JP2009001885A - 膜厚検知装置及び蒸着方法 - Google Patents

膜厚検知装置及び蒸着方法 Download PDF

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Publication number
JP2009001885A
JP2009001885A JP2007165773A JP2007165773A JP2009001885A JP 2009001885 A JP2009001885 A JP 2009001885A JP 2007165773 A JP2007165773 A JP 2007165773A JP 2007165773 A JP2007165773 A JP 2007165773A JP 2009001885 A JP2009001885 A JP 2009001885A
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JP
Japan
Prior art keywords
vibrator
vapor deposition
film thickness
substrate
deposition chamber
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JP2007165773A
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English (en)
Japanese (ja)
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JP2009001885A5 (enExample
Inventor
Toshiaki Yoshikawa
俊明 吉川
Seiji Mashita
精二 真下
Naoto Fukuda
直人 福田
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Canon Inc
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Canon Inc
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Priority to JP2007165773A priority Critical patent/JP2009001885A/ja
Publication of JP2009001885A publication Critical patent/JP2009001885A/ja
Publication of JP2009001885A5 publication Critical patent/JP2009001885A5/ja
Pending legal-status Critical Current

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JP2007165773A 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法 Pending JP2009001885A (ja)

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JP2007165773A JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

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JP2007165773A JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

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JP2009001885A true JP2009001885A (ja) 2009-01-08
JP2009001885A5 JP2009001885A5 (enExample) 2010-07-29

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JP2007165773A Pending JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012127711A (ja) * 2010-12-14 2012-07-05 Ulvac Japan Ltd 真空蒸着装置及び薄膜の製造方法
JP2013014798A (ja) * 2011-07-01 2013-01-24 Ulvac Japan Ltd 真空蒸着装置、薄膜製造方法
CN110527968A (zh) * 2019-09-26 2019-12-03 北京北方华创微电子装备有限公司 遮挡盘检测装置、磁控溅射腔室及遮挡盘检测方法
CN114574811A (zh) * 2020-11-30 2022-06-03 佳能特机株式会社 蒸镀装置、成膜装置、成膜方法及电子器件的制造方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361368A (ja) * 1989-07-28 1991-03-18 Hitachi Nakaseiki Ltd イオンスパッタリング方法およびその装置
JP2002373782A (ja) * 2001-04-20 2002-12-26 Eastman Kodak Co 有機層を蒸着するための方法及び装置
JP2003139505A (ja) * 2001-11-05 2003-05-14 Ulvac Japan Ltd 水晶発振式膜厚モニタ用センサヘッド及びこれを用いた膜厚のモニタ方法。

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361368A (ja) * 1989-07-28 1991-03-18 Hitachi Nakaseiki Ltd イオンスパッタリング方法およびその装置
JP2002373782A (ja) * 2001-04-20 2002-12-26 Eastman Kodak Co 有機層を蒸着するための方法及び装置
JP2003139505A (ja) * 2001-11-05 2003-05-14 Ulvac Japan Ltd 水晶発振式膜厚モニタ用センサヘッド及びこれを用いた膜厚のモニタ方法。

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012127711A (ja) * 2010-12-14 2012-07-05 Ulvac Japan Ltd 真空蒸着装置及び薄膜の製造方法
JP2013014798A (ja) * 2011-07-01 2013-01-24 Ulvac Japan Ltd 真空蒸着装置、薄膜製造方法
CN110527968A (zh) * 2019-09-26 2019-12-03 北京北方华创微电子装备有限公司 遮挡盘检测装置、磁控溅射腔室及遮挡盘检测方法
CN110527968B (zh) * 2019-09-26 2021-07-13 北京北方华创微电子装备有限公司 遮挡盘检测装置、磁控溅射腔室及遮挡盘检测方法
CN114574811A (zh) * 2020-11-30 2022-06-03 佳能特机株式会社 蒸镀装置、成膜装置、成膜方法及电子器件的制造方法
CN114574811B (zh) * 2020-11-30 2023-08-18 佳能特机株式会社 蒸镀装置、成膜装置、成膜方法及电子器件的制造方法

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