JP2009086384A - フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 - Google Patents

フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 Download PDF

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Publication number
JP2009086384A
JP2009086384A JP2007256931A JP2007256931A JP2009086384A JP 2009086384 A JP2009086384 A JP 2009086384A JP 2007256931 A JP2007256931 A JP 2007256931A JP 2007256931 A JP2007256931 A JP 2007256931A JP 2009086384 A JP2009086384 A JP 2009086384A
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JP
Japan
Prior art keywords
light
pattern
semi
mask
film
Prior art date
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Pending
Application number
JP2007256931A
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English (en)
Japanese (ja)
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JP2009086384A5 (enExample
Inventor
Michiaki Sano
道明 佐野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
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Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP2007256931A priority Critical patent/JP2009086384A/ja
Priority to TW097136430A priority patent/TW200933289A/zh
Priority to KR1020080094415A priority patent/KR20090033314A/ko
Priority to CN2008101681334A priority patent/CN101398612B/zh
Publication of JP2009086384A publication Critical patent/JP2009086384A/ja
Publication of JP2009086384A5 publication Critical patent/JP2009086384A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007256931A 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法 Pending JP2009086384A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007256931A JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
TW097136430A TW200933289A (en) 2007-09-29 2008-09-23 Photomask, method of manufacturing the photomask, and method of transferring a pattern
KR1020080094415A KR20090033314A (ko) 2007-09-29 2008-09-26 포토마스크 및 포토마스크의 제조 방법과 패턴 전사 방법
CN2008101681334A CN101398612B (zh) 2007-09-29 2008-09-28 光掩膜及光掩膜的制造方法、以及图案转印方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007256931A JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Publications (2)

Publication Number Publication Date
JP2009086384A true JP2009086384A (ja) 2009-04-23
JP2009086384A5 JP2009086384A5 (enExample) 2010-11-18

Family

ID=40517248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007256931A Pending JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法

Country Status (4)

Country Link
JP (1) JP2009086384A (enExample)
KR (1) KR20090033314A (enExample)
CN (1) CN101398612B (enExample)
TW (1) TW200933289A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP2009122295A (ja) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd フォトマスク
TWI679489B (zh) * 2017-10-01 2019-12-11 南韓商S&S技術股份有限公司 用於防止靜電破壞的空白遮罩和光遮罩

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106773345B (zh) * 2016-12-20 2019-12-24 惠科股份有限公司 显示面板、显示面板的制程及光罩
TWI710850B (zh) * 2018-03-23 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法
CN109143775A (zh) * 2018-08-29 2019-01-04 上海华力集成电路制造有限公司 降低光罩静电放电风险的方法及其得到的光罩图形
CN111736435A (zh) * 2020-07-23 2020-10-02 上海华力微电子有限公司 光刻装置及其曝光方法
CN112711174A (zh) * 2020-12-28 2021-04-27 Tcl华星光电技术有限公司 光罩、阵列基板的制备方法与显示面板

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131823A (ja) * 1998-10-27 2000-05-12 New Japan Radio Co Ltd 半導体レチクル・マスク
JP2002278048A (ja) * 2001-03-16 2002-09-27 Canon Inc フォトマスク及びカラーフィルタ製造方法
JP2005037933A (ja) * 2003-06-30 2005-02-10 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク
JP2007093798A (ja) * 2005-09-27 2007-04-12 Sharp Corp フォトマスク及びその製造方法
JP2009086383A (ja) * 2007-09-29 2009-04-23 Hoya Corp グレートーンマスク、パターン転写方法、及びグレートーンマスクブランク

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4210166B2 (ja) * 2003-06-30 2009-01-14 Ｈｏｙａ株式会社 グレートーンマスクの製造方法
CN100517075C (zh) * 2006-03-09 2009-07-22 北京京东方光电科技有限公司 一种薄膜晶体管液晶显示器的阵列基板的制作方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131823A (ja) * 1998-10-27 2000-05-12 New Japan Radio Co Ltd 半導体レチクル・マスク
JP2002278048A (ja) * 2001-03-16 2002-09-27 Canon Inc フォトマスク及びカラーフィルタ製造方法
JP2005037933A (ja) * 2003-06-30 2005-02-10 Hoya Corp グレートーンマスクの製造方法及びグレートーンマスク
JP2007093798A (ja) * 2005-09-27 2007-04-12 Sharp Corp フォトマスク及びその製造方法
JP2009086383A (ja) * 2007-09-29 2009-04-23 Hoya Corp グレートーンマスク、パターン転写方法、及びグレートーンマスクブランク

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP2009122295A (ja) * 2007-11-14 2009-06-04 Dainippon Printing Co Ltd フォトマスク
TWI679489B (zh) * 2017-10-01 2019-12-11 南韓商S&S技術股份有限公司 用於防止靜電破壞的空白遮罩和光遮罩

Also Published As

Publication number Publication date
CN101398612B (zh) 2011-11-23
CN101398612A (zh) 2009-04-01
KR20090033314A (ko) 2009-04-02
TW200933289A (en) 2009-08-01

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