JP2008311351A5 - - Google Patents

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Publication number
JP2008311351A5
JP2008311351A5 JP2007156357A JP2007156357A JP2008311351A5 JP 2008311351 A5 JP2008311351 A5 JP 2008311351A5 JP 2007156357 A JP2007156357 A JP 2007156357A JP 2007156357 A JP2007156357 A JP 2007156357A JP 2008311351 A5 JP2008311351 A5 JP 2008311351A5
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JP
Japan
Prior art keywords
sample
electrostatic chuck
charged particle
particle beam
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007156357A
Other languages
English (en)
Japanese (ja)
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JP2008311351A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007156357A priority Critical patent/JP2008311351A/ja
Priority claimed from JP2007156357A external-priority patent/JP2008311351A/ja
Priority to US12/137,128 priority patent/US7763863B2/en
Publication of JP2008311351A publication Critical patent/JP2008311351A/ja
Publication of JP2008311351A5 publication Critical patent/JP2008311351A5/ja
Priority to US12/828,781 priority patent/US8158955B2/en
Pending legal-status Critical Current

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JP2007156357A 2007-06-13 2007-06-13 荷電粒子線装置 Pending JP2008311351A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007156357A JP2008311351A (ja) 2007-06-13 2007-06-13 荷電粒子線装置
US12/137,128 US7763863B2 (en) 2007-06-13 2008-06-11 Charged particle beam application apparatus
US12/828,781 US8158955B2 (en) 2007-06-13 2010-07-01 Charged particle beam application apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007156357A JP2008311351A (ja) 2007-06-13 2007-06-13 荷電粒子線装置

Publications (2)

Publication Number Publication Date
JP2008311351A JP2008311351A (ja) 2008-12-25
JP2008311351A5 true JP2008311351A5 (https=) 2009-07-30

Family

ID=40131437

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007156357A Pending JP2008311351A (ja) 2007-06-13 2007-06-13 荷電粒子線装置

Country Status (2)

Country Link
US (2) US7763863B2 (https=)
JP (1) JP2008311351A (https=)

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JP2008311351A (ja) * 2007-06-13 2008-12-25 Hitachi High-Technologies Corp 荷電粒子線装置
JP2009302415A (ja) * 2008-06-17 2009-12-24 Hitachi High-Technologies Corp 荷電粒子線装置，試料保持システム，試料の保持方法、および、試料の離脱方法
TWI465708B (zh) * 2008-12-29 2014-12-21 Ind Tech Res Inst 聚焦式離子束系統之物件加工方法及應用於該方法之載具
WO2010097858A1 (ja) * 2009-02-27 2010-09-02 株式会社 日立ハイテクノロジーズ 電子顕微鏡および試料保持方法
JP5174750B2 (ja) * 2009-07-03 2013-04-03 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び荷電粒子線画像を安定に取得する方法
KR101849383B1 (ko) * 2010-06-08 2018-04-16 액셀리스 테크놀러지스, 인크. 고온에서 기계적 클램프 성능을 포함하는 가열된 정전 척
JP5331828B2 (ja) * 2011-01-14 2013-10-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2014144533A1 (en) * 2013-03-15 2014-09-18 Applied Materials, Inc. Position and temperature monitoring of ald platen susceptor
JP6064032B2 (ja) 2013-03-15 2017-01-18 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP2015026553A (ja) * 2013-07-29 2015-02-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6174972B2 (ja) * 2013-11-12 2017-08-02 株式会社ディスコ 位置出しテーブル
JP6496184B2 (ja) * 2014-06-27 2019-04-03 日本電子株式会社 試料導入方法、試料ステージ、および荷電粒子線装置
US9449805B2 (en) * 2014-09-23 2016-09-20 Agilent Technologies Inc. Isolation of charged particle optics from vacuum chamber deformations
US10186446B2 (en) * 2016-09-30 2019-01-22 Axcelis Technology, Inc. Adjustable circumference electrostatic clamp
JP2019215957A (ja) * 2018-06-11 2019-12-19 株式会社荏原製作所 ビームベンダ
JP6994437B2 (ja) * 2018-07-06 2022-01-14 株式会社日立ハイテク 基板保持具及び走査型電子顕微鏡装置
JP2020199517A (ja) * 2019-06-07 2020-12-17 ファナック株式会社 レーザ加工システム
CN110982686B (zh) * 2019-12-27 2025-01-17 珠海迪尔生物工程股份有限公司 微生物观测测试卡、观测系统和观测方法

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JP2004363085A (ja) * 2003-05-09 2004-12-24 Ebara Corp 荷電粒子線による検査装置及びその検査装置を用いたデバイス製造方法
JP4637684B2 (ja) * 2004-09-10 2011-02-23 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置
JP4997842B2 (ja) * 2005-10-18 2012-08-08 東京エレクトロン株式会社 処理装置
JP4935149B2 (ja) * 2006-03-30 2012-05-23 東京エレクトロン株式会社 プラズマ処理用の電極板及びプラズマ処理装置
US8177990B2 (en) * 2006-03-31 2012-05-15 Tokyo Electron Limited Etching method, plasma processing system and storage medium
JP2008311351A (ja) * 2007-06-13 2008-12-25 Hitachi High-Technologies Corp 荷電粒子線装置

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