CN1954094A - 用于固体化学制品持续蒸汽发送的起泡器 - Google Patents

用于固体化学制品持续蒸汽发送的起泡器 Download PDF

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Publication number
CN1954094A
CN1954094A CNA2005800159337A CN200580015933A CN1954094A CN 1954094 A CN1954094 A CN 1954094A CN A2005800159337 A CNA2005800159337 A CN A2005800159337A CN 200580015933 A CN200580015933 A CN 200580015933A CN 1954094 A CN1954094 A CN 1954094A
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CN
China
Prior art keywords
chamber
bubbler
chambers
carrier gas
compound
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CNA2005800159337A
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English (en)
Chinese (zh)
Inventor
N·H·特兰
D·L·迪文波特
T·科
N·埃尔－赛因
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akzo Nobel Co ltd
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Akzo Nobel Co ltd
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Filing date
Publication date
Application filed by Akzo Nobel Co ltd filed Critical Akzo Nobel Co ltd
Publication of CN1954094A publication Critical patent/CN1954094A/zh
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
CNA2005800159337A 2004-05-20 2005-05-17 用于固体化学制品持续蒸汽发送的起泡器 Pending CN1954094A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57268704P 2004-05-20 2004-05-20
US60/572,687 2004-05-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201410384907.2A Division CN104152870A (zh) 2004-05-20 2005-05-17 用于固体化学制品持续蒸汽发送的起泡器

Publications (1)

Publication Number Publication Date
CN1954094A true CN1954094A (zh) 2007-04-25

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CNA2005800159337A Pending CN1954094A (zh) 2004-05-20 2005-05-17 用于固体化学制品持续蒸汽发送的起泡器
CN201410384907.2A Pending CN104152870A (zh) 2004-05-20 2005-05-17 用于固体化学制品持续蒸汽发送的起泡器

Family Applications After (1)

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CN201410384907.2A Pending CN104152870A (zh) 2004-05-20 2005-05-17 用于固体化学制品持续蒸汽发送的起泡器

Country Status (14)

Country Link
US (1) US8170404B2 (https=)
EP (1) EP1747302B1 (https=)
JP (2) JP5383038B2 (https=)
CN (2) CN1954094A (https=)
AU (1) AU2005245634B2 (https=)
CA (1) CA2566944C (https=)
HK (1) HK1200196A1 (https=)
IL (1) IL179354A (https=)
IN (1) IN266811B (https=)
PL (1) PL1747302T3 (https=)
RU (1) RU2384652C2 (https=)
TW (1) TWI402372B (https=)
UA (1) UA86810C2 (https=)
WO (1) WO2005113857A1 (https=)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103137525A (zh) * 2011-11-28 2013-06-05 东京毅力科创株式会社 气化原料供给装置、基板处理装置及气化原料供给方法
CN105063570A (zh) * 2015-08-31 2015-11-18 清远先导材料有限公司 一种提高三甲基铟利用率的方法
TWI676027B (zh) * 2014-08-11 2019-11-01 美商維克儀器公司 用以聲學確定測試媒介的特性之裝置、保持聲波感測器於實質均一溫度的方法、質量傳輸率控制配置及於處理氣體混和物中控制質流傳輸率的方法
CN118953888A (zh) * 2024-10-17 2024-11-15 常熟市华懋化工设备有限公司 一种圆柱型mo源钢瓶

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US9018108B2 (en) 2013-01-25 2015-04-28 Applied Materials, Inc. Low shrinkage dielectric films
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US10876205B2 (en) 2016-09-30 2020-12-29 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US11926894B2 (en) 2016-09-30 2024-03-12 Asm Ip Holding B.V. Reactant vaporizer and related systems and methods
US12104252B2 (en) 2018-03-14 2024-10-01 Ceevee Tech, Llc Method and apparatus for making a vapor of precise concentration by sublimation
US11168394B2 (en) 2018-03-14 2021-11-09 CeeVeeTech, LLC Method and apparatus for making a vapor of precise concentration by sublimation
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US11624113B2 (en) 2019-09-13 2023-04-11 Asm Ip Holding B.V. Heating zone separation for reactant evaporation system

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103137525A (zh) * 2011-11-28 2013-06-05 东京毅力科创株式会社 气化原料供给装置、基板处理装置及气化原料供给方法
TWI676027B (zh) * 2014-08-11 2019-11-01 美商維克儀器公司 用以聲學確定測試媒介的特性之裝置、保持聲波感測器於實質均一溫度的方法、質量傳輸率控制配置及於處理氣體混和物中控制質流傳輸率的方法
CN105063570A (zh) * 2015-08-31 2015-11-18 清远先导材料有限公司 一种提高三甲基铟利用率的方法
CN118953888A (zh) * 2024-10-17 2024-11-15 常熟市华懋化工设备有限公司 一种圆柱型mo源钢瓶

Also Published As

Publication number Publication date
JP2007538393A (ja) 2007-12-27
HK1200196A1 (en) 2015-07-31
AU2005245634A1 (en) 2005-12-01
TW200604373A (en) 2006-02-01
CA2566944C (en) 2016-10-11
US20070221127A1 (en) 2007-09-27
TWI402372B (zh) 2013-07-21
EP1747302B1 (en) 2012-12-26
RU2006145280A (ru) 2008-07-10
CA2566944A1 (en) 2005-12-01
JP5645985B2 (ja) 2014-12-24
WO2005113857A1 (en) 2005-12-01
RU2384652C2 (ru) 2010-03-20
IN266811B (https=) 2015-06-03
IL179354A0 (en) 2007-03-08
JP2013138238A (ja) 2013-07-11
JP5383038B2 (ja) 2014-01-08
IL179354A (en) 2013-03-24
EP1747302A1 (en) 2007-01-31
PL1747302T3 (pl) 2013-05-31
US8170404B2 (en) 2012-05-01
CN104152870A (zh) 2014-11-19
UA86810C2 (ru) 2009-05-25
AU2005245634B2 (en) 2010-07-01

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