JP2009110945A5 - - Google Patents
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- Publication number
- JP2009110945A5 JP2009110945A5 JP2008261277A JP2008261277A JP2009110945A5 JP 2009110945 A5 JP2009110945 A5 JP 2009110945A5 JP 2008261277 A JP2008261277 A JP 2008261277A JP 2008261277 A JP2008261277 A JP 2008261277A JP 2009110945 A5 JP2009110945 A5 JP 2009110945A5
- Authority
- JP
- Japan
- Prior art keywords
- layer
- organic compound
- opening
- oxide layer
- fluorocarbon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000010410 layer Substances 0.000 claims 82
- 150000002894 organic compounds Chemical class 0.000 claims 28
- 239000002346 layers by function Substances 0.000 claims 19
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims 17
- 229920005989 resin Polymers 0.000 claims 10
- 239000011347 resin Substances 0.000 claims 10
- 239000000463 material Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 238000005192 partition Methods 0.000 claims 6
- 239000004925 Acrylic resin Substances 0.000 claims 5
- 229920000178 Acrylic resin Polymers 0.000 claims 5
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 5
- 229920003986 novolac Polymers 0.000 claims 5
- 239000005011 phenolic resin Substances 0.000 claims 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 5
- 229920002554 vinyl polymer Polymers 0.000 claims 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 3
- 229910052731 fluorine Inorganic materials 0.000 claims 3
- 239000011737 fluorine Substances 0.000 claims 3
- 238000007599 discharging Methods 0.000 claims 2
- 239000003960 organic solvent Substances 0.000 claims 2
- 239000004952 Polyamide Substances 0.000 claims 1
- 239000004642 Polyimide Substances 0.000 claims 1
- 239000004760 aramid Substances 0.000 claims 1
- 229920003235 aromatic polyamide Polymers 0.000 claims 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 229920005575 poly(amic acid) Polymers 0.000 claims 1
- 229920002647 polyamide Polymers 0.000 claims 1
- 229920001721 polyimide Polymers 0.000 claims 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008261277A JP5271657B2 (ja) | 2007-10-11 | 2008-10-08 | 表示装置及び表示装置の作製方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007265334 | 2007-10-11 | ||
| JP2007265334 | 2007-10-11 | ||
| JP2008261277A JP5271657B2 (ja) | 2007-10-11 | 2008-10-08 | 表示装置及び表示装置の作製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009110945A JP2009110945A (ja) | 2009-05-21 |
| JP2009110945A5 true JP2009110945A5 (https=) | 2011-10-27 |
| JP5271657B2 JP5271657B2 (ja) | 2013-08-21 |
Family
ID=40533529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008261277A Expired - Fee Related JP5271657B2 (ja) | 2007-10-11 | 2008-10-08 | 表示装置及び表示装置の作製方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US8083956B2 (https=) |
| JP (1) | JP5271657B2 (https=) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5417732B2 (ja) * | 2008-03-31 | 2014-02-19 | 住友化学株式会社 | 親液撥液パターンの形成方法および有機エレクトロルミネッセンス素子の製造方法 |
| KR102383642B1 (ko) | 2008-07-10 | 2022-04-08 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 발광장치 및 전자기기 |
| EP2398084B1 (en) * | 2009-02-10 | 2018-06-06 | Joled Inc. | Light-emitting element, light-emitting device comprising light-emitting element, and method for manufacturing light-emitting element |
| KR102577885B1 (ko) * | 2009-10-16 | 2023-09-14 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 반도체 장치 |
| US8153528B1 (en) * | 2009-11-20 | 2012-04-10 | Integrated Photovoltaic, Inc. | Surface characteristics of graphite and graphite foils |
| KR101643009B1 (ko) * | 2009-12-22 | 2016-07-27 | 가부시키가이샤 제이올레드 | 표시 장치와 그 제조 방법 |
| KR101077424B1 (ko) * | 2010-07-23 | 2011-10-26 | 삼성전기주식회사 | 터치패널 및 그 제조방법 |
| WO2012017486A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 発光素子の製造方法 |
| WO2012017496A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 発光素子、発光素子を備えた発光装置および発光素子の製造方法 |
| WO2012017495A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子およびその製造方法 |
| WO2012017497A1 (ja) | 2010-08-06 | 2012-02-09 | パナソニック株式会社 | 有機el素子 |
| JP5543600B2 (ja) | 2010-08-06 | 2014-07-09 | パナソニック株式会社 | 発光素子、発光素子を備えた発光装置および発光素子の製造方法 |
| JP5677432B2 (ja) | 2010-08-06 | 2015-02-25 | パナソニック株式会社 | 有機el素子、表示装置および発光装置 |
| WO2012049712A1 (ja) * | 2010-10-15 | 2012-04-19 | パナソニック株式会社 | 有機発光パネルとその製造方法、および有機表示装置 |
| WO2012049719A1 (ja) | 2010-10-15 | 2012-04-19 | パナソニック株式会社 | 有機発光パネルとその製造方法、および有機表示装置 |
| WO2012049716A1 (ja) | 2010-10-15 | 2012-04-19 | パナソニック株式会社 | 有機発光パネルとその製造方法、および有機表示装置 |
| JP2012103474A (ja) * | 2010-11-10 | 2012-05-31 | Toppan Printing Co Ltd | カラーフィルタ基板の製造方法及びカラーフィルタ基板、並びにこれを用いた液晶表示装置 |
| JP5776296B2 (ja) * | 2011-04-18 | 2015-09-09 | セイコーエプソン株式会社 | カラーフィルター基板、電気光学装置および電子機器 |
| DE102012002650B4 (de) * | 2012-02-10 | 2013-10-31 | Demmel Ag | Verfahren und Vorrichtung zur Herstellung einer Dekorblende |
| US8946985B2 (en) * | 2012-05-07 | 2015-02-03 | Samsung Display Co., Ltd. | Flexible touch screen panel and flexible display device with the same |
| CN104123925B (zh) * | 2014-07-11 | 2016-05-11 | 京东方科技集团股份有限公司 | 一种显示器、显示方法及装置 |
| KR20160092110A (ko) * | 2015-01-26 | 2016-08-04 | 삼성디스플레이 주식회사 | 유기 발광 표시 장치 |
| WO2019106716A1 (ja) | 2017-11-28 | 2019-06-06 | 堺ディスプレイプロダクト株式会社 | 有機el発光素子及びその製造方法 |
| KR102511870B1 (ko) | 2017-12-15 | 2023-03-20 | 삼성전기주식회사 | 인덕터 |
| JP6752305B2 (ja) * | 2019-01-17 | 2020-09-09 | 堺ディスプレイプロダクト株式会社 | 有機el発光素子及びその製造方法 |
| JP2019102466A (ja) * | 2019-01-17 | 2019-06-24 | 堺ディスプレイプロダクト株式会社 | 有機el発光素子及びその製造方法 |
| JP6755344B2 (ja) * | 2019-01-17 | 2020-09-16 | 堺ディスプレイプロダクト株式会社 | 有機el発光素子及びその製造方法 |
| US11121345B2 (en) * | 2019-11-26 | 2021-09-14 | Applied Materials, Inc. | Structures and methods of OLED display fabrication suited for deposition of light enhancing layer |
| KR102911183B1 (ko) * | 2019-12-31 | 2026-01-14 | 삼성디스플레이 주식회사 | 색변환 부재 및 이를 포함하는 표시 장치 |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999048339A1 (en) | 1998-03-17 | 1999-09-23 | Seiko Epson Corporation | Substrate for patterning thin film and surface treatment thereof |
| TW471011B (en) * | 1999-10-13 | 2002-01-01 | Semiconductor Energy Lab | Thin film forming apparatus |
| JP2001272527A (ja) * | 2000-03-27 | 2001-10-05 | Dainippon Printing Co Ltd | カラーフィルタおよびその製造方法 |
| US6885146B2 (en) * | 2002-03-14 | 2005-04-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device comprising substrates, contrast medium and barrier layers between contrast medium and each of substrates |
| US7285440B2 (en) * | 2002-11-25 | 2007-10-23 | International Business Machines Corporation | Organic underlayers that improve the performance of organic semiconductors |
| JP2004296424A (ja) * | 2003-03-11 | 2004-10-21 | Advanced Lcd Technologies Development Center Co Ltd | 金属層の形成方法、金属層、及び金属層を用いた表示装置 |
| JP2004294878A (ja) * | 2003-03-27 | 2004-10-21 | Seiko Epson Corp | 微細構造物の製造方法、デバイス、光学素子、集積回路及び電子機器 |
| JP2004319119A (ja) * | 2003-04-11 | 2004-11-11 | Toshiba Matsushita Display Technology Co Ltd | 表示装置及びその製造方法 |
| JP4628109B2 (ja) * | 2003-04-25 | 2011-02-09 | 株式会社半導体エネルギー研究所 | 半導体装置の作製方法 |
| CN100380596C (zh) * | 2003-04-25 | 2008-04-09 | 株式会社半导体能源研究所 | 液滴排出装置、图案的形成方法及半导体装置的制造方法 |
| US7192859B2 (en) * | 2003-05-16 | 2007-03-20 | Semiconductor Energy Laboratory Co., Ltd. | Method of manufacturing semiconductor device and display device |
| JP3923462B2 (ja) * | 2003-10-02 | 2007-05-30 | 株式会社半導体エネルギー研究所 | 薄膜トランジスタの作製方法 |
| US7226819B2 (en) * | 2003-10-28 | 2007-06-05 | Semiconductor Energy Laboratory Co., Ltd. | Methods for forming wiring and manufacturing thin film transistor and droplet discharging method |
| JP5093985B2 (ja) * | 2004-01-16 | 2012-12-12 | 株式会社半導体エネルギー研究所 | 膜パターンの形成方法 |
| US8053171B2 (en) * | 2004-01-16 | 2011-11-08 | Semiconductor Energy Laboratory Co., Ltd. | Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television |
| US7273773B2 (en) * | 2004-01-26 | 2007-09-25 | Semiconductor Energy Laboratory Co., Ltd. | Display device, method for manufacturing thereof, and television device |
| TWI366701B (en) * | 2004-01-26 | 2012-06-21 | Semiconductor Energy Lab | Method of manufacturing display and television |
| JP4557755B2 (ja) * | 2004-03-11 | 2010-10-06 | キヤノン株式会社 | 基板、導電性基板および有機電界効果型トランジスタの各々の製造方法 |
| US7476572B2 (en) * | 2004-03-25 | 2009-01-13 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing thin film transistor |
| TWI367686B (en) * | 2004-04-07 | 2012-07-01 | Semiconductor Energy Lab | Light emitting device, electronic device, and television device |
| US7732334B2 (en) * | 2004-08-23 | 2010-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing semiconductor device |
| US7470604B2 (en) * | 2004-10-08 | 2008-12-30 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
| US7687326B2 (en) * | 2004-12-17 | 2010-03-30 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
| JP4693619B2 (ja) * | 2004-12-17 | 2011-06-01 | 株式会社半導体エネルギー研究所 | 導電層を有する基板の作製方法及び半導体装置の作製方法 |
| US7449372B2 (en) | 2004-12-17 | 2008-11-11 | Semiconductor Energy Laboratory Co., Ltd. | Manufacturing method of substrate having conductive layer and manufacturing method of semiconductor device |
| EP1846952A4 (en) * | 2005-02-10 | 2012-11-07 | Semiconductor Energy Lab | SEMICONDUCTOR COMPONENT AND METHOD FOR THE PRODUCTION THEREOF |
| JP4788161B2 (ja) * | 2005-03-03 | 2011-10-05 | セイコーエプソン株式会社 | 塗布液組成物、薄膜形成方法および有機薄膜 |
| JP4592473B2 (ja) * | 2005-03-31 | 2010-12-01 | 三洋電機株式会社 | 発光パネルの製造方法、表示パネルの製造方法及び表示パネル |
| GB2430201A (en) * | 2005-09-20 | 2007-03-21 | Seiko Epson Corp | Substrate surface with different hydrophilic or oleophilic areas |
| GB2430547A (en) * | 2005-09-20 | 2007-03-28 | Seiko Epson Corp | A method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface |
| GB2430178A (en) | 2005-09-20 | 2007-03-21 | Seiko Epson Corp | Method of producing a substrate having areas of different hydrophilicity and/or oleophilicity on the same surface |
| TW200802843A (en) * | 2006-05-10 | 2008-01-01 | Casio Computer Co Ltd | Display device and manufacturing method thereof |
| US7879390B2 (en) * | 2007-05-30 | 2011-02-01 | Palo Alto Research Center Incorporated | Surface energy control methods for color filter printing |
| US8017422B2 (en) * | 2007-06-19 | 2011-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Method for forming pattern, method for manufacturing light emitting device, and light emitting device |
| US20090072225A1 (en) * | 2007-09-18 | 2009-03-19 | Electronics And Telecommunications Research Institute | Flat panel display device having organic thin film transistor and manufacturing method thereof |
| JP2009134274A (ja) * | 2007-10-30 | 2009-06-18 | Semiconductor Energy Lab Co Ltd | 液晶表示装置の作製方法 |
| JP5417732B2 (ja) * | 2008-03-31 | 2014-02-19 | 住友化学株式会社 | 親液撥液パターンの形成方法および有機エレクトロルミネッセンス素子の製造方法 |
-
2008
- 2008-10-07 US US12/246,947 patent/US8083956B2/en not_active Expired - Fee Related
- 2008-10-08 JP JP2008261277A patent/JP5271657B2/ja not_active Expired - Fee Related
-
2011
- 2011-12-21 US US13/333,304 patent/US8847482B2/en not_active Expired - Fee Related
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