstellung |
| DD279603A1 (de) | 1985-12-06 | 1990-06-13 | Inst F Pflanzenschutzforsch Kl | Mittel zur larvenschlupfinduktion bei zystenbildenden nematoden |
| US5223337A (en) * | 1988-12-10 | 1993-06-29 | Fried. Krupp Gmbh | Tool produced by a plasma-activated CVD process |
| US5436071A (en) | 1990-01-31 | 1995-07-25 | Mitsubishi Materials Corporation | Cermet cutting tool and process for producing the same |
| US5223945A (en) * | 1990-01-31 | 1993-06-29 | Sony Corporation | Recording mode discrimination circuit |
| JP2775955B2 (ja) | 1990-01-31 | 1998-07-16 | 三菱マテリアル株式会社 | 耐摩耗性に優れたコーティングサーメットの製造法 |
| DE19530518A1 (de) * | 1995-08-19 | 1997-02-20 | Widia Gmbh | Verfahren zur Herstellung von Multikomponenten-Carbonitrid-Hartstoffschichten und Verbundkörper |
| DE19722728A1 (de) * | 1996-12-24 | 1998-06-25 | Widia Gmbh | Verbundkörper, bestehend aus einem Hartmetall-, Cermet-, oder Keramiksubstratkörper und Verfahren zu seiner Herstellung |
| US6472060B1 (en) | 2000-01-19 | 2002-10-29 | Seco Tools Ab | Coated body with nanocrystalline CVD coating for enhanced edge toughness and reduced friction |
| JP4437353B2 (ja) | 2000-03-30 | 2010-03-24 | 株式会社タンガロイ | 被覆切削工具およびその製造方法 |
| US6638571B2 (en) * | 2000-05-31 | 2003-10-28 | Mitsubishi Materials Corporation | Coated cemented carbide cutting tool member and process for producing the same |
| US6650498B1 (en) * | 2000-09-12 | 2003-11-18 | Hitachi Global Storage Technologies Netherlands B.V. | Actuator retract circuit for dual speed hard disk drive |
| DE10258282A1 (de) * | 2002-12-13 | 2004-07-08 | Walter Ag | CVD-Beschichtungsverfarhen für ZrBx CyNz-Schichten (x+y+z = 1) sowie beschichtetes Schneidwerkzeug |
| SE527346C2 (sv) | 2003-04-24 | 2006-02-14 | Seco Tools Ab | Skär med beläggning av skikt av MTCVD-Ti (C,N) med styrd kornstorlek och morfologi och metod för att belägga skäret |
| SE527349C2 (sv) | 2003-04-24 | 2006-02-14 | Seco Tools Ab | Skär med beläggning av skikt av MTCVD-Ti (C,N) med styrd kornstorlek och morfologi och metod för att belägga skäret |
| DE10320652A1 (de) * | 2003-05-07 | 2004-12-02 | Kennametal Widia Gmbh & Co.Kg | Werkzeug, insbesondere Schneidwerkzeug und Verfahren zur CVD-Abscheidung einer zweiphasigen Schicht auf einem Substratkörper |
-
2005
- 2005-10-15 DE DE102005049393.9A patent/DE102005049393B4/de not_active Expired - Lifetime
-
2006
- 2006-10-07 CN CN2006800345265A patent/CN101305112B/zh active Active
- 2006-10-07 EP EP06805375A patent/EP1934382A1/de not_active Withdrawn
- 2006-10-07 US US12/067,897 patent/US8012535B2/en active Active
- 2006-10-07 WO PCT/DE2006/001755 patent/WO2007045209A1/de not_active Ceased
- 2006-10-07 JP JP2008534863A patent/JP5184364B2/ja not_active Expired - Fee Related
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008057042A5 (enExample) | ||
| EP1383163A3 (en) | Methods for forming silicon dioxide layers on substrates using atomic layer deposition | |
| JP2009511283A5 (enExample) | ||
| DE602005007379D1 (de) | Topographie und selbstorganisierenden monoschichten | |
| DE602007005017D1 (de) | Verfahren für leicht zu reinigende substrate und artikel daraus | |
| ATE519870T1 (de) | Verfahren zur abscheidung von metallschichten aus metallcarbonylvorläufern | |
| WO2008057625A3 (en) | Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects | |
| SG134217A1 (en) | Thermal barrier coating compositions, processes for applying same and articles coated with same | |
| WO2013148490A4 (en) | Method of enabling seamless cobalt gap-fill | |
| TW200940738A (en) | Method for forming a titanium-containing layer on a substrate using an ALD process | |
| TW200622022A (en) | A method and system for forming a passivated metal layer | |
| RU2014127540A (ru) | Покрытые высокопрочным материалом изделия из металла, твёрдого сплава, металлокерамики или керамики и способ изготовления таких изделий | |
| DE502007006068D1 (de) | Wolfram- und Molybdän-Verbindungen und ihre Verwendung für die Chemical Vapour Deposition (CVD) | |
| TW200618066A (en) | Deposition of ruthenium metal layers in a thermal chemical vapor deposition process | |
| WO2004114371A3 (de) | Verbindung zur bildung einer selbstorganisierenden monolage, schichtstruktur, halbleiterbauelement mit einer schichtstruktur und verfahren zur herstellung einer schichtstruktur | |
| TW200609238A (en) | Chemical vapor deposition material and chemical vapor deposition | |
| ATE548327T1 (de) | Verfahren zur herstellung von nanostrukturen | |
| JP2018515694A5 (enExample) | ||
| IL189693A0 (en) | Metal carbonitride layer and method for the production of a metal carbonitride layer | |
| TW200833886A (en) | Method for manufacture of III-V family chemical compound semiconductor | |
| TW200715375A (en) | Low-temperature catalyzed formation of segmented nanowire of dielectric material | |
| MY147893A (en) | Method of forming a zinc oxide coated article | |
| TW200701579A (en) | Method for manufacturing p type nitride semiconductor and semiconductor device manufactured by such method | |
| JP2004235632A5 (enExample) | ||
| ATE456687T1 (de) | Verfahren zur herstellung dünner zirkoniumnitrid- schichten |