JP2007515070A - 超接合デバイスの製造方法 - Google Patents
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Abstract
【選択図】 なし
Description
本発明は、また、そのような部分的に製造された半導体デバイスの形成方法と、この方法から形成される半導体からなる。
Claims (18)
- 部分的に製造された半導体デバイスであって、
半導体基板は相互に対向する第1主表面と第2主表面とを有し、
上記の半導体基板は、その第2主表面に第1導電率形の強くドープされた領域を有するとともに、その第1主表面に上記第1導電率形の軽くドープされた領域とを有し、
上記の第1主表面上に第1酸化物層が形成され、この酸化物で被覆された基板上にマスクが置かれ、複数個の第1溝と、少なくとも1つの第2溝とが、マスクの開口部を介して、酸化物層を通って半導体基板内にエッチングにより形成されて、台地(メサ)を形成し、各第1溝9は、強くドープされた領域に向け第1主表面から第1深さ位置まで伸びる第1延長部分を有し、少なくとも1つの第2溝は、強くドープされた領域に向け、第1表面から第2深さ位置まで伸びる第2延長部分を有し、各台地は側壁面を備え、複数個の第1溝の各々と少なくとも1つの第2溝とは、隣接する溝から台地の1つにより離されており、少なくとも1つの第2溝は、複数個の第1溝の各々より深くて、広く、
第2酸化物層が、台地の領域と複数個の第1溝との上に形成されており、この第2酸化物層は、各台地の頂部を覆い、複数個の第1溝各々の頂部と、台地と複数個の第1溝とを含む領域の縁部の少なくとも1つの第2溝をシールし、
フォトレジスト、窒化物、金属およびポリシリコンを含むグループから選ばれたマスク材料の層が、少なくとも台地の領域と複数個の第1溝とを含む作動領域に隣接する縁部端子領域の所定領域上と、台地と複数個の第1溝とを含む作動領域の地域の縁部の少なくとも1つの第2溝上の1部分に沈着せられ、縁部端子領域は少なくとも1つの第2溝の1部分を含み、作動領域はその上に半導体デバイスが形成される領域であって、端子領域とは、半導体デバイスのセル同士間を遮断する領域であり、
マスク層で被覆されない台地の領域と複数個の第1溝オキシダント・シールは、少なくとも1つの第2溝を含む複数個の第1溝上で除去され、
マスク材料を含む庇領域が、マスク材料により被覆されない酸化物層の領域を除去する湿式エッチング法により形成され、この庇領域が上記の少なくとも1つの第2溝上に部分的に伸び、
イオン注入領域は、作動領域の各溝の側壁を含み、上記の複数個の第1溝の各々の第1深さ方向および少なくとも1つの第2溝の1部の第2深さ方向に沿ってP−N接合を形成するもの。 - 請求項1に記載の部分的に製造された半導体デバイスであって、各台地の側壁面が、第1主表面に対し所定傾斜角度を維持するもの。
- 請求項1に記載の部分的に製造された半導体デバイスであって、更に、上記の作動領域に位置する複数個の第1溝と、上記の縁部端子領域に少なくとも部分的に位置する少なくとも1つの第2溝とに充填される遮断材料と、
平坦化された頂面とを備えるもの。 - 相互に対向する第1主表面と第2主表面とを有する半導体基板からなる半導体デバイスであって、
上記の半導体基板は、その第2主表面に、第1導電率形の強くドープされた領域と、その第1主表面に上記第1導電率形が軽くドープされた領域とを有し、
上記の第1主表面上に第1酸化物層が形成され、この酸化物で被覆された基板上にマスクが置かれ、複数個の第1溝と、少なくとも1つの第2溝とが、マスクの開口部を介して、酸化物層を通って半導体基板内にエッチングにより形成されて、台地を形成し、各第1溝9は、強くドープされた領域に向け第1主表面から第1深さ位置まで伸びる第1延長部分を有し、少なくとも1つの第2溝は、強くドープされた領域に向け、第1表面から第2深さ位置まで伸びる第2延長部分を有し、各台地は側壁面を備え、複数個の第1溝の各々と少なくとも1つの第2溝とは、隣接する溝から台地の1つにより離されており、少なくとも1つの第2溝は、複数個の第1溝の各々より深くて、広く、
第2酸化物層が、台地の領域と複数個の第1溝との上に形成されており、この第2酸化物層は、各台地の頂部を覆うと共に、複数個の第1溝各々と、台地と複数個の第1溝を含む領域の縁部の少なくとも1つの第2溝とをシールし、
フォトレジスト、窒化物、金属およびポリシリコンを含むグループから選ばれたマスク材料の層が、少なくとも台地の領域と複数個の第1溝とを含む作動領域に隣接する縁部端子領域の所定領域上と、台地と複数個の第1溝とを含む作動領域の地域の縁部の少なくとも1つの第2溝上の1部分に沈着せられ、縁部端子領域は少なくとも1つの第2溝の1部分を含み、
マスク層で被覆されない台地の領域と複数個の第1溝のオキシダント・シールは、少なくとも1つの第2溝を含む複数個の第1溝上で除去され、
マスク材料をふくむ庇領域が、マスク材料により被覆されない酸化物層の領域を除去する湿式エッチング法により形成され、この庇領域が上記の少なくとも1つの第2溝上に部分的に伸び、
作動領域における各溝の側壁を含み、複数個の第1溝の各々の第1深さ方向と、少なくとも1つの第2溝の1部の第2深さ方向に沿うP−N接合を形成するイオン注入領域と、
上記の作動領域に位置する複数個の第1溝と、上記の縁部端子領域に位置する少なくとも1つの第2溝とに充填される遮断材料と、
平坦化された頂面と、
デバイスの上に形成される超接合デバイスとを備え、作動領域とは、その上にこの超接合デバイスが形成される領域であって、端子領域とは、超接合デバイスのセル同士間を遮断するもの。 - 半導体デバイスの製造方法であって、
相互に対向する第1主表面と第2主表面とを有する半導体基板を設け、この半導体基板は、その第2主表面に、第1導電率形の強くドープされた領域と、その第1主表面に上記第1導電率形の軽くドープされた領域とを有し、
第1導電率形の軽くドープされた領域の露出面を酸化し、
複数個の第1溝と、少なくとも1つの第2溝と、台地とを半導体基板内に設け、各第1溝は、強くドープされた領域に向け第1主表面から第1深さ位置まで伸びる第1延長部分を有し、少なくとも1つの第2溝は、強くドープされた領域に向け、第1表面から第2深さ位置まで伸びる第2延長部分を有し、各台地は側壁面を備え、複数個の第1溝の各々と少なくとも1つの第2溝とは、隣接する溝から台地の1つにより離されており、少なくとも1つの第2溝は、複数個の第1溝の各々より深くて、広く、少なくとも1つの第2溝は、作動領域と端子領域との間の境界に位置し、作動領域とは、その上に半導体デバイスが形成される領域であって、端子領域とは、作動デバイスのセル同士間を遮断するものであり、
化学蒸着法(CVD)工程を行って、複数個の第1溝の各々の頂部と、少なくとも1つの第2溝の頂部とをシールし、複数個の第1溝の各々と、少なくとも1つの第2溝とに空洞を生じさせて、各台地の頂部を被覆し、
フォトレジスト、窒化物、金属およびポリシリコンを含むグループから選ばれた材料の層を、縁部端子領域上と、作動領域と縁部端子領域との境界の第2溝上の1部分とに沈着させ、
乾式酸化物エッチング工程を行い、複数個の第1溝と少なくとも1つの第2溝上とのシールを除去し、
湿式酸化物エッチング工程を行い、CVD工程後、複数個の第1溝と少なくとも1つの第2溝内に残存している酸化物および、最初の酸化で残存している台地上の酸化物を除去し、フォトレジスト、窒化物、金属ないしポリシリコン材料の庇部分を、作動領域と端子領域との間の境界の少なくとも1つの第2溝上に形成し、
複数個の第1溝の隣接対のもの同士間の半導体基板の少なくとも1つの台地に、1つの溝の側壁面で、第1導電率形のドーパントを打込み、上記の1つの溝の側壁面に、強くドープされた領域よりも低いドープ濃度を有する第1導電率形の第1ドープ領域を形成し、上記庇部分は、作動領域と端子領域との間の境界の少なくとも1つの第2溝の底部にドーパントが打込まれることを阻止し、
第1導電率形のドーパントを打込んだ側壁に対向する側壁面で、少なくとも1つの台地に第2導電率形のドーパントを打込んで、第1導電率形のドーパントを打込んだ側壁に対向する側壁面に第2導電率形の第2ドープ領域を設け、
上記複数個の第1溝に遮断材料を再充填し、
デバイスの表面を平坦化すること。 - 請求項5に記載した半導体デバイスの製造方法であって、
更に、生じた構造体に超接合デバイスを形成することからなるもの。 - 請求項5に記載した半導体デバイスの製造方法であって、
更に、第2ドープ領域と電気的に接続する、第2導電率形の第3ド−プ領域を、第1および第2ドープ領域の第1主表面に設け、
第1導電率形の第4ドープ領域を、この領域が、第3ドープ領域を介在させて、第1ドープ領域に対向するよう、上記の1つの溝の第1主表面あるいは側壁面に設け、
第3ドープ領域の上方、第1ドープ領域と第4ドープ領域との間に、ゲート遮断層を介在させてゲート電極層を設けることからなるもの。 - 請求項7に記載した半導体デバイスの製造方法であって、ゲート電極層を少なくとも1つの溝に形成することからなるもの。
- 請求項7に記載した半導体デバイスの製造方法であって、ゲート電極層を第1主表面上に形成することからなるもの。
- 請求項5に記載した半導体デバイスの製造方法であって、
更に第2ドープ領域に電気的に接続する第2導電率形の第3ドープ領域を第1および第2ド−プ領域の第主表面に設けることからなるもの。 - 請求項5に記載した半導体デバイスの製造方法であって、
更に、電極層を第1ドープ領域にショトキー接触させることからなるもの。 - 請求項3に記載した半導体デバイスの製造方法において、
半導体デバイスの頂面における第1および第2導電率形の領域の各ドーパントの横寸法が、隣接対の溝の両側壁面から第1および第2ドープ領域のP−N接合までの距離より大きいもの。 - 請求項4に記載の半導体デバイスにおいて、各台地の側壁面が第1主表面に対し、所定の傾斜角度を維持するもの。
- 請求項5に記載した半導体デバイスの製造方法において、各台地の側壁面が第1主表面に対し、所定の傾斜角度を維持するもの。
- 請求項5に記載した半導体デバイスの製造方法であって、上記のシールが、複数個の第1溝および少なくとも1つの第2溝に如何なる物質も沈着させないもの。
- 請求項5に記載した半導体デバイスの製造方法であって、第1導電率形のドーパントが第1所定打込み角度で打込まれるもの。
- 請求項5に記載した半導体デバイスの製造方法であって、第2導電率形のドーパントが第2所定打込み角度で打込まれるもの
- 請求項第5項の方法により形成される半導体デバイス。
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US7410891B2 (en) | 2008-08-12 |
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