JP2007517358A5 - - Google Patents

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Publication number
JP2007517358A5
JP2007517358A5 JP2006533770A JP2006533770A JP2007517358A5 JP 2007517358 A5 JP2007517358 A5 JP 2007517358A5 JP 2006533770 A JP2006533770 A JP 2006533770A JP 2006533770 A JP2006533770 A JP 2006533770A JP 2007517358 A5 JP2007517358 A5 JP 2007517358A5
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JP
Japan
Prior art keywords
coil
ion beam
magnetic
pair
deflection module
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JP2006533770A
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English (en)
Japanese (ja)
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JP4650748B2 (ja
JP2007517358A (ja
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Priority claimed from US10/461,702 external-priority patent/US6881966B2/en
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Publication of JP2007517358A publication Critical patent/JP2007517358A/ja
Publication of JP2007517358A5 publication Critical patent/JP2007517358A5/ja
Application granted granted Critical
Publication of JP4650748B2 publication Critical patent/JP4650748B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2006533770A 2003-06-13 2004-06-14 イオン注入システムのための磁気偏向器およびイオン注入システム Expired - Lifetime JP4650748B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/461,702 US6881966B2 (en) 2003-05-15 2003-06-13 Hybrid magnetic/electrostatic deflector for ion implantation systems
PCT/US2004/018788 WO2004114354A2 (en) 2003-06-13 2004-06-14 A hybrid magnetic/electrostatic deflector for ion implantation systems

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009046436A Division JP4645965B2 (ja) 2003-06-13 2009-02-27 イオン注入システムのための磁気／静電式ハイブリッド偏向器およびイオンビームの偏向方法

Publications (3)

Publication Number Publication Date
JP2007517358A JP2007517358A (ja) 2007-06-28
JP2007517358A5 true JP2007517358A5 (enExample) 2007-11-29
JP4650748B2 JP4650748B2 (ja) 2011-03-16

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ID=33538973

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Application Number Title Priority Date Filing Date
JP2006533770A Expired - Lifetime JP4650748B2 (ja) 2003-06-13 2004-06-14 イオン注入システムのための磁気偏向器およびイオン注入システム
JP2009046436A Expired - Lifetime JP4645965B2 (ja) 2003-06-13 2009-02-27 イオン注入システムのための磁気／静電式ハイブリッド偏向器およびイオンビームの偏向方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2009046436A Expired - Lifetime JP4645965B2 (ja) 2003-06-13 2009-02-27 イオン注入システムのための磁気／静電式ハイブリッド偏向器およびイオンビームの偏向方法

Country Status (7)

Country Link
US (1) US6881966B2 (enExample)
EP (1) EP1634316B1 (enExample)
JP (2) JP4650748B2 (enExample)
KR (1) KR101157676B1 (enExample)
CN (2) CN101777481B (enExample)
TW (1) TWI314337B (enExample)
WO (1) WO2004114354A2 (enExample)

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CN105895486A (zh) * 2014-12-18 2016-08-24 北京中科信电子装备有限公司 一种带电粒子束流偏转磁场结构及应用该结构的离子注入机
CN106653533B (zh) * 2015-11-04 2018-08-14 北京中科信电子装备有限公司 一种带电粒子束流磁场聚焦结构及应用该结构的离子注入机
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TWI795448B (zh) 2017-10-09 2023-03-11 美商艾克塞利斯科技公司 用於在角能量過濾器區域中穩定或移除射束線組件上所形成之膜的離子植入系統及方法
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