JP2008124194A5 - - Google Patents

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Publication number
JP2008124194A5
JP2008124194A5 JP2006305242A JP2006305242A JP2008124194A5 JP 2008124194 A5 JP2008124194 A5 JP 2008124194A5 JP 2006305242 A JP2006305242 A JP 2006305242A JP 2006305242 A JP2006305242 A JP 2006305242A JP 2008124194 A5 JP2008124194 A5 JP 2008124194A5
Authority
JP
Japan
Prior art keywords
stage
liquid
substrate
immersion exposure
movement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006305242A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008124194A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006305242A priority Critical patent/JP2008124194A/ja
Priority claimed from JP2006305242A external-priority patent/JP2008124194A/ja
Priority to US11/925,579 priority patent/US7518708B2/en
Priority to TW096142041A priority patent/TW200834248A/zh
Priority to KR1020070113020A priority patent/KR100911696B1/ko
Priority to EP07120392A priority patent/EP1921504A3/en
Publication of JP2008124194A publication Critical patent/JP2008124194A/ja
Priority to KR1020090032244A priority patent/KR101015118B1/ko
Publication of JP2008124194A5 publication Critical patent/JP2008124194A5/ja
Pending legal-status Critical Current

Links

JP2006305242A 2006-11-10 2006-11-10 液浸露光方法および液浸露光装置 Pending JP2008124194A (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2006305242A JP2008124194A (ja) 2006-11-10 2006-11-10 液浸露光方法および液浸露光装置
US11/925,579 US7518708B2 (en) 2006-11-10 2007-10-26 Liquid-immersion exposure method and liquid-immersion exposure apparatus
TW096142041A TW200834248A (en) 2006-11-10 2007-11-07 Liquid-immersion exposure method and liquid-immersion exposure apparatus
KR1020070113020A KR100911696B1 (ko) 2006-11-10 2007-11-07 액침 노광방법 및 액침 노광장치
EP07120392A EP1921504A3 (en) 2006-11-10 2007-11-09 Liquid-immersion exposure method and liquid-immersion exposure apparatus
KR1020090032244A KR101015118B1 (ko) 2006-11-10 2009-04-14 액침 노광방법 및 액침 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006305242A JP2008124194A (ja) 2006-11-10 2006-11-10 液浸露光方法および液浸露光装置

Publications (2)

Publication Number Publication Date
JP2008124194A JP2008124194A (ja) 2008-05-29
JP2008124194A5 true JP2008124194A5 (cg-RX-API-DMAC7.html) 2009-12-24

Family

ID=39145193

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006305242A Pending JP2008124194A (ja) 2006-11-10 2006-11-10 液浸露光方法および液浸露光装置

Country Status (5)

Country Link
US (1) US7518708B2 (cg-RX-API-DMAC7.html)
EP (1) EP1921504A3 (cg-RX-API-DMAC7.html)
JP (1) JP2008124194A (cg-RX-API-DMAC7.html)
KR (2) KR100911696B1 (cg-RX-API-DMAC7.html)
TW (1) TW200834248A (cg-RX-API-DMAC7.html)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4481698B2 (ja) * 2004-03-29 2010-06-16 キヤノン株式会社 加工装置
JP2007194484A (ja) * 2006-01-20 2007-08-02 Toshiba Corp 液浸露光方法
JP5089143B2 (ja) * 2006-11-20 2012-12-05 キヤノン株式会社 液浸露光装置
CN101675500B (zh) * 2007-11-07 2011-05-18 株式会社尼康 曝光装置、曝光方法以及元件制造方法
JP2009182110A (ja) * 2008-01-30 2009-08-13 Nikon Corp 露光装置、露光方法、及びデバイス製造方法
JP2009218564A (ja) * 2008-02-12 2009-09-24 Canon Inc 露光装置及びデバイス製造方法
NL2003362A (en) * 2008-10-16 2010-04-19 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
EP2221669A3 (en) 2009-02-19 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
TWI502283B (zh) * 2009-04-03 2015-10-01 尼康股份有限公司 曝光裝置、曝光方法及元件製造方法
EP2264529A3 (en) * 2009-06-16 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus
NL2005322A (en) * 2009-09-11 2011-03-14 Asml Netherlands Bv A shutter member, a lithographic apparatus and device manufacturing method.
NL2006818A (en) 2010-07-02 2012-01-03 Asml Netherlands Bv A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus.
JP6017134B2 (ja) * 2011-12-13 2016-10-26 東京エレクトロン株式会社 生産効率化システム、生産効率化装置および生産効率化方法
JP6802726B2 (ja) * 2017-02-14 2020-12-16 株式会社Ｓｃｒｅｅｎホールディングス 基板搬送装置、それを備える基板処理装置および基板搬送方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
SG121818A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TWI614794B (zh) * 2003-05-23 2018-02-11 Nikon Corp 曝光方法及曝光裝置以及元件製造方法
JP4720106B2 (ja) * 2003-05-23 2011-07-13 株式会社ニコン 露光方法、並びにデバイス製造方法
JP4524601B2 (ja) 2003-10-09 2010-08-18 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
JP4513534B2 (ja) 2003-12-03 2010-07-28 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
KR20180117228A (ko) * 2004-01-05 2018-10-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
JP4474927B2 (ja) * 2004-01-20 2010-06-09 株式会社ニコン 露光方法及び露光装置、デバイス製造方法
US7990516B2 (en) * 2004-02-03 2011-08-02 Nikon Corporation Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
JP3870207B2 (ja) * 2004-08-05 2007-01-17 キヤノン株式会社 液浸露光装置及びデバイス製造方法
KR101364347B1 (ko) * 2004-10-15 2014-02-18 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
EP1843385A4 (en) * 2005-01-28 2011-04-27 Nikon Corp OPTICAL PROJECTION SYSTEM, EXPOSURE SYSTEM AND EXPOSURE METHOD
US20070132976A1 (en) * 2005-03-31 2007-06-14 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
JP4918858B2 (ja) * 2005-04-27 2012-04-18 株式会社ニコン 露光方法、露光装置、デバイス製造方法、及び膜の評価方法
JP2007194484A (ja) * 2006-01-20 2007-08-02 Toshiba Corp 液浸露光方法

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