JP2009168913A - 膜パターンの形成方法 - Google Patents

膜パターンの形成方法 Download PDF

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Publication number
JP2009168913A
JP2009168913A JP2008004390A JP2008004390A JP2009168913A JP 2009168913 A JP2009168913 A JP 2009168913A JP 2008004390 A JP2008004390 A JP 2008004390A JP 2008004390 A JP2008004390 A JP 2008004390A JP 2009168913 A JP2009168913 A JP 2009168913A
Authority
JP
Japan
Prior art keywords
photosensitive resin
film pattern
developing
developer
peeling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2008004390A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009168913A5 (https=
Inventor
Yoshimasa Mori
省誠 森
Masahiro Terada
匡宏 寺田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008004390A priority Critical patent/JP2009168913A/ja
Priority to US12/351,127 priority patent/US8153356B2/en
Publication of JP2009168913A publication Critical patent/JP2009168913A/ja
Publication of JP2009168913A5 publication Critical patent/JP2009168913A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008004390A 2008-01-11 2008-01-11 膜パターンの形成方法 Withdrawn JP2009168913A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008004390A JP2009168913A (ja) 2008-01-11 2008-01-11 膜パターンの形成方法
US12/351,127 US8153356B2 (en) 2008-01-11 2009-01-09 Method for forming film pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008004390A JP2009168913A (ja) 2008-01-11 2008-01-11 膜パターンの形成方法

Publications (2)

Publication Number Publication Date
JP2009168913A true JP2009168913A (ja) 2009-07-30
JP2009168913A5 JP2009168913A5 (https=) 2010-07-22

Family

ID=40850937

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008004390A Withdrawn JP2009168913A (ja) 2008-01-11 2008-01-11 膜パターンの形成方法

Country Status (2)

Country Link
US (1) US8153356B2 (https=)
JP (1) JP2009168913A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011124352A (ja) * 2009-12-10 2011-06-23 Tokyo Electron Ltd 現像処理方法、プログラム及びコンピュータ記憶媒体
JP2012113056A (ja) * 2010-11-22 2012-06-14 Nitto Denko Corp 半導体装置用実装品の製法
JP2014158035A (ja) * 2010-08-06 2014-08-28 Brewer Science Inc 薄ウェーハハンドリングのための多層接合層

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5858987B2 (ja) * 2010-05-04 2016-02-10 エルジー・ケム・リミテッド ネガティブフォトレジスト組成物および素子のパターニング方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3061790B1 (ja) 1999-02-10 2000-07-10 株式会社半導体先端テクノロジーズ マスク製造方法及びパタ―ン形成方法
US7413942B2 (en) * 2004-01-29 2008-08-19 Rohm And Haas Electronic Materials Llc T-gate formation
JP4294521B2 (ja) * 2004-03-19 2009-07-15 東京応化工業株式会社 ネガ型レジスト組成物及びそれを用いたパターン形成方法

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011124352A (ja) * 2009-12-10 2011-06-23 Tokyo Electron Ltd 現像処理方法、プログラム及びコンピュータ記憶媒体
JP2014158035A (ja) * 2010-08-06 2014-08-28 Brewer Science Inc 薄ウェーハハンドリングのための多層接合層
US9224631B2 (en) 2010-08-06 2015-12-29 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
US9263314B2 (en) 2010-08-06 2016-02-16 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
US9472436B2 (en) 2010-08-06 2016-10-18 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
JP2012113056A (ja) * 2010-11-22 2012-06-14 Nitto Denko Corp 半導体装置用実装品の製法

Also Published As

Publication number Publication date
US20090181331A1 (en) 2009-07-16
US8153356B2 (en) 2012-04-10

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