JP2009168913A5 - - Google Patents
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- Publication number
- JP2009168913A5 JP2009168913A5 JP2008004390A JP2008004390A JP2009168913A5 JP 2009168913 A5 JP2009168913 A5 JP 2009168913A5 JP 2008004390 A JP2008004390 A JP 2008004390A JP 2008004390 A JP2008004390 A JP 2008004390A JP 2009168913 A5 JP2009168913 A5 JP 2009168913A5
- Authority
- JP
- Japan
- Prior art keywords
- film pattern
- photosensitive resin
- developer
- forming
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 claims 7
- 239000011347 resin Substances 0.000 claims 7
- 229920005989 resin Polymers 0.000 claims 7
- 239000000758 substrate Substances 0.000 claims 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 4
- 238000000151 deposition Methods 0.000 claims 3
- 229920002120 photoresistant polymer Polymers 0.000 claims 3
- 239000000243 solution Substances 0.000 claims 3
- 239000003513 alkali Substances 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 2
- 230000008021 deposition Effects 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 1
- 125000002843 carboxylic acid group Chemical group 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008004390A JP2009168913A (ja) | 2008-01-11 | 2008-01-11 | 膜パターンの形成方法 |
| US12/351,127 US8153356B2 (en) | 2008-01-11 | 2009-01-09 | Method for forming film pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008004390A JP2009168913A (ja) | 2008-01-11 | 2008-01-11 | 膜パターンの形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009168913A JP2009168913A (ja) | 2009-07-30 |
| JP2009168913A5 true JP2009168913A5 (https=) | 2010-07-22 |
Family
ID=40850937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008004390A Withdrawn JP2009168913A (ja) | 2008-01-11 | 2008-01-11 | 膜パターンの形成方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8153356B2 (https=) |
| JP (1) | JP2009168913A (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011124352A (ja) * | 2009-12-10 | 2011-06-23 | Tokyo Electron Ltd | 現像処理方法、プログラム及びコンピュータ記憶媒体 |
| JP5858987B2 (ja) * | 2010-05-04 | 2016-02-10 | エルジー・ケム・リミテッド | ネガティブフォトレジスト組成物および素子のパターニング方法 |
| US9263314B2 (en) | 2010-08-06 | 2016-02-16 | Brewer Science Inc. | Multiple bonding layers for thin-wafer handling |
| JP5462771B2 (ja) * | 2010-11-22 | 2014-04-02 | 日東電工株式会社 | 半導体装置用実装品の製法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3061790B1 (ja) | 1999-02-10 | 2000-07-10 | 株式会社半導体先端テクノロジーズ | マスク製造方法及びパタ―ン形成方法 |
| US7413942B2 (en) * | 2004-01-29 | 2008-08-19 | Rohm And Haas Electronic Materials Llc | T-gate formation |
| JP4294521B2 (ja) * | 2004-03-19 | 2009-07-15 | 東京応化工業株式会社 | ネガ型レジスト組成物及びそれを用いたパターン形成方法 |
-
2008
- 2008-01-11 JP JP2008004390A patent/JP2009168913A/ja not_active Withdrawn
-
2009
- 2009-01-09 US US12/351,127 patent/US8153356B2/en not_active Expired - Fee Related
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