|
TW538256B
(en)
*
|
2000-01-14 |
2003-06-21 |
Zeiss Stiftung |
Microlithographic reduction projection catadioptric objective
|
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7372541B2
(en)
*
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
CN100568101C
(zh)
|
2002-11-12 |
2009-12-09 |
Asml荷兰有限公司 |
光刻装置和器件制造方法
|
|
TWI232357B
(en)
|
2002-11-12 |
2005-05-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4352874B2
(ja)
*
|
2002-12-10 |
2009-10-28 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
EP1571698A4
(en)
*
|
2002-12-10 |
2006-06-21 |
Nikon Corp |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
|
|
EP1571694A4
(en)
*
|
2002-12-10 |
2008-10-15 |
Nikon Corp |
EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE
|
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
EP1571695A4
(en)
|
2002-12-10 |
2008-10-15 |
Nikon Corp |
EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE SAME
|
|
US7948604B2
(en)
*
|
2002-12-10 |
2011-05-24 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
KR20110086130A
(ko)
*
|
2002-12-10 |
2011-07-27 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
|
JP4223936B2
(ja)
*
|
2003-02-06 |
2009-02-12 |
株式会社リコー |
投射光学系、拡大投射光学系、拡大投射装置及び画像投射装置
|
|
KR101381538B1
(ko)
*
|
2003-02-26 |
2014-04-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
JP4353179B2
(ja)
|
2003-03-25 |
2009-10-28 |
株式会社ニコン |
露光装置、露光方法、及びデバイス製造方法
|
|
ATE426914T1
(de)
|
2003-04-07 |
2009-04-15 |
Nikon Corp |
Belichtungsgerat und verfahren zur herstellung einer vorrichtung
|
|
JP4488004B2
(ja)
*
|
2003-04-09 |
2010-06-23 |
株式会社ニコン |
液浸リソグラフィ流体制御システム
|
|
EP2667253B1
(en)
*
|
2003-04-10 |
2015-06-10 |
Nikon Corporation |
Environmental system including vacuum scavenge for an immersion lithography apparatus
|
|
WO2004093160A2
(en)
*
|
2003-04-10 |
2004-10-28 |
Nikon Corporation |
Run-off path to collect liquid for an immersion lithography apparatus
|
|
KR101745223B1
(ko)
*
|
2003-04-10 |
2017-06-08 |
가부시키가이샤 니콘 |
액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
|
|
JP4656057B2
(ja)
*
|
2003-04-10 |
2011-03-23 |
株式会社ニコン |
液浸リソグラフィ装置用電気浸透素子
|
|
SG189557A1
(en)
*
|
2003-04-11 |
2013-05-31 |
Nikon Corp |
Cleanup method for optics in immersion lithography
|
|
JP4582089B2
(ja)
|
2003-04-11 |
2010-11-17 |
株式会社ニコン |
液浸リソグラフィ用の液体噴射回収システム
|
|
SG10201603067VA
(en)
|
2003-04-11 |
2016-05-30 |
Nikon Corp |
Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly
|
|
ATE542167T1
(de)
*
|
2003-04-17 |
2012-02-15 |
Nikon Corp |
Lithographisches immersionsgerät
|
|
US7348575B2
(en)
*
|
2003-05-06 |
2008-03-25 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
|
|
KR101516141B1
(ko)
|
2003-05-06 |
2015-05-04 |
가부시키가이샤 니콘 |
투영 광학계, 노광 장치 및 노광 방법
|
|
TWI295414B
(en)
*
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
JP4552853B2
(ja)
*
|
2003-05-15 |
2010-09-29 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
TWI503865B
(zh)
*
|
2003-05-23 |
2015-10-11 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
|
TW201515064A
(zh)
|
2003-05-23 |
2015-04-16 |
尼康股份有限公司 |
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|
|
KR20150036794A
(ko)
*
|
2003-05-28 |
2015-04-07 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치, 및 디바이스 제조 방법
|
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7684008B2
(en)
|
2003-06-11 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7317504B2
(en)
*
|
2004-04-08 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
TW200511388A
(en)
|
2003-06-13 |
2005-03-16 |
Nikon Corp |
Exposure method, substrate stage, exposure apparatus and method for manufacturing device
|
|
TWI433212B
(zh)
|
2003-06-19 |
2014-04-01 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
|
WO2005006026A2
(en)
*
|
2003-07-01 |
2005-01-20 |
Nikon Corporation |
Using isotopically specified fluids as optical elements
|
|
EP2466382B1
(en)
*
|
2003-07-08 |
2014-11-26 |
Nikon Corporation |
Wafer table for immersion lithography
|
|
KR20060026883A
(ko)
*
|
2003-07-09 |
2006-03-24 |
가부시키가이샤 니콘 |
결합장치, 노광장치 및 디바이스 제조방법
|
|
KR101296501B1
(ko)
*
|
2003-07-09 |
2013-08-13 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
EP1646075B1
(en)
|
2003-07-09 |
2011-06-15 |
Nikon Corporation |
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|
|
EP3346485A1
(en)
|
2003-07-25 |
2018-07-11 |
Nikon Corporation |
Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method
|
|
US7175968B2
(en)
*
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
|
KR101641011B1
(ko)
*
|
2003-07-28 |
2016-07-19 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
|
|
US7326522B2
(en)
|
2004-02-11 |
2008-02-05 |
Asml Netherlands B.V. |
Device manufacturing method and a substrate
|
|
EP1503244A1
(en)
*
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
|
US7779781B2
(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
TWI263859B
(en)
*
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
EP2804048A1
(en)
*
|
2003-08-29 |
2014-11-19 |
Nikon Corporation |
Exposure apparatus and device fabricating method
|
|
KR101371917B1
(ko)
*
|
2003-09-03 |
2014-03-07 |
가부시키가이샤 니콘 |
액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
|
|
JP4444920B2
(ja)
*
|
2003-09-19 |
2010-03-31 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
US8208198B2
(en)
|
2004-01-14 |
2012-06-26 |
Carl Zeiss Smt Gmbh |
Catadioptric projection objective
|
|
EP2320273B1
(en)
|
2003-09-29 |
2015-01-21 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing a device
|
|
EP1672681B8
(en)
|
2003-10-08 |
2011-09-21 |
Miyagi Nikon Precision Co., Ltd. |
Exposure apparatus, substrate carrying method, exposure method, and method for producing device
|
|
JP2005136364A
(ja)
*
|
2003-10-08 |
2005-05-26 |
Zao Nikon Co Ltd |
基板搬送装置、露光装置、並びにデバイス製造方法
|
|
WO2005036623A1
(ja)
|
2003-10-08 |
2005-04-21 |
Zao Nikon Co., Ltd. |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
|
|
TW201738932A
(zh)
*
|
2003-10-09 |
2017-11-01 |
Nippon Kogaku Kk |
曝光裝置及曝光方法、元件製造方法
|
|
US7411653B2
(en)
*
|
2003-10-28 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4295712B2
(ja)
|
2003-11-14 |
2009-07-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置及び装置製造方法
|
|
WO2005055296A1
(ja)
|
2003-12-03 |
2005-06-16 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法、並びに光学部品
|
|
KR101119813B1
(ko)
*
|
2003-12-15 |
2012-03-06 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치, 및 노광 방법
|
|
JPWO2005057635A1
(ja)
*
|
2003-12-15 |
2007-07-05 |
株式会社ニコン |
投影露光装置及びステージ装置、並びに露光方法
|
|
US7466489B2
(en)
*
|
2003-12-15 |
2008-12-16 |
Susanne Beder |
Projection objective having a high aperture and a planar end surface
|
|
US20070081133A1
(en)
*
|
2004-12-14 |
2007-04-12 |
Niikon Corporation |
Projection exposure apparatus and stage unit, and exposure method
|
|
JP5102492B2
(ja)
*
|
2003-12-19 |
2012-12-19 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
結晶素子を有するマイクロリソグラフィー投影用対物レンズ
|
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
CN102207608B
(zh)
|
2004-01-14 |
2013-01-02 |
卡尔蔡司Smt有限责任公司 |
反射折射投影物镜
|
|
US20080151364A1
(en)
|
2004-01-14 |
2008-06-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
|
US7463422B2
(en)
*
|
2004-01-14 |
2008-12-09 |
Carl Zeiss Smt Ag |
Projection exposure apparatus
|
|
WO2005071491A2
(en)
*
|
2004-01-20 |
2005-08-04 |
Carl Zeiss Smt Ag |
Exposure apparatus and measuring device for a projection lens
|
|
US7589822B2
(en)
*
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
US7990516B2
(en)
|
2004-02-03 |
2011-08-02 |
Nikon Corporation |
Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
|
|
TWI402893B
(zh)
*
|
2004-03-25 |
2013-07-21 |
尼康股份有限公司 |
曝光方法
|
|
WO2005098504A1
(en)
|
2004-04-08 |
2005-10-20 |
Carl Zeiss Smt Ag |
Imaging system with mirror group
|
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1747499A2
(en)
*
|
2004-05-04 |
2007-01-31 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
|
KR20170028451A
(ko)
|
2004-05-17 |
2017-03-13 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
|
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
CN101833247B
(zh)
|
2004-06-04 |
2013-11-06 |
卡尔蔡司Smt有限责任公司 |
微光刻投影曝光系统的投影物镜的光学测量的测量系统
|
|
KR101433496B1
(ko)
*
|
2004-06-09 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US20080273185A1
(en)
*
|
2004-06-16 |
2008-11-06 |
Nikon Corporation |
Optical System, Exposing Apparatus and Exposing Method
|
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101433491B1
(ko)
*
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7511798B2
(en)
*
|
2004-07-30 |
2009-03-31 |
Asml Holding N.V. |
Off-axis catadioptric projection optical system for lithography
|
|
US8305553B2
(en)
*
|
2004-08-18 |
2012-11-06 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
US7701550B2
(en)
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7397533B2
(en)
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7880860B2
(en)
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE602006012746D1
(de)
*
|
2005-01-14 |
2010-04-22 |
Asml Netherlands Bv |
Lithografische Vorrichtung und Herstellungsverfahren
|
|
SG124351A1
(en)
*
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
KR20180125636A
(ko)
*
|
2005-01-31 |
2018-11-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US8692973B2
(en)
*
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
US20060198018A1
(en)
*
|
2005-02-04 |
2006-09-07 |
Carl Zeiss Smt Ag |
Imaging system
|
|
US7282701B2
(en)
|
2005-02-28 |
2007-10-16 |
Asml Netherlands B.V. |
Sensor for use in a lithographic apparatus
|
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
|
KR101653514B1
(ko)
*
|
2005-06-02 |
2016-09-01 |
칼 짜이스 에스엠티 게엠베하 |
마이크로리소그래피 투영 대물 렌즈
|
|
CA2617872C
(en)
*
|
2005-08-16 |
2013-12-24 |
Benvenue Medical, Inc. |
Spinal tissue distraction devices
|
|
JP2009508150A
(ja)
|
2005-09-13 |
2009-02-26 |
カール・ツァイス・エスエムティー・アーゲー |
マイクロリソグラフィ投影光学系、ある機器を製造するための方法、光学面を設計する方法
|
|
US7357768B2
(en)
*
|
2005-09-22 |
2008-04-15 |
William Marshall |
Recliner exerciser
|
|
US20070124987A1
(en)
*
|
2005-12-05 |
2007-06-07 |
Brown Jeffrey K |
Electronic pest control apparatus
|
|
KR100768849B1
(ko)
*
|
2005-12-06 |
2007-10-22 |
엘지전자 주식회사 |
계통 연계형 연료전지 시스템의 전원공급장치 및 방법
|
|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE102006014380A1
(de)
*
|
2006-03-27 |
2007-10-11 |
Carl Zeiss Smt Ag |
Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
|
|
EP2005249A1
(en)
*
|
2006-04-07 |
2008-12-24 |
Carl Zeiss SMT AG |
Microlithography projection optical system and method for manufacturing a device
|
|
DE102006021797A1
(de)
*
|
2006-05-09 |
2007-11-15 |
Carl Zeiss Smt Ag |
Optische Abbildungseinrichtung mit thermischer Dämpfung
|
|
US8817226B2
(en)
|
2007-02-15 |
2014-08-26 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning using ozone in immersion lithography
|
|
US8654305B2
(en)
*
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
|
US8237911B2
(en)
*
|
2007-03-15 |
2012-08-07 |
Nikon Corporation |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
|
|
TWI389551B
(zh)
*
|
2007-08-09 |
2013-03-11 |
Mstar Semiconductor Inc |
迦瑪校正裝置
|
|
KR101448152B1
(ko)
*
|
2008-03-26 |
2014-10-07 |
삼성전자주식회사 |
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|
|
US9176393B2
(en)
|
2008-05-28 |
2015-11-03 |
Asml Netherlands B.V. |
Lithographic apparatus and a method of operating the apparatus
|
|
MX2012007581A
(es)
*
|
2009-12-28 |
2012-07-30 |
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Genotipos restauradores de la fertilidad de sorgo y metodos de seleccion asistida por marcadores.
|
|
EP2381310B1
(en)
|
2010-04-22 |
2015-05-06 |
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Fluid handling structure and lithographic apparatus
|
|
CN103424979A
(zh)
*
|
2012-05-23 |
2013-12-04 |
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远景检测装置及其远景检测方法
|
|
TW201348689A
(zh)
*
|
2012-05-23 |
2013-12-01 |
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遠景檢測裝置及其遠景檢測方法
|
|
US9726859B1
(en)
|
2014-03-16 |
2017-08-08 |
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Optical assembly for a wide field of view camera with low TV distortion
|
|
US9316820B1
(en)
|
2014-03-16 |
2016-04-19 |
Hyperion Development, LLC |
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|
|
US9091843B1
(en)
|
2014-03-16 |
2015-07-28 |
Hyperion Development, LLC |
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|
|
US9316808B1
(en)
|
2014-03-16 |
2016-04-19 |
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|
|
US10139595B1
(en)
|
2014-03-16 |
2018-11-27 |
Navitar Industries, Llc |
Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
|
|
US10386604B1
(en)
|
2014-03-16 |
2019-08-20 |
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Compact wide field of view digital camera with stray light impact suppression
|
|
US10545314B1
(en)
|
2014-03-16 |
2020-01-28 |
Navitar Industries, Llc |
Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
|
|
US9494772B1
(en)
|
2014-03-16 |
2016-11-15 |
Hyperion Development, LLC |
Optical assembly for a wide field of view point action camera with low field curvature
|
|
US9995910B1
(en)
|
2014-03-16 |
2018-06-12 |
Navitar Industries, Llc |
Optical assembly for a compact wide field of view digital camera with high MTF
|
|
CN104062746B
(zh)
*
|
2014-06-23 |
2016-08-24 |
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一种大数值孔径的折反射浸没投影光学系统
|
|
CN105807410B
(zh)
*
|
2014-12-31 |
2018-11-09 |
上海微电子装备(集团)股份有限公司 |
一种基于高数值孔径的折反射式投影物镜
|
|
US9835835B1
(en)
|
2015-04-10 |
2017-12-05 |
Navitar Industries, Llc |
Projection zoom lens and camera
|
|
DE102016209847A1
(de)
|
2016-06-03 |
2016-07-28 |
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Projektionsbelichtungsanlage für die Halbleiterlithographie mit optischer Korrekturenanordnung und Verfahren zum Betrieb einer Projektionsbelichtungsanlage
|
|
JP6882053B2
(ja)
*
|
2016-12-05 |
2021-06-02 |
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カタディオプトリック光学系、照明光学系、露光装置および物品製造方法
|
|
US11043239B2
(en)
|
2019-03-20 |
2021-06-22 |
Kla Corporation |
Magneto-optic Kerr effect metrology systems
|
|
US11650487B2
(en)
*
|
2020-01-28 |
2023-05-16 |
Daniel Joseph Reiley |
Front converter optical assembly for camera
|
|
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(zh)
*
|
2021-08-11 |
2025-02-25 |
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|