JP2007514185A5 - - Google Patents

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Publication number
JP2007514185A5
JP2007514185A5 JP2006539748A JP2006539748A JP2007514185A5 JP 2007514185 A5 JP2007514185 A5 JP 2007514185A5 JP 2006539748 A JP2006539748 A JP 2006539748A JP 2006539748 A JP2006539748 A JP 2006539748A JP 2007514185 A5 JP2007514185 A5 JP 2007514185A5
Authority
JP
Japan
Prior art keywords
pattern
substrate
printing
predetermined
providing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006539748A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007514185A (ja
Filing date
Publication date
Priority claimed from US10/706,200 external-priority patent/US6870168B1/en
Application filed filed Critical
Publication of JP2007514185A publication Critical patent/JP2007514185A/ja
Publication of JP2007514185A5 publication Critical patent/JP2007514185A5/ja
Pending legal-status Critical Current

Links

JP2006539748A 2003-11-12 2004-11-09 レジスト内でのパーツのサイズ変動 Pending JP2007514185A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/706,200 US6870168B1 (en) 2003-11-12 2003-11-12 Varying feature size in resist across the chip without the artifact of “grid-snapping” from the mask writing tool
PCT/US2004/037354 WO2005047976A2 (en) 2003-11-12 2004-11-09 Varying feature size in resist

Publications (2)

Publication Number Publication Date
JP2007514185A JP2007514185A (ja) 2007-05-31
JP2007514185A5 true JP2007514185A5 (enExample) 2007-11-29

Family

ID=34274830

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006539748A Pending JP2007514185A (ja) 2003-11-12 2004-11-09 レジスト内でのパーツのサイズ変動

Country Status (5)

Country Link
US (1) US6870168B1 (enExample)
EP (1) EP1682941B1 (enExample)
JP (1) JP2007514185A (enExample)
DE (1) DE602004014013D1 (enExample)
WO (1) WO2005047976A2 (enExample)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4538105A (en) * 1981-12-07 1985-08-27 The Perkin-Elmer Corporation Overlay test wafer
JPS61102738A (ja) * 1984-10-26 1986-05-21 Fujitsu Ltd レジスト膜パタ−ンの形成方法
JPH01258419A (ja) * 1988-04-08 1989-10-16 Hitachi Ltd パターン形成方法
US5103101A (en) 1991-03-04 1992-04-07 Etec Systems, Inc. Multiphase printing for E-beam lithography
US5773836A (en) 1996-10-28 1998-06-30 International Business Machines Corporation Method for correcting placement errors in a lithography system
US5905020A (en) 1996-12-20 1999-05-18 Intel Corporation Method and apparatus for reducing the critical dimension difference of features printed on a substrate
JP2000114156A (ja) * 1998-10-09 2000-04-21 Toshiba Corp 露光装置および露光方法
JP2000133563A (ja) * 1998-10-22 2000-05-12 Nikon Corp 露光方法及び露光装置
US6278123B1 (en) 1999-04-07 2001-08-21 Intel Corporation Reducing the critical dimension difference of features printed on a substrate
JP3635979B2 (ja) * 1999-04-09 2005-04-06 セイコーエプソン株式会社 照明光学系および投写型表示装置
US6335151B1 (en) * 1999-06-18 2002-01-01 International Business Machines Corporation Micro-surface fabrication process
US6331711B1 (en) 1999-08-06 2001-12-18 Etec Systems, Inc. Correction for systematic, low spatial frequency critical dimension variations in lithography
US6322934B1 (en) * 1999-09-30 2001-11-27 Lucent Technologies Inc. Method for making integrated circuits including features with a relatively small critical dimension
US7084905B1 (en) * 2000-02-23 2006-08-01 The Trustees Of Columbia University In The City Of New York Method and apparatus for obtaining high dynamic range images
US20020045105A1 (en) * 2000-07-05 2002-04-18 Brown David R. High quality lithographic processing
US6813046B1 (en) * 2000-11-07 2004-11-02 Eastman Kodak Company Method and apparatus for exposure control for a sparsely sampled extended dynamic range image sensing device
TWI237849B (en) * 2001-11-19 2005-08-11 Nanya Technology Corp Method of utilizing multi-exposure to form isolated lines

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