JP2007538393A5 - - Google Patents
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- Publication number
- JP2007538393A5 JP2007538393A5 JP2007517248A JP2007517248A JP2007538393A5 JP 2007538393 A5 JP2007538393 A5 JP 2007538393A5 JP 2007517248 A JP2007517248 A JP 2007517248A JP 2007517248 A JP2007517248 A JP 2007517248A JP 2007538393 A5 JP2007538393 A5 JP 2007538393A5
- Authority
- JP
- Japan
- Prior art keywords
- bubbler
- chambers
- compound
- carrier gas
- series
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US57268704P | 2004-05-20 | 2004-05-20 | |
| US60/572,687 | 2004-05-20 | ||
| PCT/EP2005/052247 WO2005113857A1 (en) | 2004-05-20 | 2005-05-17 | Bubbler for constant vapor delivery of a solid chemical |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013032199A Division JP5645985B2 (ja) | 2004-05-20 | 2013-02-21 | 固形化合物の蒸気を一定供給するためのバブラー |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2007538393A JP2007538393A (ja) | 2007-12-27 |
| JP2007538393A5 true JP2007538393A5 (https=) | 2008-07-03 |
| JP5383038B2 JP5383038B2 (ja) | 2014-01-08 |
Family
ID=34968166
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007517248A Expired - Lifetime JP5383038B2 (ja) | 2004-05-20 | 2005-05-17 | 固形化合物の蒸気を一定供給するためのバブラー |
| JP2013032199A Expired - Lifetime JP5645985B2 (ja) | 2004-05-20 | 2013-02-21 | 固形化合物の蒸気を一定供給するためのバブラー |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013032199A Expired - Lifetime JP5645985B2 (ja) | 2004-05-20 | 2013-02-21 | 固形化合物の蒸気を一定供給するためのバブラー |
Country Status (14)
| Country | Link |
|---|---|
| US (1) | US8170404B2 (https=) |
| EP (1) | EP1747302B1 (https=) |
| JP (2) | JP5383038B2 (https=) |
| CN (2) | CN1954094A (https=) |
| AU (1) | AU2005245634B2 (https=) |
| CA (1) | CA2566944C (https=) |
| HK (1) | HK1200196A1 (https=) |
| IL (1) | IL179354A (https=) |
| IN (1) | IN266811B (https=) |
| PL (1) | PL1747302T3 (https=) |
| RU (1) | RU2384652C2 (https=) |
| TW (1) | TWI402372B (https=) |
| UA (1) | UA86810C2 (https=) |
| WO (1) | WO2005113857A1 (https=) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7547363B2 (en) * | 2003-07-08 | 2009-06-16 | Tosoh Finechem Corporation | Solid organometallic compound-filled container and filling method thereof |
| US20060121192A1 (en) * | 2004-12-02 | 2006-06-08 | Jurcik Benjamin J | Liquid precursor refill system |
| GB2432371B (en) * | 2005-11-17 | 2011-06-15 | Epichem Ltd | Improved bubbler for the transportation of substances by a carrier gas |
| US20070254100A1 (en) * | 2006-04-26 | 2007-11-01 | Applied Materials, Inc. | MOCVD reactor without metalorganic-source temperature control |
| US20070254093A1 (en) * | 2006-04-26 | 2007-11-01 | Applied Materials, Inc. | MOCVD reactor with concentration-monitor feedback |
| US20090159003A1 (en) * | 2006-05-30 | 2009-06-25 | Ube Industries Ltd | Device for supplying organic metal compound |
| GB2444143B (en) * | 2006-11-27 | 2009-10-28 | Sumitomo Chemical Co | Apparatus of supplying organometallic compound |
| JP5262083B2 (ja) * | 2007-11-26 | 2013-08-14 | 宇部興産株式会社 | 固体有機金属化合物の供給装置 |
| US9034105B2 (en) | 2008-01-10 | 2015-05-19 | American Air Liquide, Inc. | Solid precursor sublimator |
| CN102597310B (zh) | 2009-11-02 | 2015-02-04 | 西格玛-奥吉奇有限责任公司 | 固态前体输送组件以及相关方法 |
| JP2013115208A (ja) * | 2011-11-28 | 2013-06-10 | Tokyo Electron Ltd | 気化原料供給装置、これを備える基板処理装置、及び気化原料供給方法 |
| DE102012021527A1 (de) | 2012-10-31 | 2014-04-30 | Dockweiler Ag | Vorrichtung zur Erzeugung eines Gasgemisches |
| US9018108B2 (en) | 2013-01-25 | 2015-04-28 | Applied Materials, Inc. | Low shrinkage dielectric films |
| US20150079283A1 (en) * | 2013-09-13 | 2015-03-19 | LGS Innovations LLC | Apparatus and method to deposit doped films |
| CN106796200B (zh) * | 2014-08-11 | 2019-10-25 | 威科仪器有限公司 | 用于声波气体浓度感测以及流量控制的增强型罩壳 |
| DE102015108430A1 (de) * | 2015-05-28 | 2016-12-01 | Dockweiler Ag | Vorrichtung zur Erzeugung eines Gases mit einer ringzylindrischen Reaktionskammer |
| CN105063570A (zh) * | 2015-08-31 | 2015-11-18 | 清远先导材料有限公司 | 一种提高三甲基铟利用率的方法 |
| US10876205B2 (en) | 2016-09-30 | 2020-12-29 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US11926894B2 (en) | 2016-09-30 | 2024-03-12 | Asm Ip Holding B.V. | Reactant vaporizer and related systems and methods |
| US12104252B2 (en) | 2018-03-14 | 2024-10-01 | Ceevee Tech, Llc | Method and apparatus for making a vapor of precise concentration by sublimation |
| US11168394B2 (en) | 2018-03-14 | 2021-11-09 | CeeVeeTech, LLC | Method and apparatus for making a vapor of precise concentration by sublimation |
| DE112019001953T5 (de) | 2018-04-13 | 2021-01-21 | Veeco Instruments Inc. | Vorrichtung zur chemischen gasphasenabscheidung mit mehrzonen-injektorblock |
| KR20200020608A (ko) | 2018-08-16 | 2020-02-26 | 에이에스엠 아이피 홀딩 비.브이. | 고체 소스 승화기 |
| US11624113B2 (en) | 2019-09-13 | 2023-04-11 | Asm Ip Holding B.V. | Heating zone separation for reactant evaporation system |
| CN118953888B (zh) * | 2024-10-17 | 2024-12-27 | 常熟市华懋化工设备有限公司 | 一种圆柱型mo源钢瓶 |
Family Cites Families (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB404005A (en) | 1932-06-30 | 1934-01-01 | Holmes W C & Co Ltd | New or improved process for bringing mutually immiscible liquids of different specific gravity into intimate contact |
| US4506815A (en) * | 1982-12-09 | 1985-03-26 | Thiokol Corporation | Bubbler cylinder and dip tube device |
| FR2569207B1 (fr) | 1984-08-14 | 1986-11-14 | Mellet Robert | Procede et dispositif d'obtention d'un courant gazeux contenant un compose a l'etat de vapeur, utilisable notamment pour introduire ce compose dans un reacteur d'epitaxie |
| JPS61183195A (ja) | 1985-02-07 | 1986-08-15 | Nec Corp | 液体原料容器 |
| JPS6211536A (ja) | 1985-07-09 | 1987-01-20 | Nec Corp | 有機金属バブラ−容器 |
| JPS6311598A (ja) | 1986-07-03 | 1988-01-19 | Toyo Sutoufuaa Chem:Kk | 有機金属気相成長用シリンダ− |
| JPS6425523A (en) | 1987-07-22 | 1989-01-27 | Matsushita Electric Industrial Co Ltd | Container of organic metal compound |
| JPS6464314A (en) * | 1987-09-04 | 1989-03-10 | Mitsubishi Electric Corp | Sublimator |
| JPH01168331A (ja) * | 1987-12-24 | 1989-07-03 | Mitsui Toatsu Chem Inc | 有機金属化合物の飽和方法 |
| DE3801147A1 (de) | 1988-01-16 | 1989-07-27 | Philips Patentverwaltung | Vorrichtung zum erzeugen eines mit dem dampf eines wenig fluechtigen stoffes angereicherten gasstroms |
| SU1513949A1 (ru) * | 1988-08-03 | 1995-03-10 | Дзержинский филиал Ленинградского научно-исследовательского и конструкторского института химического машиностроения | Устройство для химического осаждения покрытий из паровой фазы |
| JPH0269389A (ja) | 1988-08-31 | 1990-03-08 | Toyo Stauffer Chem Co | 有機金属気相成長法における固体有機金属化合物の飽和蒸気生成方法 |
| GB2223509B (en) | 1988-10-04 | 1992-08-05 | Stc Plc | Vapour phase processing |
| DE69027496T2 (de) | 1989-09-26 | 1996-10-31 | Canon Kk | Gasversorgungsvorrichtung und ihre Verwendung für eine Filmabscheidungsanlage |
| JPH03181123A (ja) | 1989-12-11 | 1991-08-07 | Ricoh Co Ltd | 気相成長法 |
| JP2943076B2 (ja) | 1990-06-07 | 1999-08-30 | アネルバ株式会社 | バブリング機構とこれを含む表面処理装置 |
| JPH0499312A (ja) * | 1990-08-17 | 1992-03-31 | Mitsubishi Electric Corp | 有機金属気相成長装置 |
| JPH04187232A (ja) * | 1990-11-17 | 1992-07-03 | Fujikura Ltd | 原料供給装置 |
| SU1763521A1 (ru) * | 1990-11-19 | 1992-09-23 | Институт Полупроводников Ан Усср | Испаритель дл хелатных металлоорганических соединений |
| GB9116381D0 (en) | 1991-07-30 | 1991-09-11 | Shell Int Research | Method for deposition of a metal |
| JPH05251348A (ja) | 1992-03-05 | 1993-09-28 | Mitsubishi Electric Corp | バブラおよびガス供給装置 |
| GB9206552D0 (en) | 1992-03-26 | 1992-05-06 | Epichem Ltd | Bubblers |
| JPH06151311A (ja) * | 1992-10-30 | 1994-05-31 | Tosoh Akzo Corp | 有機金属気相成長法における固体有機金属化合物供給装置 |
| JPH06196415A (ja) | 1992-12-25 | 1994-07-15 | Kawasaki Steel Corp | 気相成長用ガス供給方法及びその装置 |
| US5502227A (en) | 1993-07-27 | 1996-03-26 | Cvd, Incorporated | Liquid indium source |
| KR960010901A (ko) | 1994-09-30 | 1996-04-20 | 김광호 | 고체 유기화합물 전용 버블러 장치 |
| US5553395A (en) | 1995-05-31 | 1996-09-10 | Hughes Aircraft Company | Bubbler for solid metal organic source material and method of producing saturated carrying gas |
| TW322602B (https=) | 1996-04-05 | 1997-12-11 | Ehara Seisakusho Kk | |
| US6180190B1 (en) | 1997-12-01 | 2001-01-30 | President And Fellows Of Harvard College | Vapor source for chemical vapor deposition |
| JP3998309B2 (ja) * | 1997-12-26 | 2007-10-24 | Ｄｏｗａホールディングス株式会社 | Ｃｖｄ法における有機アルカリ土類金属錯体の気化方法 |
| US6444038B1 (en) | 1999-12-27 | 2002-09-03 | Morton International, Inc. | Dual fritted bubbler |
| DE10005820C1 (de) * | 2000-02-10 | 2001-08-02 | Schott Glas | Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks |
| AU2001245816A1 (en) | 2000-05-25 | 2001-12-11 | Corning Incorporated | Method of making a titania-doped fused silica preform |
| DE60106675T2 (de) | 2000-05-31 | 2005-12-01 | Shipley Co., L.L.C., Marlborough | Verdampfer |
| AU2002306436A1 (en) * | 2001-02-12 | 2002-10-15 | Asm America, Inc. | Improved process for deposition of semiconductor films |
| JP3909022B2 (ja) | 2002-02-08 | 2007-04-25 | 東ソー・ファインケム株式会社 | 固体有機金属化合物用充填容器 |
| US7031600B2 (en) * | 2003-04-07 | 2006-04-18 | Applied Materials, Inc. | Method and apparatus for silicon oxide deposition on large area substrates |
| US6909839B2 (en) * | 2003-07-23 | 2005-06-21 | Advanced Technology Materials, Inc. | Delivery systems for efficient vaporization of precursor source material |
| US7258892B2 (en) * | 2003-12-10 | 2007-08-21 | Micron Technology, Inc. | Methods and systems for controlling temperature during microfeature workpiece processing, e.g., CVD deposition |
-
2005
- 2005-05-17 WO PCT/EP2005/052247 patent/WO2005113857A1/en not_active Ceased
- 2005-05-17 CN CNA2005800159337A patent/CN1954094A/zh active Pending
- 2005-05-17 EP EP05749586A patent/EP1747302B1/en not_active Expired - Lifetime
- 2005-05-17 CA CA2566944A patent/CA2566944C/en not_active Expired - Fee Related
- 2005-05-17 US US11/579,889 patent/US8170404B2/en active Active
- 2005-05-17 IN IN3807KON2006 patent/IN266811B/en unknown
- 2005-05-17 AU AU2005245634A patent/AU2005245634B2/en not_active Ceased
- 2005-05-17 UA UAA200613504A patent/UA86810C2/ru unknown
- 2005-05-17 CN CN201410384907.2A patent/CN104152870A/zh active Pending
- 2005-05-17 JP JP2007517248A patent/JP5383038B2/ja not_active Expired - Lifetime
- 2005-05-17 PL PL05749586T patent/PL1747302T3/pl unknown
- 2005-05-17 RU RU2006145280/02A patent/RU2384652C2/ru active
- 2005-05-20 TW TW094116492A patent/TWI402372B/zh not_active IP Right Cessation
-
2006
- 2006-11-16 IL IL179354A patent/IL179354A/en active IP Right Grant
-
2013
- 2013-02-21 JP JP2013032199A patent/JP5645985B2/ja not_active Expired - Lifetime
-
2015
- 2015-01-21 HK HK15100671.9A patent/HK1200196A1/xx unknown
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