JP2009256784A5 - - Google Patents

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Publication number
JP2009256784A5
JP2009256784A5 JP2009060645A JP2009060645A JP2009256784A5 JP 2009256784 A5 JP2009256784 A5 JP 2009256784A5 JP 2009060645 A JP2009060645 A JP 2009060645A JP 2009060645 A JP2009060645 A JP 2009060645A JP 2009256784 A5 JP2009256784 A5 JP 2009256784A5
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Japan
Prior art keywords
light absorption
absorption layer
substrate
nitride
material layer
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JP2009060645A
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English (en)
Japanese (ja)
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JP2009256784A (ja
JP5410791B2 (ja
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Priority claimed from JP2009060645A external-priority patent/JP5410791B2/ja
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Publication of JP2009256784A5 publication Critical patent/JP2009256784A5/ja
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Publication of JP5410791B2 publication Critical patent/JP5410791B2/ja
Expired - Fee Related legal-status Critical Current
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JP2009060645A 2008-03-17 2009-03-13 成膜方法および発光装置の作製方法 Expired - Fee Related JP5410791B2 (ja)

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Application Number Priority Date Filing Date Title
JP2009060645A JP5410791B2 (ja) 2008-03-17 2009-03-13 成膜方法および発光装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008068542 2008-03-17
JP2008068542 2008-03-17
JP2009060645A JP5410791B2 (ja) 2008-03-17 2009-03-13 成膜方法および発光装置の作製方法

Publications (3)

Publication Number Publication Date
JP2009256784A JP2009256784A (ja) 2009-11-05
JP2009256784A5 true JP2009256784A5 (OSRAM) 2012-04-12
JP5410791B2 JP5410791B2 (ja) 2014-02-05

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JP2009060645A Expired - Fee Related JP5410791B2 (ja) 2008-03-17 2009-03-13 成膜方法および発光装置の作製方法

Country Status (2)

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US (2) US8182863B2 (OSRAM)
JP (1) JP5410791B2 (OSRAM)

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