JP2008119818A5 - - Google Patents
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- Publication number
- JP2008119818A5 JP2008119818A5 JP2007131317A JP2007131317A JP2008119818A5 JP 2008119818 A5 JP2008119818 A5 JP 2008119818A5 JP 2007131317 A JP2007131317 A JP 2007131317A JP 2007131317 A JP2007131317 A JP 2007131317A JP 2008119818 A5 JP2008119818 A5 JP 2008119818A5
- Authority
- JP
- Japan
- Prior art keywords
- movable electrode
- electrode
- forming
- movable
- wiring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 4
- 229910052710 silicon Inorganic materials 0.000 claims 4
- 239000010703 silicon Substances 0.000 claims 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 239000011733 molybdenum Substances 0.000 claims 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 2
- 229910052721 tungsten Inorganic materials 0.000 claims 2
- 239000010937 tungsten Substances 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 239000012535 impurity Substances 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007131317A JP2008119818A (ja) | 2006-10-20 | 2007-05-17 | Ｍｅｍｓデバイスおよびその製造方法 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006286035 | 2006-10-20 | ||
| JP2007131317A JP2008119818A (ja) | 2006-10-20 | 2007-05-17 | Ｍｅｍｓデバイスおよびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008119818A JP2008119818A (ja) | 2008-05-29 |
| JP2008119818A5 true JP2008119818A5 (enExample) | 2010-07-01 |
Family
ID=39505125
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007131317A Pending JP2008119818A (ja) | 2006-10-20 | 2007-05-17 | Ｍｅｍｓデバイスおよびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008119818A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8470628B2 (en) | 2011-06-20 | 2013-06-25 | International Business Machines Corporation | Methods to fabricate silicide micromechanical device |
| JP5784513B2 (ja) * | 2012-01-13 | 2015-09-24 | 株式会社東芝 | Ｍｅｍｓデバイスおよびその製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0778800A (ja) * | 1993-09-07 | 1995-03-20 | Fujitsu Ltd | 微細加工方法および加速度計とその製造方法 |
| JP3435850B2 (ja) * | 1994-10-28 | 2003-08-11 | 株式会社デンソー | 半導体力学量センサ及びその製造方法 |
| JP3307200B2 (ja) * | 1995-11-01 | 2002-07-24 | 株式会社村田製作所 | 角速度センサ |
| JPH1048246A (ja) * | 1996-08-08 | 1998-02-20 | Hitachi Ltd | 半導体加速度センサ |
| JPH11211483A (ja) * | 1998-01-30 | 1999-08-06 | Aisin Seiki Co Ltd | 表面マイクロマシンおよびその製造方法 |
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2007
- 2007-05-17 JP JP2007131317A patent/JP2008119818A/ja active Pending