JP2008079328A - 圧電薄膜共振子及びその製造方法 - Google Patents

圧電薄膜共振子及びその製造方法 Download PDF

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Publication number
JP2008079328A
JP2008079328A JP2007265981A JP2007265981A JP2008079328A JP 2008079328 A JP2008079328 A JP 2008079328A JP 2007265981 A JP2007265981 A JP 2007265981A JP 2007265981 A JP2007265981 A JP 2007265981A JP 2008079328 A JP2008079328 A JP 2008079328A
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JP
Japan
Prior art keywords
thin film
piezoelectric thin
lower electrode
ruthenium
electrode
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Pending
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JP2007265981A
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English (en)
Japanese (ja)
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JP2008079328A5 (https=
Inventor
Takeshi Yokoyama
剛 横山
Takeshi Sakashita
武 坂下
Tokihiro Nishihara
時弘 西原
Tsutomu Miyashita
勉 宮下
Yoshio Sato
良夫 佐藤
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Fujitsu Ltd
Fujitsu Media Devices Ltd
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Fujitsu Ltd
Fujitsu Media Devices Ltd
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Priority to JP2007265981A priority Critical patent/JP2008079328A/ja
Publication of JP2008079328A publication Critical patent/JP2008079328A/ja
Publication of JP2008079328A5 publication Critical patent/JP2008079328A5/ja
Pending legal-status Critical Current

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JP2007265981A 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法 Pending JP2008079328A (ja)

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JP2007265981A JP2008079328A (ja) 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法

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JP2007265981A JP2008079328A (ja) 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法

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JP2003303707A Division JP2005073175A (ja) 2003-08-27 2003-08-27 圧電薄膜共振子及びその製造方法

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JP2011066820A Division JP5204258B2 (ja) 2011-03-24 2011-03-24 圧電薄膜共振子の製造方法

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JP2008079328A true JP2008079328A (ja) 2008-04-03
JP2008079328A5 JP2008079328A5 (https=) 2009-07-09

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118951A (ja) * 2008-11-13 2010-05-27 Fujitsu Ltd 共振子、フィルタ、デュープレクサおよび電子装置

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0982666A (ja) * 1995-09-19 1997-03-28 Fujitsu Ltd 薄膜形成方法、半導体装置及びその製造方法
JPH1050667A (ja) * 1996-07-30 1998-02-20 Matsushita Electric Works Ltd 半導体装置の製造方法
WO1999066558A1 (en) * 1998-06-19 1999-12-23 Hitachi, Ltd. Semiconductor device and production method thereof
JP2000357931A (ja) * 1999-06-16 2000-12-26 Victor Co Of Japan Ltd 複合圧電基板振動子の製造方法
JP2001111136A (ja) * 1999-10-08 2001-04-20 Fujitsu Ltd 磁化方向制御膜及びこれを用いた磁気抵抗効果型センサ
JP2001168675A (ja) * 1999-12-08 2001-06-22 Mitsubishi Electric Corp 圧電共振子およびこれを用いた圧電発振器並びに圧電共振子の製造方法
JP2001251159A (ja) * 2000-03-08 2001-09-14 Mitsubishi Electric Corp 薄膜圧電素子及びその製造方法
JP2001250995A (ja) * 2000-03-07 2001-09-14 Mitsubishi Electric Corp 圧電体薄膜素子
JP2003022074A (ja) * 2001-04-23 2003-01-24 Agilent Technol Inc 薄膜バルク波音響共振器アレイの製造方法及び送受切換器
JP2003046160A (ja) * 2001-04-26 2003-02-14 Matsushita Electric Ind Co Ltd 圧電素子，アクチュエータ及びインクジェットヘッド
JP2003198319A (ja) * 2001-12-26 2003-07-11 Ube Electronics Ltd 窒化アルミニウム薄膜−金属電極積層体およびそれを用いた薄膜圧電共振子
JP2003204239A (ja) * 2001-10-26 2003-07-18 Fujitsu Ltd 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法
JP2005073175A (ja) * 2003-08-27 2005-03-17 Fujitsu Media Device Kk 圧電薄膜共振子及びその製造方法

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0982666A (ja) * 1995-09-19 1997-03-28 Fujitsu Ltd 薄膜形成方法、半導体装置及びその製造方法
JPH1050667A (ja) * 1996-07-30 1998-02-20 Matsushita Electric Works Ltd 半導体装置の製造方法
WO1999066558A1 (en) * 1998-06-19 1999-12-23 Hitachi, Ltd. Semiconductor device and production method thereof
JP2000357931A (ja) * 1999-06-16 2000-12-26 Victor Co Of Japan Ltd 複合圧電基板振動子の製造方法
JP2001111136A (ja) * 1999-10-08 2001-04-20 Fujitsu Ltd 磁化方向制御膜及びこれを用いた磁気抵抗効果型センサ
JP2001168675A (ja) * 1999-12-08 2001-06-22 Mitsubishi Electric Corp 圧電共振子およびこれを用いた圧電発振器並びに圧電共振子の製造方法
JP2001250995A (ja) * 2000-03-07 2001-09-14 Mitsubishi Electric Corp 圧電体薄膜素子
JP2001251159A (ja) * 2000-03-08 2001-09-14 Mitsubishi Electric Corp 薄膜圧電素子及びその製造方法
JP2003022074A (ja) * 2001-04-23 2003-01-24 Agilent Technol Inc 薄膜バルク波音響共振器アレイの製造方法及び送受切換器
JP2003046160A (ja) * 2001-04-26 2003-02-14 Matsushita Electric Ind Co Ltd 圧電素子，アクチュエータ及びインクジェットヘッド
JP2003204239A (ja) * 2001-10-26 2003-07-18 Fujitsu Ltd 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法
JP2003198319A (ja) * 2001-12-26 2003-07-11 Ube Electronics Ltd 窒化アルミニウム薄膜−金属電極積層体およびそれを用いた薄膜圧電共振子
JP2005073175A (ja) * 2003-08-27 2005-03-17 Fujitsu Media Device Kk 圧電薄膜共振子及びその製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010118951A (ja) * 2008-11-13 2010-05-27 Fujitsu Ltd 共振子、フィルタ、デュープレクサおよび電子装置

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