JP2008171929A - Substrate transfer apparatus - Google Patents

Substrate transfer apparatus Download PDF

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JP2008171929A
JP2008171929A JP2007002276A JP2007002276A JP2008171929A JP 2008171929 A JP2008171929 A JP 2008171929A JP 2007002276 A JP2007002276 A JP 2007002276A JP 2007002276 A JP2007002276 A JP 2007002276A JP 2008171929 A JP2008171929 A JP 2008171929A
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substrate
suction
glass substrate
holding mechanism
floating stage
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Tatsuya Nakamura
達哉 中村
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate transfer apparatus capable of stably transferring a substrate having a warp. <P>SOLUTION: The substrate transfer apparatus 1 includes a substrate floating stage 3 which floats a substrate W by air, a substrate holding mechanism 27 which holds the middle part of the substrate W in its width direction on either the front end W4 or the rear end W5 of the substrate W in a transfer direction B, a transfer mechanism 5 which moves the substrate holding mechanism 27 in the transfer direction B relative to the substrate floating stage 3, and a retreating means which retreats the substrate holding mechanism 27 to the upside of the substrate W. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

この発明は、大型の基板を浮上させて搬送する基板搬送装置に関するものである。   The present invention relates to a substrate transfer apparatus that floats and transfers a large substrate.

近年、液晶ディスプレイ(以下、LCDと省略する)やプラズマディスプレイパネル(以下、PDPと省略する)等のフラットパネルディスプレイ(以下、FPDと省略する)の画面の大型化に伴い、FPDを多面取りで製造するマザーガラス基板のサイズが年々大型化し、1辺が2000mm、3000mmを超えるマザーガラス基板が出現している。
従来、FPD製造工程などにおいて大型のガラス基板を搬送する基板搬送装置には、例えば特許文献1のように、平行に配置された複数のエアー供給管の上面側に通気性セラミックス材を設け、この通気性セラミックス材からエアーをガラス基板の下面に吹きつけて、ガラス基板を浮上させた状態で各エアー供給管ごと搬送させるものがある。
In recent years, as the screen of a flat panel display (hereinafter abbreviated as “FPD”) such as a liquid crystal display (hereinafter abbreviated as “LCD”) or a plasma display panel (hereinafter abbreviated as “PDP”) is enlarged, the FPD can be multi-faceted. The size of the mother glass substrate to be manufactured has increased year by year, and a mother glass substrate having a side of 2000 mm or more than 3000 mm has appeared.
Conventionally, in a substrate transfer apparatus that transfers a large glass substrate in an FPD manufacturing process or the like, a breathable ceramic material is provided on the upper surface side of a plurality of air supply pipes arranged in parallel as in Patent Document 1, for example. There is one in which air is blown from the air-permeable ceramic material onto the lower surface of the glass substrate, and the air supply pipes are conveyed together with the glass substrate floating.

また、基板搬送装置としては、例えば、エアーを吹きつける多数の孔を形成した基板浮上ステージ上にガラス基板を浮上させた状態で、ガラス基板の端部を吸着保持して搬送する搬送機構を備えたものがある。なお、この搬送機構は、基板浮上ステージの一側部に沿って平行に敷設されたガイドレールに移動可能に設けられており、ガラス基板の側端部を保持して、基板浮上ステージに対してガラス基板を強制的に搬送する。
特開2000−136024号公報(図1、図2)
In addition, as the substrate transport device, for example, a transport mechanism is provided that transports the glass substrate while adsorbing and holding the end of the glass substrate in a state where the glass substrate is floated on a substrate floating stage in which a large number of holes for blowing air are formed. There is something. The transport mechanism is movably provided on a guide rail laid in parallel along one side of the substrate levitation stage, holds the side edge of the glass substrate, and moves relative to the substrate levitation stage. The glass substrate is forcibly transferred.
JP 2000-136024 A (FIGS. 1 and 2)

ところで、FPDの製造工程においては、ガラス基板の表面にレジストを塗布して乾燥させることがあるが、レジストとの収縮率の違いによってガラス基板がその厚さ方向に反り返ってしまう場合がある。ここで、ガラス基板が基板浮上ステージによるガラス基板の浮上高さよりも下方に大きく反ると、ガラス基板の搬送方向の前方側や後方側の端部が基板浮上ステージに接触してしまうため、ガラス基板を非接触で搬送できなくなるという問題が生ずる。
特に、搬送機構によって基板浮上ステージに対してガラス基板を搬送する際には、搬送機構により保持されていないガラス基板の前端部や後端部が基板浮上ステージ上を擦りながら移動するため、ガラス基板が基板浮上ステージの継ぎ目などに当接して破損したり、基板浮上ステージがガラス基板により削られて損傷すると共に、このときの粉塵によりガラス基板が汚染するという問題が生ずる。
By the way, in the FPD manufacturing process, a resist may be applied to the surface of the glass substrate and dried, but the glass substrate may be warped in the thickness direction due to a difference in shrinkage from the resist. Here, if the glass substrate is greatly warped below the flying height of the glass substrate by the substrate floating stage, the front and rear end portions in the transport direction of the glass substrate come into contact with the substrate floating stage. There arises a problem that the substrate cannot be conveyed in a non-contact manner.
In particular, when the glass substrate is transported to the substrate levitation stage by the transport mechanism, the front and rear ends of the glass substrate not held by the transport mechanism move while rubbing on the substrate levitation stage. However, there is a problem that the substrate floating stage is damaged due to contact with the joint of the substrate floating stage or the substrate floating stage is scraped and damaged by the glass substrate, and the glass substrate is contaminated by dust at this time.

この発明は上述した事情に鑑みてなされたものであって、反りが発生した基板を安定して搬送することができる基板搬送装置を提供することを目的としている。   The present invention has been made in view of the above-described circumstances, and an object of the present invention is to provide a substrate transport apparatus that can stably transport a warped substrate.

上記目的を達成するために、この発明は、以下の手段を提供する。
請求項1に係る発明は、基板をエアー浮上させる基板浮上ステージと、前記基板の搬送方向の前端部及び後端部の少なくとも一方のうち、前記基板の幅方向の中途部分を保持する基板保持機構と、この基板保持機構を前記基板浮上ステージに対して前記搬送方向に移動させる搬送機構と、前記基板保持機構を前記基板の上方に退避させる退避手段とを備えることを特徴とする。
In order to achieve the above object, the present invention provides the following means.
According to a first aspect of the present invention, there is provided a substrate levitating stage for levitating a substrate and a substrate holding mechanism for holding an intermediate portion in the width direction of the substrate among at least one of a front end portion and a rear end portion in the transport direction of the substrate. And a transport mechanism for moving the substrate holding mechanism in the transport direction with respect to the substrate floating stage, and a retracting means for retracting the substrate holding mechanism above the substrate.

本発明の基板搬送装置によれば、基板の前端部や後端部の中途部分を保持する基板保持機構が設けられているため、基板を基板浮上ステージの上面上で浮上させた状態において、基板の前端部や後端部が反り返っていても、基板保持機構によって基板の前端部や後端部の反りを矯正することができる。したがって、基板の前端部や後端部が基板浮上ステージの上面に擦れることを防止でき、基板を安定した状態で搬送することが可能となる。
なお、基板の前端部が基板浮上ステージの上面に擦れる場合には、後端部が擦れる場合と比較して大きな傷がつきやすいため、基板の前端部を基板保持機構によって保持することは特に有効である。
According to the substrate transfer apparatus of the present invention, since the substrate holding mechanism that holds the middle part of the front end portion and the rear end portion of the substrate is provided, the substrate is floated on the upper surface of the substrate floating stage. Even if the front end portion or the rear end portion of the substrate is warped, the warp of the front end portion or the rear end portion of the substrate can be corrected by the substrate holding mechanism. Therefore, it is possible to prevent the front end and rear end of the substrate from rubbing against the upper surface of the substrate floating stage, and the substrate can be transported in a stable state.
Note that when the front end of the substrate rubs against the upper surface of the substrate floating stage, it is more likely to be scratched than when the rear end rubs, so it is particularly effective to hold the front end of the substrate with the substrate holding mechanism. It is.

以下、図1から図5を参照して本発明の第1実施形態に係る基板搬送装置について説明する。
図1に示すように、この実施形態に係る基板搬送装置1は、LCDやPDP等のFPDを多面取りで製造する矩形のガラス基板(基板)Wを浮上状態で搬送するものであり、ガラス基板Wを非接触状態で浮上させるための基板浮上ステージ3と、基板浮上ステージ3の上面3aに沿う一方向(搬送方向B)にガラス基板Wを搬送する搬送機構5とを備えている。
基板浮上ステージ3は、ガラス基板Wの搬送方向Bに延びて形成されており、その幅方向(上面3a内でガラス基板の搬送方向Bに直交する方向)の寸法は、ガラス基板Wの幅よりも短くなっている。すなわち、ガラス基板Wを基板浮上ステージ3上に配した状態においては、ガラス基板Wの側端部W1,W2が基板浮上ステージ3の両側部3c,3dから突出することになる。
Hereinafter, a substrate transfer apparatus according to a first embodiment of the present invention will be described with reference to FIGS. 1 to 5.
As shown in FIG. 1, a substrate transport apparatus 1 according to this embodiment transports a rectangular glass substrate (substrate) W for manufacturing an FPD such as an LCD or a PDP in a multi-faced state in a floating state. A substrate levitation stage 3 for levitating W in a non-contact state and a transport mechanism 5 for transporting the glass substrate W in one direction along the upper surface 3a of the substrate levitation stage 3 (transport direction B) are provided.
The substrate floating stage 3 is formed to extend in the transport direction B of the glass substrate W, and the dimension in the width direction (the direction perpendicular to the transport direction B of the glass substrate in the upper surface 3a) is larger than the width of the glass substrate W. Is also shorter. That is, in a state where the glass substrate W is disposed on the substrate floating stage 3, the side end portions W 1 and W 2 of the glass substrate W protrude from both side portions 3 c and 3 d of the substrate floating stage 3.

基板浮上ステージ3の上面3aには、エアー吹き上げ用の空気孔3e,3e,・・・が多数開口して形成されており、これら空気孔3e,3e,・・・から圧縮空気を噴出させることで、ガラス基板Wが基板浮上ステージ3の上面3a上でエアー浮上することになる。また、基板浮上ステージ3の上面3aには、ガラス基板Wの搬送方向Bに延びて後述する吊下部31,31,31を通すための通路7,7,7が複数(図示例では3つ)形成されている。本実施形態では、通路7,7,7を溝状に形成したが、基板浮上ステージ3を複数の基板浮上ステージブロックに分割し、これら基板浮上ステージブロックを所定の間隔を開けて通路7,7,7とすることもできる。   A large number of air holes 3e, 3e,... For air blowing are formed in the upper surface 3a of the substrate levitation stage 3, and compressed air is ejected from these air holes 3e, 3e,. Thus, the glass substrate W floats on the upper surface 3 a of the substrate floating stage 3. In addition, the upper surface 3a of the substrate levitation stage 3 has a plurality of passages 7, 7, and 7 (three in the illustrated example) that extend in the transport direction B of the glass substrate W and pass through suspension parts 31, 31, and 31 described later. Is formed. In this embodiment, the passages 7, 7, and 7 are formed in a groove shape. However, the substrate floating stage 3 is divided into a plurality of substrate floating stage blocks, and the substrate floating stage blocks are separated from each other by a predetermined interval. , 7.

搬送機構5は、基板浮上ステージ3の両側部3c,3dに平行にベース配置されて搬送方向Bに延びる一対のレール11,11、及び、各レール11,11上で搬送方向B及びその逆方向に移動可能とされた一対の搬送部13,13によって構成されている。そして、図2,3に示すように、各搬送部13は、搬送駆動部15と、搬送駆動部15の上方に設けられた複数の吸着ユニット17,17,17と、各吸着ユニット17を搬送駆動部15に対して上下方向に移動させるアクチュエータからなる昇降機構19とを備えている。
搬送駆動部15は例えばリニアモータによって構成されており、搬送駆動部15に対向するレール11の上面11aに敷設されたリニアガイドの上をガラス基板Wの搬送方向Bに沿って往復移動できるようになっている。
The transport mechanism 5 includes a pair of rails 11, 11 that are arranged in parallel with both side portions 3 c, 3 d of the substrate floating stage 3 and extend in the transport direction B, and the transport direction B and the opposite direction on each rail 11, 11. It is comprised by a pair of conveyance parts 13 and 13 made movable. As shown in FIGS. 2 and 3, each transport unit 13 transports a transport drive unit 15, a plurality of suction units 17, 17, 17 provided above the transport drive unit 15, and each suction unit 17. An elevating mechanism 19 composed of an actuator that moves the drive unit 15 in the vertical direction is provided.
The conveyance drive unit 15 is constituted by, for example, a linear motor, and can reciprocate along the conveyance direction B of the glass substrate W on the linear guide laid on the upper surface 11 a of the rail 11 facing the conveyance drive unit 15. It has become.

複数の吸着ユニット17,17,17は、ガラス基板Wの搬送方向Bに並べて配され、ガラス基板Wの両側端部W1,W2の裏面W3を吸着保持する基板保持機構をなしている。すなわち、各吸着ユニット17の上部には、基板浮上ステージ3の側部3c,3dから突出するガラス基板Wの側端部W1,W2の裏面W3をエアー吸引により吸着保持するための吸着部21,21,・・・が複数(図示例では4つ)設けられており、これら複数の吸着部21,21,・・・も搬送方向Bに並べて配されている。ガラス基板Wの側端部W1,W2に接触する各吸着部21の上面21aの図示しない偏平な凹部には、吸着ユニット17内部から真空ポンプ(不図示)まで連通する吸引孔21bが開口しており、真空ポンプにより各吸着部21の上面21a側を真空引きすることで、ガラス基板Wの側端部W1,W2の裏面W3を吸着保持するようになっている。   The plurality of suction units 17, 17, 17 are arranged side by side in the transport direction B of the glass substrate W, and form a substrate holding mechanism that sucks and holds the back surfaces W <b> 3 of the side end portions W <b> 1, W <b> 2 of the glass substrate W. That is, at the upper part of each suction unit 17 is a suction part 21 for sucking and holding the back surfaces W3 of the side edges W1 and W2 of the glass substrate W protruding from the side parts 3c and 3d of the substrate floating stage 3 by air suction. Are provided in a plurality of (four in the illustrated example), and the plurality of suction portions 21, 21,. A suction hole 21b communicating from the inside of the suction unit 17 to the vacuum pump (not shown) is opened in a flat recess (not shown) of the upper surface 21a of each suction part 21 that contacts the side edges W1 and W2 of the glass substrate W. In addition, the back surface W3 of the side end portions W1, W2 of the glass substrate W is sucked and held by evacuating the upper surface 21a side of each suction portion 21 with a vacuum pump.

昇降機構19は、搬送駆動部15の上部に固定されたシリンダ23及びピストン25からなるエアアクチュエータによって構成されている。この昇降機構19は、ガラス基板Wを受け取るために搬入側に移動する際、搬入側で待機しているガラス基板Wに吸着部21が接触しない位置まで吸着ユニット17を下降させる。また、この昇降機構19は、ガラス基板Wを吸着して搬送する際、ガラス基板Wの側端部W1,W2を吸着部21により基板浮上ステージ3の基板浮上高さに支持できる高さまで吸着ユニット17を上昇させる。なお、昇降機構19は、基板保持機構である吸着ユニット17を昇降させて吸着部21がガラス基板Wの裏面W3に接する吸着位置とガラス基板Wから離間する退避位置との間で上下移動できる退避手段をなしていればよく、例えば電磁アクチュエータであっても構わない。   The elevating mechanism 19 is constituted by an air actuator including a cylinder 23 and a piston 25 fixed to the upper part of the transport driving unit 15. When the elevating mechanism 19 moves to the carry-in side to receive the glass substrate W, it lowers the suction unit 17 to a position where the suction unit 21 does not come into contact with the glass substrate W waiting on the carry-in side. Further, when the glass substrate W is sucked and transported, the lifting mechanism 19 has a suction unit up to a height at which the side end portions W1 and W2 of the glass substrate W can be supported by the substrate flying height of the substrate floating stage 3 by the suction portion 21. Raise 17 The lifting mechanism 19 lifts and lowers the suction unit 17 that is a substrate holding mechanism so that the suction portion 21 can move up and down between a suction position where the suction portion 21 contacts the back surface W3 of the glass substrate W and a retract position where the suction portion 21 is separated from the glass substrate W. For example, an electromagnetic actuator may be used.

また、この基板搬送装置1は、図1に示すように、ガラス基板Wの搬送方向Bの前端部W4及び後端部W5のうち、ガラス基板Wの幅方向の中途部分を保持する基板保持機構27,27を備えている。基板保持機構27,27はガラス基板Wの前端部W4側及び後端部W5側に1つずつ設けられている。
各基板保持機構27は、図1,4に示すように、基板浮上ステージ3の上面3aに浮上したガラス基板Wの上方側において基板浮上ステージ3の幅方向にわたって延在する略棒状の支持軸29と、支持軸29の延在方向の中途部に取り付けられて、支持軸29からその延在方向に直交して突出する複数(図示例では3つ)の吊下部31,31,31と、各吊下部31の先端に設けられて、エアー吸引に基づいてガラス基板Wの裏面W3を吸着保持するための吸着部33とを備えている。
In addition, as shown in FIG. 1, the substrate transport apparatus 1 includes a substrate holding mechanism that holds a middle portion in the width direction of the glass substrate W among the front end W4 and the rear end W5 in the transport direction B of the glass substrate W. 27 and 27 are provided. One substrate holding mechanism 27 is provided on each of the front end W4 side and the rear end W5 side of the glass substrate W.
As shown in FIGS. 1 and 4, each substrate holding mechanism 27 has a substantially rod-like support shaft 29 extending over the width direction of the substrate floating stage 3 above the glass substrate W floating on the upper surface 3 a of the substrate floating stage 3. And a plurality (three in the illustrated example) of suspension parts 31, 31, 31 that are attached to the middle part of the support shaft 29 in the extending direction and project perpendicularly to the extending direction from the support shaft 29, An adsorption portion 33 is provided at the tip of the hanging portion 31 and adsorbs and holds the back surface W3 of the glass substrate W based on air suction.

支持軸29の延在方向の両端は、各搬送駆動部15から基板浮上ステージ3の上方に突出して一体に形成された軸受部35,35にそれぞれ連結されており、これによって基板保持機構27が搬送部13と共に搬送方向B及びその逆方向に移動できるようになっている。すなわち、前述した搬送機構5は基板保持機構27を基板浮上ステージ3に対して搬送方向B及びその逆方向に移動させる役割も果たしている。そして、各支持軸29は、その延在方向を軸線L1として軸受部35に対して回転可能となっており、支持軸29の延在方向の一端には、支持軸29を回転駆動するためのモータ37が設けられている。
各吊下部31は、相互に直交する2つの直線部31a,31bを繋げて略L字状に形成されており、一方の直線部31aの先端が支持軸29に固定されている。また、他方の直線部31bの先端に吸着部33が固定されている。
Both ends of the support shaft 29 in the extending direction are respectively connected to bearing portions 35 and 35 that are integrally formed so as to protrude above the substrate floating stage 3 from the respective transport driving portions 15, and thereby the substrate holding mechanism 27 is connected to the support shaft 29. It can move in the transport direction B and the opposite direction together with the transport unit 13. That is, the transport mechanism 5 described above also serves to move the substrate holding mechanism 27 in the transport direction B and the opposite direction with respect to the substrate floating stage 3. Each support shaft 29 is rotatable with respect to the bearing portion 35 with its extending direction as an axis L1. One end of the support shaft 29 in the extending direction is for rotationally driving the support shaft 29. A motor 37 is provided.
Each hanging portion 31 is formed in a substantially L shape by connecting two linear portions 31 a and 31 b orthogonal to each other, and the tip of one linear portion 31 a is fixed to the support shaft 29. Moreover, the adsorption | suction part 33 is being fixed to the front-end | tip of the other linear part 31b.

ガラス基板Wの前端部W4や後端部W5の裏面W3に接触する各吸着部33の上面33aには、前述した搬送部13の吸着部21と同様に、吊下部31や支持軸29の内部から真空ポンプ(不図示)まで連通する吸引孔33bが開口しており、真空ポンプにより各吸着部33の上面33a側を真空引きすることで、ガラス基板Wの前端部W4や後端部W5の裏面W3を吸着保持するようになっている。
このように構成された基板保持機構27においては、モータ37の駆動に基づく支持軸29の回転に応じて、吸着部33の上面33aをガラス基板Wの前端部W4や後端部W5の裏面W3に接する吸着位置(図4参照)と、吊下部31及び吸着部33を支持軸29の上方に退避させる退避位置(図5参照)との間で、吊下部31及び吸着部33を移動させることができることで退避手段を構成している。
The upper surface 33a of each suction portion 33 that contacts the front end portion W4 of the glass substrate W and the rear surface W3 of the rear end portion W5 is similar to the suction portion 21 of the transport portion 13 described above, and the interior of the suspended portion 31 and the support shaft 29. To the vacuum pump (not shown) is opened, and the upper surface 33a side of each suction portion 33 is evacuated by the vacuum pump, so that the front end portion W4 and the rear end portion W5 of the glass substrate W are The back surface W3 is sucked and held.
In the substrate holding mechanism 27 configured as described above, the upper surface 33a of the suction portion 33 is changed to the front end portion W4 of the glass substrate W or the rear surface W3 of the rear end portion W5 according to the rotation of the support shaft 29 based on the driving of the motor 37. The suspension part 31 and the suction part 33 are moved between a suction position (see FIG. 4) in contact with the suspension part and a retreat position (see FIG. 5) where the suspension part 31 and the suction part 33 are retracted above the support shaft 29. The evacuation means is configured by being able to.

なお、図1,4に示すように、吊下部31及び吸着部33が吸着位置に配された状態においては、基板浮上ステージ3の通路7内に配されるようになっている、すなわち、吊下部31及び吸着部33の一部が基板浮上ステージ3の上面3aよりも下側に配されるようになっている。
また、吊下部31及び吸着部33が吸着位置に配された状態において、退避位置から吸着位置に向かう方向に支持軸29をさらに微小回転させることで、ガラス基板Wの前端部W4や後端部W5を基板浮上ステージ3の上面3aの上方に持ち上げることができるようになっている。
さらに、図5に示すように、吊下部31及び吸着部33が退避位置に配された状態においては、基板浮上ステージ3の幅方向にわたって、基板浮上ステージ3の上面3aと吊下部31の直線部31aとの間に隙間が形成されることになる。
As shown in FIGS. 1 and 4, in the state in which the suspended portion 31 and the adsorption portion 33 are arranged at the adsorption position, they are arranged in the passage 7 of the substrate floating stage 3. A part of the lower part 31 and the suction part 33 are arranged below the upper surface 3 a of the substrate floating stage 3.
Further, in the state where the suspended portion 31 and the suction portion 33 are arranged at the suction position, the front end portion W4 and the rear end portion of the glass substrate W are further rotated by slightly rotating the support shaft 29 in the direction from the retracted position toward the suction position. W5 can be lifted above the upper surface 3a of the substrate floating stage 3.
Furthermore, as shown in FIG. 5, in the state in which the suspended portion 31 and the suction portion 33 are disposed at the retracted position, the upper surface 3 a of the substrate floating stage 3 and the linear portion of the suspended portion 31 across the width direction of the substrate floating stage 3. A gap is formed between 31a and 31a.

以上のように構成された基板搬送装置1において、ガラス基板Wを吸着ユニット17や基板保持機構27で保持した状態で搬送方向Bに搬送する際には、はじめに、ガラス基板Wを基板浮上ステージ3の上面3aに載置する。次いで、基板保持機構27の吊下部31及び吸着部33を退避位置に配して基板浮上ステージ3の上面3aと吊下部31との間に隙間を形成した状態で、この隙間にガラス基板Wが通過するように基板保持機構27を搬送駆動部15により搬送方向Bと逆向きに移動させることで、ガラス基板Wの側端部W1,W2、前端部W4及び後端部W5の内側に各吸着部21,33を配置する。   In the substrate transfer apparatus 1 configured as described above, when the glass substrate W is transferred in the transfer direction B while being held by the suction unit 17 or the substrate holding mechanism 27, first, the glass substrate W is transferred to the substrate floating stage 3. It is placed on the upper surface 3a. Next, the glass substrate W is placed in the gap in a state where the suspended portion 31 and the suction portion 33 of the substrate holding mechanism 27 are disposed at the retracted position and a gap is formed between the upper surface 3a of the substrate floating stage 3 and the suspended portion 31. By moving the substrate holding mechanism 27 in the direction opposite to the transport direction B by the transport driving unit 15 so as to pass, each suction is performed inside the side ends W1, W2, the front end W4, and the rear end W5 of the glass substrate W. Parts 21 and 33 are arranged.

その後、吸着ユニット17及び基板保持機構27の吸着部21,33がガラス基板Wの側端部W1,W2や前端部W4、後端部W5に接する基板浮上高さまで持ち上がるように、昇降機構19により吸着ユニット17を上昇させ、かつ、支持軸29を回転させて基板保持機構27の吸着部33をガラス基板Wの裏面W3に当接させる。そして、この状態において、真空ポンプにより各吸着ユニット17及び各基板保持機構27の吸着部21,33の上面21a,33a側を真空引きすることで、ガラス基板Wの側端部W1,W2、前端部W4及び後端部W5の裏面W3を吸着保持する。
このようにしておくことで、ガラス基板Wを基板浮上ステージ3の上面3aに接触させることなく、搬送駆動部15の駆動力によってガラス基板Wを搬送方向Bに搬送することができる。
Thereafter, the elevating mechanism 19 causes the suction units 21 and 33 of the suction unit 17 and the substrate holding mechanism 27 to be lifted to the substrate flying height in contact with the side end portions W1 and W2, the front end portion W4, and the rear end portion W5 of the glass substrate W. The suction unit 17 is raised and the support shaft 29 is rotated to bring the suction portion 33 of the substrate holding mechanism 27 into contact with the back surface W3 of the glass substrate W. In this state, the vacuum pumps are used to evacuate the upper surfaces 21a and 33a of the suction units 21 and 33 of the suction units 17 and the substrate holding mechanisms 27, so that the side edges W1 and W2 of the glass substrate W and the front edge The back surface W3 of the part W4 and the rear end part W5 is sucked and held.
In this way, the glass substrate W can be transported in the transport direction B by the driving force of the transport drive unit 15 without bringing the glass substrate W into contact with the upper surface 3a of the substrate floating stage 3.

また、ガラス基板Wを各吸着ユニット17及び各基板保持機構27から取り外す際には、真空ポンプによる吸着部21,33の上面21a,33a側の真空引きを停止して、ガラス基板Wの側端部W1,W2、前端部W4及び後端部W5の裏面W3の吸着保持状態を解除する。次いで、各昇降機構19により各吸着ユニット17を下降させると共に、図5に示すように、支持軸29を回転させて基板保持機構27の吸着部33を退避位置に配置して基板浮上ステージ3の上面3aと支持軸29との間に隙間を形成する。この状態において、搬送機構5により各吸着ユニット17及び各基板保持機構27を搬送方向Bと逆向きに移動させることで、ガラス基板Wに接触することなく各吸着ユニット17及び各基板保持機構27をガラス基板Wの搬入位置まで戻すことができる。   Further, when removing the glass substrate W from each suction unit 17 and each substrate holding mechanism 27, evacuation of the upper surfaces 21 a and 33 a side of the suction portions 21 and 33 by the vacuum pump is stopped and the side edge of the glass substrate W is stopped. The suction holding state of the back surface W3 of the parts W1, W2, the front end part W4, and the rear end part W5 is released. Next, each suction unit 17 is lowered by each lifting mechanism 19 and the support shaft 29 is rotated to place the suction portion 33 of the substrate holding mechanism 27 at the retracted position as shown in FIG. A gap is formed between the upper surface 3 a and the support shaft 29. In this state, each suction unit 17 and each substrate holding mechanism 27 can be moved without contacting the glass substrate W by moving each suction unit 17 and each substrate holding mechanism 27 in the direction opposite to the transport direction B by the transport mechanism 5. The glass substrate W can be returned to the loading position.

上述したように、この基板搬送装置1によれば、ガラス基板Wの前端部W4や後端部W5の中途部分を吸着保持する基板保持機構27が設けられているため、ガラス基板Wの前端部W4や後端部W5が基板浮上ステージ3の上面3aに向けて反り返っていても、基板保持機構27によってガラス基板Wの前端部W4や後端部W5の反りを矯正することができる。したがって、ガラス基板Wの前端部W4や後端部W5が基板浮上ステージ3の上面3aに擦れることを防止でき、ガラス基板Wを汚染することなく安全に搬送することが可能となる。   As described above, according to the substrate transport apparatus 1, the front end portion of the glass substrate W is provided with the substrate holding mechanism 27 that sucks and holds the front end portion W4 and the middle portion of the rear end portion W5 of the glass substrate W. Even if W4 and the rear end W5 are warped toward the upper surface 3a of the substrate floating stage 3, the warp of the front end W4 and the rear end W5 of the glass substrate W can be corrected by the substrate holding mechanism 27. Therefore, the front end portion W4 and the rear end portion W5 of the glass substrate W can be prevented from rubbing against the upper surface 3a of the substrate floating stage 3, and the glass substrate W can be safely transported without being contaminated.

また、支持軸29を回転させて吊下部31及び吸着部33を退避位置に配することで、基板浮上ステージ3の幅方向にわたって基板浮上ステージ3の上面3aと吊下部31との間に隙間が形成されるため、基板保持機構27がガラス基板Wに接触することなく任意の位置に搬送機構5を移動させることができる。
さらに、吸着部21,33によりガラス基板Wの側端部W1,W2や前端部W4、後端部W5を保持することで、ガラス基板Wの全周に亘って反りを矯正することが可能となり、ガラス基板Wを基板浮上ステージ3上に水平に浮上保持することができる。例えば、ガラス基板Wを搬送方向Bに移動させながらガラス基板W上の欠陥を検査したり、ガラス基板Wにパターンを露光する際に、反り返ったガラス基板Wを水平に矯正することで、検査精度や露光精度を高めることができる。
Further, by rotating the support shaft 29 and disposing the hanging portion 31 and the suction portion 33 at the retracted position, a gap is formed between the upper surface 3 a of the substrate floating stage 3 and the hanging portion 31 over the width direction of the substrate floating stage 3. Thus, the transport mechanism 5 can be moved to an arbitrary position without the substrate holding mechanism 27 contacting the glass substrate W.
Further, by holding the side end portions W1, W2, the front end portion W4, and the rear end portion W5 of the glass substrate W by the adsorbing portions 21, 33, it becomes possible to correct the warp over the entire circumference of the glass substrate W. The glass substrate W can be floated and held horizontally on the substrate floating stage 3. For example, by inspecting defects on the glass substrate W while moving the glass substrate W in the transport direction B, or by correcting the warped glass substrate W horizontally when exposing the pattern to the glass substrate W, the inspection accuracy is improved. And exposure accuracy can be increased.

また、この基板搬送装置1では、安定した状態でガラス基板Wを浮上搬送することができるため、例えば、LCDやPDP等のFPDの製造工程におけるインライン検査に適用することができる。なお、このインライン検査には、例えばガラス基板Wのパターン検査、欠陥検査等がある。また、各検査に際しては、例えば顕微鏡、ラインセンサ、CCDカメラ等の各種検査用機器を基板搬送装置1に設けておけばよい。   In addition, since the substrate transport apparatus 1 can float and transport the glass substrate W in a stable state, it can be applied to, for example, in-line inspection in the manufacturing process of FPDs such as LCDs and PDPs. The in-line inspection includes, for example, a pattern inspection and a defect inspection of the glass substrate W. For each inspection, for example, various inspection devices such as a microscope, a line sensor, and a CCD camera may be provided in the substrate transfer apparatus 1.

なお、上述した第1実施形態において、ガラス基板Wの側端部W1,W2を吸着保持して移動する搬送部13は、基板浮上ステージ3の両側部3c,3dに設けられるとしたが、例えば図6に示すように、基板浮上ステージ3の一方の側部3cのみに設けられるとしてもよい。この構成においては、1つの搬送部13によってガラス基板Wの一方の側端部W1のみが吸着保持されることになる。
この構成の場合には、基板浮上ステージ3の他方の側部3dに、基板保持機構27,27の支持軸29,29の端部を軸支するための軸受部43、及び、軸受部43を搬送方向B及びその逆方向に移動可能とするレール45を設けておく必要がある。ただし、軸受部43には、上記実施形態の搬送駆動部15のように、これを積極的に駆動するものを設ける必要はない。
In the first embodiment described above, the transport unit 13 that moves by sucking and holding the side ends W1 and W2 of the glass substrate W is provided on both side portions 3c and 3d of the substrate floating stage 3. As shown in FIG. 6, it may be provided only on one side 3 c of the substrate floating stage 3. In this configuration, only one side end W <b> 1 of the glass substrate W is sucked and held by one transport unit 13.
In the case of this configuration, the bearing portion 43 for supporting the ends of the support shafts 29 and 29 of the substrate holding mechanisms 27 and 27 on the other side portion 3d of the substrate floating stage 3 and the bearing portion 43 are provided. It is necessary to provide a rail 45 that can move in the transport direction B and in the opposite direction. However, it is not necessary to provide the bearing portion 43 that positively drives it like the transport driving portion 15 of the above embodiment.

また、この場合には、例えば、基板浮上ステージ3の他方の側部3dに搬送方向Bに回転可能なローラ47,47,・・・を搬送方向Bに多数並べて配置しておき、これら多数のローラ47,47,・・・によりガラス基板Wの他方の側端部W2を支持すればよい。
この構成の場合には、上記実施形態と同様の効果を奏すると共に、搬送駆動部15や昇降機構19、吸着部21を備える搬送部13の設置数を減らすことができるため、基板搬送装置41の製造コスト削減を図ることができる。
In this case, for example, a large number of rollers 47, 47,... That can rotate in the transport direction B are arranged in the transport direction B on the other side 3 d of the substrate floating stage 3. The other side end W2 of the glass substrate W may be supported by the rollers 47, 47,.
In the case of this configuration, the same effects as in the above embodiment can be obtained, and the number of installation of the conveyance unit 13 including the conveyance driving unit 15, the lifting mechanism 19, and the suction unit 21 can be reduced. Manufacturing costs can be reduced.

また、基板浮上ステージ3の両方の側部3c,3dに搬送方向Bに回転可能なローラ47を多数並べて配置し、ガラス基板Wの前端部W4及び後端部W5を基板保持機構27,27で吸着保持してガラス基板Wを搬送させるとしてもよい。
このように、ガラス基板Wの両側部3c,3dをローラ47で支持すると共に、ガラス基板Wの前端部W4及び後端部W5を基板保持機構27により支持することで、反ったガラス基板Wでも基板浮上ステージ3に接触することなく安全に搬送することができる。また、ガラス基板Wの前端部W4及び後端部W5の中央部を吸着保持して搬送することにより、ガラス基板Wの回転モーメントの影響を受けにくく、ガラス基板Wを安定して搬送することができる。
Further, a large number of rollers 47 that can be rotated in the transport direction B are arranged on both sides 3c and 3d of the substrate floating stage 3 so that the front end W4 and the rear end W5 of the glass substrate W are placed by the substrate holding mechanisms 27 and 27. The glass substrate W may be transported by suction.
As described above, both the side portions 3c and 3d of the glass substrate W are supported by the rollers 47, and the front end portion W4 and the rear end portion W5 of the glass substrate W are supported by the substrate holding mechanism 27. The substrate can be safely transported without contacting the substrate floating stage 3. Further, by sucking and holding the central portion of the front end portion W4 and the rear end portion W5 of the glass substrate W, the glass substrate W can be stably transported without being affected by the rotational moment of the glass substrate W. it can.

さらに、支持軸29に取り付けられる吊下部31及び吸着部33は、ガラス基板Wの前端部W4及び後端部W5のうちガラス基板Wの幅方向の中途部分の複数箇所を保持するように複数並べて設けられるとしたが、これに限ることはなく、少なくとも1箇所のみを保持するように1つだけ設けられていればよい。ただし、この場合には、ガラス基板Wの前端部W4及び後端部W5のうちガラス基板Wの幅方向の中間位置を保持する位置に吊下部31及び吸着部33を設けることが好ましい。   Further, a plurality of suspension portions 31 and suction portions 33 attached to the support shaft 29 are arranged so as to hold a plurality of locations in the middle portion in the width direction of the glass substrate W among the front end portion W4 and the rear end portion W5 of the glass substrate W. However, the present invention is not limited to this, and it is only necessary to provide one so as to hold at least one location. However, in this case, it is preferable to provide the hanging portion 31 and the suction portion 33 at a position that holds the intermediate position in the width direction of the glass substrate W among the front end portion W4 and the rear end portion W5 of the glass substrate W.

また、基板浮上ステージ3は、その上面3aから窪む通路7を形成して構成されるとしたが、これに限ることはなく、例えば、上面3aに多数の空気孔3e,3e,・・・を形成した細長い帯状の基板浮上ステージブロックを複数用意し、これら複数の基板浮上ステージブロックを相互に間隔をおいて配列して構成されるとしても構わない。この構成の場合には、相互に隣り合う基板浮上ステージブロック間の隙間が上記実施形態と同様の通路7をなし、この隙間に基板保持機構27の吊下部31及び吸着部33を通過させることができる。   Further, the substrate levitation stage 3 is configured by forming the passage 7 that is recessed from the upper surface 3a. However, the substrate levitation stage 3 is not limited to this, and for example, a large number of air holes 3e, 3e,. It is also possible to prepare a plurality of elongated substrate-like substrate levitation stage blocks formed with a plurality of substrate levitation stage blocks arranged at intervals. In the case of this configuration, a gap between adjacent substrate levitation stage blocks forms the same passage 7 as in the above embodiment, and the suspended portion 31 and the suction portion 33 of the substrate holding mechanism 27 can pass through this gap. it can.

次に、本発明による第2実施形態について図7を参照して説明する。なお、この第2実施形態の基板搬送装置のうち、第1実施形態の基板搬送装置1の構成要素と同一の部分については同一符号を付し、その説明を省略する。   Next, a second embodiment according to the present invention will be described with reference to FIG. Note that, in the substrate transfer apparatus of the second embodiment, the same components as those of the substrate transfer apparatus 1 of the first embodiment are denoted by the same reference numerals, and the description thereof is omitted.

図7に示すように、この実施形態に係る基板搬送装置51は、ガラス基板Wの搬送方向Bの前端部W4及び後端部W5のうち、ガラス基板Wの幅方向の中途部分をそれぞれ保持する基板保持機構53を備えている。
この基板保持機構53は、基板浮上ステージ3の上面3aに浮上したガラス基板Wの上方側において基板浮上ステージ3の幅方向にわたって延在すると共に搬送機構5に連結された門柱型の支持部55と、支持部55の延在方向の中途部のうちガラス基板Wの前端部W4や後端部W5の表面W6に対向する位置に固定された吸着部57とを備えている。
As shown in FIG. 7, the substrate transport apparatus 51 according to this embodiment holds halfway portions in the width direction of the glass substrate W among the front end portion W4 and the rear end portion W5 in the transport direction B of the glass substrate W. A substrate holding mechanism 53 is provided.
The substrate holding mechanism 53 extends in the width direction of the substrate floating stage 3 on the upper side of the glass substrate W that has floated on the upper surface 3 a of the substrate floating stage 3, and is connected to the transport mechanism 5. In addition, a suction part 57 fixed to a position facing the front end W4 of the glass substrate W and the surface W6 of the rear end W5 in the middle part in the extending direction of the support part 55 is provided.

支持部55の延在方向の両端部をなす支柱55a,55aは、ガラス基板Wの側端部W1,W2よりも外側に突出しており、昇降機構(退避手段)59を介して搬送駆動部15に連結されている。すなわち、この支持部55と基板浮上ステージ3の上面3aとの間には、基板浮上ステージ3の幅方向にわたって常に隙間が形成されるようになっている。なお、上述した昇降機構59は、搬送駆動部15と吸着ユニット17とを連結する昇降機構19と同様の構成となっており、吸着部57をガラス基板Wの表面W6に接する吸着位置と、吸着部57をガラス基板Wから離間する上方に退避させる退避位置との間で、支持部55を昇降させるようになっている。   The support columns 55a and 55a forming both ends in the extending direction of the support portion 55 protrude outward from the side end portions W1 and W2 of the glass substrate W, and the transport driving portion 15 is provided via an elevating mechanism (retracting means) 59. It is connected to. That is, a gap is always formed between the support portion 55 and the upper surface 3 a of the substrate floating stage 3 in the width direction of the substrate floating stage 3. In addition, the raising / lowering mechanism 59 mentioned above becomes the structure similar to the raising / lowering mechanism 19 which connects the conveyance drive part 15 and the adsorption | suction unit 17, the adsorption | suction position which adsorb | sucks the adsorption | suction part 57 to the surface W6 of the glass substrate W, and adsorption | suction The support portion 55 is moved up and down between a retreat position where the portion 57 is retreated upward away from the glass substrate W.

ガラス基板Wの前端部W4や後端部W5の表面W6に接触する吸着部57の下面57aには、第1実施形態の吸着部21,33と同様に、支持部55の内部から真空ポンプ(不図示)まで連通する吸引孔57bが開口しており、真空ポンプにより吸着部57の下面57a側を真空引きすることで、ガラス基板Wの前端部W4や後端部W5の表面W6を吸着保持するようになっている。この場合、吸着部57は、ガラス基板Wの表面W6上に形成されるパターン形成領域の外側を吸着するものとする。
なお、この吸着部57は、例えば、支持部55の延在方向にわたって複数並べて配されるとしても良いし、ガラス基板Wの幅方向の中間位置を保持する位置に1つだけ設けられるとしても構わない。
Similarly to the suction portions 21 and 33 of the first embodiment, a vacuum pump (from the inside of the support portion 55 is applied to the lower surface 57a of the suction portion 57 that contacts the front end portion W4 and the front end portion W5 of the glass substrate W. A suction hole 57b communicating with the glass substrate W (not shown) is opened, and the front surface W4 of the glass substrate W and the surface W6 of the rear end W5 are sucked and held by evacuating the lower surface 57a side of the suction portion 57 by a vacuum pump. It is supposed to be. In this case, it is assumed that the suction part 57 sucks the outside of the pattern formation region formed on the surface W6 of the glass substrate W.
Note that, for example, a plurality of the adsorbing portions 57 may be arranged side by side in the extending direction of the support portion 55, or only one adsorbing portion 57 may be provided at a position that holds an intermediate position in the width direction of the glass substrate W. Absent.

以上のように構成された基板搬送装置51において、ガラス基板Wを吸着ユニット17や基板保持機構53で保持した状態で搬送方向Bに搬送する際には、はじめに、第1実施形態と同様に、ガラス基板Wを基板浮上ステージ3の上面3aに載置する。次いで、昇降機構59により支持部55を上昇させ、支持部55と基板浮上ステージ3の上面3aとの間に隙間を形成した状態で、吸着ユニット17及び基板保持機構53を搬送方向Bと逆向きに移動させ、ガラス基板Wの側端部W1,W2や前端部W4、後端部W5に、吸着ユニット17及び基板保持機構53の吸着部21,57を対向配置させる。   In the substrate transport apparatus 51 configured as described above, when transporting the glass substrate W in the transport direction B while being held by the suction unit 17 or the substrate holding mechanism 53, first, as in the first embodiment, The glass substrate W is placed on the upper surface 3 a of the substrate floating stage 3. Next, the support unit 55 is lifted by the lifting mechanism 59, and the suction unit 17 and the substrate holding mechanism 53 are opposite to the transport direction B in a state where a gap is formed between the support unit 55 and the upper surface 3 a of the substrate floating stage 3. The suction unit 17 and the suction portions 21 and 57 of the substrate holding mechanism 53 are disposed opposite to the side end portions W1 and W2, the front end portion W4, and the rear end portion W5 of the glass substrate W.

その後、吸着ユニット17の吸着部21がガラス基板Wの側端部W1,W2に接する基板浮上高さまで持ち上がるように、昇降機構19により吸着ユニット17を上昇させる。さらに、これと同時に、昇降機構59により支持部55を下降させて、基板保持機構53の吸着部57をガラス基板Wの前端部W4や後端部W5の表面W6に接触させる。そして、この状態において、真空ポンプにより吸着ユニット17及び基板保持機構53の吸着部21,57の上面21a,57a側を真空引きすることで、ガラス基板Wの側端部W1,W2、前端部W4及び後端部W5の裏面W3や表面W6を吸着保持する。   Thereafter, the suction unit 17 is lifted by the lifting mechanism 19 so that the suction portion 21 of the suction unit 17 is lifted to the substrate flying height in contact with the side ends W1 and W2 of the glass substrate W. At the same time, the support portion 55 is lowered by the elevating mechanism 59 to bring the suction portion 57 of the substrate holding mechanism 53 into contact with the front end portion W4 of the glass substrate W and the surface W6 of the rear end portion W5. In this state, the upper ends 21 a and 57 a of the suction units 21 and 57 of the suction unit 17 and the substrate holding mechanism 53 are evacuated by a vacuum pump, so that the side ends W 1 and W 2 and the front end W 4 of the glass substrate W are obtained. And the back surface W3 and the front surface W6 of the rear end W5 are sucked and held.

これにより、ガラス基板Wの前端部W4や後端部W5が基板保持機構53の吸着部57により吸引され、その反りが矯正される。同様に、ガラス基板Wの両側端部W1,W2は吸着ユニット17により吸着されて、その反りが矯正される。
このようにガラス基板Wの全周を吸着保持することで、ガラス基板Wを基板浮上ステージ3の上面3aに接触させることなく、搬送駆動部15の駆動力によってガラス基板Wを搬送方向Bに搬送することができる。
Thereby, the front end portion W4 and the rear end portion W5 of the glass substrate W are sucked by the suction portion 57 of the substrate holding mechanism 53, and the warpage thereof is corrected. Similarly, both end portions W1 and W2 of the glass substrate W are adsorbed by the adsorbing unit 17, and the warpage thereof is corrected.
By holding the entire circumference of the glass substrate W in this way, the glass substrate W is transported in the transport direction B by the driving force of the transport drive unit 15 without bringing the glass substrate W into contact with the upper surface 3a of the substrate floating stage 3. can do.

また、ガラス基板Wを吸着ユニット17及び基板保持機構53から取り外す際には、真空ポンプによる真空引きを停止して、ガラス基板Wの側端部W1,W2、前端部W4及び後端部W5の裏面W3や表面W6の吸着保持状態を解除する。次いで、昇降機構19により吸着ユニット17を下降させると共に、昇降機構59により支持部55を上昇させて退避位置まで移動させる。
この状態において、支持部55と基板浮上ステージ3の上面3aとの間に隙間が形成され、搬送機構5により各吸着ユニット17及び各基板保持機構53を搬送方向Bと逆向きに移動させることで、ガラス基板Wに接触することなく、各吸着ユニット17及び基板保持機構53をガラス基板Wの搬入位置まで戻すことができる。
Further, when removing the glass substrate W from the suction unit 17 and the substrate holding mechanism 53, the evacuation by the vacuum pump is stopped, and the side end portions W1, W2, the front end portion W4 and the rear end portion W5 of the glass substrate W are stopped. The suction holding state of the back surface W3 and the front surface W6 is released. Next, the suction unit 17 is lowered by the lifting mechanism 19, and the support portion 55 is lifted by the lifting mechanism 59 and moved to the retracted position.
In this state, a gap is formed between the support portion 55 and the upper surface 3 a of the substrate floating stage 3, and the respective suction units 17 and the respective substrate holding mechanisms 53 are moved in the direction opposite to the transport direction B by the transport mechanism 5. The suction units 17 and the substrate holding mechanism 53 can be returned to the loading position of the glass substrate W without contacting the glass substrate W.

上述したように、この基板搬送装置1によれば、第1実施形態と同様に、ガラス基板Wの前端部W4や後端部W5の中途部分を吸着保持する基板保持機構53が設けられているため、反りの生じたガラス基板Wを水平に矯正することができ、ガラス基板Wを汚染させることなく安全に搬送することが可能となる。
また、支持部55を昇降可能に設けることにより、支持部55及び吸着部57と基板浮上ステージ3の上面3aとの間に隙間が形成されるため、基板保持機構53がガラス基板Wに接触することなく、任意の位置に搬送機構5を移動させることができる。
As described above, according to the substrate transport apparatus 1, the substrate holding mechanism 53 that sucks and holds the middle portion of the front end portion W4 and the rear end portion W5 of the glass substrate W is provided as in the first embodiment. Therefore, the warped glass substrate W can be corrected horizontally, and the glass substrate W can be safely transported without being contaminated.
Further, by providing the support portion 55 so that it can be raised and lowered, a gap is formed between the support portion 55 and the suction portion 57 and the upper surface 3 a of the substrate floating stage 3, so that the substrate holding mechanism 53 contacts the glass substrate W. The transport mechanism 5 can be moved to an arbitrary position without any problem.

さらに、吸着部57は常に基板浮上ステージ3の上方に配置されるため、第1実施形態のように、基板浮上ステージ3に通路7を形成したり、基板浮上ステージを複数の基板浮上ステージブロックに分割して形成する必要が無くなる。したがって、基板浮上ステージ3の設計の自由度が向上すると共に、基板搬送装置51の製造コスト削減を図ることができる。   Further, since the suction portion 57 is always arranged above the substrate floating stage 3, a passage 7 is formed in the substrate floating stage 3 as in the first embodiment, or the substrate floating stage is used as a plurality of substrate floating stage blocks. There is no need to divide and form. Therefore, the degree of freedom in designing the substrate floating stage 3 can be improved, and the manufacturing cost of the substrate transfer apparatus 51 can be reduced.

なお、上述した全ての実施形態において、吸着ユニット17及び基板保持機構27,53は、ガラス基板Wの表面W6や裏面W3をエアー吸引に基づいて吸着保持する吸着部21,33,57を備えるとしたが、これに限ることはなく、少なくともガラス基板Wの側端部W1,W2、前端部W4及び後端部W5を保持することができるように構成されていればよい。   In all the embodiments described above, the suction unit 17 and the substrate holding mechanisms 27 and 53 include the suction portions 21, 33, and 57 that suck and hold the front surface W6 and the back surface W3 of the glass substrate W based on air suction. However, the present invention is not limited to this, and it is only necessary to be configured to hold at least the side end portions W1, W2, the front end portion W4, and the rear end portion W5 of the glass substrate W.

また、基板保持機構27,53は、前端部W4及び後端部W5の少なくとも一方を保持するように設けられればよい。ただし、ガラス基板Wの前端部W4が基板浮上ステージ3の上面3aに擦れる場合には、後端部W5が擦れる場合と比較して、ガラス基板Wに大きな傷がつきやすいため、基板保持機構27,53によりガラス基板Wの前端部W4を保持することは特に有効である。   The substrate holding mechanisms 27 and 53 may be provided so as to hold at least one of the front end portion W4 and the rear end portion W5. However, when the front end portion W4 of the glass substrate W is rubbed against the upper surface 3a of the substrate floating stage 3, the glass substrate W is easily damaged compared with the case where the rear end portion W5 is rubbed. , 53 is particularly effective to hold the front end W4 of the glass substrate W.

以上、本発明の実施形態について図面を参照して詳述したが、具体的な構成はこの実施形態に限られるものではなく、本発明の要旨を逸脱しない範囲の設計変更等も含まれる。   As mentioned above, although embodiment of this invention was explained in full detail with reference to drawings, the concrete structure is not restricted to this embodiment, The design change etc. of the range which does not deviate from the summary of this invention are included.

この発明の第1実施形態に係る基板搬送装置を示す概略上面図である。1 is a schematic top view showing a substrate transfer apparatus according to a first embodiment of the present invention. 図1の基板搬送装置において、搬送部の概略構成を示す拡大側断面図である。FIG. 2 is an enlarged side cross-sectional view illustrating a schematic configuration of a transfer unit in the substrate transfer apparatus of FIG. 1. 図2のA−A矢視断面図である。It is AA arrow sectional drawing of FIG. 図1の基板搬送装置において、基板保持機構の吊下部及び吸着部が吸着位置に配された状態を示す拡大側断面図である。FIG. 2 is an enlarged side cross-sectional view illustrating a state in which a suspended portion and a suction portion of a substrate holding mechanism are arranged at a suction position in the substrate transport apparatus of FIG. 1. 図1の基板搬送装置において、基板保持機構の吊下部及び吸着部が退避位置に配された状態を示す拡大側断面図である。FIG. 2 is an enlarged side cross-sectional view illustrating a state in which a suspended portion and a suction portion of a substrate holding mechanism are arranged at a retracted position in the substrate transfer apparatus of FIG. 1. この発明の他の実施形態に係る基板搬送装置を示す概略上面図である。It is a schematic top view which shows the board | substrate conveyance apparatus which concerns on other embodiment of this invention. この発明の第2実施形態に係る基板搬送装置において、基板保持機構の概略構成を示す拡大側断面図である。In the board | substrate conveyance apparatus which concerns on 2nd Embodiment of this invention, it is an expanded sectional side view which shows schematic structure of a board | substrate holding mechanism.

符号の説明Explanation of symbols

1,41,51 基板搬送装置
3 基板浮上ステージ
3a 上面
5 搬送機構
27,53 基板保持機構
29 支持軸
31 吊下部
33,57 吸着部
55 支持部
59 昇降機構(退避手段)
B 搬送方向
W ガラス基板(基板)
W1,W2 側端部
W3 裏面
W4 前端部
W5 後端部
W6 表面
1, 41, 51 Substrate transport device 3 Substrate floating stage 3a Upper surface 5 Transport mechanism 27, 53 Substrate holding mechanism 29 Support shaft 31 Suspended lower portion 33, 57 Suction portion 55 Support portion 59 Lifting mechanism (retracting means)
B Transport direction W Glass substrate (substrate)
W1, W2 side end W3 back surface W4 front end W5 rear end W6 surface

Claims (4)

基板をエアー浮上させる基板浮上ステージと、
前記基板の搬送方向の前端部及び後端部の少なくとも一方のうち、前記基板の幅方向の中途部分を保持する基板保持機構と、
この基板保持機構を前記基板浮上ステージに対して前記搬送方向に移動させる搬送機構と、
前記基板保持機構を前記基板の上方に退避させる退避手段とを備えることを特徴とする基板搬送装置。
A substrate levitating stage for levitating the substrate,
A substrate holding mechanism that holds a midway portion in the width direction of the substrate among at least one of a front end portion and a rear end portion in the transport direction of the substrate;
A transport mechanism for moving the substrate holding mechanism in the transport direction with respect to the substrate floating stage;
A substrate transfer apparatus comprising: a retracting unit configured to retract the substrate holding mechanism above the substrate.
前記基板保持機構が、前記基板浮上ステージの上面に対向する前記基板の裏面、若しくは、該裏面の反対側の表面をエアーの吸引に基づいて吸着保持する吸着部を備えることを特徴とする請求項1に記載の基板搬送装置。   The substrate holding mechanism includes an adsorption portion that adsorbs and holds the back surface of the substrate facing the upper surface of the substrate floating stage or the surface opposite to the back surface based on air suction. 2. The substrate transfer apparatus according to 1. 前記基板保持機構が、前記基板浮上ステージの上面に浮上した基板の上方側において前記基板浮上ステージの幅方向にわたって延在する支持軸と、該支持軸からその延在方向に直交する方向に突出して先端に前記基板の裏面を吸着保持する吸着部を設けた吊下部とを備え、
前記退避手段が、前記支持軸の回転に応じて、前記吸着部を前記基板の裏面に接する吸着位置と、前記吸着部を前記基板の上方に退避させる退避位置との間で、前記吊下部を移動させることを特徴とする請求項1に記載の基板搬送装置。
The substrate holding mechanism protrudes in a direction orthogonal to the extending direction from the support shaft extending over the width direction of the substrate floating stage on the upper side of the substrate floating on the upper surface of the substrate floating stage. A suspension portion provided with a suction portion for sucking and holding the back surface of the substrate at the tip;
The retracting means moves the suspension portion between a suction position where the suction portion comes into contact with the back surface of the substrate and a retract position where the suction portion is retracted above the substrate according to the rotation of the support shaft. The substrate transfer apparatus according to claim 1, wherein the substrate transfer apparatus is moved.
前記基板保持機構が、前記基板浮上ステージの上面に浮上した基板の上方側において前記基板浮上ステージの幅方向にわたって延在する支持部と、この支持部に設けられて前記基板の表面を吸着保持する前記吸着部とを備え、
前記退避手段が、前記支持部を昇降させる昇降機構を備え、
この昇降機構により前記吸着部を前記基板の表面に接する吸着位置と、前記吸着部を前記基板から離間する上方に退避させる退避位置との間で、前記支持部を昇降させることを特徴とする請求項1に記載の基板搬送装置。
The substrate holding mechanism is provided on the support portion that extends over the width direction of the substrate levitation stage on the upper side of the substrate levitated on the upper surface of the substrate levitation stage, and is provided on the support portion to suck and hold the surface of the substrate. Comprising the adsorbing part,
The retracting means includes an elevating mechanism for elevating the support part,
The elevating mechanism raises and lowers the support portion between a suction position where the suction portion is in contact with the surface of the substrate and a retreat position where the suction portion is retracted upward away from the substrate. Item 2. The substrate transfer apparatus according to Item 1.
JP2007002276A 2007-01-10 2007-01-10 Substrate transfer apparatus Pending JP2008171929A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101841534B1 (en) * 2011-11-21 2018-03-23 한화테크윈 주식회사 Panel Stransfer Apparatus
CN108106996A (en) * 2017-12-25 2018-06-01 通彩智能科技集团有限公司 A kind of glass detection holds platform

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0386917A (en) * 1989-08-22 1991-04-11 Basf Ag Magnetic recording carrier
JPH0574020A (en) * 1991-09-10 1993-03-26 Sony Corp Recording and/or reproducing device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0386917A (en) * 1989-08-22 1991-04-11 Basf Ag Magnetic recording carrier
JPH0574020A (en) * 1991-09-10 1993-03-26 Sony Corp Recording and/or reproducing device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101841534B1 (en) * 2011-11-21 2018-03-23 한화테크윈 주식회사 Panel Stransfer Apparatus
CN108106996A (en) * 2017-12-25 2018-06-01 通彩智能科技集团有限公司 A kind of glass detection holds platform
CN108106996B (en) * 2017-12-25 2024-05-28 通彩智能科技集团有限公司 Glass detects holds platform

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