JP2007505356A5 - - Google Patents

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Publication number
JP2007505356A5
JP2007505356A5 JP2006526111A JP2006526111A JP2007505356A5 JP 2007505356 A5 JP2007505356 A5 JP 2007505356A5 JP 2006526111 A JP2006526111 A JP 2006526111A JP 2006526111 A JP2006526111 A JP 2006526111A JP 2007505356 A5 JP2007505356 A5 JP 2007505356A5
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JP
Japan
Prior art keywords
substrate
negative photoresist
photoresist layer
radiation beam
microstructure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006526111A
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English (en)
Japanese (ja)
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JP2007505356A (ja
JP4635006B2 (ja
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Publication date
Priority claimed from US10/661,917 external-priority patent/US7867695B2/en
Application filed filed Critical
Publication of JP2007505356A publication Critical patent/JP2007505356A/ja
Publication of JP2007505356A5 publication Critical patent/JP2007505356A5/ja
Application granted granted Critical
Publication of JP4635006B2 publication Critical patent/JP4635006B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2006526111A 2003-09-11 2004-08-20 シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法 Expired - Fee Related JP4635006B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/661,917 US7867695B2 (en) 2003-09-11 2003-09-11 Methods for mastering microstructures through a substrate using negative photoresist
PCT/US2004/027209 WO2005035435A2 (en) 2003-09-11 2004-08-20 Systems and methods for mastering microstructures through a substrate using negative photoresist and microstructure masters so produced

Publications (3)

Publication Number Publication Date
JP2007505356A JP2007505356A (ja) 2007-03-08
JP2007505356A5 true JP2007505356A5 (enExample) 2007-10-04
JP4635006B2 JP4635006B2 (ja) 2011-02-16

Family

ID=34273974

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006526111A Expired - Fee Related JP4635006B2 (ja) 2003-09-11 2004-08-20 シリンダ形プラットフォームおよびラスタ走査される放射線ビームを使用して光学的微細構造体を形成するためのシステムおよび方法

Country Status (5)

Country Link
US (2) US7867695B2 (enExample)
EP (1) EP1663851A2 (enExample)
JP (1) JP4635006B2 (enExample)
KR (1) KR101060323B1 (enExample)
WO (1) WO2005035435A2 (enExample)

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