JP2007507618A5 - - Google Patents

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Publication number
JP2007507618A5
JP2007507618A5 JP2006534325A JP2006534325A JP2007507618A5 JP 2007507618 A5 JP2007507618 A5 JP 2007507618A5 JP 2006534325 A JP2006534325 A JP 2006534325A JP 2006534325 A JP2006534325 A JP 2006534325A JP 2007507618 A5 JP2007507618 A5 JP 2007507618A5
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JP
Japan
Prior art keywords
titanium
target
coating station
substrate
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006534325A
Other languages
English (en)
Japanese (ja)
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JP2007507618A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2004/033045 external-priority patent/WO2005035822A1/en
Publication of JP2007507618A publication Critical patent/JP2007507618A/ja
Publication of JP2007507618A5 publication Critical patent/JP2007507618A5/ja
Pending legal-status Critical Current

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JP2006534325A 2003-10-07 2004-10-07 ルチル型二酸化チタンを高速で堆積させるための装置及び方法 Pending JP2007507618A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US50887703P 2003-10-07 2003-10-07
US50887103P 2003-10-07 2003-10-07
US51200203P 2003-10-17 2003-10-17
PCT/US2004/033045 WO2005035822A1 (en) 2003-10-07 2004-10-07 Apparatus and process for high rate deposition of rutile titanium dioxide

Publications (2)

Publication Number Publication Date
JP2007507618A JP2007507618A (ja) 2007-03-29
JP2007507618A5 true JP2007507618A5 (https=) 2007-11-15

Family

ID=34437665

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006534325A Pending JP2007507618A (ja) 2003-10-07 2004-10-07 ルチル型二酸化チタンを高速で堆積させるための装置及び方法

Country Status (5)

Country Link
US (1) US20050092599A1 (https=)
EP (1) EP1680527B1 (https=)
JP (1) JP2007507618A (https=)
AT (1) ATE550456T1 (https=)
WO (1) WO2005035822A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8133361B2 (en) * 2007-06-05 2012-03-13 Deposition Sciences, Inc. Thin film coating system and method
EP2188411B1 (en) * 2007-08-30 2011-10-26 Koninklijke Philips Electronics N.V. Sputtering system
CN101809185B (zh) * 2007-10-26 2013-05-08 沉积科学公司 薄膜涂覆系统和方法
WO2010044922A1 (en) * 2008-06-12 2010-04-22 Anguel Nikolov Thin film and optical interference filter incorporating high-index titanium dioxide and method for making them
WO2011119727A1 (en) * 2010-03-23 2011-09-29 Deposition Sciences, Inc. Antireflection coating for multi-junction solar cells
JP6681683B2 (ja) * 2015-08-27 2020-04-15 日本電気硝子株式会社 光学膜及びその製造方法

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US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
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EP0641842B1 (de) * 1993-09-02 1998-05-06 MERCK PATENT GmbH Oberflächenmodifizierte Pigmente und deren Verwendung zur Vergilbungsinhibierung von pigmentierten Kunststoffen
DE69428253T2 (de) * 1993-11-12 2002-06-27 Ppg Industries Ohio, Inc. Haltbare Sputterschicht aus Metalloxid
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WO1996006203A1 (en) * 1994-08-19 1996-02-29 Optical Coating Laboratory, Inc. Electrochromic materials and devices, and method
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KR100190558B1 (ko) * 1995-03-04 1999-10-15 구본준 강유전체 및 이를 채용한 반도체장치의 커패시터
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US5849162A (en) * 1995-04-25 1998-12-15 Deposition Sciences, Inc. Sputtering device and method for reactive for reactive sputtering
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GB9600210D0 (en) * 1996-01-05 1996-03-06 Vanderstraeten E Bvba Improved sputtering targets and method for the preparation thereof
US6340544B1 (en) * 1996-09-19 2002-01-22 Fuji Xerox Co., Ltd. Process for recording image using photoelectrodeposition method and process for producing color filter using the same
DE19644752A1 (de) * 1996-10-28 1998-04-30 Leybold Systems Gmbh Interferenzschichtensystem
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US6103320A (en) * 1998-03-05 2000-08-15 Shincron Co., Ltd. Method for forming a thin film of a metal compound by vacuum deposition
JP3735461B2 (ja) * 1998-03-27 2006-01-18 株式会社シンクロン 複合金属の化合物薄膜形成方法及びその薄膜形成装置
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JP2001240960A (ja) * 1999-12-21 2001-09-04 Nippon Sheet Glass Co Ltd 光触媒膜が被覆された物品、その物品の製造方法及びその膜を被覆するために用いるスパッタリングターゲット
JP3774353B2 (ja) * 2000-02-25 2006-05-10 株式会社シンクロン 金属化合物薄膜の形成方法およびその形成装置
JP3584854B2 (ja) * 2000-05-22 2004-11-04 日本板硝子株式会社 光沢性塗被紙およびその製造方法
US6677063B2 (en) * 2000-08-31 2004-01-13 Ppg Industries Ohio, Inc. Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
JP3997731B2 (ja) * 2001-03-19 2007-10-24 富士ゼロックス株式会社 基材上に結晶性半導体薄膜を形成する方法
JP4857496B2 (ja) * 2001-08-01 2012-01-18 大日本印刷株式会社 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置

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