JP2008523987A5 - - Google Patents

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Publication number
JP2008523987A5
JP2008523987A5 JP2007547451A JP2007547451A JP2008523987A5 JP 2008523987 A5 JP2008523987 A5 JP 2008523987A5 JP 2007547451 A JP2007547451 A JP 2007547451A JP 2007547451 A JP2007547451 A JP 2007547451A JP 2008523987 A5 JP2008523987 A5 JP 2008523987A5
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JP
Japan
Prior art keywords
alkyl
interrupted
cycloalkyl
alkenyl
phenyl
Prior art date
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JP2007547451A
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English (en)
Japanese (ja)
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JP2008523987A (ja
JP5421533B2 (ja
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Priority claimed from PCT/EP2005/056683 external-priority patent/WO2006067061A2/en
Publication of JP2008523987A publication Critical patent/JP2008523987A/ja
Publication of JP2008523987A5 publication Critical patent/JP2008523987A5/ja
Application granted granted Critical
Publication of JP5421533B2 publication Critical patent/JP5421533B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007547451A 2004-12-22 2005-12-12 強接着性コーティングの製造方法 Expired - Fee Related JP5421533B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP04106822 2004-12-22
EP04106822.2 2004-12-22
PCT/EP2005/056683 WO2006067061A2 (en) 2004-12-22 2005-12-12 Process for the production of strongly adherent coatings

Publications (3)

Publication Number Publication Date
JP2008523987A JP2008523987A (ja) 2008-07-10
JP2008523987A5 true JP2008523987A5 (enExample) 2009-02-05
JP5421533B2 JP5421533B2 (ja) 2014-02-19

Family

ID=34930110

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007547451A Expired - Fee Related JP5421533B2 (ja) 2004-12-22 2005-12-12 強接着性コーティングの製造方法

Country Status (5)

Country Link
US (1) US8414982B2 (enExample)
EP (1) EP1836002B1 (enExample)
JP (1) JP5421533B2 (enExample)
TW (1) TWI392712B (enExample)
WO (1) WO2006067061A2 (enExample)

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WO2008040650A2 (en) * 2006-10-03 2008-04-10 Ciba Holding Inc. Photocurable compositions comprising a photoinitiator of the phenylglyoxylate type
US8057852B2 (en) 2006-11-23 2011-11-15 National Research Council Of Canada Microdevice for a fluorescence-based assay, and a method for making the microdevice
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EP1978038A1 (en) * 2007-04-02 2008-10-08 Vlaamse Instelling Voor Technologisch Onderzoek (Vito) A method for producing a coating by atmospheric pressure plasma technology
EP2147060B1 (en) 2007-04-25 2013-07-03 Basf Se Substrates with biopassive coating
WO2010044668A1 (en) * 2008-10-17 2010-04-22 Wageningen Universiteit Photochemical modification of solid materials
DE102008052586A1 (de) * 2008-10-21 2010-04-22 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Zusammensetzung zur Herstellung optischer Elemente mit Gradientenstruktur
EP2737996B1 (en) * 2011-07-28 2017-12-27 Toppan Printing Co., Ltd. Laminated body, gas barrier film, and method for producing laminated body and gas barrier film
WO2014078947A1 (en) * 2012-11-26 2014-05-30 Farnum Bryan Christopher Powder coating pretreatment compositions, and methods of using and making the same
CN104994938A (zh) 2012-12-17 2015-10-21 巴斯夫欧洲公司 具有增强通量的过滤系统和膜及其制备方法
KR20160014040A (ko) * 2013-05-29 2016-02-05 시마 나노 테크 이스라엘 리미티드 광개시제를 사용하는 기재의 전처리
WO2015177047A1 (en) * 2014-05-19 2015-11-26 Styrolution Group Gmbh Styrene copolymer composite film
CN104610541A (zh) * 2015-02-10 2015-05-13 天津墨森科技有限公司 新型苯甲酰甲酸酯类引发剂及其制备方法
KR101860188B1 (ko) * 2016-01-27 2018-06-28 대진대학교 산학협력단 마이크로웨이브를 이용한 3d 프린트물의 표면처리 방법
JP7057058B2 (ja) * 2016-08-10 2022-04-19 ダイセルポリマー株式会社 熱可塑性樹脂組成物の成形体の塗装方法
CN106397815A (zh) * 2016-09-28 2017-02-15 南宁市日建塑料包装有限责任公司 一种提高塑料印刷品中油墨附着力的方法
CN106905147A (zh) * 2017-02-21 2017-06-30 怀化金鑫新材料有限公司 光引发剂苯甲酰甲酸二甘醇酯的合成新工艺
US10851045B2 (en) 2017-03-31 2020-12-01 Coloplast A/S Acrylamide photoinitiators
US10633550B2 (en) * 2017-08-31 2020-04-28 Xerox Corporation Molecular organic reactive inks for conductive silver printing
EP3784499A1 (en) 2018-04-25 2021-03-03 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
WO2019206846A1 (en) 2018-04-25 2019-10-31 Basf Se Process for the production of strongly adherent liquid crystal films on flexible substrates
US10814659B2 (en) 2018-06-28 2020-10-27 Xerox Corporation Methods for printing conductive objects
CN111804550A (zh) * 2020-07-07 2020-10-23 安徽百世佳包装有限公司 一种铝制品表面罩光涂层处理工艺
KR20250114384A (ko) * 2023-04-05 2025-07-29 케이제이 케미칼즈 가부시키가이샤 벤조일포름산아미드 유도체
JP7609210B1 (ja) 2023-07-14 2025-01-07 ａｒｔｉｅｎｃｅ株式会社 水性フレキソインキ及びその印刷物

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US3622848A (en) 1970-03-19 1971-11-23 Du Pont Capacitor with photocrosslinked dielectric
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AU718619B2 (en) * 1997-01-30 2000-04-20 Ciba Specialty Chemicals Holding Inc. Non-volatile phenylglyoxalic esters
DE19826712A1 (de) 1998-06-16 1999-12-23 Basf Ag Strahlungshärtbare Massen, enthaltend Phenylglyoxylate
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
ATE258467T1 (de) * 1998-10-28 2004-02-15 Ciba Sc Holding Ag Verfahren zur herstellung haftfester oberflächenbeschichtungen
DE19953433A1 (de) 1999-11-06 2001-05-10 Michael Bauer Verfahren zur Herstellung haftfester, strukturierbarer Metallbeschichtungen
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ATE314156T1 (de) * 2002-01-29 2006-01-15 Ciba Sc Holding Ag Verfahren zur herstellung von stark haftenden beschichtungen
WO2003074718A1 (en) * 2002-03-06 2003-09-12 Ciba Specialty Chemicals Holding Inc. Enzymatic process for preparing organosilicon group containing photoinitiators
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MXPA05006693A (es) * 2002-12-20 2005-09-08 Ciba Sc Holding Ag Metodo para formar capas funcionales.
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WO2005021824A2 (en) * 2003-08-04 2005-03-10 Ciba Specialty Chemicals Holding Inc. Process for the production of strongly adherent coatings
BRPI0413295A (pt) * 2003-08-04 2006-10-10 Ciba Sc Holding Ag processo para a produção de revestimentos fortemente aderentes

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