JP2007507618A - ルチル型二酸化チタンを高速で堆積させるための装置及び方法 - Google Patents

ルチル型二酸化チタンを高速で堆積させるための装置及び方法 Download PDF

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Publication number
JP2007507618A
JP2007507618A JP2006534325A JP2006534325A JP2007507618A JP 2007507618 A JP2007507618 A JP 2007507618A JP 2006534325 A JP2006534325 A JP 2006534325A JP 2006534325 A JP2006534325 A JP 2006534325A JP 2007507618 A JP2007507618 A JP 2007507618A
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Japan
Prior art keywords
titanium
target
substrate
coating station
plasma
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JP2006534325A
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Japanese (ja)
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JP2007507618A5 (https=
Inventor
ボーリング，ノーム
クライスル，エリック
ジョージ，マーク
レインズ，マイルス
グレイ，ロバート，エイチ
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デポジション・サイエンシイズ・インコーポレイテッド
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Publication of JP2007507618A publication Critical patent/JP2007507618A/ja
Publication of JP2007507618A5 publication Critical patent/JP2007507618A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C23C14/0073—Reactive sputtering by exposing the substrates to reactive gases intermittently
    • C23C14/0078—Reactive sputtering by exposing the substrates to reactive gases intermittently by moving the substrates between spatially separate sputtering and reaction stations

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
JP2006534325A 2003-10-07 2004-10-07 ルチル型二酸化チタンを高速で堆積させるための装置及び方法 Pending JP2007507618A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US50887703P 2003-10-07 2003-10-07
US50887103P 2003-10-07 2003-10-07
US51200203P 2003-10-17 2003-10-17
PCT/US2004/033045 WO2005035822A1 (en) 2003-10-07 2004-10-07 Apparatus and process for high rate deposition of rutile titanium dioxide

Publications (2)

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JP2007507618A true JP2007507618A (ja) 2007-03-29
JP2007507618A5 JP2007507618A5 (https=) 2007-11-15

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ID=34437665

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JP2006534325A Pending JP2007507618A (ja) 2003-10-07 2004-10-07 ルチル型二酸化チタンを高速で堆積させるための装置及び方法

Country Status (5)

Country Link
US (1) US20050092599A1 (https=)
EP (1) EP1680527B1 (https=)
JP (1) JP2007507618A (https=)
AT (1) ATE550456T1 (https=)
WO (1) WO2005035822A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010538157A (ja) * 2007-08-30 2010-12-09 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ スパッタシステム
JP2017044904A (ja) * 2015-08-27 2017-03-02 日本電気硝子株式会社 光学膜及びその製造方法

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8133361B2 (en) * 2007-06-05 2012-03-13 Deposition Sciences, Inc. Thin film coating system and method
CN101809185B (zh) * 2007-10-26 2013-05-08 沉积科学公司 薄膜涂覆系统和方法
WO2010044922A1 (en) * 2008-06-12 2010-04-22 Anguel Nikolov Thin film and optical interference filter incorporating high-index titanium dioxide and method for making them
WO2011119727A1 (en) * 2010-03-23 2011-09-29 Deposition Sciences, Inc. Antireflection coating for multi-junction solar cells

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JPH02247904A (ja) * 1989-03-22 1990-10-03 Taiyo Yuden Co Ltd セラミック誘電体薄膜及びその製造方法
JPH03164431A (ja) * 1989-11-24 1991-07-16 Nippon Soda Co Ltd 高耐熱性高屈折率複合酸化物薄膜形成用組成物
JPH05156436A (ja) * 1991-05-31 1993-06-22 Deposition Sciences Inc スパッタ被覆装置
JPH05286738A (ja) * 1992-04-07 1993-11-02 Yoshio Morita 二酸化チタン光学薄膜の形成方法
JPH0782509A (ja) * 1993-09-02 1995-03-28 Merck Patent Gmbh 表面改質顔料および着色プラスチック中での黄化防止剤としての使用
JPH07333423A (ja) * 1994-06-08 1995-12-22 Hitachi Maxell Ltd 選択透過膜
JPH10130830A (ja) * 1996-10-28 1998-05-19 Leybold Syst Gmbh 基板上に金属酸化物層をスパッタ誘導により析出する方法及び光学作用層系
JPH10317136A (ja) * 1997-05-16 1998-12-02 Hoya Corp 両面同時成膜方法および装置
JP2001234338A (ja) * 2000-02-25 2001-08-31 Shincron:Kk 金属化合物薄膜の形成方法およびその形成装置
JP2001329492A (ja) * 2000-05-22 2001-11-27 Nippon Sheet Glass Co Ltd 光沢性塗被紙およびその製造方法
JP2002512656A (ja) * 1995-04-24 2002-04-23 デポジション・サイエンシス，インコーポレイテッド スパッタリング装置
JP2003041152A (ja) * 2001-08-01 2003-02-13 Dainippon Printing Co Ltd 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置

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US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
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US5589280A (en) * 1993-02-05 1996-12-31 Southwall Technologies Inc. Metal on plastic films with adhesion-promoting layer
DE69428253T2 (de) * 1993-11-12 2002-06-27 Ppg Industries Ohio, Inc. Haltbare Sputterschicht aus Metalloxid
GB9405442D0 (en) * 1994-03-19 1994-05-04 Applied Vision Ltd Apparatus for coating substrates
WO1996006203A1 (en) * 1994-08-19 1996-02-29 Optical Coating Laboratory, Inc. Electrochromic materials and devices, and method
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KR100190558B1 (ko) * 1995-03-04 1999-10-15 구본준 강유전체 및 이를 채용한 반도체장치의 커패시터
JP3812751B2 (ja) * 1995-03-31 2006-08-23 大日本印刷株式会社 コーティング組成物及びその製造方法、並びに機能性膜及びその製造方法
US5616224A (en) * 1995-05-09 1997-04-01 Deposition Sciences, Inc. Apparatus for reducing the intensity and frequency of arcs which occur during a sputtering process
GB9600210D0 (en) * 1996-01-05 1996-03-06 Vanderstraeten E Bvba Improved sputtering targets and method for the preparation thereof
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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02247904A (ja) * 1989-03-22 1990-10-03 Taiyo Yuden Co Ltd セラミック誘電体薄膜及びその製造方法
JPH03164431A (ja) * 1989-11-24 1991-07-16 Nippon Soda Co Ltd 高耐熱性高屈折率複合酸化物薄膜形成用組成物
JPH05156436A (ja) * 1991-05-31 1993-06-22 Deposition Sciences Inc スパッタ被覆装置
JPH05286738A (ja) * 1992-04-07 1993-11-02 Yoshio Morita 二酸化チタン光学薄膜の形成方法
JPH0782509A (ja) * 1993-09-02 1995-03-28 Merck Patent Gmbh 表面改質顔料および着色プラスチック中での黄化防止剤としての使用
JPH07333423A (ja) * 1994-06-08 1995-12-22 Hitachi Maxell Ltd 選択透過膜
JP2002512656A (ja) * 1995-04-24 2002-04-23 デポジション・サイエンシス，インコーポレイテッド スパッタリング装置
JPH10130830A (ja) * 1996-10-28 1998-05-19 Leybold Syst Gmbh 基板上に金属酸化物層をスパッタ誘導により析出する方法及び光学作用層系
JPH10317136A (ja) * 1997-05-16 1998-12-02 Hoya Corp 両面同時成膜方法および装置
JP2001234338A (ja) * 2000-02-25 2001-08-31 Shincron:Kk 金属化合物薄膜の形成方法およびその形成装置
JP2001329492A (ja) * 2000-05-22 2001-11-27 Nippon Sheet Glass Co Ltd 光沢性塗被紙およびその製造方法
JP2003041152A (ja) * 2001-08-01 2003-02-13 Dainippon Printing Co Ltd 複合体、コーティング組成物、その塗膜、反射防止膜、反射防止フィルム、及び、画像表示装置

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010538157A (ja) * 2007-08-30 2010-12-09 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ スパッタシステム
JP2017044904A (ja) * 2015-08-27 2017-03-02 日本電気硝子株式会社 光学膜及びその製造方法

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Publication number Publication date
EP1680527B1 (en) 2012-03-21
EP1680527A4 (en) 2008-10-22
WO2005035822A1 (en) 2005-04-21
EP1680527A1 (en) 2006-07-19
US20050092599A1 (en) 2005-05-05
ATE550456T1 (de) 2012-04-15

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