JP2009504910A5 - - Google Patents

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Publication number
JP2009504910A5
JP2009504910A5 JP2008526063A JP2008526063A JP2009504910A5 JP 2009504910 A5 JP2009504910 A5 JP 2009504910A5 JP 2008526063 A JP2008526063 A JP 2008526063A JP 2008526063 A JP2008526063 A JP 2008526063A JP 2009504910 A5 JP2009504910 A5 JP 2009504910A5
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JP
Japan
Prior art keywords
metal
substrate
patterned
nanostructured surface
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008526063A
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English (en)
Japanese (ja)
Other versions
JP2009504910A (ja
JP5199089B2 (ja
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Publication date
Priority claimed from US11/200,551 external-priority patent/US7871670B2/en
Application filed filed Critical
Publication of JP2009504910A publication Critical patent/JP2009504910A/ja
Publication of JP2009504910A5 publication Critical patent/JP2009504910A5/ja
Application granted granted Critical
Publication of JP5199089B2 publication Critical patent/JP5199089B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008526063A 2005-08-10 2006-07-31 パターン化トポグラフィーの複製と自己組織化単一層を用いた微細加工 Expired - Fee Related JP5199089B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/200,551 2005-08-10
US11/200,551 US7871670B2 (en) 2005-08-10 2005-08-10 Microfabrication using replicated patterned topography and self-assembled monolayers
PCT/US2006/029848 WO2007021527A2 (en) 2005-08-10 2006-07-31 Microfabrication using replciated patterned topography and self-assembled monolayers

Publications (3)

Publication Number Publication Date
JP2009504910A JP2009504910A (ja) 2009-02-05
JP2009504910A5 true JP2009504910A5 (enExample) 2009-09-10
JP5199089B2 JP5199089B2 (ja) 2013-05-15

Family

ID=37742852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526063A Expired - Fee Related JP5199089B2 (ja) 2005-08-10 2006-07-31 パターン化トポグラフィーの複製と自己組織化単一層を用いた微細加工

Country Status (5)

Country Link
US (1) US7871670B2 (enExample)
EP (1) EP1922436A2 (enExample)
JP (1) JP5199089B2 (enExample)
CN (1) CN101243209B (enExample)
WO (1) WO2007021527A2 (enExample)

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TWI739984B (zh) * 2017-01-31 2021-09-21 美商應用材料股份有限公司 就圖案化應用進行選擇性沉積之方案
JP7224978B2 (ja) * 2019-03-15 2023-02-20 マクセル株式会社 メッキ部品の製造方法及び基材の成形に用いられる金型
US20220244635A1 (en) * 2019-05-29 2022-08-04 B.G. Negev Technologies & Applications Ltd., At Ben-Gurion University A method for imprinting micropatterns on a substrate of a chalcogenide glass
CN110357614B (zh) * 2019-07-25 2021-12-10 哈尔滨理工大学 一种室温顺电-铁电可调的陶瓷材料及其制备方法
CN114132062A (zh) * 2020-09-03 2022-03-04 苏州苏大维格科技集团股份有限公司 一种微纳米潜影防伪器件及其制备方法与版辊

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