PL2768785T3 - Sposób obróbki termicznej warstw srebra - Google Patents

Sposób obróbki termicznej warstw srebra

Info

Publication number
PL2768785T3
PL2768785T3 PL12790591T PL12790591T PL2768785T3 PL 2768785 T3 PL2768785 T3 PL 2768785T3 PL 12790591 T PL12790591 T PL 12790591T PL 12790591 T PL12790591 T PL 12790591T PL 2768785 T3 PL2768785 T3 PL 2768785T3
Authority
PL
Poland
Prior art keywords
heat treatment
silver layers
silver
layers
treatment
Prior art date
Application number
PL12790591T
Other languages
English (en)
Inventor
Fabien Lienhart
Martin PYTHON
Original Assignee
Saint-Gobain Glass France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Saint-Gobain Glass France filed Critical Saint-Gobain Glass France
Publication of PL2768785T3 publication Critical patent/PL2768785T3/pl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5806—Thermal treatment
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/81—Anodes
    • H10K50/816—Multilayers, e.g. transparent multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/30—Aspects of methods for coating glass not covered above
    • C03C2218/32—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12896—Ag-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)
  • Laminated Bodies (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroluminescent Light Sources (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
PL12790591T 2011-10-18 2012-10-18 Sposób obróbki termicznej warstw srebra PL2768785T3 (pl)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
FR1159389A FR2981346B1 (fr) 2011-10-18 2011-10-18 Procede de traitement thermique de couches d'argent
EP12790591.7A EP2768785B1 (fr) 2011-10-18 2012-10-18 Procede de traitement thermique de couches d'argent
PCT/FR2012/052368 WO2013057428A1 (fr) 2011-10-18 2012-10-18 Procede de traitement thermique de couches d'argent

Publications (1)

Publication Number Publication Date
PL2768785T3 true PL2768785T3 (pl) 2020-01-31

Family

ID=47221452

Family Applications (1)

Application Number Title Priority Date Filing Date
PL12790591T PL2768785T3 (pl) 2011-10-18 2012-10-18 Sposób obróbki termicznej warstw srebra

Country Status (14)

Country Link
US (1) US20140272465A1 (pl)
EP (1) EP2768785B1 (pl)
JP (2) JP6219830B2 (pl)
KR (1) KR20140088520A (pl)
CN (2) CN103874667A (pl)
BR (1) BR112014007659A2 (pl)
CA (1) CA2849422A1 (pl)
DE (1) DE202012013088U1 (pl)
EA (1) EA033169B1 (pl)
FR (1) FR2981346B1 (pl)
IN (1) IN2014CN02556A (pl)
MX (1) MX360956B (pl)
PL (1) PL2768785T3 (pl)
WO (1) WO2013057428A1 (pl)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8154850B2 (en) 2007-05-11 2012-04-10 Paratek Microwave, Inc. Systems and methods for a thin film capacitor having a composite high-k thin film stack
US10060180B2 (en) 2010-01-16 2018-08-28 Cardinal Cg Company Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology
US10000965B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductive coating technology
US10000411B2 (en) 2010-01-16 2018-06-19 Cardinal Cg Company Insulating glass unit transparent conductivity and low emissivity coating technology
DE102011089884B4 (de) * 2011-08-19 2016-03-10 Von Ardenne Gmbh Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems
DE102014105300A1 (de) * 2014-03-12 2015-09-17 Von Ardenne Gmbh Prozessieranordnung und Verfahren zum Betreiben einer Prozessieranordnung
FR3021967B1 (fr) * 2014-06-06 2021-04-23 Saint Gobain Procede d'obtention d'un substrat revetu d'une couche fonctionnelle
US10115527B2 (en) 2015-03-09 2018-10-30 Blackberry Limited Thin film dielectric stack
DE102015103577A1 (de) * 2015-03-11 2016-09-15 Von Ardenne Gmbh Prozessieranordnung und Verfahren zum Kurzzeittempern einer Beschichtung auf einem lichtdurchlässigen Substrat
US10011524B2 (en) 2015-06-19 2018-07-03 Guardian Glass, LLC Coated article with sequentially activated low-E coating, and/or method of making the same
US10297658B2 (en) 2016-06-16 2019-05-21 Blackberry Limited Method and apparatus for a thin film dielectric stack
JP6783984B2 (ja) * 2016-07-19 2020-11-11 豊田合成株式会社 発光素子
FR3056579B1 (fr) * 2016-09-26 2021-02-12 Saint Gobain Substrat revetu d'un revetement bas-emissif
FR3056580B1 (fr) * 2016-09-26 2021-02-12 Saint Gobain Substrat revetu d'un revetement bas-emissif
US11220455B2 (en) * 2017-08-04 2022-01-11 Vitro Flat Glass Llc Flash annealing of silver coatings
ES2967924T3 (es) * 2017-08-04 2024-05-06 Vitro Flat Glass Llc Recocido por destellos de revestimientos de semiconductor y de óxido conductor transparente
CN111699430B (zh) * 2018-01-29 2022-07-22 应用材料公司 用于光学器件增强的润湿层
US11028012B2 (en) 2018-10-31 2021-06-08 Cardinal Cg Company Low solar heat gain coatings, laminated glass assemblies, and methods of producing same
FR3109776B1 (fr) * 2020-04-30 2023-03-24 Saint Gobain Materiau comportant un empilement a sous-couche dielectrique fine d’oxide a base de zinc et procede de depot de ce materiau
RU2757458C1 (ru) * 2021-01-26 2021-10-18 Акционерное Общество "Центр Прикладной Физики Мгту Им. Н.Э. Баумана" Способ управления холодной плазмой посредством микрорельефа на твёрдом диэлектрике

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4412318C2 (de) * 1994-04-11 1998-08-13 Ver Glaswerke Gmbh Wärmebehandlung einer mit einer teilreflektierenden Silberschicht versehenen Glasscheibe
JP4029613B2 (ja) * 2001-12-25 2008-01-09 ウシオ電機株式会社 閃光放射装置および光加熱装置
JP4140279B2 (ja) * 2002-05-22 2008-08-27 ウシオ電機株式会社 フラッシュランプ装置および閃光放射装置
EP1375445A1 (fr) * 2002-06-17 2004-01-02 Glaverbel Procédé de fabrication d'un vitrage pourvu d'un revêtement multicouche
FR2858975B1 (fr) * 2003-08-20 2006-01-27 Saint Gobain Substrat transparent revetu d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire
FR2911130B1 (fr) * 2007-01-05 2009-11-27 Saint Gobain Procede de depot de couche mince et produit obtenu
JP5465373B2 (ja) * 2007-09-12 2014-04-09 大日本スクリーン製造株式会社 熱処理装置
JP5236405B2 (ja) * 2008-09-12 2013-07-17 住友化学株式会社 透明電極膜の改質方法及び透明電極膜付基板の製造方法
CN101531471A (zh) * 2009-03-10 2009-09-16 上海耀华皮尔金顿玻璃股份有限公司 双银复合结构可钢化低辐射镀膜玻璃及其工艺
FR2946639B1 (fr) * 2009-06-12 2011-07-15 Saint Gobain Procede de depot de couche mince et produit obtenu.
FR2969391B1 (fr) * 2010-12-17 2013-07-05 Saint Gobain Procédé de fabrication d'un dispositif oled
US20120156827A1 (en) * 2010-12-17 2012-06-21 General Electric Company Method for forming cadmium tin oxide layer and a photovoltaic device

Also Published As

Publication number Publication date
BR112014007659A2 (pt) 2017-04-11
JP6526118B2 (ja) 2019-06-05
MX2014004552A (es) 2014-08-01
MX360956B (es) 2018-11-23
FR2981346A1 (fr) 2013-04-19
EP2768785B1 (fr) 2019-07-10
JP2018012639A (ja) 2018-01-25
FR2981346B1 (fr) 2014-01-24
JP2015505790A (ja) 2015-02-26
AU2012324666A1 (en) 2014-06-05
CA2849422A1 (fr) 2013-04-25
KR20140088520A (ko) 2014-07-10
EA033169B1 (ru) 2019-09-30
CN108285279A (zh) 2018-07-17
CN103874667A (zh) 2014-06-18
JP6219830B2 (ja) 2017-10-25
IN2014CN02556A (pl) 2015-08-07
EA201490810A1 (ru) 2014-07-30
US20140272465A1 (en) 2014-09-18
EP2768785A1 (fr) 2014-08-27
DE202012013088U1 (de) 2014-10-27
WO2013057428A1 (fr) 2013-04-25

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