JP2009001885A5 - - Google Patents

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Publication number
JP2009001885A5
JP2009001885A5 JP2007165773A JP2007165773A JP2009001885A5 JP 2009001885 A5 JP2009001885 A5 JP 2009001885A5 JP 2007165773 A JP2007165773 A JP 2007165773A JP 2007165773 A JP2007165773 A JP 2007165773A JP 2009001885 A5 JP2009001885 A5 JP 2009001885A5
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JP
Japan
Prior art keywords
vibrator
vapor deposition
film thickness
evaporation
deposition chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007165773A
Other languages
English (en)
Japanese (ja)
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JP2009001885A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007165773A priority Critical patent/JP2009001885A/ja
Priority claimed from JP2007165773A external-priority patent/JP2009001885A/ja
Publication of JP2009001885A publication Critical patent/JP2009001885A/ja
Publication of JP2009001885A5 publication Critical patent/JP2009001885A5/ja
Pending legal-status Critical Current

Links

JP2007165773A 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法 Pending JP2009001885A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007165773A JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007165773A JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

Publications (2)

Publication Number Publication Date
JP2009001885A JP2009001885A (ja) 2009-01-08
JP2009001885A5 true JP2009001885A5 (enExample) 2010-07-29

Family

ID=40318585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007165773A Pending JP2009001885A (ja) 2007-06-25 2007-06-25 膜厚検知装置及び蒸着方法

Country Status (1)

Country Link
JP (1) JP2009001885A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5697427B2 (ja) * 2010-12-14 2015-04-08 株式会社アルバック 真空蒸着装置及び薄膜の製造方法
JP2013014798A (ja) * 2011-07-01 2013-01-24 Ulvac Japan Ltd 真空蒸着装置、薄膜製造方法
CN110527968B (zh) * 2019-09-26 2021-07-13 北京北方华创微电子装备有限公司 遮挡盘检测装置、磁控溅射腔室及遮挡盘检测方法
JP7252933B2 (ja) * 2020-11-30 2023-04-05 キヤノントッキ株式会社 蒸着装置、成膜装置、成膜方法及び電子デバイスの製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0361368A (ja) * 1989-07-28 1991-03-18 Hitachi Nakaseiki Ltd イオンスパッタリング方法およびその装置
US6558735B2 (en) * 2001-04-20 2003-05-06 Eastman Kodak Company Reusable mass-sensor in manufacture of organic light-emitting devices
JP3953301B2 (ja) * 2001-11-05 2007-08-08 株式会社アルバック 水晶発振式膜厚モニタ用センサヘッド

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