CN101398612B - 光掩膜及光掩膜的制造方法、以及图案转印方法 - Google Patents

光掩膜及光掩膜的制造方法、以及图案转印方法 Download PDF

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Publication number
CN101398612B
CN101398612B CN2008101681334A CN200810168133A CN101398612B CN 101398612 B CN101398612 B CN 101398612B CN 2008101681334 A CN2008101681334 A CN 2008101681334A CN 200810168133 A CN200810168133 A CN 200810168133A CN 101398612 B CN101398612 B CN 101398612B
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China
Prior art keywords
pattern
semi
mask
photomask
mentioned
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Expired - Fee Related
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CN2008101681334A
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English (en)
Chinese (zh)
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CN101398612A (zh
Inventor
佐野道明
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Hoya Corp
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Hoya Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2008101681334A 2007-09-29 2008-09-28 光掩膜及光掩膜的制造方法、以及图案转印方法 Expired - Fee Related CN101398612B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007256931 2007-09-29
JP2007256931A JP2009086384A (ja) 2007-09-29 2007-09-29 フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP2007-256931 2007-09-29

Publications (2)

Publication Number Publication Date
CN101398612A CN101398612A (zh) 2009-04-01
CN101398612B true CN101398612B (zh) 2011-11-23

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CN2008101681334A Expired - Fee Related CN101398612B (zh) 2007-09-29 2008-09-28 光掩膜及光掩膜的制造方法、以及图案转印方法

Country Status (4)

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JP (1) JP2009086384A (enExample)
KR (1) KR20090033314A (enExample)
CN (1) CN101398612B (enExample)
TW (1) TW200933289A (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009086385A (ja) * 2007-09-29 2009-04-23 Hoya Corp フォトマスク及びフォトマスクの製造方法、並びにパターン転写方法
JP4993113B2 (ja) * 2007-11-14 2012-08-08 大日本印刷株式会社 フォトマスク
CN106773345B (zh) * 2016-12-20 2019-12-24 惠科股份有限公司 显示面板、显示面板的制程及光罩
KR20190038981A (ko) * 2017-10-01 2019-04-10 주식회사 에스앤에스텍 정전 파괴 방지용 블랭크 마스크 및 포토마스크
TWI710850B (zh) * 2018-03-23 2020-11-21 日商Ｈｏｙａ股份有限公司 光罩、光罩基底、光罩之製造方法、及電子元件之製造方法
CN109143775A (zh) * 2018-08-29 2019-01-04 上海华力集成电路制造有限公司 降低光罩静电放电风险的方法及其得到的光罩图形
CN111736435A (zh) * 2020-07-23 2020-10-02 上海华力微电子有限公司 光刻装置及其曝光方法
CN112711174A (zh) * 2020-12-28 2021-04-27 Tcl华星光电技术有限公司 光罩、阵列基板的制备方法与显示面板

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1577084A (zh) * 2003-06-30 2005-02-09 Hoya株式会社 灰调掩模的制造方法
CN101034262A (zh) * 2006-03-09 2007-09-12 京东方科技集团股份有限公司 一种薄膜晶体管液晶显示器的阵列基板的制作方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000131823A (ja) * 1998-10-27 2000-05-12 New Japan Radio Co Ltd 半導体レチクル・マスク
JP2002278048A (ja) * 2001-03-16 2002-09-27 Canon Inc フォトマスク及びカラーフィルタ製造方法
JP4393290B2 (ja) * 2003-06-30 2010-01-06 Ｈｏｙａ株式会社 グレートーンマスクの製造方法及び薄膜トランジスタ基板の製造方法
JP2007093798A (ja) * 2005-09-27 2007-04-12 Sharp Corp フォトマスク及びその製造方法
JP2009086383A (ja) * 2007-09-29 2009-04-23 Hoya Corp グレートーンマスク、パターン転写方法、及びグレートーンマスクブランク

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1577084A (zh) * 2003-06-30 2005-02-09 Hoya株式会社 灰调掩模的制造方法
CN101034262A (zh) * 2006-03-09 2007-09-12 京东方科技集团股份有限公司 一种薄膜晶体管液晶显示器的阵列基板的制作方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2003-248294A 2003.09.05
JP特开2005-189665A 2005.07.14

Also Published As

Publication number Publication date
CN101398612A (zh) 2009-04-01
KR20090033314A (ko) 2009-04-02
TW200933289A (en) 2009-08-01
JP2009086384A (ja) 2009-04-23

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Granted publication date: 20111123

Termination date: 20130928