JP2008540829A5 - - Google Patents

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Publication number
JP2008540829A5
JP2008540829A5 JP2008510033A JP2008510033A JP2008540829A5 JP 2008540829 A5 JP2008540829 A5 JP 2008540829A5 JP 2008510033 A JP2008510033 A JP 2008510033A JP 2008510033 A JP2008510033 A JP 2008510033A JP 2008540829 A5 JP2008540829 A5 JP 2008540829A5
Authority
JP
Japan
Prior art keywords
granular material
supply position
opening
powder material
rotary screw
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008510033A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008540829A (ja
JP5237088B2 (ja
Filing date
Publication date
Priority claimed from US11/121,242 external-priority patent/US7625602B2/en
Application filed filed Critical
Publication of JP2008540829A publication Critical patent/JP2008540829A/ja
Publication of JP2008540829A5 publication Critical patent/JP2008540829A5/ja
Application granted granted Critical
Publication of JP5237088B2 publication Critical patent/JP5237088B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008510033A 2005-05-03 2006-04-25 粉末材料または粒状材料の制御可能な供給 Active JP5237088B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/121,242 US7625602B2 (en) 2005-05-03 2005-05-03 Controllably feeding powdered or granular material
US11/121,242 2005-05-03
PCT/US2006/015351 WO2006118837A2 (en) 2005-05-03 2006-04-25 Method for feeding powdered or granular material

Publications (3)

Publication Number Publication Date
JP2008540829A JP2008540829A (ja) 2008-11-20
JP2008540829A5 true JP2008540829A5 (enExample) 2009-04-16
JP5237088B2 JP5237088B2 (ja) 2013-07-17

Family

ID=37103274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008510033A Active JP5237088B2 (ja) 2005-05-03 2006-04-25 粉末材料または粒状材料の制御可能な供給

Country Status (4)

Country Link
US (1) US7625602B2 (enExample)
EP (1) EP1893785B1 (enExample)
JP (1) JP5237088B2 (enExample)
WO (1) WO2006118837A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5179739B2 (ja) * 2006-09-27 2013-04-10 東京エレクトロン株式会社 蒸着装置、蒸着装置の制御装置、蒸着装置の制御方法および蒸着装置の使用方法
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
JP4974036B2 (ja) 2009-11-19 2012-07-11 株式会社ジャパンディスプレイセントラル 有機ｅｌ装置の製造方法
CN106119781B (zh) * 2016-07-27 2018-10-30 京东方科技集团股份有限公司 蒸发装置、蒸镀设备和蒸镀方法
EP4340969A1 (de) 2021-05-21 2024-03-27 Merck Patent GmbH Verfahren zur kontinuierlichen aufreinigung von mindestens einem funktionalen material und vorrichtung zur kontinuierlichen aufreinigung von mindestens einem funktionalen material
CN115595550B (zh) * 2022-10-24 2024-07-23 广东振华科技股份有限公司 一种af颗粒膜料自动换料连续蒸发镀膜装置及方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2447789A (en) * 1945-03-23 1948-08-24 Polaroid Corp Evaporating crucible for coating apparatus
JPS50109182A (enExample) * 1974-02-07 1975-08-28
SU779441A1 (ru) 1978-07-31 1980-11-15 Институт Механики Металлополимерных Систем Ан Белорусской Сср Дозирующий питатель
DE3530106A1 (de) * 1985-08-23 1987-02-26 Kempten Elektroschmelz Gmbh Aufdampfgut zum aufdampfen anorganischer verbindungen mittels einer photonen-erzeugenden strahlungsheizquelle in kontinuierlich betriebenen vakuumbedampfungsanlagen
US4885211A (en) * 1987-02-11 1989-12-05 Eastman Kodak Company Electroluminescent device with improved cathode
US4769292A (en) * 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
JPH0645213Y2 (ja) * 1988-02-08 1994-11-16 住友電気工業株式会社 高精度粉体供給装置
EP0585848A1 (de) * 1992-09-02 1994-03-09 Hoechst Aktiengesellschaft Verfahren und Vorrichtung zur chemischen Gasphasenabscheidung dünner Schichten
JP2000248358A (ja) * 1999-03-01 2000-09-12 Casio Comput Co Ltd 蒸着装置および蒸着方法
IT1310745B1 (it) 1999-11-26 2002-02-22 Lawer Spa Dispositivo per l'erogazione dosata di prodotti scorrevoli.
JP2003293121A (ja) * 2002-04-05 2003-10-15 Cluster Ion Beam Technology Kk 蒸着材料供給手段を備えた蒸着用坩堝
US7118783B2 (en) * 2002-06-26 2006-10-10 Micron Technology, Inc. Methods and apparatus for vapor processing of micro-device workpieces
US6837939B1 (en) * 2003-07-22 2005-01-04 Eastman Kodak Company Thermal physical vapor deposition source using pellets of organic material for making OLED displays
US7339139B2 (en) * 2003-10-03 2008-03-04 Darly Custom Technology, Inc. Multi-layered radiant thermal evaporator and method of use
US7288285B2 (en) * 2004-09-21 2007-10-30 Eastman Kodak Company Delivering organic powder to a vaporization zone
US7213347B2 (en) 2005-05-03 2007-05-08 Eastman Kodak Company Metering material to promote rapid vaporization

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