JP2009187949A5 - - Google Patents

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Publication number
JP2009187949A5
JP2009187949A5 JP2009027373A JP2009027373A JP2009187949A5 JP 2009187949 A5 JP2009187949 A5 JP 2009187949A5 JP 2009027373 A JP2009027373 A JP 2009027373A JP 2009027373 A JP2009027373 A JP 2009027373A JP 2009187949 A5 JP2009187949 A5 JP 2009187949A5
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JP
Japan
Prior art keywords
charged particle
particle beam
detection unit
primary
primary charged
Prior art date
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Granted
Application number
JP2009027373A
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English (en)
Japanese (ja)
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JP4879288B2 (ja
JP2009187949A (ja
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Publication date
Priority claimed from EP08101448A external-priority patent/EP2088614B1/en
Application filed filed Critical
Publication of JP2009187949A publication Critical patent/JP2009187949A/ja
Publication of JP2009187949A5 publication Critical patent/JP2009187949A5/ja
Application granted granted Critical
Publication of JP4879288B2 publication Critical patent/JP4879288B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009027373A 2008-02-08 2009-02-09 ビーム電流キャリブレーションシステム Expired - Fee Related JP4879288B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US2733508P 2008-02-08 2008-02-08
US61/027,335 2008-02-08
EP08101448A EP2088614B1 (en) 2008-02-08 2008-02-08 Beam current calibration system
EP08101448.2 2008-02-08

Publications (3)

Publication Number Publication Date
JP2009187949A JP2009187949A (ja) 2009-08-20
JP2009187949A5 true JP2009187949A5 (https=) 2011-12-08
JP4879288B2 JP4879288B2 (ja) 2012-02-22

Family

ID=39590844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009027373A Expired - Fee Related JP4879288B2 (ja) 2008-02-08 2009-02-09 ビーム電流キャリブレーションシステム

Country Status (4)

Country Link
US (1) US7982179B2 (https=)
EP (1) EP2088614B1 (https=)
JP (1) JP4879288B2 (https=)
DE (1) DE602008003970D1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
EP2365511B1 (en) 2010-03-10 2013-05-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Feedback loop for emitter flash cleaning
WO2012086419A1 (ja) * 2010-12-22 2012-06-28 株式会社日立ハイテクノロジーズ 荷電粒子放出銃及び荷電粒子線装置
US10049852B2 (en) 2014-11-05 2018-08-14 Howmedica Osteonics Corp. Assessment and calibration of a high energy beam
US9620331B1 (en) * 2015-11-19 2017-04-11 Carl Zeiss Microscopy Ltd. Method for analyzing an object and charged particle beam device for carrying out the method
AU2018273352B2 (en) 2017-05-22 2023-07-27 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
US10245448B2 (en) * 2017-07-21 2019-04-02 Varian Medical Systems Particle Therapy Gmbh Particle beam monitoring systems and methods
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US11117195B2 (en) 2018-07-19 2021-09-14 The University Of Liverpool System and process for in-process electron beam profile and location analyses
EP3716313A1 (en) * 2019-03-28 2020-09-30 ASML Netherlands B.V. Aperture array with integrated current measurement
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
JP7076021B1 (ja) * 2021-03-10 2022-05-26 浜松ホトニクス株式会社 ライトガイド、電子線検出器、及び荷電粒子装置
DE102021118561B4 (de) 2021-07-19 2023-03-30 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskopes mit schneller Strahlstromregelung, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop
US12237142B2 (en) 2022-06-16 2025-02-25 Fei Company Methods for determining the virtual source location of a liquid metal ion source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3842271A (en) * 1973-04-24 1974-10-15 American Optical Corp Scanning electron microscope
JPH0487244A (ja) * 1990-07-27 1992-03-19 Hitachi Ltd 走査型電子顕微鏡
US5345085A (en) * 1993-03-26 1994-09-06 Etec Systems, Inc. Method and structure for electronically measuring beam parameters
JPH07105888A (ja) * 1993-10-05 1995-04-21 Jeol Ltd 走査電子顕微鏡
JP2001202912A (ja) * 2000-01-21 2001-07-27 Nikon Corp 荷電粒子線装置の開口と光軸の軸合わせ方法
US6545277B1 (en) * 2000-08-15 2003-04-08 Applied Materials, Inc. High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM
EP1255278B1 (en) * 2001-04-24 2005-06-15 Advantest Corporation Scanning particle mirror microscope
EP1768162A3 (en) * 2001-10-05 2007-05-09 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Multiple electron beam device
US6639219B2 (en) * 2001-11-09 2003-10-28 International Business Machines Corporation Electron scatter in a thin membrane to eliminate detector saturation

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