MX2014004552A - Metodo de tratamiento termico de capas de plata. - Google Patents
Metodo de tratamiento termico de capas de plata.Info
- Publication number
- MX2014004552A MX2014004552A MX2014004552A MX2014004552A MX2014004552A MX 2014004552 A MX2014004552 A MX 2014004552A MX 2014004552 A MX2014004552 A MX 2014004552A MX 2014004552 A MX2014004552 A MX 2014004552A MX 2014004552 A MX2014004552 A MX 2014004552A
- Authority
- MX
- Mexico
- Prior art keywords
- heat treatment
- stack
- silver layers
- silver
- treatment
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/816—Multilayers, e.g. transparent multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12896—Ag-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Thermal Sciences (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Electroluminescent Light Sources (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
La presente invención se relaciona con un método para obtener un material que comprende un sustrato recubierto sobre al menos una parte de al menos una de sus superficies con un apilamiento de capas delgadas que comprende al menos una capa de plata, el método comprende una etapa de depósito del apilamiento seguida por una etapa de tratamiento térmico, el tratamiento térmico se implementa irradiando al menos una parte de la superficie del apilamiento con la ayuda de al menos una fuente de luz incoherente por un periodo de irradiación de entre 0.1 milisegundos y 00 segundos, de suerte que la resistencia cuadrada y/o la emisividad del apilamiento se reduce en al menos 5% relativamente, la o cada capa de plata permanece continua al final del tratamiento.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR1159389A FR2981346B1 (fr) | 2011-10-18 | 2011-10-18 | Procede de traitement thermique de couches d'argent |
PCT/FR2012/052368 WO2013057428A1 (fr) | 2011-10-18 | 2012-10-18 | Procede de traitement thermique de couches d'argent |
Publications (2)
Publication Number | Publication Date |
---|---|
MX2014004552A true MX2014004552A (es) | 2014-08-01 |
MX360956B MX360956B (es) | 2018-11-23 |
Family
ID=47221452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MX2014004552A MX360956B (es) | 2011-10-18 | 2012-10-18 | Método de tratamiento térmico de capas de plata. |
Country Status (14)
Country | Link |
---|---|
US (1) | US20140272465A1 (es) |
EP (1) | EP2768785B1 (es) |
JP (2) | JP6219830B2 (es) |
KR (1) | KR20140088520A (es) |
CN (2) | CN108285279A (es) |
BR (1) | BR112014007659A2 (es) |
CA (1) | CA2849422A1 (es) |
DE (1) | DE202012013088U1 (es) |
EA (1) | EA033169B1 (es) |
FR (1) | FR2981346B1 (es) |
IN (1) | IN2014CN02556A (es) |
MX (1) | MX360956B (es) |
PL (1) | PL2768785T3 (es) |
WO (1) | WO2013057428A1 (es) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008138127A1 (en) | 2007-05-11 | 2008-11-20 | Paratek Microwave, Inc. | Systems and methods for a thin film capacitor having a composite high-k thin film stack |
US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
DE102011089884B4 (de) * | 2011-08-19 | 2016-03-10 | Von Ardenne Gmbh | Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems |
DE102014105300A1 (de) * | 2014-03-12 | 2015-09-17 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Betreiben einer Prozessieranordnung |
FR3021967B1 (fr) | 2014-06-06 | 2021-04-23 | Saint Gobain | Procede d'obtention d'un substrat revetu d'une couche fonctionnelle |
US10115527B2 (en) | 2015-03-09 | 2018-10-30 | Blackberry Limited | Thin film dielectric stack |
DE102015103577A1 (de) * | 2015-03-11 | 2016-09-15 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Kurzzeittempern einer Beschichtung auf einem lichtdurchlässigen Substrat |
US10011524B2 (en) | 2015-06-19 | 2018-07-03 | Guardian Glass, LLC | Coated article with sequentially activated low-E coating, and/or method of making the same |
US10297658B2 (en) | 2016-06-16 | 2019-05-21 | Blackberry Limited | Method and apparatus for a thin film dielectric stack |
JP6783984B2 (ja) * | 2016-07-19 | 2020-11-11 | 豊田合成株式会社 | 発光素子 |
FR3056579B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
FR3056580B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
US12032124B2 (en) | 2017-08-04 | 2024-07-09 | Vitro Flat Glass Llc | Flash annealing of transparent conductive oxide and semiconductor coatings |
US11220455B2 (en) * | 2017-08-04 | 2022-01-11 | Vitro Flat Glass Llc | Flash annealing of silver coatings |
CN111699430B (zh) * | 2018-01-29 | 2022-07-22 | 应用材料公司 | 用于光学器件增强的润湿层 |
US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
CN111362590A (zh) * | 2020-03-25 | 2020-07-03 | 四川猛犸半导体科技有限公司 | 一种薄膜器件 |
FR3109776B1 (fr) * | 2020-04-30 | 2023-03-24 | Saint Gobain | Materiau comportant un empilement a sous-couche dielectrique fine d’oxide a base de zinc et procede de depot de ce materiau |
RU2757458C1 (ru) * | 2021-01-26 | 2021-10-18 | Акционерное Общество "Центр Прикладной Физики Мгту Им. Н.Э. Баумана" | Способ управления холодной плазмой посредством микрорельефа на твёрдом диэлектрике |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4412318C2 (de) * | 1994-04-11 | 1998-08-13 | Ver Glaswerke Gmbh | Wärmebehandlung einer mit einer teilreflektierenden Silberschicht versehenen Glasscheibe |
JP4029613B2 (ja) * | 2001-12-25 | 2008-01-09 | ウシオ電機株式会社 | 閃光放射装置および光加熱装置 |
JP4140279B2 (ja) * | 2002-05-22 | 2008-08-27 | ウシオ電機株式会社 | フラッシュランプ装置および閃光放射装置 |
EP1375445A1 (fr) * | 2002-06-17 | 2004-01-02 | Glaverbel | Procédé de fabrication d'un vitrage pourvu d'un revêtement multicouche |
FR2858975B1 (fr) * | 2003-08-20 | 2006-01-27 | Saint Gobain | Substrat transparent revetu d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
JP5465373B2 (ja) * | 2007-09-12 | 2014-04-09 | 大日本スクリーン製造株式会社 | 熱処理装置 |
JP5236405B2 (ja) * | 2008-09-12 | 2013-07-17 | 住友化学株式会社 | 透明電極膜の改質方法及び透明電極膜付基板の製造方法 |
CN101531471A (zh) * | 2009-03-10 | 2009-09-16 | 上海耀华皮尔金顿玻璃股份有限公司 | 双银复合结构可钢化低辐射镀膜玻璃及其工艺 |
FR2946639B1 (fr) * | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
US20120156827A1 (en) * | 2010-12-17 | 2012-06-21 | General Electric Company | Method for forming cadmium tin oxide layer and a photovoltaic device |
FR2969391B1 (fr) * | 2010-12-17 | 2013-07-05 | Saint Gobain | Procédé de fabrication d'un dispositif oled |
-
2011
- 2011-10-18 FR FR1159389A patent/FR2981346B1/fr not_active Expired - Fee Related
-
2012
- 2012-10-18 KR KR1020147009929A patent/KR20140088520A/ko not_active Application Discontinuation
- 2012-10-18 CN CN201810153629.8A patent/CN108285279A/zh active Pending
- 2012-10-18 JP JP2014536314A patent/JP6219830B2/ja not_active Expired - Fee Related
- 2012-10-18 DE DE202012013088.9U patent/DE202012013088U1/de not_active Expired - Lifetime
- 2012-10-18 EP EP12790591.7A patent/EP2768785B1/fr not_active Not-in-force
- 2012-10-18 WO PCT/FR2012/052368 patent/WO2013057428A1/fr active Application Filing
- 2012-10-18 IN IN2556CHN2014 patent/IN2014CN02556A/en unknown
- 2012-10-18 US US14/352,903 patent/US20140272465A1/en not_active Abandoned
- 2012-10-18 CN CN201280050807.5A patent/CN103874667A/zh active Pending
- 2012-10-18 CA CA2849422A patent/CA2849422A1/fr not_active Abandoned
- 2012-10-18 BR BR112014007659A patent/BR112014007659A2/pt not_active Application Discontinuation
- 2012-10-18 MX MX2014004552A patent/MX360956B/es active IP Right Grant
- 2012-10-18 EA EA201490810A patent/EA033169B1/ru not_active IP Right Cessation
- 2012-10-18 PL PL12790591T patent/PL2768785T3/pl unknown
-
2017
- 2017-07-27 JP JP2017145528A patent/JP6526118B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
IN2014CN02556A (es) | 2015-08-07 |
EP2768785A1 (fr) | 2014-08-27 |
BR112014007659A2 (pt) | 2017-04-11 |
WO2013057428A1 (fr) | 2013-04-25 |
EA201490810A1 (ru) | 2014-07-30 |
US20140272465A1 (en) | 2014-09-18 |
JP6219830B2 (ja) | 2017-10-25 |
CN103874667A (zh) | 2014-06-18 |
MX360956B (es) | 2018-11-23 |
JP2018012639A (ja) | 2018-01-25 |
EA033169B1 (ru) | 2019-09-30 |
KR20140088520A (ko) | 2014-07-10 |
DE202012013088U1 (de) | 2014-10-27 |
PL2768785T3 (pl) | 2020-01-31 |
JP6526118B2 (ja) | 2019-06-05 |
FR2981346A1 (fr) | 2013-04-19 |
EP2768785B1 (fr) | 2019-07-10 |
CN108285279A (zh) | 2018-07-17 |
FR2981346B1 (fr) | 2014-01-24 |
JP2015505790A (ja) | 2015-02-26 |
CA2849422A1 (fr) | 2013-04-25 |
AU2012324666A1 (en) | 2014-06-05 |
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Legal Events
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FG | Grant or registration |