JP2008202112A - 微細構造体および製造方法 - Google Patents

微細構造体および製造方法 Download PDF

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Publication number
JP2008202112A
JP2008202112A JP2007040811A JP2007040811A JP2008202112A JP 2008202112 A JP2008202112 A JP 2008202112A JP 2007040811 A JP2007040811 A JP 2007040811A JP 2007040811 A JP2007040811 A JP 2007040811A JP 2008202112 A JP2008202112 A JP 2008202112A
Authority
JP
Japan
Prior art keywords
micropore
treatment
micropores
aluminum
microstructure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2007040811A
Other languages
English (en)
Japanese (ja)
Inventor
Yusuke Hatanaka
優介 畠中
Yoshinori Hotta
吉則 堀田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2007040811A priority Critical patent/JP2008202112A/ja
Priority to EP20070023950 priority patent/EP1967616B8/fr
Priority to CN 200710160897 priority patent/CN101275264A/zh
Publication of JP2008202112A publication Critical patent/JP2008202112A/ja
Abandoned legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/18—Polishing of light metals
    • C25F3/20—Polishing of light metals of aluminium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02—Anodisation
    • C25D11/04—Anodisation of aluminium or alloys based thereon
    • C25D11/18—After-treatment, e.g. pore-sealing
    • C25D11/20—Electrolytic after-treatment
JP2007040811A 2007-02-21 2007-02-21 微細構造体および製造方法 Abandoned JP2008202112A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007040811A JP2008202112A (ja) 2007-02-21 2007-02-21 微細構造体および製造方法
EP20070023950 EP1967616B8 (fr) 2007-02-21 2007-12-11 Microstructure et procédé de fabrication correspondant
CN 200710160897 CN101275264A (zh) 2007-02-21 2007-12-27 微结构体及其制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007040811A JP2008202112A (ja) 2007-02-21 2007-02-21 微細構造体および製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012015549A Division JP2012140708A (ja) 2012-01-27 2012-01-27 微細構造体および製造方法

Publications (1)

Publication Number Publication Date
JP2008202112A true JP2008202112A (ja) 2008-09-04

Family

ID=39446458

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007040811A Abandoned JP2008202112A (ja) 2007-02-21 2007-02-21 微細構造体および製造方法

Country Status (3)

Country Link
EP (1) EP1967616B8 (fr)
JP (1) JP2008202112A (fr)
CN (1) CN101275264A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012241224A (ja) * 2011-05-18 2012-12-10 Kogakuin Univ 多孔質材料及びその製造方法
JP2013251333A (ja) * 2012-05-30 2013-12-12 Fujifilm Corp 熱電変換素子の製造方法
CN117558560A (zh) * 2024-01-12 2024-02-13 中国科学院合肥物质科学研究院 高能束流辅助制备有序多孔钽箔的方法及其产品和应用

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8993921B2 (en) 2012-06-22 2015-03-31 Apple Inc. Method of forming white appearing anodized films by laser beam treatment
US9839974B2 (en) 2013-11-13 2017-12-12 Apple Inc. Forming white metal oxide films by oxide structure modification or subsurface cracking
JP6585759B1 (ja) * 2018-03-28 2019-10-02 株式会社Uacj アルミニウム部材及びその製造方法
US11312107B2 (en) * 2018-09-27 2022-04-26 Apple Inc. Plugging anodic oxides for increased corrosion resistance
US11447887B2 (en) 2020-12-10 2022-09-20 Saudi Arabian Oil Company Surface smoothing of copper by electropolishing
US11512400B2 (en) * 2020-12-10 2022-11-29 Saudi Arabian Oil Company Electrochemical reduction of carbon dioxide
US11617981B1 (en) 2022-01-03 2023-04-04 Saudi Arabian Oil Company Method for capturing CO2 with assisted vapor compression

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605897A (ja) * 1983-06-22 1985-01-12 Fujitsu Ltd 高耐蝕アルマイト基板の製造法
JPS61101946A (ja) * 1984-10-23 1986-05-20 Kao Corp メツシユの製造方法
JPH10121292A (ja) * 1996-08-26 1998-05-12 Nippon Telegr & Teleph Corp <Ntt> 多孔性陽極酸化アルミナ膜の作製方法
JP2005152707A (ja) * 2003-11-21 2005-06-16 Shiseido Co Ltd フィルター材料

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2708655A (en) 1955-05-17 Electrolytic polishing of aluminum
US3488262A (en) * 1966-07-13 1970-01-06 Clarence W Forestek Method of heat treating hard anodized surfaces
JPS60231921A (ja) * 1984-05-01 1985-11-18 Kobe Steel Ltd 磁気デイスク用基盤の表面処理方法
JPS62149029A (ja) * 1985-09-04 1987-07-03 Furukawa Alum Co Ltd アルマイト磁気デイスク基板とその製造方法
GB8823417D0 (en) * 1988-10-05 1988-11-09 Alcan Int Ltd Treating porous anodic aluminium oxide membrane
TWI285225B (en) * 2004-09-07 2007-08-11 Univ Nat Chiao Tung Method of manufacturing aluminum oxide film with arrayed nanometric pores
EP1715085B1 (fr) * 2005-04-18 2013-04-03 FUJIFILM Corporation Procédé pour la fabrication d'une structure anodisée

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605897A (ja) * 1983-06-22 1985-01-12 Fujitsu Ltd 高耐蝕アルマイト基板の製造法
JPS61101946A (ja) * 1984-10-23 1986-05-20 Kao Corp メツシユの製造方法
JPH10121292A (ja) * 1996-08-26 1998-05-12 Nippon Telegr & Teleph Corp <Ntt> 多孔性陽極酸化アルミナ膜の作製方法
JP2005152707A (ja) * 2003-11-21 2005-06-16 Shiseido Co Ltd フィルター材料

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012241224A (ja) * 2011-05-18 2012-12-10 Kogakuin Univ 多孔質材料及びその製造方法
JP2013251333A (ja) * 2012-05-30 2013-12-12 Fujifilm Corp 熱電変換素子の製造方法
CN117558560A (zh) * 2024-01-12 2024-02-13 中国科学院合肥物质科学研究院 高能束流辅助制备有序多孔钽箔的方法及其产品和应用

Also Published As

Publication number Publication date
CN101275264A (zh) 2008-10-01
EP1967616A1 (fr) 2008-09-10
EP1967616B1 (fr) 2013-08-28
EP1967616B8 (fr) 2013-10-02

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