JP2008543034A5 - - Google Patents

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Publication number
JP2008543034A5
JP2008543034A5 JP2008512728A JP2008512728A JP2008543034A5 JP 2008543034 A5 JP2008543034 A5 JP 2008543034A5 JP 2008512728 A JP2008512728 A JP 2008512728A JP 2008512728 A JP2008512728 A JP 2008512728A JP 2008543034 A5 JP2008543034 A5 JP 2008543034A5
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JP
Japan
Prior art keywords
optical system
lens
cavity
exposure apparatus
optical
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Application number
JP2008512728A
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English (en)
Japanese (ja)
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JP5225075B2 (ja
JP2008543034A (ja
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Priority claimed from DE102005024163A external-priority patent/DE102005024163A1/de
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Publication of JP2008543034A publication Critical patent/JP2008543034A/ja
Publication of JP2008543034A5 publication Critical patent/JP2008543034A5/ja
Application granted granted Critical
Publication of JP5225075B2 publication Critical patent/JP5225075B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2008512728A 2005-05-23 2006-05-13 マイクロリソグラフィ投影露光装置の光学系 Expired - Fee Related JP5225075B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US68356205P 2005-05-23 2005-05-23
DE102005024163.8 2005-05-23
US60/683,562 2005-05-23
DE102005024163A DE102005024163A1 (de) 2005-05-23 2005-05-23 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
PCT/EP2006/004520 WO2006125538A1 (en) 2005-05-23 2006-05-13 Optical system of a microlithographic projection exposure apparatus

Publications (3)

Publication Number Publication Date
JP2008543034A JP2008543034A (ja) 2008-11-27
JP2008543034A5 true JP2008543034A5 (https=) 2012-02-16
JP5225075B2 JP5225075B2 (ja) 2013-07-03

Family

ID=37387660

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008512728A Expired - Fee Related JP5225075B2 (ja) 2005-05-23 2006-05-13 マイクロリソグラフィ投影露光装置の光学系

Country Status (7)

Country Link
US (3) US20080170217A1 (https=)
EP (1) EP1883860A1 (https=)
JP (1) JP5225075B2 (https=)
CN (1) CN101180581A (https=)
DE (1) DE102005024163A1 (https=)
TW (1) TWI428701B (https=)
WO (1) WO2006125538A1 (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
CN101727021A (zh) * 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
US7969549B2 (en) * 2006-06-30 2011-06-28 Asml Netherlands B.V. Liquid filled lens element, lithographic apparatus comprising such an element and device manufacturing method
JP5058305B2 (ja) * 2009-06-19 2012-10-24 エーエスエムエル ネザーランズ ビー．ブイ． 液浸リソグラフィ装置、液体閉じ込め構造体、液浸リソグラフィ装置用の投影システムの最終エレメント、および基板テーブル
US8941814B2 (en) * 2011-06-20 2015-01-27 Nikon Corporation Multiple-blade holding devices
JP5972010B2 (ja) * 2012-03-30 2016-08-17 キヤノン株式会社 撮像装置
CN104570613B (zh) * 2013-10-25 2018-01-19 上海微电子装备（集团）股份有限公司 浸没头、浸没流场初始化和维持方法及光刻设备
WO2018031590A1 (en) * 2016-08-09 2018-02-15 Skattward Research Llc Lens system with optical actuator
DE102017217389A1 (de) * 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh Optische Linse zur Verwendung in einer Medienzuführungsvorrichtung sowie Objektiv, Medienzuführungsvorrichtung und Mikroskop
DE102017217380A1 (de) * 2017-09-29 2019-04-04 Carl Zeiss Microscopy Gmbh Immersionsvorrichtung zur dynamischen Anpassung eines Mediums an eine Probe
CN111240003B (zh) * 2020-03-26 2024-09-20 苏州睿仟科技有限公司 一种高数值孔径水浸/油浸物镜系统及显微镜扫描系统
CN114646291B (zh) * 2020-12-17 2024-09-13 均豪精密工业股份有限公司 检测设备及物镜贴合度的检测方法
TWI798986B (zh) * 2021-02-04 2023-04-11 大陸商廣州立景創新科技有限公司 變焦透鏡模組
DE102024204464A1 (de) * 2024-05-14 2025-05-08 Carl Zeiss Smt Gmbh Kühlvorrichtung zum kühlen einer positionssensitiven komponente einer lithographieanlage und lithographieanlage

Family Cites Families (22)

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Publication number Priority date Publication date Assignee Title
JPS5919912A (ja) * 1982-07-26 1984-02-01 Hitachi Ltd 液浸距離保持装置
DD221563A1 (de) * 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
KR20050085236A (ko) * 2002-12-10 2005-08-29 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1571697A4 (en) * 2002-12-10 2007-07-04 Nikon Corp EXPOSURE SYSTEM AND COMPONENT MANUFACTURING METHOD
CN100370533C (zh) * 2002-12-13 2008-02-20 皇家飞利浦电子股份有限公司 用于照射层的方法和用于将辐射导向层的装置
US6781670B2 (en) * 2002-12-30 2004-08-24 Intel Corporation Immersion lithography
JP4902201B2 (ja) 2003-04-07 2012-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
EP1700163A1 (en) 2003-12-15 2006-09-13 Carl Zeiss SMT AG Objective as a microlithography projection objective with at least one liquid lens
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
CN101727021A (zh) 2004-02-13 2010-06-09 卡尔蔡司Smt股份公司 微平版印刷投影曝光装置的投影物镜
US20070030467A1 (en) * 2004-02-19 2007-02-08 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method
US20060244938A1 (en) * 2004-05-04 2006-11-02 Karl-Heinz Schuster Microlitographic projection exposure apparatus and immersion liquid therefore
US7209213B2 (en) * 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4961709B2 (ja) * 2004-10-13 2012-06-27 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
US7128427B2 (en) * 2004-11-05 2006-10-31 Sematech, Inc. Method and apparatus for fluid handling in immersion lithography
JP4980922B2 (ja) * 2004-11-18 2012-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置及びマイクロリソグラフィ投影露光装置の像面湾曲を修正するための方法
US7405805B2 (en) * 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7324185B2 (en) * 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20070070323A1 (en) * 2005-09-21 2007-03-29 Nikon Corporation Exposure apparatus, exposure method, and device fabricating method

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