JP2008544852A5 - - Google Patents
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- Publication number
- JP2008544852A5 JP2008544852A5 JP2008519700A JP2008519700A JP2008544852A5 JP 2008544852 A5 JP2008544852 A5 JP 2008544852A5 JP 2008519700 A JP2008519700 A JP 2008519700A JP 2008519700 A JP2008519700 A JP 2008519700A JP 2008544852 A5 JP2008544852 A5 JP 2008544852A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- fluid ejector
- wetting layer
- forming
- orifice
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000012530 fluid Substances 0.000 claims 29
- 238000000034 method Methods 0.000 claims 18
- 238000009736 wetting Methods 0.000 claims 18
- 239000000463 material Substances 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 5
- 229920002120 photoresistant polymer Polymers 0.000 claims 4
- 239000002243 precursor Substances 0.000 claims 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 125000003396 thiol group Chemical class [H]S* 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 1
- 230000008021 deposition Effects 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US69603505P | 2005-07-01 | 2005-07-01 | |
| US60/696,035 | 2005-07-01 | ||
| PCT/US2006/026023 WO2007005857A1 (en) | 2005-07-01 | 2006-06-30 | Non-wetting coating on a fluid ejector |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008544852A JP2008544852A (ja) | 2008-12-11 |
| JP2008544852A5 true JP2008544852A5 (enExample) | 2009-07-16 |
| JP5241491B2 JP5241491B2 (ja) | 2013-07-17 |
Family
ID=37055980
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008519700A Active JP5241491B2 (ja) | 2005-07-01 | 2006-06-30 | 流体エゼクター上の非湿性コーティング |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8523322B2 (enExample) |
| EP (1) | EP1910085B1 (enExample) |
| JP (1) | JP5241491B2 (enExample) |
| KR (1) | KR20080027296A (enExample) |
| CN (1) | CN101272915B (enExample) |
| TW (2) | TWI379771B (enExample) |
| WO (1) | WO2007005857A1 (enExample) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI379771B (en) | 2005-07-01 | 2012-12-21 | Fujifilm Dimatix Inc | Non-wetting coating on a fluid ejector |
| US7726320B2 (en) | 2006-10-18 | 2010-06-01 | R. J. Reynolds Tobacco Company | Tobacco-containing smoking article |
| US8128201B2 (en) | 2006-12-01 | 2012-03-06 | Fujifilm Dimatix, Inc. | Non-wetting coating on a fluid ejector |
| US20090191409A1 (en) * | 2008-01-25 | 2009-07-30 | Steve Simon | Combined Wetting/Non-Wetting Element For Low and High Surface Tension Liquids |
| EP2732973B1 (en) | 2008-10-30 | 2015-04-15 | Fujifilm Corporation | Non-wetting coating on a fluid ejector |
| US20100110144A1 (en) * | 2008-10-31 | 2010-05-06 | Andreas Bibl | Applying a Layer to a Nozzle Outlet |
| US8136922B2 (en) * | 2009-09-01 | 2012-03-20 | Xerox Corporation | Self-assembly monolayer modified printhead |
| US8262200B2 (en) | 2009-09-15 | 2012-09-11 | Fujifilm Corporation | Non-wetting coating on a fluid ejector |
| US20110080449A1 (en) * | 2009-10-02 | 2011-04-07 | Fujifilm Corporation | Non-wetting Coating on Die Mount |
| US8210649B2 (en) * | 2009-11-06 | 2012-07-03 | Fujifilm Corporation | Thermal oxide coating on a fluid ejector |
| US8454132B2 (en) | 2009-12-14 | 2013-06-04 | Fujifilm Corporation | Moisture protection of fluid ejector |
| US8567910B2 (en) | 2010-03-31 | 2013-10-29 | Fujifilm Corporation | Durable non-wetting coating on fluid ejector |
| US8757147B2 (en) | 2010-05-15 | 2014-06-24 | Minusa Holdings Llc | Personal vaporizing inhaler with internal light source |
| US11344683B2 (en) | 2010-05-15 | 2022-05-31 | Rai Strategic Holdings, Inc. | Vaporizer related systems, methods, and apparatus |
| JP5666337B2 (ja) | 2011-02-17 | 2015-02-12 | 富士フイルム株式会社 | 画像形成方法 |
| JP2012171987A (ja) * | 2011-02-17 | 2012-09-10 | Fujifilm Corp | インク組成物、インクセット、及び画像形成方法 |
| US9078473B2 (en) | 2011-08-09 | 2015-07-14 | R.J. Reynolds Tobacco Company | Smoking articles and use thereof for yielding inhalation materials |
| JP5861815B2 (ja) * | 2011-08-10 | 2016-02-16 | セイコーエプソン株式会社 | インク組成物、これを用いる記録ユニットおよびインクジェット記録装置、ならびに記録物 |
| GB2494168B (en) * | 2011-09-01 | 2014-04-09 | Memsstar Ltd | Improved deposition technique for micro electro-mechanical structures (MEMS) |
| JP5752816B2 (ja) | 2013-02-04 | 2015-07-22 | 富士フイルム株式会社 | 撥水膜の製造方法、ノズルプレート、インクジェットヘッド、及びインクジェット記録装置 |
| JP5988936B2 (ja) | 2013-09-04 | 2016-09-07 | 富士フイルム株式会社 | 撥水膜、成膜方法、ノズルプレート、インクジェットヘッド、及びインクジェット記録装置 |
| US9839238B2 (en) | 2014-02-28 | 2017-12-12 | Rai Strategic Holdings, Inc. | Control body for an electronic smoking article |
| EP3103642A1 (en) | 2015-06-10 | 2016-12-14 | OCE-Technologies B.V. | Orifice surface, print head comprising an orifice surface and method for forming the orifice surface |
| US10034494B2 (en) | 2015-09-15 | 2018-07-31 | Rai Strategic Holdings, Inc. | Reservoir for aerosol delivery devices |
| US10006564B2 (en) | 2016-08-10 | 2018-06-26 | Ckd Corporation | Corrosion resistant coating for process gas control valve |
| CN107244145A (zh) * | 2017-06-08 | 2017-10-13 | 翁焕榕 | 喷墨打印头及其喷嘴板、喷墨打印机 |
| JP6972697B2 (ja) * | 2017-06-22 | 2021-11-24 | セイコーエプソン株式会社 | ノズルプレート、液体噴射ヘッド、及び、液体噴射装置 |
| WO2021045783A1 (en) * | 2019-09-06 | 2021-03-11 | Hewlett-Packard Development Company, L.P. | Fluid ejection face selective coating |
| CN114368222A (zh) * | 2022-01-21 | 2022-04-19 | 武汉敏捷微电子有限公司 | 一种微流体器件及其制作方法 |
Family Cites Families (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8906379D0 (en) | 1989-03-20 | 1989-05-04 | Am Int | Providing a surface with solvent-wettable and solvent-non wettable zones |
| GB9010289D0 (en) | 1990-05-08 | 1990-06-27 | Xaar Ltd | Drop-on-demand printing apparatus and method of manufacture |
| US5341161A (en) | 1991-06-14 | 1994-08-23 | Canon Kabushiki Kaisha | Ink recorder including a sealing member for an ink storage section |
| US5434606A (en) * | 1991-07-02 | 1995-07-18 | Hewlett-Packard Corporation | Orifice plate for an ink-jet pen |
| CA2272165C (en) | 1992-07-31 | 2003-10-14 | Canon Kabushiki Kaisha | Liquid storing container for recording apparatus |
| GB9417445D0 (en) | 1994-08-30 | 1994-10-19 | Xaar Ltd | Coating, coating composition and method of forming coating |
| JPH0985956A (ja) | 1995-09-21 | 1997-03-31 | Rohm Co Ltd | インクジェットノズルの形成方法 |
| US5812158A (en) | 1996-01-18 | 1998-09-22 | Lexmark International, Inc. | Coated nozzle plate for ink jet printing |
| WO1998000295A1 (de) | 1996-06-28 | 1998-01-08 | Pelikan Produktions Ag | Antitrielbeschichtung für tintenstrahldruckköpfe |
| JPH10235858A (ja) * | 1997-02-24 | 1998-09-08 | Seiko Epson Corp | インクジェットヘッド及びその製造方法 |
| US6918654B2 (en) | 1997-07-15 | 2005-07-19 | Silverbrook Research Pty Ltd | Ink distribution assembly for an ink jet printhead |
| US7708372B2 (en) | 1997-07-15 | 2010-05-04 | Silverbrook Research Pty Ltd | Inkjet nozzle with ink feed channels etched from back of wafer |
| US6336697B1 (en) * | 1998-01-28 | 2002-01-08 | Seiko Epson Corporation | Liquid jet structure, ink jet type recording head and printer |
| US6312103B1 (en) | 1998-09-22 | 2001-11-06 | Hewlett-Packard Company | Self-cleaning titanium dioxide coated ink-jet printer head |
| US6511149B1 (en) | 1998-09-30 | 2003-01-28 | Xerox Corporation | Ballistic aerosol marking apparatus for marking a substrate |
| US6325490B1 (en) * | 1998-12-31 | 2001-12-04 | Eastman Kodak Company | Nozzle plate with mixed self-assembled monolayer |
| JP3616732B2 (ja) | 1999-07-07 | 2005-02-02 | 東京エレクトロン株式会社 | 基板の処理方法及び処理装置 |
| JP4438918B2 (ja) * | 1999-11-11 | 2010-03-24 | セイコーエプソン株式会社 | インクジェットプリンタヘッド及びその製造方法、並びに多環系チオール化合物 |
| US6561624B1 (en) | 1999-11-17 | 2003-05-13 | Konica Corporation | Method of processing nozzle plate, nozzle plate, ink jet head and image forming apparatus |
| AUPQ455999A0 (en) | 1999-12-09 | 2000-01-06 | Silverbrook Research Pty Ltd | Memjet four color modular print head packaging |
| EP1108761A3 (en) | 1999-12-13 | 2001-07-18 | Canon Kabushiki Kaisha | Polymer film, and polymeric compound for the production thereof |
| US6364456B1 (en) * | 1999-12-22 | 2002-04-02 | Eastman Kodak Company | Replenishable coating for printhead nozzle plate |
| US6472332B1 (en) | 2000-11-28 | 2002-10-29 | Xerox Corporation | Surface micromachined structure fabrication methods for a fluid ejection device |
| US6488357B2 (en) * | 2000-12-05 | 2002-12-03 | Xerox Corporation | Corrision resistant hydrophobic liquid level control plate for printhead of ink jet printer and process |
| JP4323809B2 (ja) * | 2001-04-02 | 2009-09-02 | パナソニック株式会社 | 撥水膜とその製造方法、およびそれを用いたインクジェットヘッドとインクジェット式記録装置 |
| US6800188B2 (en) * | 2001-05-09 | 2004-10-05 | Ebara-Udylite Co., Ltd. | Copper plating bath and plating method for substrate using the copper plating bath |
| KR100552660B1 (ko) * | 2001-08-09 | 2006-02-20 | 삼성전자주식회사 | 버블 젯 방식의 잉크 젯 프린트 헤드 |
| US6900083B2 (en) | 2001-08-31 | 2005-05-31 | Sharp Laboratories Of America, Inc. | Method of forming multi-layers for a thin film transistor |
| US6866366B2 (en) | 2002-04-23 | 2005-03-15 | Hitachi, Ltd. | Inkjet printer and printer head |
| US6938986B2 (en) | 2002-04-30 | 2005-09-06 | Hewlett-Packard Development Company, L.P. | Surface characteristic apparatus and method |
| JP2004025657A (ja) * | 2002-06-26 | 2004-01-29 | Brother Ind Ltd | インクジェットヘッド |
| US7086154B2 (en) * | 2002-06-26 | 2006-08-08 | Brother Kogyo Kabushiki Kaisha | Process of manufacturing nozzle plate for ink-jet print head |
| US6972261B2 (en) * | 2002-06-27 | 2005-12-06 | Xerox Corporation | Method for fabricating fine features by jet-printing and surface treatment |
| KR100468859B1 (ko) * | 2002-12-05 | 2005-01-29 | 삼성전자주식회사 | 일체형 잉크젯 프린트헤드 및 그 제조방법 |
| JP4424751B2 (ja) | 2003-07-22 | 2010-03-03 | キヤノン株式会社 | インクジェットヘッドおよびその製造方法 |
| DE60332288D1 (de) | 2003-07-22 | 2010-06-02 | Canon Kk | Tintenstrahlkopf und herstellungsverfahren dafür |
| WO2005037558A2 (en) | 2003-10-10 | 2005-04-28 | Dimatix, Inc. | Print head with thin membrane |
| KR100561864B1 (ko) * | 2004-02-27 | 2006-03-17 | 삼성전자주식회사 | 잉크젯 프린트헤드의 노즐 플레이트 표면에 소수성코팅막을 형성하는 방법 |
| US7347532B2 (en) | 2004-08-05 | 2008-03-25 | Fujifilm Dimatix, Inc. | Print head nozzle formation |
| WO2006047326A1 (en) | 2004-10-21 | 2006-05-04 | Fujifilm Dimatix, Inc. | Sacrificial substrate for etching |
| WO2006105581A1 (en) | 2005-04-04 | 2006-10-12 | Silverbrook Research Pty Ltd | Printhead assembly suitable for redirecting ejected ink droplets |
| TWI379771B (en) | 2005-07-01 | 2012-12-21 | Fujifilm Dimatix Inc | Non-wetting coating on a fluid ejector |
| JP2007276443A (ja) | 2006-03-14 | 2007-10-25 | Seiko Epson Corp | 液滴吐出ヘッドの製造方法、液滴吐出ヘッド、および液滴吐出装置の製造方法、液滴吐出装置 |
| US8128201B2 (en) | 2006-12-01 | 2012-03-06 | Fujifilm Dimatix, Inc. | Non-wetting coating on a fluid ejector |
| US8038260B2 (en) | 2006-12-22 | 2011-10-18 | Fujifilm Dimatix, Inc. | Pattern of a non-wetting coating on a fluid ejector and apparatus |
| US7819503B2 (en) * | 2007-06-15 | 2010-10-26 | Silverbrook Research Pty Ltd | Printhead integrated circuit comprising inkjet nozzle assemblies having connector posts |
| EP2732973B1 (en) | 2008-10-30 | 2015-04-15 | Fujifilm Corporation | Non-wetting coating on a fluid ejector |
| US8262200B2 (en) | 2009-09-15 | 2012-09-11 | Fujifilm Corporation | Non-wetting coating on a fluid ejector |
| JP5345034B2 (ja) * | 2009-09-28 | 2013-11-20 | 富士フイルム株式会社 | 撥液膜形成方法 |
-
2006
- 2006-06-30 TW TW095123931A patent/TWI379771B/zh active
- 2006-06-30 EP EP06786241A patent/EP1910085B1/en active Active
- 2006-06-30 US US11/479,152 patent/US8523322B2/en active Active
- 2006-06-30 TW TW101130873A patent/TWI500525B/zh active
- 2006-06-30 CN CN2006800322757A patent/CN101272915B/zh active Active
- 2006-06-30 JP JP2008519700A patent/JP5241491B2/ja active Active
- 2006-06-30 WO PCT/US2006/026023 patent/WO2007005857A1/en not_active Ceased
- 2006-06-30 KR KR1020077031053A patent/KR20080027296A/ko not_active Ceased
-
2011
- 2011-05-12 US US13/106,737 patent/US8226208B2/en active Active
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