EA201490810A1 - Способ термообработки слоев серебра - Google Patents
Способ термообработки слоев серебраInfo
- Publication number
- EA201490810A1 EA201490810A1 EA201490810A EA201490810A EA201490810A1 EA 201490810 A1 EA201490810 A1 EA 201490810A1 EA 201490810 A EA201490810 A EA 201490810A EA 201490810 A EA201490810 A EA 201490810A EA 201490810 A1 EA201490810 A1 EA 201490810A1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- heat treatment
- layer
- silver
- silver layers
- emissivity
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5806—Thermal treatment
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
- C03C17/3602—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
- C03C17/3657—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having optical properties
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
- H10K50/816—Multilayers, e.g. transparent multilayers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12896—Ag-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroluminescent Light Sources (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Объектом изобретения является способ получения материала, содержащего подложку, покрытую по меньшей мере на части по меньшей мере одной из ее сторон набором тонких слоев, содержащим по меньшей мере один слой серебра, при этом указанный способ включает в себя этап нанесения упомянутого набора, затем этап термообработки, причем упомянутую термообработку осуществляют, облучая по меньшей мере часть поверхности упомянутого набора при помощи по меньшей мере одного источника некогерентного света в течение периода облучения от 0,1 мс до 100 с, таким образом, что квадратичное сопротивление и/или излучательная способность упомянутого набора уменьшается по меньшей мере на 5%, относительно, при этом слой, или каждый слой серебра, остается непрерывным в результате обработки.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR1159389A FR2981346B1 (fr) | 2011-10-18 | 2011-10-18 | Procede de traitement thermique de couches d'argent |
| PCT/FR2012/052368 WO2013057428A1 (fr) | 2011-10-18 | 2012-10-18 | Procede de traitement thermique de couches d'argent |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EA201490810A1 true EA201490810A1 (ru) | 2014-07-30 |
| EA033169B1 EA033169B1 (ru) | 2019-09-30 |
Family
ID=47221452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EA201490810A EA033169B1 (ru) | 2011-10-18 | 2012-10-18 | Способ получения подложки с покрытием для остекления и органического электролюминесцентного диода (oled) |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US20140272465A1 (ru) |
| EP (1) | EP2768785B1 (ru) |
| JP (2) | JP6219830B2 (ru) |
| KR (1) | KR20140088520A (ru) |
| CN (2) | CN103874667A (ru) |
| BR (1) | BR112014007659A2 (ru) |
| CA (1) | CA2849422A1 (ru) |
| DE (1) | DE202012013088U1 (ru) |
| EA (1) | EA033169B1 (ru) |
| FR (1) | FR2981346B1 (ru) |
| IN (1) | IN2014CN02556A (ru) |
| MX (1) | MX360956B (ru) |
| PL (1) | PL2768785T3 (ru) |
| WO (1) | WO2013057428A1 (ru) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8154850B2 (en) | 2007-05-11 | 2012-04-10 | Paratek Microwave, Inc. | Systems and methods for a thin film capacitor having a composite high-k thin film stack |
| US10060180B2 (en) | 2010-01-16 | 2018-08-28 | Cardinal Cg Company | Flash-treated indium tin oxide coatings, production methods, and insulating glass unit transparent conductive coating technology |
| US10000965B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductive coating technology |
| US10000411B2 (en) | 2010-01-16 | 2018-06-19 | Cardinal Cg Company | Insulating glass unit transparent conductivity and low emissivity coating technology |
| DE102011089884B4 (de) * | 2011-08-19 | 2016-03-10 | Von Ardenne Gmbh | Niedrigemittierende Beschichtung und Verfahren zur Herstellung eines niedrigemittierenden Schichtsystems |
| DE102014105300A1 (de) * | 2014-03-12 | 2015-09-17 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Betreiben einer Prozessieranordnung |
| FR3021967B1 (fr) * | 2014-06-06 | 2021-04-23 | Saint Gobain | Procede d'obtention d'un substrat revetu d'une couche fonctionnelle |
| US10115527B2 (en) | 2015-03-09 | 2018-10-30 | Blackberry Limited | Thin film dielectric stack |
| DE102015103577A1 (de) * | 2015-03-11 | 2016-09-15 | Von Ardenne Gmbh | Prozessieranordnung und Verfahren zum Kurzzeittempern einer Beschichtung auf einem lichtdurchlässigen Substrat |
| US10011524B2 (en) | 2015-06-19 | 2018-07-03 | Guardian Glass, LLC | Coated article with sequentially activated low-E coating, and/or method of making the same |
| US10297658B2 (en) | 2016-06-16 | 2019-05-21 | Blackberry Limited | Method and apparatus for a thin film dielectric stack |
| JP6783984B2 (ja) * | 2016-07-19 | 2020-11-11 | 豊田合成株式会社 | 発光素子 |
| FR3056579B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
| FR3056580B1 (fr) * | 2016-09-26 | 2021-02-12 | Saint Gobain | Substrat revetu d'un revetement bas-emissif |
| US11220455B2 (en) * | 2017-08-04 | 2022-01-11 | Vitro Flat Glass Llc | Flash annealing of silver coatings |
| ES2967924T3 (es) * | 2017-08-04 | 2024-05-06 | Vitro Flat Glass Llc | Recocido por destellos de revestimientos de semiconductor y de óxido conductor transparente |
| CN111699430B (zh) * | 2018-01-29 | 2022-07-22 | 应用材料公司 | 用于光学器件增强的润湿层 |
| US11028012B2 (en) | 2018-10-31 | 2021-06-08 | Cardinal Cg Company | Low solar heat gain coatings, laminated glass assemblies, and methods of producing same |
| FR3109776B1 (fr) * | 2020-04-30 | 2023-03-24 | Saint Gobain | Materiau comportant un empilement a sous-couche dielectrique fine d’oxide a base de zinc et procede de depot de ce materiau |
| RU2757458C1 (ru) * | 2021-01-26 | 2021-10-18 | Акционерное Общество "Центр Прикладной Физики Мгту Им. Н.Э. Баумана" | Способ управления холодной плазмой посредством микрорельефа на твёрдом диэлектрике |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4412318C2 (de) * | 1994-04-11 | 1998-08-13 | Ver Glaswerke Gmbh | Wärmebehandlung einer mit einer teilreflektierenden Silberschicht versehenen Glasscheibe |
| JP4029613B2 (ja) * | 2001-12-25 | 2008-01-09 | ウシオ電機株式会社 | 閃光放射装置および光加熱装置 |
| JP4140279B2 (ja) * | 2002-05-22 | 2008-08-27 | ウシオ電機株式会社 | フラッシュランプ装置および閃光放射装置 |
| EP1375445A1 (fr) * | 2002-06-17 | 2004-01-02 | Glaverbel | Procédé de fabrication d'un vitrage pourvu d'un revêtement multicouche |
| FR2858975B1 (fr) * | 2003-08-20 | 2006-01-27 | Saint Gobain | Substrat transparent revetu d'un empilement de couches minces a proprietes de reflexion dans l'infrarouge et/ou dans le domaine du rayonnement solaire |
| FR2911130B1 (fr) * | 2007-01-05 | 2009-11-27 | Saint Gobain | Procede de depot de couche mince et produit obtenu |
| JP5465373B2 (ja) * | 2007-09-12 | 2014-04-09 | 大日本スクリーン製造株式会社 | 熱処理装置 |
| JP5236405B2 (ja) * | 2008-09-12 | 2013-07-17 | 住友化学株式会社 | 透明電極膜の改質方法及び透明電極膜付基板の製造方法 |
| CN101531471A (zh) * | 2009-03-10 | 2009-09-16 | 上海耀华皮尔金顿玻璃股份有限公司 | 双银复合结构可钢化低辐射镀膜玻璃及其工艺 |
| FR2946639B1 (fr) * | 2009-06-12 | 2011-07-15 | Saint Gobain | Procede de depot de couche mince et produit obtenu. |
| FR2969391B1 (fr) * | 2010-12-17 | 2013-07-05 | Saint Gobain | Procédé de fabrication d'un dispositif oled |
| US20120156827A1 (en) * | 2010-12-17 | 2012-06-21 | General Electric Company | Method for forming cadmium tin oxide layer and a photovoltaic device |
-
2011
- 2011-10-18 FR FR1159389A patent/FR2981346B1/fr not_active Expired - Fee Related
-
2012
- 2012-10-18 JP JP2014536314A patent/JP6219830B2/ja not_active Expired - Fee Related
- 2012-10-18 BR BR112014007659A patent/BR112014007659A2/pt not_active Application Discontinuation
- 2012-10-18 CA CA2849422A patent/CA2849422A1/fr not_active Abandoned
- 2012-10-18 US US14/352,903 patent/US20140272465A1/en not_active Abandoned
- 2012-10-18 EP EP12790591.7A patent/EP2768785B1/fr not_active Not-in-force
- 2012-10-18 DE DE202012013088.9U patent/DE202012013088U1/de not_active Expired - Lifetime
- 2012-10-18 CN CN201280050807.5A patent/CN103874667A/zh active Pending
- 2012-10-18 CN CN201810153629.8A patent/CN108285279A/zh active Pending
- 2012-10-18 EA EA201490810A patent/EA033169B1/ru not_active IP Right Cessation
- 2012-10-18 WO PCT/FR2012/052368 patent/WO2013057428A1/fr active Application Filing
- 2012-10-18 IN IN2556CHN2014 patent/IN2014CN02556A/en unknown
- 2012-10-18 KR KR1020147009929A patent/KR20140088520A/ko not_active Application Discontinuation
- 2012-10-18 MX MX2014004552A patent/MX360956B/es active IP Right Grant
- 2012-10-18 PL PL12790591T patent/PL2768785T3/pl unknown
-
2017
- 2017-07-27 JP JP2017145528A patent/JP6526118B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| PL2768785T3 (pl) | 2020-01-31 |
| BR112014007659A2 (pt) | 2017-04-11 |
| JP6526118B2 (ja) | 2019-06-05 |
| MX2014004552A (es) | 2014-08-01 |
| MX360956B (es) | 2018-11-23 |
| FR2981346A1 (fr) | 2013-04-19 |
| EP2768785B1 (fr) | 2019-07-10 |
| JP2018012639A (ja) | 2018-01-25 |
| FR2981346B1 (fr) | 2014-01-24 |
| JP2015505790A (ja) | 2015-02-26 |
| AU2012324666A1 (en) | 2014-06-05 |
| CA2849422A1 (fr) | 2013-04-25 |
| KR20140088520A (ko) | 2014-07-10 |
| EA033169B1 (ru) | 2019-09-30 |
| CN108285279A (zh) | 2018-07-17 |
| CN103874667A (zh) | 2014-06-18 |
| JP6219830B2 (ja) | 2017-10-25 |
| IN2014CN02556A (ru) | 2015-08-07 |
| US20140272465A1 (en) | 2014-09-18 |
| EP2768785A1 (fr) | 2014-08-27 |
| DE202012013088U1 (de) | 2014-10-27 |
| WO2013057428A1 (fr) | 2013-04-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Lapse of a eurasian patent due to non-payment of renewal fees within the time limit in the following designated state(s) |
Designated state(s): AM AZ BY KZ KG TJ TM |