JP2011029565A - Substrate holding device - Google Patents

Substrate holding device Download PDF

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JP2011029565A
JP2011029565A JP2009176627A JP2009176627A JP2011029565A JP 2011029565 A JP2011029565 A JP 2011029565A JP 2009176627 A JP2009176627 A JP 2009176627A JP 2009176627 A JP2009176627 A JP 2009176627A JP 2011029565 A JP2011029565 A JP 2011029565A
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substrate
substrate holding
holding surface
lifting
suction
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Taro Kimura
太郎 木村
Hitoshi Yokota
仁志 横田
Takamasa Okuma
隆正 大熊
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate holding device preventing generation of local stress acting on a glass substrate in lifting up or lifting down the glass substrate, and resultantly preventing damage of a thin film formed on a surface of the glass substrate and a crack of the glass substrate itself. <P>SOLUTION: In this substrate holding device, a substrate being a processing object is transported to the upper side of a substrate holding surface by a substrate transport arm, and thereafter mounted on the substrate holding surface, and the substrate is sucked and held. The substrate holding device includes: a plurality of substrate holding parts for forming a flat substrate holding surface; a comb-teeth-like substrate holding surface vertical-movement part vertically moving under the substrate holding surface; a substrate sucking/holding means to suck and hold the substrate to the flat substrate holding surface; and a substrate lifting means to lift the substrate from the substrate holding surface. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

本発明は、液晶表示装置等に用いられるガラス基板を処理する際に、処理対象のガラス基板を保持する基板保持装置に関するものである。   The present invention relates to a substrate holding device that holds a glass substrate to be processed when a glass substrate used in a liquid crystal display device or the like is processed.

処理対象のガラス基板として液晶表示装置に用いられるカラーフィルタを例として説明する。図1はカラー液晶表示装置に用いられるカラーフィルタの一例を断面で示した図である。カラーフィルタ1は、ガラス基板2上にブラックマトリックス(以下、BM)3、レッドRの着色画素(以下、R画素)4−1、グリーンGの着色画素(以下、G画素)4−2、ブルーBの着色画素(以下、B画素)4−3、透明電極5、及びフォトスペーサー(Photo Spacer)(以下、PS)6、バーテイカルアライメント(Vertical Alignment)(以下、VA)7が順次形成されたものである。   A color filter used in a liquid crystal display device will be described as an example of a glass substrate to be processed. FIG. 1 is a cross-sectional view showing an example of a color filter used in a color liquid crystal display device. The color filter 1 includes a black matrix (hereinafter referred to as BM) 3, a red R colored pixel (hereinafter referred to as R pixel) 4-1, a green G colored pixel (hereinafter referred to as G pixel) 4-2, blue on a glass substrate 2. B colored pixels (hereinafter referred to as B pixels) 4-3, a transparent electrode 5, a photo spacer (hereinafter referred to as PS) 6, and a vertical alignment (hereinafter referred to as VA) 7 were sequentially formed. Is.

上記構造のカラーフィルタの製造方法は、フォトリソグラフィー法、印刷法、インクジェット法が知られているが、図2は一般的に用いられているフォトリソグラフィー法の工程を示すフロー図である。カラーフィルタは、先ず、ガラス基板上にBMを形成処理する工程(C−1)、ガラス基板を洗浄処理する工程(C−2)、着色フォトレジストを塗布および予備乾燥処理する工程(C−3)、着色フォトレジストを乾燥、硬化処理するプリベーク工程(C−4)、露光処理する工程(C−5)、現像処理する工程(C−6)、着色フォトレジストを硬化処理する工程(C−7)が行われる。例えば、R画素、G画素、B画素の順に画素が形成される場合には、カラーフィルタ用ガラス基板を洗浄処理する工程(C−2)から、着色フォトレジストを硬化処理する工程間(C−7)ではレッドR、グリーンG、ブルーBの順に着色レジストを変更して3回繰り返されてR画素、G画素、B画素が形成される。更に研磨する工程(C−8)、透明電極を成膜処理する工程(C−9)、PS、VAを形成処理する工程(C−10)がこの順に行われ製造される。更に図示していないが検査、修正が適宜、工程間に挿入される。   As a method for manufacturing a color filter having the above structure, a photolithography method, a printing method, and an ink jet method are known. FIG. 2 is a flow chart showing steps of a commonly used photolithography method. In the color filter, first, a step of forming BM on the glass substrate (C-1), a step of cleaning the glass substrate (C-2), and a step of applying and pre-drying a colored photoresist (C-3) ), A pre-baking step (C-4) for drying and curing the colored photoresist, a step (C-5) for exposing, a step (C-6) for developing, and a step (C-) for curing the colored photoresist. 7) is performed. For example, when pixels are formed in the order of R pixel, G pixel, and B pixel, from the step (C-2) of cleaning the color filter glass substrate to the step of curing the colored photoresist (C- In 7), the color resist is changed in the order of red R, green G, and blue B, and the process is repeated three times to form R, G, and B pixels. Further, the step of polishing (C-8), the step of forming a transparent electrode (C-9), and the step of forming PS and VA (C-10) are performed in this order. Further, although not shown, inspection and correction are appropriately inserted between the processes.

上記のカラーフィルタ製造工程における各処理は、図3に示す基板保持装置に処理対象のガラス基板を載置、保持して行われる。基板保持装置11にガラス基板10を載置するためには、基板保持装置11の昇降ピン12を突出させておき(図3(a))、ガラス基板10を搬送アーム13に載せたまま矢印14の方向に挿入する(図3(b)。その後、ガラス基板10を昇降ピン12に載置させた後、搬送アーム13を基板保持装置11の外に矢印14で示す方向に退避させ、その後、昇降ピン12を基板保持装置11の中に没入させ、ガラス基板10を基板保持装置11に載置し、真空吸着(真空吸着部は図示せず)して保持する(図3(c))。   Each process in the color filter manufacturing process is performed by placing and holding a glass substrate to be processed on the substrate holding apparatus shown in FIG. In order to place the glass substrate 10 on the substrate holding device 11, the elevation pins 12 of the substrate holding device 11 are projected (FIG. 3A), and the glass substrate 10 is placed on the transfer arm 13 and the arrow 14. (FIG. 3B) Then, after placing the glass substrate 10 on the lifting pins 12, the transfer arm 13 is retracted outside the substrate holding device 11 in the direction indicated by the arrow 14, and then The elevating pins 12 are immersed in the substrate holding device 11, and the glass substrate 10 is placed on the substrate holding device 11 and held by vacuum suction (a vacuum suction portion is not shown) (FIG. 3C).

特開2002−246450号公報JP 2002-246450 A

昇降ピン12にガラス基板10を載置してリフトアップ、リフトダウンする際には、ガラス基板と昇降ピンの接触面積が小さいため、ガラス基板が受ける局所的な応力が大きく、ガラス基板表面に形成したRGB画素等の薄膜の損傷やガラス基板自体の割れの原因となる。   When the glass substrate 10 is placed on the lift pins 12 and lifted up and down, the contact area between the glass substrate and the lift pins is small, so that the local stress received by the glass substrate is large and formed on the surface of the glass substrate. This causes damage to thin films such as RGB pixels and breakage of the glass substrate itself.

そこで本発明では、ガラス基板をリフトアップ、リフトダウンする際にガラス基板に作用する局所的な応力を発生させず、その結果、ガラス基板表面に形成した薄膜の損傷やガラス基板自体の割れを防ぐことを可能とする基板保持装置を提供することを課題とする。   Therefore, in the present invention, when the glass substrate is lifted up and down, local stress acting on the glass substrate is not generated, and as a result, damage to the thin film formed on the glass substrate surface and cracking of the glass substrate itself are prevented. It is an object of the present invention to provide a substrate holding device that makes it possible.

上記の課題を解決するための手段として、請求項1に記載の発明は、処理対象である基板を基板搬送アームで基板保持面の上方に搬送した後に基板保持面に載置し、基板を吸着保持する基板保持装置であって、平坦な基板保持面を形成するための複数の基板保持部と、基板保持面下で昇降する櫛歯状の基板保持面昇降部と、平坦な基板保持面に基板を吸着保持する基板吸着保持手段と、基板を基板保持面から浮上する基板浮上手段と、を備えたことを特徴とする基板保持装置である。   As a means for solving the above problems, the invention according to claim 1 is characterized in that the substrate to be processed is transported above the substrate holding surface by the substrate transport arm and then placed on the substrate holding surface to attract the substrate. A substrate holding device for holding a plurality of substrate holding portions for forming a flat substrate holding surface, a comb-like substrate holding surface elevating portion that moves up and down under the substrate holding surface, and a flat substrate holding surface A substrate holding apparatus comprising: a substrate suction holding unit that holds a substrate by suction; and a substrate floating unit that floats the substrate from a substrate holding surface.

また、請求項2に記載の発明は、基板保持部と基板保持面昇降部が相対する辺は非直線な形状とすることを特徴とする請求項1記載の基板保持装置である。   According to a second aspect of the present invention, there is provided the substrate holding apparatus according to the first aspect, wherein the opposite sides of the substrate holding part and the substrate holding surface elevating part are non-linear.

また、請求項3に記載の発明は、基板保持部と基板保持面昇降部の両方、あるいは基板保持部または基板保持面昇降部のいずれかに基板吸着孔及び基板吸着保持手段を有し、基板保持面昇降部が上昇し基板保持面が平坦になった状態で基板吸着孔からエアーを吸引し基板を吸着保持することを特徴とする請求項1または2に記載の基板保持装置である。   According to a third aspect of the present invention, there is provided a substrate suction hole and a substrate suction holding means in both the substrate holding part and the substrate holding surface lifting part, or in either the substrate holding part or the substrate holding surface lifting part, 3. The substrate holding apparatus according to claim 1, wherein the substrate is sucked and held by sucking air from the substrate suction hole in a state where the holding surface raising / lowering portion is raised and the substrate holding surface is flattened.

また、請求項4に記載の発明は、基板保持部と基板保持面昇降部の両方、あるいは基板保持部または基板保持面昇降部に基板浮上孔及び基板浮上手段を有し、基板を上昇させる直前に基板浮上孔からエアーを噴出し基板を浮上させることを特徴とする請求項1から3のいずれかに記載の基板保持装置である。   According to a fourth aspect of the present invention, there is provided a substrate floating hole and a substrate floating means in both the substrate holding part and the substrate holding surface elevating part, or the substrate holding part or the substrate holding surface elevating part, and immediately before raising the substrate. 4. The substrate holding apparatus according to claim 1, wherein air is blown out from the substrate floating hole to float the substrate.

また、請求項5に記載の発明は、複数の基板保持部と櫛歯状の基板保持面昇降部の全ての基板吸着の駆動は同時に開始されるか、あるいは時刻をずらして開始され、また複数の基板保持部と櫛歯状の基板保持面昇降部の全ての基板浮上の駆動は同時に開始されるか、あるいは時刻をずらして開始されることを特徴とする請求項1から4のいずれかに記載の基板保持装置である。   In the invention according to claim 5, the driving of all the substrate suctions of the plurality of substrate holding units and the comb-shaped substrate holding surface lifting unit is started at the same time or started at different times, 5. The driving of all the substrate floating of the substrate holding part and the comb-like substrate holding surface elevating part is started at the same time or at different times. It is a board | substrate holding apparatus of description.

また、請求項6に記載の発明は、基板保持面における基板保持部と基板保持面昇降部の端部は、角部が面取りされていることを特徴とする請求項1から5のいずれかに記載の基板保持装置である。   According to a sixth aspect of the present invention, in the end portion of the substrate holding portion and the substrate holding surface raising / lowering portion on the substrate holding surface, corner portions are chamfered. It is a board | substrate holding apparatus of description.

また、請求項7に記載の発明は、基板吸着孔と基板浮上孔はサラモミ構造またはポケット状の静圧軸受け構造であることを特徴とする請求項1から6のいずれかに記載の基板保持装置である。   According to a seventh aspect of the present invention, there is provided the substrate holding device according to any one of the first to sixth aspects, wherein the substrate suction hole and the substrate floating hole have a salamomi structure or a pocket-shaped static pressure bearing structure. It is.

本発明の基板保持装置は、平坦な基板保持面の一部、即ち、基板保持部昇降部を沈下させることによって、基板搬送アームを基板保持面の上方に挿入するための空間を作ることが出来、その結果、基板の投入、払い出しを行うことが可能となる。 The substrate holding apparatus of the present invention can create a space for inserting the substrate transfer arm above the substrate holding surface by lowering a part of the flat substrate holding surface, that is, the substrate holding unit lifting / lowering unit. As a result, the substrate can be loaded and unloaded.

基板を吸着、浮上する吸着孔、浮上孔を基板保持部、基板保持面昇降部の両方、あるいは基板保持部、基板保持面昇降部のいずれかに備えることによって、基板を基板保持面より着脱することが出来る。   The substrate is attached to and detached from the substrate holding surface by providing a suction hole for sucking and floating the substrate, and providing the floating hole in both the substrate holding unit and the substrate holding surface lifting unit, or in the substrate holding unit and the substrate holding surface lifting unit. I can do it.

基板保持部と基板保持面昇降部によって形成された平坦な基板保持面に生ずる継ぎ目に起因する不良が発生すると懸念される。例えば基板保持面上で基板を加熱、冷却する場合、継ぎ目部分の熱伝達が不均一となり、基板の温度ムラが発生する可能性がある。このた
め基板保持部と基板保持面昇降部が相対する辺を非直線な形状とすることをすることで、基板保持部と基板保持面昇降部の継ぎ目部分の形状起因による不良を防ぐことが出来る。
There is a concern that a defect caused by a seam generated on the flat substrate holding surface formed by the substrate holding portion and the substrate holding surface raising / lowering portion may occur. For example, when the substrate is heated and cooled on the substrate holding surface, the heat transfer at the joint portion becomes non-uniform, and the temperature of the substrate may be uneven. For this reason, the side by which the substrate holding part and the substrate holding surface elevating part are opposed to each other is formed in a non-linear shape, thereby preventing defects due to the shape of the joint portion of the substrate holding part and the substrate holding surface elevating part. .

基板保持面昇降部によって、従来の昇降ピンを使用する場合に比べて基板昇降部と基板の接触面積が非常に大となり、その結果、基板あるいは基板表面に形成した薄膜の損傷を防止することが出来る。   The substrate holding surface lifting / lowering portion makes the contact area between the substrate lifting / lowering portion and the substrate much larger than when using conventional lifting / lowering pins, thereby preventing damage to the substrate or the thin film formed on the substrate surface. I can do it.

複数の基板保持部と櫛歯状の基板保持面昇降部の基板吸着の駆動は時刻をずらして開始され、また複数の基板保持部と櫛歯状の基板保持面昇降部の基板浮上の駆動は時刻をずらして開始されることによって、特に大型のガラス基板の場合は、ガラス基板に与える局所的な応力を小さくすることが出来、ガラス基板の破損発生を防ぐことが可能になると共に着脱の時間を短縮することが期待出来る。   The driving of the substrate suction of the plurality of substrate holding units and the comb-shaped substrate holding surface lifting unit is started at different times, and the driving of the substrate floating of the plurality of substrate holding units and the comb-shaped substrate holding surface lifting unit is By starting at a different time, especially for large glass substrates, it is possible to reduce the local stress applied to the glass substrate, prevent the glass substrate from being damaged, and attach / detach time Can be expected to shorten.

基板吸着孔と基板浮上孔はサラモミ構造またはポケット状の静圧軸受け構造とすることによって、基板浮上の際はエアーの推力が基板に効率よく伝えることが出来る。   The substrate suction hole and the substrate floating hole have a salamomi structure or a pocket-shaped static pressure bearing structure, so that air thrust can be efficiently transmitted to the substrate when the substrate floats.

従来用いられている昇降ピンに比べてガラス基板と接触面積の大きい櫛歯状基板保持面昇降部を用いることで、ガラス基板およびガラス基板表面に形成した薄膜の破壊を防止することが期待出来る。   By using the comb-shaped substrate holding surface lifting part having a larger contact area with the glass substrate than that of the conventionally used lifting pins, it can be expected to prevent the glass substrate and the thin film formed on the glass substrate surface from being broken.

また、従来用いられていた昇降ピンによるガラス基板の昇降に比較して、基板保持面昇降部を用いることによってガラス基板への局所的な応力が減少し、また、基板保持面昇降部を昇降ピンに比較して高速に昇降することが可能となるため、ガラス基板の投入、払い出しに要する時間を短縮することが期待出来る。   Also, compared to the conventional lifting and lowering of the glass substrate using the lifting pins, the use of the substrate holding surface lifting and lowering portion reduces the local stress on the glass substrate, and the substrate holding surface lifting and lowering portion is connected to the lifting and lowering pins. Therefore, it is possible to shorten the time required for loading and unloading the glass substrate.

カラー液晶表示装置に用いられるカラーフィルタの一例を断面で示した図。The figure which showed an example of the color filter used for a color liquid crystal display device in a cross section. 一般的に用いられているフォトリソグラフィー法の工程のフロー図。The flowchart of the process of the photolithographic method generally used. ガラス基板を基板保持装置に載置する方法を説明するための図。(a)は基板保持装置の昇降ピンを突出させた状態を示す図。(b)はガラス基板を搬送アームに載せたまま搬送アームを挿入させた状態を示す図。(c)はガラス基板を基板保持装置に載置し、真空吸着して保持した状態を示す図。The figure for demonstrating the method of mounting a glass substrate in a substrate holding device. (A) is a figure which shows the state which made the raising / lowering pin of the board | substrate holding | maintenance apparatus protrude. (B) is a figure which shows the state which inserted the conveyance arm, with the glass substrate mounted on the conveyance arm. (C) is a figure which shows the state which mounted the glass substrate in the board | substrate holding | maintenance apparatus, and was vacuum-sucked and hold | maintained. 本発明に係る基板保持装置の断面を示す図。(a)は基板保持面昇降部を基板保持面の下方に沈下させた状態で、ガラス基板を搭載した搬送アームが基板保持装置上方に挿入された状態を示す図。(b)はガラス基板を搬送アームから基板保持面に受け渡した状態を示す図。(c)は基板保持面昇降部が上昇し、基板保持面が平坦となった状態を示す図。The figure which shows the cross section of the board | substrate holding apparatus which concerns on this invention. (A) is a figure which shows the state by which the conveyance arm carrying a glass substrate was inserted above the substrate holding apparatus in the state where the substrate holding surface raising / lowering part was sunk below the substrate holding surface. FIG. 6B is a diagram illustrating a state where the glass substrate is transferred from the transfer arm to the substrate holding surface. (C) is a figure which shows the state which the board | substrate holding surface raising / lowering part raised and the board | substrate holding surface became flat. 本発明に係る基板保持装置にガラス基板を載置し、基板搬送アームがガラス基板から離脱した状態を示す図。The figure which shows the state which mounted the glass substrate in the board | substrate holding | maintenance apparatus which concerns on this invention, and the substrate conveyance arm detach | leaved from the glass substrate. 本発明に係る基板保持装置の基板保持面昇降部が上昇し、基板保持面が平坦となった状態を示す図。The figure which shows the state which the board | substrate holding surface raising / lowering part of the board | substrate holding apparatus which concerns on this invention rose, and the substrate holding surface became flat. 本発明に係る基板保持装置の概略構成を示す図。The figure which shows schematic structure of the board | substrate holding | maintenance apparatus which concerns on this invention. 本発明に係る基板保持装置を上面から見た模式図で、複数の基板保持部と櫛歯状の基板保持面昇降部を示す図。The figure which looked at the substrate holding device concerning the present invention from the upper surface, and is a figure showing a plurality of substrate holding parts and a comb-like substrate holding surface raising and lowering part. 本発明に係る基板保持装置の基板保持部と基板保持面昇降部の一部を断面で示した図。(a)は基板保持部と基板保持面昇降部の角部にテーパー形状か丸みのある形状を設けることを説明するための図。(b)は基板吸着孔及び基板浮上孔の形状を詳細に示した図である。The figure which showed the substrate holding part of the substrate holding device which concerns on this invention, and a part of substrate holding surface raising / lowering part by the cross section. (A) is a figure for demonstrating providing the shape with a taper shape or roundness in the corner | angular part of a board | substrate holding part and a board | substrate holding surface raising / lowering part. (B) is the figure which showed the shape of the board | substrate adsorption | suction hole and the board | substrate floating hole in detail.

図4は本発明に係る基板保持装置の断面を示す図である。基板保持装置50は平坦な基板保持面33を形成する複数の基板保持部20及び櫛歯状の基板保持面昇降部21と、基板を吸着保持する基板吸着保持手段である真空吸引装置(図示せず)と、基板を基板保持面から浮上する基板浮上手段である圧空装置(図示せず)と、を備えている。基板保持部の基板吸着孔及び基板浮上孔20−1と、基板保持面昇降部の基板吸着孔及び基板浮上孔21−1は真空吸引装置及び圧空装置に配管されている。また、基板を設定された位置に載置するための基板ガイド24やアライメントピン25が設けられている。   FIG. 4 is a view showing a cross section of the substrate holding apparatus according to the present invention. The substrate holding device 50 includes a plurality of substrate holding units 20 and a comb-like substrate holding surface elevating unit 21 that form a flat substrate holding surface 33, and a vacuum suction device (not shown) that is a substrate suction holding unit that holds the substrate by suction. And a compressed air device (not shown) which is a substrate floating means for floating the substrate from the substrate holding surface. The substrate suction hole and the substrate floating hole 20-1 of the substrate holding unit and the substrate suction hole and the substrate floating hole 21-1 of the substrate holding surface elevating unit are piped to a vacuum suction device and a pneumatic device. A substrate guide 24 and alignment pins 25 are provided for placing the substrate at a set position.

基板保持装置50にガラス基板60を投入する場合には、図4(a)に示すように基板保持面昇降部21を昇降駆動部(図示せず)によって基板保持面33の下方に沈下させた状態で、ガラス基板60を搭載した搬送装置40に備えられた搬送アーム41を矢印42で示す方向に挿入する。次に、図4(b)に示すようにガラス基板60を搬送アーム41から基板保持面33にガラス基板60を受け渡す。この状態では基板保持部20の表面の基板浮上孔20−1より圧空装置によってエアーを吹き出して、ガラス基板60の載置をアシストしても良い。   When the glass substrate 60 is put into the substrate holding device 50, the substrate holding surface raising / lowering unit 21 is lowered below the substrate holding surface 33 by the raising / lowering driving unit (not shown) as shown in FIG. In the state, the transfer arm 41 provided in the transfer device 40 on which the glass substrate 60 is mounted is inserted in the direction indicated by the arrow 42. Next, as shown in FIG. 4B, the glass substrate 60 is transferred from the transfer arm 41 to the substrate holding surface 33. In this state, air may be blown out from the substrate floating hole 20-1 on the surface of the substrate holding unit 20 by a compressed air device to assist the placement of the glass substrate 60.

図4(b)及び図5はガラス基板60を基板保持面33に載置し、基板搬送アーム41がガラス基板60から離脱した状態を示している。この状態から基板搬送アーム41は基板保持装置50内より矢印42で示す方向に退避する。   4B and 5 show a state where the glass substrate 60 is placed on the substrate holding surface 33 and the substrate transfer arm 41 is detached from the glass substrate 60. FIG. From this state, the substrate transfer arm 41 is retracted from the substrate holding device 50 in the direction indicated by the arrow 42.

図4(c)及び図6は基板保持面昇降部21が矢印26で示される方向に上昇し、基板保持面が平坦となった状態を示す。この時圧空装置からエアーを吹き出してガラス基板60を浮上させ、基板ガイド24によってガラス基板60を移動させ、基板ガイド24は浮上した基板の滑走を防止する。アライメント後に基板吸着孔20−1、21−1によりガラス基板60を吸着して保持する。   4C and 6 show a state in which the substrate holding surface raising / lowering portion 21 is raised in the direction indicated by the arrow 26, and the substrate holding surface is flattened. At this time, air is blown out from the compressed air device to float the glass substrate 60, and the glass substrate 60 is moved by the substrate guide 24. The substrate guide 24 prevents the floating substrate from sliding. After alignment, the glass substrate 60 is sucked and held by the substrate suction holes 20-1 and 21-1.

ガラス基板60を吸着する場合は、基板保持部20の基板吸着孔20−1と基板保持面昇降部21の基板吸着孔21−1の両方、あるいは基板保持部20の基板吸着孔20−1または基板保持面昇降部21の基板吸着孔21−1のいずれかによって基板を吸着する。両方あるいはいずれかは、ガラス基板60が処理される間に位置ずれを起こさないことを条件に適宜選択すれば良い。   When adsorbing the glass substrate 60, both the substrate adsorption hole 20-1 of the substrate holding unit 20 and the substrate adsorption hole 21-1 of the substrate holding surface elevating unit 21, or the substrate adsorption hole 20-1 of the substrate holding unit 20 or The substrate is adsorbed by any of the substrate adsorbing holes 21-1 of the substrate holding surface elevating unit 21. Both or either of them may be appropriately selected on the condition that no displacement occurs while the glass substrate 60 is processed.

ガラス基板60を基板保持装置50より払い出す場合は、上記と逆の動作によって行われる。即ち、基板保持部20及び基板保持面昇降部21に吸着保持されているガラス基板60を離脱するために、基板浮上孔20−1及び21−1より圧縮空気を吹き出すことにより真空を解除してガラス基板60を浮上させ、基板保持面昇降部21を沈下した後、基板搬送アーム41を挿入し、ガラス基板60の払い出しを行う。基板保持面昇降部21は、沈下した状態で基板搬送アーム40が基板保持面昇降部21とガラス基板60に干渉しない位置まで沈下する。   When the glass substrate 60 is dispensed from the substrate holding device 50, the reverse operation is performed. That is, in order to release the glass substrate 60 adsorbed and held by the substrate holding unit 20 and the substrate holding surface elevating unit 21, the vacuum is released by blowing compressed air from the substrate floating holes 20-1 and 21-1. After the glass substrate 60 is levitated and the substrate holding surface elevating part 21 is lowered, the substrate transfer arm 41 is inserted, and the glass substrate 60 is discharged. The substrate holding surface elevating unit 21 sinks to a position where the substrate transport arm 40 does not interfere with the substrate holding surface elevating unit 21 and the glass substrate 60 in the state of being submerged.

ガラス基板60を浮上する場合は、基板保持部20の基板浮上孔20−1と基板保持面昇降部21の基板浮上孔21−1の両方、あるいは基板保持部20の基板浮上孔20−1または基板保持面昇降部21の基板浮上孔21−1のいずれかによって基板を浮上する。両方あるいはいずれかは、ガラス基板60が浮上されることを条件に適宜選択すれば良い。   When the glass substrate 60 is levitated, both the substrate levitating hole 20-1 of the substrate holding unit 20 and the substrate levitating hole 21-1 of the substrate holding surface elevating unit 21, or the substrate levitating hole 20-1 of the substrate holding unit 20 or The substrate is levitated by one of the substrate levitation holes 21-1 of the substrate holding surface elevating unit 21. Both or either may be selected as appropriate on the condition that the glass substrate 60 is levitated.

基板保持面上で基板を加熱、冷却する場合、基板保持部と基板保持面昇降部によって形
成された平坦な基板保持面に生ずる継ぎ目に起因する基板の温度ムラが発生する可能性がある。このため図5に示すように端部が咬合するような非直線な形状とすることによって上記問題が解決出来る。
When the substrate is heated and cooled on the substrate holding surface, there is a possibility that the temperature unevenness of the substrate due to the seam generated on the flat substrate holding surface formed by the substrate holding unit and the substrate holding surface raising / lowering unit may occur. For this reason, as shown in FIG. 5, the above-mentioned problem can be solved by using a non-linear shape in which the end portion is engaged.

図6に示すように、浮上開始時に基板保持部20にはガラス基板60が浮上滑走しないように基板ガイド24や、基板の位置を補正するためのアライメントピン25を設けることが望ましい。   As shown in FIG. 6, it is desirable to provide the substrate holding unit 20 with a substrate guide 24 and alignment pins 25 for correcting the position of the substrate so that the glass substrate 60 does not float and slide when starting to float.

図7は本発明の基板保持装置の概略構成を示した図である。基板保持面昇降部21を上下させる昇降駆動部32、ガラス基板を吸着保持する基板吸着保持手段、基板を浮上させる基板浮上手段を有する。昇降駆動部32はモーター32aに連結されたカップリング32bを介してボールネジ32cによって台形カム32dを回転することによってカム従動子32eを上下し、基板保持面昇降部21を昇降する。昇降駆動部32の構造は、モーター32aと台形カム32dを用いた一般的な構造の一例である。真空吸引装置30及び圧空装置31は、基板保持部20及び基板保持面昇降部21に設けられた吸着孔、浮上孔20−1、21−1に配管されている。   FIG. 7 is a diagram showing a schematic configuration of the substrate holding apparatus of the present invention. There is an elevating drive unit 32 that moves the substrate holding surface elevating unit 21 up and down, a substrate adsorption holding unit that adsorbs and holds a glass substrate, and a substrate floating unit that levitates the substrate. The raising / lowering drive unit 32 moves the cam follower 32e up and down by rotating the trapezoidal cam 32d with a ball screw 32c through a coupling 32b connected to the motor 32a, and raises and lowers the substrate holding surface lifting unit 21. The structure of the raising / lowering drive part 32 is an example of the general structure using the motor 32a and the trapezoidal cam 32d. The vacuum suction device 30 and the compressed air device 31 are connected to suction holes and floating holes 20-1 and 21-1 provided in the substrate holding unit 20 and the substrate holding surface lifting / lowering unit 21.

本発明の実施の形態では、真空吸引装置30及び圧空装置31に配管された基板保持部の吸着孔及び浮上孔20−1は同一孔で、また基板保持面昇降部の吸着孔及び浮上孔21−1は同一孔であって電磁弁34によって吸引と浮上の切り替えを行うことを例としたが、吸着孔及び浮上孔を個別に設けて配管しても良い。   In the embodiment of the present invention, the suction hole and the floating hole 20-1 of the substrate holding portion piped to the vacuum suction device 30 and the pressure pneumatic device 31 are the same hole, and the suction hole and the floating hole 21 of the substrate holding surface lifting and lowering portion. -1 is the same hole, and the solenoid valve 34 is used for switching between suction and levitation. However, the suction hole and the levitation hole may be provided separately and piped.

図8は本発明の基板保持装置の上面から見た模式図で、複数の基板保持部と櫛歯状の昇降部の基板を真空吸着する開始時刻と基板を真空解除する開始時刻を説明するための図である。ガラス基板を複数の基板保持部と櫛歯状の昇降部に真空吸着する際には、複数の基板保持部と櫛歯状の昇降部の基板を真空吸着する開始時刻を同一時刻とし、また、基板を真空解除する開始時刻を同一としても良いが、大型の基板の場合には、基板を浮上する際にはガラス基板の中心部から吸着することによってガラス基板と基板保持面の間にエアーを巻き込みことを防げ、また真空解除時にはガラス基板の周辺部から真空解除することによってガラス基板に与える応力を小さく出来、ガラス基板の破損発生を防ぐことが可能となる。   FIG. 8 is a schematic view seen from the upper surface of the substrate holding device of the present invention, for explaining the start time for vacuum suction of the substrates of the plurality of substrate holding parts and the comb-like lifting part and the start time for releasing the vacuum of the substrate. FIG. When vacuum adsorbing a glass substrate to a plurality of substrate holding parts and comb-shaped lifting parts, the start time for vacuum suction of the plurality of substrate holding parts and the comb-shaped lifting parts is the same time, The start time for releasing the vacuum from the substrate may be the same, but in the case of a large substrate, when the substrate is levitated, air is sucked from the glass substrate and the substrate holding surface by sucking from the center of the glass substrate. When the vacuum is released, the stress applied to the glass substrate can be reduced by releasing the vacuum from the peripheral portion of the glass substrate, and the glass substrate can be prevented from being broken.

図8において、例えば基板保持部が20a〜20d、基板保持面昇降部が21a〜21iあった場合、ガラス基板を真空吸着する際には、真空吸着の順序は、例えば、開始時間1(20b、21e、20c)→開始時間2(21d、21b、21f、21h)→開始時間3(21a、21c、21g、21i)→開始時間4(20a、20d)とし、一方、ガラス基板を真空解除する際には、上記真空吸着と逆に、開始時間11(20a、20d)→開始時間12(21a、21c、21g、21i)→開始時間13(21d、21b、21f、21h)→開始時間14(20b、21e、20c)の順序で行う。   In FIG. 8, for example, when the substrate holding part is 20a to 20d and the substrate holding surface lifting part is 21a to 21i, when vacuum sucking the glass substrate, the order of vacuum suction is, for example, the start time 1 (20b, 21e, 20c) → start time 2 (21d, 21b, 21f, 21h) → start time 3 (21a, 21c, 21g, 21i) → start time 4 (20a, 20d), while releasing the glass substrate from vacuum In contrast to the above vacuum suction, start time 11 (20a, 20d) → start time 12 (21a, 21c, 21g, 21i) → start time 13 (21d, 21b, 21f, 21h) → start time 14 (20b) , 21e, 20c).

上記のように、真空吸着開始時間(開始時間1〜4)や真空解除開始時間(開始時間11〜14)をずらして行う場合は、電磁弁を複数個(上記の場合は4個)設け、それぞれの吸着孔、浮上孔と、真空装置及び圧空装置とを配管して、真空吸着、真空解除を行う。   As described above, when the vacuum adsorption start time (start time 1 to 4) and the vacuum release start time (start time 11 to 14) are shifted, a plurality of solenoid valves (four in the above case) are provided. Each suction hole, levitation hole, a vacuum device and a pneumatic device are connected to perform vacuum suction and vacuum release.

図9(a)は基板保持部20と基板保持面昇降部21の一部を断面で示した図である。基板保持部20及び基板保持面昇降部21の角部20−2、21−2はガラス基板と直接接触するため、テーパー形状か丸みのある形状としてガラス基板に損傷を与えない形状となっている。   FIG. 9A is a cross-sectional view of a part of the substrate holding unit 20 and the substrate holding surface elevating unit 21. Since the corners 20-2 and 21-2 of the substrate holding unit 20 and the substrate holding surface elevating unit 21 are in direct contact with the glass substrate, the glass substrate is not damaged as a tapered shape or a rounded shape. .

図9(b)は基板保持部20の基板吸着孔及び基板浮上孔20−1、基板保持面昇降部
21の基板吸着孔及び基板浮上孔21−1の形状を詳細に示した図である。基板吸着孔と基板浮上孔20−1、21−1はサラモミ構造またはポケット状の静圧軸受け構造とする。その結果、基板の吸着を均一に行え、基板浮上の際はエアーの推力が基板に効率よく伝えることが出来る。
FIG. 9B is a diagram showing in detail the shapes of the substrate suction hole and the substrate floating hole 20-1 of the substrate holding unit 20 and the substrate suction hole and the substrate floating hole 21-1 of the substrate holding surface elevating unit 21. The substrate suction holes and the substrate floating holes 20-1 and 21-1 have a salamomi structure or a pocket-shaped static pressure bearing structure. As a result, the adsorption of the substrate can be performed uniformly, and the thrust of the air can be efficiently transmitted to the substrate when the substrate floats.

基板保持面20及び基板保持面昇降部21には、基板保持装置の加熱、冷却等の処理内容に応じて適切な特性(例えば、熱伝導率、電気伝導率、熱膨張率、表面粗さ等)を有する材料を適宜選択する。また基板保持面及びガラス基板に発生する静電気を防止する材質、表面処理を適宜選択することが望ましい。   The substrate holding surface 20 and the substrate holding surface lifting / lowering unit 21 have appropriate characteristics (for example, thermal conductivity, electrical conductivity, thermal expansion coefficient, surface roughness, etc.) according to the processing contents such as heating and cooling of the substrate holding device. ) Is appropriately selected. Further, it is desirable to appropriately select a material and surface treatment for preventing static electricity generated on the substrate holding surface and the glass substrate.

以上のように本発明によれば、基板のリフトアップ、リフトダウンを基板保持面昇降部によって行うため、ガラス基板への局所的な応力を減少することが出来、その結果、ガラス基板表面に形成した薄膜の損傷及びガラス基板自体の割れを防止することが出来る。また、従来の昇降ピンに比較して基板保持面昇降部はガラス基板との接触部が非常に大きいために、高速に昇降することが可能となり、基板を基板保持装置への投入、払い出しに要する処理時間の短縮が期待出来る。   As described above, according to the present invention, since the substrate is lifted up and down by the substrate holding surface lifting part, the local stress on the glass substrate can be reduced, and as a result, formed on the surface of the glass substrate. Damage to the thin film and cracking of the glass substrate itself can be prevented. In addition, since the substrate holding surface elevating part is much larger in contact with the glass substrate than the conventional elevating pins, it is possible to move up and down at high speed, which is required for loading and unloading the substrate to and from the substrate holding device. Reduction of processing time can be expected.

また、基板保持部と基板保持面昇降部によって形成された平坦な基板保持面に生ずる継ぎ目部分の熱伝達が不均一となり、基板の温度ムラが発生する可能性が新たに懸念されるが、基板保持部と基板保持面昇降部が相対する辺を非直線な形状とすることをすることで、基板保持部と基板保持面昇降部が咬合する形状とし、その結果、基板保持部と基板保持面昇降部の継ぎ目部分の形状起因による不良を防ぐことが出来る。   In addition, there is a new concern that the heat transfer of the seam portion generated on the flat substrate holding surface formed by the substrate holding portion and the substrate holding surface raising / lowering portion may become uneven, and the temperature unevenness of the substrate may occur. By making the sides where the holding unit and the substrate holding surface elevating unit face each other in a non-linear shape, the substrate holding unit and the substrate holding surface elevating unit are engaged with each other. As a result, the substrate holding unit and the substrate holding surface are obtained. Defects due to the shape of the joint portion of the elevating part can be prevented.

1・・・カラーフィルタ
2・・・ガラス基板
3・・・BM
4−1・・・R画素
4−2・・・G画素
4−3・・・B画素
5・・・透明電極
6・・・PS
7・・・VA
10・・・ガラス基板
11・・・基板保持装置
12・・・昇降ピン
13・・・搬送アーム
14・・・搬送アームの挿入、退避の方向を示す矢印
20・・・基板保持部
20−1・・・基板保持部の基板吸着孔、基板浮上孔
21・・・基板保持面昇降部
21−1・・・基板保持面昇降部の基板吸着孔、基板浮上孔
24・・・基板ガイド
25・・・アライメントピン
26・・・基板保持面昇降部の上昇方向を示す矢印
30・・・真空吸引装置
31・・・圧空導入装置
32・・・昇降駆動部
32a・・・モーター
32b・・・カップリング
32c・・・ボールねじ
32d・・・台形カム
32e・・・カム従動子
33・・・基板保持面
34・・・電磁弁
40・・・基板搬送装置
41・・・基板搬送アーム
42・・・搬送アームの挿入、退避の方向を示す矢印
50・・・基板保持装置
60・・・ガラス基板
DESCRIPTION OF SYMBOLS 1 ... Color filter 2 ... Glass substrate 3 ... BM
4-1 ... R pixel 4-2 ... G pixel 4-3 ... B pixel 5 ... transparent electrode 6 ... PS
7 ... VA
DESCRIPTION OF SYMBOLS 10 ... Glass substrate 11 ... Substrate holding device 12 ... Elevating pin 13 ... Transfer arm 14 ... Arrow 20 indicating direction of insertion / retraction of transfer arm ... Substrate holding unit 20-1 ... Substrate adsorption hole, substrate floating hole 21 ... Substrate holding surface elevating part 21-1 ... Substrate adsorption hole, substrate floating hole 24 ... Substrate floating hole 24 ... Substrate guide 25. ..Alignment pin 26... Arrow 30 indicating the ascending direction of the substrate holding surface elevating part... Vacuum suction device 31... Compressed air introduction device 32. Ring 32c ... Ball screw 32d ... Trapezoid cam 32e ... Cam follower 33 ... Substrate holding surface 34 ... Solenoid valve 40 ... Substrate transfer device 41 ... Substrate transfer arm 42 ... -Indicates the direction of transfer arm insertion and retraction Indicia 50 ... substrate holding device 60 ... a glass substrate

Claims (7)

処理対象である基板を基板搬送アームで基板保持面の上方に搬送した後に基板保持面に載置し、基板を吸着保持する基板保持装置であって、平坦な基板保持面を形成するための複数の基板保持部と、基板保持面下で昇降する櫛歯状の基板保持面昇降部と、平坦な基板保持面に基板を吸着保持する基板吸着保持手段と、基板を基板保持面から浮上する基板浮上手段と、を備えたことを特徴とする基板保持装置。   A substrate holding device for transferring a substrate to be processed onto a substrate holding surface after the substrate transfer arm is transferred above the substrate holding surface and holding the substrate by suction, and a plurality of substrates for forming a flat substrate holding surface. Substrate holding portion, comb-like substrate holding surface elevating portion that moves up and down under the substrate holding surface, substrate suction holding means for sucking and holding the substrate on a flat substrate holding surface, and a substrate that floats the substrate from the substrate holding surface And a levitation means. 基板保持部と基板保持面昇降部が相対する辺は非直線な形状とすることを特徴とする請求項1記載の基板保持装置。   2. The substrate holding apparatus according to claim 1, wherein the sides facing the substrate holding part and the substrate holding surface elevating part have a non-linear shape. 基板保持部と基板保持面昇降部の両方、あるいは基板保持部または基板保持面昇降部のいずれかに基板吸着孔及び基板吸着保持手段を有し、基板保持面昇降部が上昇し基板保持面が平坦になった状態で基板吸着孔からエアーを吸引し基板を吸着保持することを特徴とする請求項1または2に記載の基板保持装置。   Both the substrate holding part and the substrate holding surface elevating part, or either the substrate holding part or the substrate holding surface elevating part have a substrate suction hole and a substrate suction holding means, and the substrate holding surface elevating part is raised and the substrate holding surface is 3. The substrate holding apparatus according to claim 1, wherein air is sucked from the substrate suction hole in a flat state to suck and hold the substrate. 基板保持部と基板保持面昇降部の両方、あるいは基板保持部または基板保持面昇降部に基板浮上孔及び基板浮上手段を有し、基板を上昇させる直前に基板浮上孔からエアーを噴出し基板を浮上させることを特徴とする請求項1から3のいずれかに記載の基板保持装置。   Both the substrate holding part and the substrate holding surface raising / lowering part, or the substrate holding part or the substrate holding surface raising / lowering part have a substrate floating hole and a substrate floating means, and air is blown out from the substrate floating hole immediately before the substrate is lifted. The substrate holding device according to claim 1, wherein the substrate holding device is floated. 複数の基板保持部と櫛歯状の昇降部の全ての基板吸着の駆動は同時に開始されるか、あるいは時刻をずらして開始され、また複数の基板保持部と櫛歯状の基板保持面昇降部の全ての基板浮上の駆動は同時に開始されるか、あるいは時刻をずらして開始されることを特徴とする請求項1から4のいずれかに記載の基板保持装置。   The driving of all the substrate suctions of the plurality of substrate holding units and the comb-like lifting / lowering unit is started simultaneously or at different times, and the plurality of substrate holding units and the comb-like substrate holding surface lifting / lowering unit are started. 5. The substrate holding apparatus according to claim 1, wherein the driving of all the substrate levitation is started simultaneously or at different times. 基板保持面における基板保持部と基板保持面昇降部の端部は、角部が面取りされていることを特徴とする請求項1から5のいずれかに記載の基板保持装置   6. The substrate holding device according to claim 1, wherein corners of the end portions of the substrate holding portion and the substrate holding surface lifting portion on the substrate holding surface are chamfered. 基板吸着孔と基板浮上孔はサラモミ構造またはポケット状の静圧軸受け構造であることを特徴とする請求項1から6のいずれかに記載の基板保持装置。   7. The substrate holding apparatus according to claim 1, wherein the substrate suction hole and the substrate floating hole have a salamomi structure or a pocket-shaped static pressure bearing structure.
JP2009176627A 2009-07-29 2009-07-29 Substrate holding device Pending JP2011029565A (en)

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103456667A (en) * 2012-06-04 2013-12-18 日本麦可罗尼克斯股份有限公司 Attaching bench
CN103681436A (en) * 2012-09-04 2014-03-26 日本麦可罗尼克斯股份有限公司 Adsorption platform
CN104037113A (en) * 2013-03-04 2014-09-10 中微半导体设备(上海)有限公司 Air supply apparatus for plasma processing cavity, and de-clamping method
CN104617017A (en) * 2015-01-12 2015-05-13 合肥京东方光电科技有限公司 Base plate supporting device and method and vacuum drying device
CN105084000A (en) * 2015-06-23 2015-11-25 武汉华星光电技术有限公司 Glass placing and taking-out method
CN109037139A (en) * 2018-08-03 2018-12-18 武汉华星光电半导体显示技术有限公司 Toter
KR20210141805A (en) * 2020-05-13 2021-11-23 에이피시스템 주식회사 Substrate supporting apparatus and method
KR20220113017A (en) * 2021-02-05 2022-08-12 주식회사 야스 Split-type substrate holding device capable of multi-model correspondence with front-end contactless substrates

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103456667A (en) * 2012-06-04 2013-12-18 日本麦可罗尼克斯股份有限公司 Attaching bench
CN103681436A (en) * 2012-09-04 2014-03-26 日本麦可罗尼克斯股份有限公司 Adsorption platform
CN104037113A (en) * 2013-03-04 2014-09-10 中微半导体设备(上海)有限公司 Air supply apparatus for plasma processing cavity, and de-clamping method
CN104617017A (en) * 2015-01-12 2015-05-13 合肥京东方光电科技有限公司 Base plate supporting device and method and vacuum drying device
CN105084000A (en) * 2015-06-23 2015-11-25 武汉华星光电技术有限公司 Glass placing and taking-out method
CN109037139A (en) * 2018-08-03 2018-12-18 武汉华星光电半导体显示技术有限公司 Toter
CN109037139B (en) * 2018-08-03 2020-08-07 武汉华星光电半导体显示技术有限公司 Carrying device
KR20210141805A (en) * 2020-05-13 2021-11-23 에이피시스템 주식회사 Substrate supporting apparatus and method
KR102503634B1 (en) * 2020-05-13 2023-02-27 에이피시스템 주식회사 Substrate supporting apparatus and method
KR20220113017A (en) * 2021-02-05 2022-08-12 주식회사 야스 Split-type substrate holding device capable of multi-model correspondence with front-end contactless substrates
KR102537104B1 (en) * 2021-02-05 2023-05-26 주식회사 야스 Split-type substrate holding device capable of multi-model correspondence with front-end contactless substrates

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