JP2009086384A - フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 - Google Patents

フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 Download PDF

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Publication number
JP2009086384A
JP2009086384A JP2007256931A JP2007256931A JP2009086384A JP 2009086384 A JP2009086384 A JP 2009086384A JP 2007256931 A JP2007256931 A JP 2007256931A JP 2007256931 A JP2007256931 A JP 2007256931A JP 2009086384 A JP2009086384 A JP 2009086384A
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JP
Japan
Prior art keywords
light
pattern
semi
mask
film
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Pending
Application number
JP2007256931A
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English (en)
Japanese (ja)
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JP2009086384A5 (https=
Inventor
Michiaki Sano
道明 佐野
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Hoya Corp
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Hoya Corp
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Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2007256931A priority Critical patent/JP2009086384A/ja
Priority to TW097136430A priority patent/TW200933289A/zh
Priority to KR1020080094415A priority patent/KR20090033314A/ko
Priority to CN2008101681334A priority patent/CN101398612B/zh
Publication of JP2009086384A publication Critical patent/JP2009086384A/ja
Publication of JP2009086384A5 publication Critical patent/JP2009086384A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • H10P76/20—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials
    • H10P76/204—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography of masks comprising organic materials of organic photoresist masks
    • H10P76/2041—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007256931A 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 Pending JP2009086384A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007256931A JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
TW097136430A TW200933289A (en) 2007-09-29 2008-09-23 Photomask, method of manufacturing the photomask, and method of transferring a pattern
KR1020080094415A KR20090033314A (ko) 2007-09-29 2008-09-26 포토마스크 및 포토마스크의 제조 방법과 패턴 전사 방법
CN2008101681334A CN101398612B (zh) 2007-09-29 2008-09-28 光掩膜及光掩膜的制造方法、以及图案转印方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007256931A JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Publications (2)

Publication Number Publication Date
JP2009086384A true JP2009086384A (ja) 2009-04-23
JP2009086384A5 JP2009086384A5 (https=) 2010-11-18

Family

ID=40517248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007256931A Pending JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Country Status (4)

Country Link
JP (1) JP2009086384A (https=)
KR (1) KR20090033314A (https=)
CN (1) CN101398612B (https=)
TW (1) TW200933289A (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP2009122295A (ja) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd フォトマスク
TWI679489B (zh) * 2017-10-01 2019-12-11 南韓商S&S技術股份有限公司 用於防止靜電破壞的空白遮罩和光遮罩

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106773345B (zh) 2016-12-20 2019-12-24 惠科股份有限公司 显示面板、显示面板的制程及光罩
TWI710850B (zh) * 2018-03-23 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法
CN109143775A (zh) * 2018-08-29 2019-01-04 上海华力集成电路制造有限公司 降低光罩静电放电风险的方法及其得到的光罩图形
CN111736435A (zh) * 2020-07-23 2020-10-02 上海华力微电子有限公司 光刻装置及其曝光方法
CN112711174A (zh) * 2020-12-28 2021-04-27 Tcl华星光电技术有限公司 光罩、阵列基板的制备方法与显示面板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131823A (ja) * 1998-10-27 2000-05-12 New Japan Radio Co Ltd 半導体レチクル・マスク
JP2002278048A (ja) * 2001-03-16 2002-09-27 Canon Inc フォトマスク及びカラーフィルタ製造方法
JP2005037933A (ja) * 2003-06-30 2005-02-10 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク
JP2007093798A (ja) * 2005-09-27 2007-04-12 Sharp Corp フォトマスク及びその製造方法
JP2009086383A (ja) * 2007-09-29 2009-04-23 Hoya Corp グレートーンマスク、パターン転写方法、及びグレートーンマスクブランク

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210166B2 (ja) * 2003-06-30 2009-01-14 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
CN100517075C (zh) * 2006-03-09 2009-07-22 北京京东方光电科技有限公司 一种薄膜晶体管液晶显示器的阵列基板的制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131823A (ja) * 1998-10-27 2000-05-12 New Japan Radio Co Ltd 半導体レチクル・マスク
JP2002278048A (ja) * 2001-03-16 2002-09-27 Canon Inc フォトマスク及びカラーフィルタ製造方法
JP2005037933A (ja) * 2003-06-30 2005-02-10 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク
JP2007093798A (ja) * 2005-09-27 2007-04-12 Sharp Corp フォトマスク及びその製造方法
JP2009086383A (ja) * 2007-09-29 2009-04-23 Hoya Corp グレートーンマスク、パターン転写方法、及びグレートーンマスクブランク

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP2009122295A (ja) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd フォトマスク
TWI679489B (zh) * 2017-10-01 2019-12-11 南韓商S&S技術股份有限公司 用於防止靜電破壞的空白遮罩和光遮罩

Also Published As

Publication number Publication date
KR20090033314A (ko) 2009-04-02
TW200933289A (en) 2009-08-01
CN101398612A (zh) 2009-04-01
CN101398612B (zh) 2011-11-23

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