JP2009037023A5 - - Google Patents

Download PDF

Info

Publication number
JP2009037023A5
JP2009037023A5 JP2007201570A JP2007201570A JP2009037023A5 JP 2009037023 A5 JP2009037023 A5 JP 2009037023A5 JP 2007201570 A JP2007201570 A JP 2007201570A JP 2007201570 A JP2007201570 A JP 2007201570A JP 2009037023 A5 JP2009037023 A5 JP 2009037023A5
Authority
JP
Japan
Prior art keywords
ray
resin layer
photosensitive resin
ultraviolet
absorbing metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007201570A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009037023A (ja
JP4642818B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007201570A priority Critical patent/JP4642818B2/ja
Priority claimed from JP2007201570A external-priority patent/JP4642818B2/ja
Publication of JP2009037023A publication Critical patent/JP2009037023A/ja
Publication of JP2009037023A5 publication Critical patent/JP2009037023A5/ja
Application granted granted Critical
Publication of JP4642818B2 publication Critical patent/JP4642818B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007201570A 2007-08-02 2007-08-02 回折格子の製造方法 Expired - Fee Related JP4642818B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007201570A JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007201570A JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Publications (3)

Publication Number Publication Date
JP2009037023A JP2009037023A (ja) 2009-02-19
JP2009037023A5 true JP2009037023A5 (enExample) 2010-09-24
JP4642818B2 JP4642818B2 (ja) 2011-03-02

Family

ID=40438991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007201570A Expired - Fee Related JP4642818B2 (ja) 2007-08-02 2007-08-02 回折格子の製造方法

Country Status (1)

Country Link
JP (1) JP4642818B2 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2443491B1 (en) * 2009-06-16 2020-03-04 Koninklijke Philips N.V. Tilted gratings and method for production of tilted gratings
US8999435B2 (en) * 2009-08-31 2015-04-07 Canon Kabushiki Kaisha Process of producing grating for X-ray image pickup apparatus
JP5773624B2 (ja) 2010-01-08 2015-09-02 キヤノン株式会社 微細構造体の製造方法
JP2015178683A (ja) * 2010-01-08 2015-10-08 キヤノン株式会社 金属吸収格子及びタルボ干渉計
JP5660910B2 (ja) * 2010-03-30 2015-01-28 富士フイルム株式会社 放射線画像撮影用グリッドの製造方法
DE102010017426A1 (de) * 2010-06-17 2011-12-22 Karlsruher Institut für Technologie Gitter aus mindestens zwei Materialien für die Röntgenbildgebung
EP2657722B1 (en) 2010-12-21 2019-08-28 Konica Minolta, Inc. Method for manufacturing metal grating structure
JP5893252B2 (ja) * 2011-02-15 2016-03-23 キヤノン株式会社 微細構造体の製造方法
JP5804726B2 (ja) * 2011-02-24 2015-11-04 キヤノン株式会社 微細構造体の製造方法
JP5656726B2 (ja) * 2011-04-15 2015-01-21 株式会社日立ハイテクサイエンス X線タルボ干渉計用位相型回折格子の製造方法
JP5860613B2 (ja) * 2011-05-26 2016-02-16 株式会社オプトニクス精密 X線干渉計用の回折格子及びその製造方法
US20140241493A1 (en) 2011-07-27 2014-08-28 Mitsuru Yokoyama Metal Lattice Production Method, Metal Lattice, X-Ray Imaging Device, and Intermediate Product for Metal Lattice
JP6245794B2 (ja) 2011-07-29 2017-12-13 キヤノン株式会社 遮蔽格子の製造方法
JP5871549B2 (ja) * 2011-07-29 2016-03-01 キヤノン株式会社 X線遮蔽格子の製造方法
KR101306185B1 (ko) 2011-12-28 2013-09-17 단국대학교 산학협력단 엑스선 간섭계의 나노 격자 제조 방법
JP6667215B2 (ja) 2014-07-24 2020-03-18 キヤノン株式会社 X線遮蔽格子、構造体、トールボット干渉計、x線遮蔽格子の製造方法
JP7059545B2 (ja) * 2017-09-20 2022-04-26 大日本印刷株式会社 構造体の製造方法、および構造体
JP7319106B2 (ja) * 2019-06-28 2023-08-01 株式会社ミツトヨ 格子部品およびその製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61174502A (ja) * 1985-01-29 1986-08-06 Shimadzu Corp 軟x線用光学素子
JP3253716B2 (ja) * 1992-12-24 2002-02-04 キヤノン株式会社 貴金属単結晶群の適用品及びその製造方法

Similar Documents

Publication Publication Date Title
EP2881790A3 (en) Photomask blank
WO2008005208A3 (en) Printing form precursor and process for preparing a stamp from the precursor
JP5658271B2 (ja) インプリントリソグラフィ
WO2011123433A3 (en) Method of slimming radiation-sensitive material lines in lithographic applications
JP2015502668A5 (enExample)
BR112013016671A2 (pt) placa de abertura foto definida e método para produzir os mesmos
JP2008310314A5 (enExample)
EP2333816A4 (en) REFLECTING MASK ROLLING FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THEREOF
US20160356934A1 (en) Circular polarizer and fabricating method thereof, as well as display panel
WO2006060758A3 (en) Methods of exposure for the purpose of thermal management for imprint lithography processes
WO2011037323A3 (ko) 광배향막 제조용 자외선 고투과 이중 선 격자 편광판 및 이의 제조방법
DE602006010529D1 (de) Vorrichtung und verfahren zur herstellung einer zweiseitig gemusterten bahn in deckung
EP1939691A3 (en) Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
JP2009512143A5 (enExample)
TW200633791A (en) Method for fabricating nano-adhesive
SG155147A1 (en) Methods for enhancing photolithography patterning
JP2018091889A5 (ja) マスクブランク、転写用マスク及び半導体デバイスの製造方法
WO2012081863A3 (ko) 감광성 고분자, 이를 포함하는 포토레지스트 조성물 및 이를 이용한 레지스트 패턴 형성방법
TW200717605A (en) Substrate, method of exposing a substrate, machine readable medium
KR20170013339A (ko) 광학 소자
JP2009023343A5 (enExample)
ATE499631T1 (de) Plasmaätzverfahren für eine fotomaske unter verwendung einer geschützten maske
SG130083A1 (en) A system and method for photolithography in semiconductor manufacturing
Mojarad et al. Patterning at 6.5 nm wavelength using interference lithography
Škriniarová et al. Periodic structures prepared by two-beam interference method