JP2009037023A5 - - Google Patents
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- JP2009037023A5 JP2009037023A5 JP2007201570A JP2007201570A JP2009037023A5 JP 2009037023 A5 JP2009037023 A5 JP 2009037023A5 JP 2007201570 A JP2007201570 A JP 2007201570A JP 2007201570 A JP2007201570 A JP 2007201570A JP 2009037023 A5 JP2009037023 A5 JP 2009037023A5
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- Prior art keywords
- ray
- resin layer
- photosensitive resin
- ultraviolet
- absorbing metal
- Prior art date
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Claims (5)
紫外線透過型基板の表面に所定のパターンでＸ線吸収金属部が形成された回折格子を準
備し、前記紫外線透過型基板及び前記Ｘ線吸収金属部の表面に紫外線感光樹脂層を形成し
て、光学リソグラフィー法により、前記Ｘ線吸収金属部を光学リソグラフィーマスクとし
て前記紫外線透過型基板の裏面から紫外線を照射して、前記Ｘ線吸収金属部に対応する前
記紫外線感光樹脂層を現像により除去し、そして、電鋳法により、前記Ｘ線吸収金属部に
電圧を印加して前記紫外線感光樹脂層が除去された部分にＸ線吸収金属部を積層させるこ
とを特徴とする、回折格子の製造方法。 A method of manufacturing a diffraction grating used in an X-ray Talbot interferometer,
Preparing a diffraction grating in which an X-ray absorbing metal part is formed in a predetermined pattern on the surface of the ultraviolet transmissive substrate, and forming an ultraviolet photosensitive resin layer on the surface of the ultraviolet transmissive substrate and the X-ray absorbing metal part; By irradiating ultraviolet rays from the back surface of the ultraviolet transmissive substrate with the X-ray absorbing metal part as an optical lithography mask by an optical lithography method, the ultraviolet photosensitive resin layer corresponding to the X-ray absorbing metal part is removed by development, Then, a method for manufacturing a diffraction grating, wherein a voltage is applied to the X-ray absorbing metal part by electroforming, and the X-ray absorbing metal part is laminated on the portion where the ultraviolet photosensitive resin layer is removed.
光樹脂層を形成して、光学リソグラフィー法により、前記金属シード層の表面に形成され
た紫外線感光樹脂層に光学リソグラフィーマスクを用いたパターニングを行って現像によ
り前記紫外線感光樹脂層を除去し、そして、電鋳法により、前記金属シード層に電圧を印
加して当該紫外線感光樹脂層が除去された部分にＸ線吸収金属部を形成し、前記Ｘ線吸収
金属部が形成された部分以外の部分に対応する前記紫外線感光樹脂層及び前記金属シード
層を除去した後、
前記紫外線透過型基板及び前記Ｘ線吸収金属部の表面に紫外線感光樹脂層を形成して、
光学リソグラフィー法により、前記Ｘ線吸収金属部を光学リソグラフィーマスクとして前
記紫外線透過型基板の裏面から紫外線を照射して、前記Ｘ線吸収金属部に対応する前記紫
外線感光樹脂層を現像により除去し、そして、電鋳法により、前記金属シード層を介して
前記Ｘ線吸収金属部に電圧を印加して前記紫外線感光樹脂層が除去された部分にＸ線吸収
金属部を積層させることを特徴とする、請求項１に記載の回折格子の製造方法。 A metal seed layer is formed on the surface of the ultraviolet transmissive substrate, an ultraviolet photosensitive resin layer is formed on the surface of the metal seed layer, and the ultraviolet photosensitive resin layer formed on the surface of the metal seed layer is formed by an optical lithography method. Patterning is performed using an optical lithography mask, the ultraviolet photosensitive resin layer is removed by development, and a voltage is applied to the metal seed layer by electroforming to apply X to the portion from which the ultraviolet photosensitive resin layer has been removed. After forming a line-absorbing metal part and removing the ultraviolet-sensitive resin layer and the metal seed layer corresponding to a part other than the part where the X-ray-absorbing metal part is formed,
Forming an ultraviolet photosensitive resin layer on the surfaces of the ultraviolet transmissive substrate and the X-ray absorbing metal part;
By irradiating ultraviolet rays from the back surface of the ultraviolet transmissive substrate with the X-ray absorbing metal part as an optical lithography mask by an optical lithography method, the ultraviolet photosensitive resin layer corresponding to the X-ray absorbing metal part is removed by development, A voltage is applied to the X-ray absorbing metal portion through the metal seed layer by electroforming, and the X-ray absorbing metal portion is laminated on the portion where the ultraviolet photosensitive resin layer is removed. The manufacturing method of the diffraction grating of Claim 1.
紫外線透過型基板の表面に金属シード層を形成し、その金属シード層の表面に紫外線感
光樹脂層を形成して、光学リソグラフィー法により、前記金属シード層の表面に形成され
た紫外線感光樹脂層に光学リソグラフィーマスクを用いたパターニングを行って現像によ
り前記紫外線感光樹脂層を除去し、そして、電鋳法により、前記金属シード層に電圧を印
加して当該紫外線感光樹脂層が除去された部分にＸ線吸収金属部を形成し、前記Ｘ線吸収
金属部が形成された部分以外の部分に対応する前記紫外線感光樹脂層及び前記金属シード
層を除去することを特徴とする、回折格子の製造方法。 A method of manufacturing a diffraction grating used in an X-ray Talbot interferometer,
A metal seed layer is formed on the surface of the ultraviolet transmissive substrate, an ultraviolet photosensitive resin layer is formed on the surface of the metal seed layer, and the ultraviolet photosensitive resin layer formed on the surface of the metal seed layer is formed by an optical lithography method. Patterning using an optical lithography mask is performed, the ultraviolet photosensitive resin layer is removed by development, and a voltage is applied to the metal seed layer by electroforming to apply X to the portion from which the ultraviolet photosensitive resin layer has been removed. A method of manufacturing a diffraction grating, comprising forming a line-absorbing metal portion and removing the ultraviolet-sensitive resin layer and the metal seed layer corresponding to a portion other than the portion where the X-ray-absorbing metal portion is formed.
Ｘ線透過型基板の表面に所定のパターンでＸ線吸収金属部が形成された回折格子を準備
し、前記Ｘ線透過型基板及び前記Ｘ線吸収金属部の表面にＸ線感光樹脂層を形成して、Ｘ
線リソグラフィー法により、前記Ｘ線吸収金属部をＸ線リソグラフィーマスクとして前記
Ｘ線透過型基板の裏面からＸ線を照射して、前記Ｘ線吸収金属部に対応する前記Ｘ線感光
樹脂層を現像により除去し、そして、電鋳法により、前記Ｘ線吸収金属部に電圧を印加し
て前記Ｘ線感光樹脂層が除去された部分にＸ線吸収金属部を積層させることを特徴とする
、回折格子の製造方法。 A method of manufacturing a diffraction grating used in an X-ray Talbot interferometer,
Prepare a diffraction grating having an X-ray absorbing metal portion formed in a predetermined pattern on the surface of the X-ray transmitting substrate, and form an X-ray photosensitive resin layer on the surface of the X-ray transmitting substrate and the X-ray absorbing metal portion. X
Develop X-ray photosensitive resin layer corresponding to the X-ray absorbing metal portion by irradiating X-ray from the back surface of the X-ray transmissive substrate by using the X-ray absorbing metal portion as an X-ray lithography mask by a line lithography method. And by applying a voltage to the X-ray absorbing metal part by electroforming and laminating the X-ray absorbing metal part on the part from which the X-ray photosensitive resin layer has been removed. A method of manufacturing a lattice.
Ｘ線透過型基板の表面に金属シード層を形成し、その金属シード層の表面にＸ線感光樹
脂層を形成して、Ｘ線リソグラフィー法により、前記金属シード層の表面に形成されたＸ
線感光樹脂層にＸ線リソグラフィーマスクを用いたパターニングを行って現像により前記
Ｘ線感光樹脂層を除去し、そして、電鋳法により、前記金属シード層に電圧を印加して当
該Ｘ線感光樹脂層が除去された部分にＸ線吸収金属部を形成することを特徴とする、回折
格子の製造方法。
の回折格子の製造方法。 A method of manufacturing a diffraction grating used in an X-ray Talbot interferometer,
A metal seed layer is formed on the surface of the X-ray transmissive substrate, an X-ray photosensitive resin layer is formed on the surface of the metal seed layer, and X formed on the surface of the metal seed layer by an X-ray lithography method.
The X-ray photosensitive resin layer is patterned using an X-ray lithography mask, the X-ray photosensitive resin layer is removed by development, and a voltage is applied to the metal seed layer by electroforming to apply the X-ray photosensitive resin layer. A method for manufacturing a diffraction grating, comprising forming an X-ray absorbing metal portion in a portion from which a layer has been removed.
Of manufacturing a diffraction grating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007201570A JP4642818B2 (en) | 2007-08-02 | 2007-08-02 | Manufacturing method of diffraction grating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007201570A JP4642818B2 (en) | 2007-08-02 | 2007-08-02 | Manufacturing method of diffraction grating |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009037023A JP2009037023A (en) | 2009-02-19 |
| JP2009037023A5 true JP2009037023A5 (en) | 2010-09-24 |
| JP4642818B2 JP4642818B2 (en) | 2011-03-02 |
Family
ID=40438991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007201570A Expired - Fee Related JP4642818B2 (en) | 2007-08-02 | 2007-08-02 | Manufacturing method of diffraction grating |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4642818B2 (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6281969B2 (en) * | 2009-06-16 | 2018-02-21 | コーニンクレッカ フィリップス エヌ ヴェＫｏｎｉｎｋｌｉｊｋｅ Ｐｈｉｌｉｐｓ Ｎ．Ｖ． | Tilted grid and method of manufacturing tilted grid |
| US8999435B2 (en) * | 2009-08-31 | 2015-04-07 | Canon Kabushiki Kaisha | Process of producing grating for X-ray image pickup apparatus |
| JP5773624B2 (en) * | 2010-01-08 | 2015-09-02 | キヤノン株式会社 | Manufacturing method of fine structure |
| JP2015178683A (en) * | 2010-01-08 | 2015-10-08 | キヤノン株式会社 | metal absorption grating and Talbot interferometer |
| JP5660910B2 (en) * | 2010-03-30 | 2015-01-28 | 富士フイルム株式会社 | Method for manufacturing grid for radiographic imaging |
| DE102010017426A1 (en) | 2010-06-17 | 2011-12-22 | Karlsruher Institut für Technologie | Lattice of at least two materials for X-ray imaging |
| WO2012086121A1 (en) | 2010-12-21 | 2012-06-28 | コニカミノルタエムジー株式会社 | Method for manufacturing metal lattice, metal lattice manufactured by the method, and x-ray imaging device using the metal lattice |
| JP5893252B2 (en) * | 2011-02-15 | 2016-03-23 | キヤノン株式会社 | Manufacturing method of fine structure |
| JP5804726B2 (en) * | 2011-02-24 | 2015-11-04 | キヤノン株式会社 | Manufacturing method of fine structure |
| JP5656726B2 (en) * | 2011-04-15 | 2015-01-21 | 株式会社日立ハイテクサイエンス | Method for manufacturing phase diffraction grating for X-ray Talbot interferometer |
| JP5860613B2 (en) * | 2011-05-26 | 2016-02-16 | 株式会社オプトニクス精密 | Diffraction grating for X-ray interferometer and method of manufacturing the same |
| US20140241493A1 (en) | 2011-07-27 | 2014-08-28 | Mitsuru Yokoyama | Metal Lattice Production Method, Metal Lattice, X-Ray Imaging Device, and Intermediate Product for Metal Lattice |
| JP5871549B2 (en) * | 2011-07-29 | 2016-03-01 | キヤノン株式会社 | X-ray shielding grid manufacturing method |
| JP6245794B2 (en) * | 2011-07-29 | 2017-12-13 | キヤノン株式会社 | Manufacturing method of shielding grid |
| KR101306185B1 (en) | 2011-12-28 | 2013-09-17 | 단국대학교 산학협력단 | X-ray Nano-gratings of X-ray Grating Interferometer and Manufacturing Method thereof |
| JP6667215B2 (en) | 2014-07-24 | 2020-03-18 | キヤノン株式会社 | X-ray shielding grating, structure, Talbot interferometer, and method of manufacturing X-ray shielding grating |
| JP7059545B2 (en) * | 2017-09-20 | 2022-04-26 | 大日本印刷株式会社 | Structure manufacturing method and structure |
| JP7319106B2 (en) * | 2019-06-28 | 2023-08-01 | 株式会社ミツトヨ | Lattice part and its manufacturing method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61174502A (en) * | 1985-01-29 | 1986-08-06 | Shimadzu Corp | Optical element for soft x ray |
| JP3253716B2 (en) * | 1992-12-24 | 2002-02-04 | キヤノン株式会社 | Applied product of noble metal single crystal group and manufacturing method thereof |
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2007
- 2007-08-02 JP JP2007201570A patent/JP4642818B2/en not_active Expired - Fee Related
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