JP2008079328A5 - - Google Patents

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Publication number
JP2008079328A5
JP2008079328A5 JP2007265981A JP2007265981A JP2008079328A5 JP 2008079328 A5 JP2008079328 A5 JP 2008079328A5 JP 2007265981 A JP2007265981 A JP 2007265981A JP 2007265981 A JP2007265981 A JP 2007265981A JP 2008079328 A5 JP2008079328 A5 JP 2008079328A5
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JP
Japan
Prior art keywords
thin film
piezoelectric thin
layer
ruthenium
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007265981A
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English (en)
Japanese (ja)
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JP2008079328A (ja
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Publication date
Application filed filed Critical
Priority to JP2007265981A priority Critical patent/JP2008079328A/ja
Priority claimed from JP2007265981A external-priority patent/JP2008079328A/ja
Publication of JP2008079328A publication Critical patent/JP2008079328A/ja
Publication of JP2008079328A5 publication Critical patent/JP2008079328A5/ja
Pending legal-status Critical Current

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JP2007265981A 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法 Pending JP2008079328A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007265981A JP2008079328A (ja) 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007265981A JP2008079328A (ja) 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2003303707A Division JP2005073175A (ja) 2003-08-27 2003-08-27 圧電薄膜共振子及びその製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011066820A Division JP5204258B2 (ja) 2011-03-24 2011-03-24 圧電薄膜共振子の製造方法

Publications (2)

Publication Number Publication Date
JP2008079328A JP2008079328A (ja) 2008-04-03
JP2008079328A5 true JP2008079328A5 (https=) 2009-07-09

Family

ID=39350831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007265981A Pending JP2008079328A (ja) 2007-10-12 2007-10-12 圧電薄膜共振子及びその製造方法

Country Status (1)

Country Link
JP (1) JP2008079328A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5322597B2 (ja) * 2008-11-13 2013-10-23 太陽誘電株式会社 共振子、フィルタ、デュープレクサおよび電子装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3672115B2 (ja) * 1995-09-19 2005-07-13 富士通株式会社 薄膜形成方法及び半導体装置の製造方法
JP3489343B2 (ja) * 1996-07-30 2004-01-19 松下電工株式会社 半導体装置の製造方法
JP4053241B2 (ja) * 1998-06-19 2008-02-27 株式会社ルネサステクノロジ 半導体装置の製造方法
JP2000357931A (ja) * 1999-06-16 2000-12-26 Victor Co Of Japan Ltd 複合圧電基板振動子の製造方法
JP2001111136A (ja) * 1999-10-08 2001-04-20 Fujitsu Ltd 磁化方向制御膜及びこれを用いた磁気抵抗効果型センサ
JP2001168675A (ja) * 1999-12-08 2001-06-22 Mitsubishi Electric Corp 圧電共振子およびこれを用いた圧電発振器並びに圧電共振子の製造方法
JP2001250995A (ja) * 2000-03-07 2001-09-14 Mitsubishi Electric Corp 圧電体薄膜素子
JP2001251159A (ja) * 2000-03-08 2001-09-14 Mitsubishi Electric Corp 薄膜圧電素子及びその製造方法
US6472954B1 (en) * 2001-04-23 2002-10-29 Agilent Technologies, Inc. Controlled effective coupling coefficients for film bulk acoustic resonators
JP2003046160A (ja) * 2001-04-26 2003-02-14 Matsushita Electric Ind Co Ltd 圧電素子，アクチュエータ及びインクジェットヘッド
JP3953315B2 (ja) * 2001-12-26 2007-08-08 宇部興産株式会社 窒化アルミニウム薄膜−金属電極積層体およびそれを用いた薄膜圧電共振子
JP3954395B2 (ja) * 2001-10-26 2007-08-08 富士通株式会社 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法
JP2005073175A (ja) * 2003-08-27 2005-03-17 Fujitsu Media Device Kk 圧電薄膜共振子及びその製造方法

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