JP4879288B2 - ビーム電流キャリブレーションシステム - Google Patents

ビーム電流キャリブレーションシステム Download PDF

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Publication number
JP4879288B2
JP4879288B2 JP2009027373A JP2009027373A JP4879288B2 JP 4879288 B2 JP4879288 B2 JP 4879288B2 JP 2009027373 A JP2009027373 A JP 2009027373A JP 2009027373 A JP2009027373 A JP 2009027373A JP 4879288 B2 JP4879288 B2 JP 4879288B2
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JP
Japan
Prior art keywords
charged particle
particle beam
detection unit
primary
primary charged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2009027373A
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English (en)
Japanese (ja)
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JP2009187949A (ja
JP2009187949A5 (https=
Inventor
アダメック パヴェル
シュー ファン
Original Assignee
アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
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Application filed by アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー filed Critical アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー
Publication of JP2009187949A publication Critical patent/JP2009187949A/ja
Publication of JP2009187949A5 publication Critical patent/JP2009187949A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2443—Scintillation detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24535—Beam current
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/282—Determination of microscope properties
    • H01J2237/2826—Calibration

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
JP2009027373A 2008-02-08 2009-02-09 ビーム電流キャリブレーションシステム Expired - Fee Related JP4879288B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US2733508P 2008-02-08 2008-02-08
US61/027,335 2008-02-08
EP08101448A EP2088614B1 (en) 2008-02-08 2008-02-08 Beam current calibration system
EP08101448.2 2008-02-08

Publications (3)

Publication Number Publication Date
JP2009187949A JP2009187949A (ja) 2009-08-20
JP2009187949A5 JP2009187949A5 (https=) 2011-12-08
JP4879288B2 true JP4879288B2 (ja) 2012-02-22

Family

ID=39590844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009027373A Expired - Fee Related JP4879288B2 (ja) 2008-02-08 2009-02-09 ビーム電流キャリブレーションシステム

Country Status (4)

Country Link
US (1) US7982179B2 (https=)
EP (1) EP2088614B1 (https=)
JP (1) JP4879288B2 (https=)
DE (1) DE602008003970D1 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009052392A1 (de) * 2009-11-09 2011-12-15 Carl Zeiss Nts Gmbh SACP-Verfahren und teilchenoptisches System zur Ausführung eines solchen Verfahrens
EP2365511B1 (en) 2010-03-10 2013-05-08 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Feedback loop for emitter flash cleaning
WO2012086419A1 (ja) * 2010-12-22 2012-06-28 株式会社日立ハイテクノロジーズ 荷電粒子放出銃及び荷電粒子線装置
US10049852B2 (en) 2014-11-05 2018-08-14 Howmedica Osteonics Corp. Assessment and calibration of a high energy beam
US9620331B1 (en) * 2015-11-19 2017-04-11 Carl Zeiss Microscopy Ltd. Method for analyzing an object and charged particle beam device for carrying out the method
AU2018273352B2 (en) 2017-05-22 2023-07-27 Howmedica Osteonics Corp. Device for in-situ fabrication process monitoring and feedback control of an electron beam additive manufacturing process
US10245448B2 (en) * 2017-07-21 2019-04-02 Varian Medical Systems Particle Therapy Gmbh Particle beam monitoring systems and methods
US10504687B2 (en) * 2018-02-20 2019-12-10 Technische Universiteit Delft Signal separator for a multi-beam charged particle inspection apparatus
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US11117195B2 (en) 2018-07-19 2021-09-14 The University Of Liverpool System and process for in-process electron beam profile and location analyses
EP3716313A1 (en) * 2019-03-28 2020-09-30 ASML Netherlands B.V. Aperture array with integrated current measurement
US11239048B2 (en) * 2020-03-09 2022-02-01 Kla Corporation Arrayed column detector
JP7076021B1 (ja) * 2021-03-10 2022-05-26 浜松ホトニクス株式会社 ライトガイド、電子線検出器、及び荷電粒子装置
DE102021118561B4 (de) 2021-07-19 2023-03-30 Carl Zeiss Multisem Gmbh Verfahren zum Betreiben eines Vielstrahl-Teilchenmikroskopes mit schneller Strahlstromregelung, Computerprogrammprodukt und Vielstrahl-Teilchenmikroskop
US12237142B2 (en) 2022-06-16 2025-02-25 Fei Company Methods for determining the virtual source location of a liquid metal ion source

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3842271A (en) * 1973-04-24 1974-10-15 American Optical Corp Scanning electron microscope
JPH0487244A (ja) * 1990-07-27 1992-03-19 Hitachi Ltd 走査型電子顕微鏡
US5345085A (en) * 1993-03-26 1994-09-06 Etec Systems, Inc. Method and structure for electronically measuring beam parameters
JPH07105888A (ja) * 1993-10-05 1995-04-21 Jeol Ltd 走査電子顕微鏡
JP2001202912A (ja) * 2000-01-21 2001-07-27 Nikon Corp 荷電粒子線装置の開口と光軸の軸合わせ方法
US6545277B1 (en) * 2000-08-15 2003-04-08 Applied Materials, Inc. High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM
EP1255278B1 (en) * 2001-04-24 2005-06-15 Advantest Corporation Scanning particle mirror microscope
EP1768162A3 (en) * 2001-10-05 2007-05-09 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Multiple electron beam device
US6639219B2 (en) * 2001-11-09 2003-10-28 International Business Machines Corporation Electron scatter in a thin membrane to eliminate detector saturation

Also Published As

Publication number Publication date
EP2088614A1 (en) 2009-08-12
US7982179B2 (en) 2011-07-19
JP2009187949A (ja) 2009-08-20
EP2088614B1 (en) 2010-12-15
DE602008003970D1 (de) 2011-01-27
US20090200497A1 (en) 2009-08-13

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