JP5241491B2 - 流体エゼクター上の非湿性コーティング - Google Patents

流体エゼクター上の非湿性コーティング Download PDF

Info

Publication number
JP5241491B2
JP5241491B2 JP2008519700A JP2008519700A JP5241491B2 JP 5241491 B2 JP5241491 B2 JP 5241491B2 JP 2008519700 A JP2008519700 A JP 2008519700A JP 2008519700 A JP2008519700 A JP 2008519700A JP 5241491 B2 JP5241491 B2 JP 5241491B2
Authority
JP
Japan
Prior art keywords
region
fluid ejector
wetting
layer
wetting coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2008519700A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008544852A5 (enExample
JP2008544852A (ja
Inventor
好真 岡村
ジョン エー． ヒギンソン，
ブランバンダー， グレゴリー デ
ポール エー． ホイジントン，
ジェフリー バークマイアー，
アンドレアス ビブル，
Original Assignee
フジフィルム ディマティックス， インコーポレイテッド
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by フジフィルム ディマティックス， インコーポレイテッド filed Critical フジフィルム ディマティックス， インコーポレイテッド
Publication of JP2008544852A publication Critical patent/JP2008544852A/ja
Publication of JP2008544852A5 publication Critical patent/JP2008544852A5/ja
Application granted granted Critical
Publication of JP5241491B2 publication Critical patent/JP5241491B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1606—Coating the nozzle area or the ink chamber
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/1433—Structure of nozzle plates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Nozzles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)
JP2008519700A 2005-07-01 2006-06-30 流体エゼクター上の非湿性コーティング Active JP5241491B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US69603505P 2005-07-01 2005-07-01
US60/696,035 2005-07-01
PCT/US2006/026023 WO2007005857A1 (en) 2005-07-01 2006-06-30 Non-wetting coating on a fluid ejector

Publications (3)

Publication Number Publication Date
JP2008544852A JP2008544852A (ja) 2008-12-11
JP2008544852A5 JP2008544852A5 (enExample) 2009-07-16
JP5241491B2 true JP5241491B2 (ja) 2013-07-17

Family

ID=37055980

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008519700A Active JP5241491B2 (ja) 2005-07-01 2006-06-30 流体エゼクター上の非湿性コーティング

Country Status (7)

Country Link
US (2) US8523322B2 (enExample)
EP (1) EP1910085B1 (enExample)
JP (1) JP5241491B2 (enExample)
KR (1) KR20080027296A (enExample)
CN (1) CN101272915B (enExample)
TW (2) TWI379771B (enExample)
WO (1) WO2007005857A1 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI379771B (en) 2005-07-01 2012-12-21 Fujifilm Dimatix Inc Non-wetting coating on a fluid ejector
US7726320B2 (en) 2006-10-18 2010-06-01 R. J. Reynolds Tobacco Company Tobacco-containing smoking article
US8128201B2 (en) 2006-12-01 2012-03-06 Fujifilm Dimatix, Inc. Non-wetting coating on a fluid ejector
US20090191409A1 (en) * 2008-01-25 2009-07-30 Steve Simon Combined Wetting/Non-Wetting Element For Low and High Surface Tension Liquids
EP2732973B1 (en) 2008-10-30 2015-04-15 Fujifilm Corporation Non-wetting coating on a fluid ejector
US20100110144A1 (en) * 2008-10-31 2010-05-06 Andreas Bibl Applying a Layer to a Nozzle Outlet
US8136922B2 (en) * 2009-09-01 2012-03-20 Xerox Corporation Self-assembly monolayer modified printhead
US8262200B2 (en) 2009-09-15 2012-09-11 Fujifilm Corporation Non-wetting coating on a fluid ejector
US20110080449A1 (en) * 2009-10-02 2011-04-07 Fujifilm Corporation Non-wetting Coating on Die Mount
US8210649B2 (en) * 2009-11-06 2012-07-03 Fujifilm Corporation Thermal oxide coating on a fluid ejector
US8454132B2 (en) 2009-12-14 2013-06-04 Fujifilm Corporation Moisture protection of fluid ejector
US8567910B2 (en) 2010-03-31 2013-10-29 Fujifilm Corporation Durable non-wetting coating on fluid ejector
US8757147B2 (en) 2010-05-15 2014-06-24 Minusa Holdings Llc Personal vaporizing inhaler with internal light source
US11344683B2 (en) 2010-05-15 2022-05-31 Rai Strategic Holdings, Inc. Vaporizer related systems, methods, and apparatus
JP5666337B2 (ja) 2011-02-17 2015-02-12 富士フイルム株式会社 画像形成方法
JP2012171987A (ja) * 2011-02-17 2012-09-10 Fujifilm Corp インク組成物、インクセット、及び画像形成方法
US9078473B2 (en) 2011-08-09 2015-07-14 R.J. Reynolds Tobacco Company Smoking articles and use thereof for yielding inhalation materials
JP5861815B2 (ja) * 2011-08-10 2016-02-16 セイコーエプソン株式会社 インク組成物、これを用いる記録ユニットおよびインクジェット記録装置、ならびに記録物
GB2494168B (en) * 2011-09-01 2014-04-09 Memsstar Ltd Improved deposition technique for micro electro-mechanical structures (MEMS)
JP5752816B2 (ja) 2013-02-04 2015-07-22 富士フイルム株式会社 撥水膜の製造方法、ノズルプレート、インクジェットヘッド、及びインクジェット記録装置
JP5988936B2 (ja) 2013-09-04 2016-09-07 富士フイルム株式会社 撥水膜、成膜方法、ノズルプレート、インクジェットヘッド、及びインクジェット記録装置
US9839238B2 (en) 2014-02-28 2017-12-12 Rai Strategic Holdings, Inc. Control body for an electronic smoking article
EP3103642A1 (en) 2015-06-10 2016-12-14 OCE-Technologies B.V. Orifice surface, print head comprising an orifice surface and method for forming the orifice surface
US10034494B2 (en) 2015-09-15 2018-07-31 Rai Strategic Holdings, Inc. Reservoir for aerosol delivery devices
US10006564B2 (en) 2016-08-10 2018-06-26 Ckd Corporation Corrosion resistant coating for process gas control valve
CN107244145A (zh) * 2017-06-08 2017-10-13 翁焕榕 喷墨打印头及其喷嘴板、喷墨打印机
JP6972697B2 (ja) * 2017-06-22 2021-11-24 セイコーエプソン株式会社 ノズルプレート、液体噴射ヘッド、及び、液体噴射装置
WO2021045783A1 (en) * 2019-09-06 2021-03-11 Hewlett-Packard Development Company, L.P. Fluid ejection face selective coating
CN114368222A (zh) * 2022-01-21 2022-04-19 武汉敏捷微电子有限公司 一种微流体器件及其制作方法

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8906379D0 (en) 1989-03-20 1989-05-04 Am Int Providing a surface with solvent-wettable and solvent-non wettable zones
GB9010289D0 (en) 1990-05-08 1990-06-27 Xaar Ltd Drop-on-demand printing apparatus and method of manufacture
US5341161A (en) 1991-06-14 1994-08-23 Canon Kabushiki Kaisha Ink recorder including a sealing member for an ink storage section
US5434606A (en) * 1991-07-02 1995-07-18 Hewlett-Packard Corporation Orifice plate for an ink-jet pen
CA2272165C (en) 1992-07-31 2003-10-14 Canon Kabushiki Kaisha Liquid storing container for recording apparatus
GB9417445D0 (en) 1994-08-30 1994-10-19 Xaar Ltd Coating, coating composition and method of forming coating
JPH0985956A (ja) 1995-09-21 1997-03-31 Rohm Co Ltd インクジェットノズルの形成方法
US5812158A (en) 1996-01-18 1998-09-22 Lexmark International, Inc. Coated nozzle plate for ink jet printing
WO1998000295A1 (de) 1996-06-28 1998-01-08 Pelikan Produktions Ag Antitrielbeschichtung für tintenstrahldruckköpfe
JPH10235858A (ja) * 1997-02-24 1998-09-08 Seiko Epson Corp インクジェットヘッド及びその製造方法
US6918654B2 (en) 1997-07-15 2005-07-19 Silverbrook Research Pty Ltd Ink distribution assembly for an ink jet printhead
US7708372B2 (en) 1997-07-15 2010-05-04 Silverbrook Research Pty Ltd Inkjet nozzle with ink feed channels etched from back of wafer
US6336697B1 (en) * 1998-01-28 2002-01-08 Seiko Epson Corporation Liquid jet structure, ink jet type recording head and printer
US6312103B1 (en) 1998-09-22 2001-11-06 Hewlett-Packard Company Self-cleaning titanium dioxide coated ink-jet printer head
US6511149B1 (en) 1998-09-30 2003-01-28 Xerox Corporation Ballistic aerosol marking apparatus for marking a substrate
US6325490B1 (en) * 1998-12-31 2001-12-04 Eastman Kodak Company Nozzle plate with mixed self-assembled monolayer
JP3616732B2 (ja) 1999-07-07 2005-02-02 東京エレクトロン株式会社 基板の処理方法及び処理装置
JP4438918B2 (ja) * 1999-11-11 2010-03-24 セイコーエプソン株式会社 インクジェットプリンタヘッド及びその製造方法、並びに多環系チオール化合物
US6561624B1 (en) 1999-11-17 2003-05-13 Konica Corporation Method of processing nozzle plate, nozzle plate, ink jet head and image forming apparatus
AUPQ455999A0 (en) 1999-12-09 2000-01-06 Silverbrook Research Pty Ltd Memjet four color modular print head packaging
EP1108761A3 (en) 1999-12-13 2001-07-18 Canon Kabushiki Kaisha Polymer film, and polymeric compound for the production thereof
US6364456B1 (en) * 1999-12-22 2002-04-02 Eastman Kodak Company Replenishable coating for printhead nozzle plate
US6472332B1 (en) 2000-11-28 2002-10-29 Xerox Corporation Surface micromachined structure fabrication methods for a fluid ejection device
US6488357B2 (en) * 2000-12-05 2002-12-03 Xerox Corporation Corrision resistant hydrophobic liquid level control plate for printhead of ink jet printer and process
JP4323809B2 (ja) * 2001-04-02 2009-09-02 パナソニック株式会社 撥水膜とその製造方法、およびそれを用いたインクジェットヘッドとインクジェット式記録装置
US6800188B2 (en) * 2001-05-09 2004-10-05 Ebara-Udylite Co., Ltd. Copper plating bath and plating method for substrate using the copper plating bath
KR100552660B1 (ko) * 2001-08-09 2006-02-20 삼성전자주식회사 버블 젯 방식의 잉크 젯 프린트 헤드
US6900083B2 (en) 2001-08-31 2005-05-31 Sharp Laboratories Of America, Inc. Method of forming multi-layers for a thin film transistor
US6866366B2 (en) 2002-04-23 2005-03-15 Hitachi, Ltd. Inkjet printer and printer head
US6938986B2 (en) 2002-04-30 2005-09-06 Hewlett-Packard Development Company, L.P. Surface characteristic apparatus and method
JP2004025657A (ja) * 2002-06-26 2004-01-29 Brother Ind Ltd インクジェットヘッド
US7086154B2 (en) * 2002-06-26 2006-08-08 Brother Kogyo Kabushiki Kaisha Process of manufacturing nozzle plate for ink-jet print head
US6972261B2 (en) * 2002-06-27 2005-12-06 Xerox Corporation Method for fabricating fine features by jet-printing and surface treatment
KR100468859B1 (ko) * 2002-12-05 2005-01-29 삼성전자주식회사 일체형 잉크젯 프린트헤드 및 그 제조방법
JP4424751B2 (ja) 2003-07-22 2010-03-03 キヤノン株式会社 インクジェットヘッドおよびその製造方法
DE60332288D1 (de) 2003-07-22 2010-06-02 Canon Kk Tintenstrahlkopf und herstellungsverfahren dafür
WO2005037558A2 (en) 2003-10-10 2005-04-28 Dimatix, Inc. Print head with thin membrane
KR100561864B1 (ko) * 2004-02-27 2006-03-17 삼성전자주식회사 잉크젯 프린트헤드의 노즐 플레이트 표면에 소수성코팅막을 형성하는 방법
US7347532B2 (en) 2004-08-05 2008-03-25 Fujifilm Dimatix, Inc. Print head nozzle formation
WO2006047326A1 (en) 2004-10-21 2006-05-04 Fujifilm Dimatix, Inc. Sacrificial substrate for etching
WO2006105581A1 (en) 2005-04-04 2006-10-12 Silverbrook Research Pty Ltd Printhead assembly suitable for redirecting ejected ink droplets
TWI379771B (en) 2005-07-01 2012-12-21 Fujifilm Dimatix Inc Non-wetting coating on a fluid ejector
JP2007276443A (ja) 2006-03-14 2007-10-25 Seiko Epson Corp 液滴吐出ヘッドの製造方法、液滴吐出ヘッド、および液滴吐出装置の製造方法、液滴吐出装置
US8128201B2 (en) 2006-12-01 2012-03-06 Fujifilm Dimatix, Inc. Non-wetting coating on a fluid ejector
US8038260B2 (en) 2006-12-22 2011-10-18 Fujifilm Dimatix, Inc. Pattern of a non-wetting coating on a fluid ejector and apparatus
US7819503B2 (en) * 2007-06-15 2010-10-26 Silverbrook Research Pty Ltd Printhead integrated circuit comprising inkjet nozzle assemblies having connector posts
EP2732973B1 (en) 2008-10-30 2015-04-15 Fujifilm Corporation Non-wetting coating on a fluid ejector
US8262200B2 (en) 2009-09-15 2012-09-11 Fujifilm Corporation Non-wetting coating on a fluid ejector
JP5345034B2 (ja) * 2009-09-28 2013-11-20 富士フイルム株式会社 撥液膜形成方法

Also Published As

Publication number Publication date
TW201307091A (zh) 2013-02-16
US8523322B2 (en) 2013-09-03
TW200706387A (en) 2007-02-16
EP1910085B1 (en) 2012-08-01
CN101272915A (zh) 2008-09-24
TWI500525B (zh) 2015-09-21
US20110212261A1 (en) 2011-09-01
WO2007005857A1 (en) 2007-01-11
US20070030306A1 (en) 2007-02-08
TWI379771B (en) 2012-12-21
EP1910085A1 (en) 2008-04-16
KR20080027296A (ko) 2008-03-26
JP2008544852A (ja) 2008-12-11
US8226208B2 (en) 2012-07-24
CN101272915B (zh) 2011-03-16
HK1114582A1 (en) 2008-11-07

Similar Documents

Publication Publication Date Title
JP5241491B2 (ja) 流体エゼクター上の非湿性コーティング
KR101389901B1 (ko) 유체 분사기 상의 비 습윤성 코팅
JP5690915B2 (ja) 流体吐出装置上の非湿潤性被膜
US8262200B2 (en) Non-wetting coating on a fluid ejector
HK1114582B (en) Non-wetting coating on a fluid ejector

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090526

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090526

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100518

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120328

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120613

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130307

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130402

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160412

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5241491

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250