JP2007500449A5 - - Google Patents

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JP2007500449A5
JP2007500449A5 JP2006521952A JP2006521952A JP2007500449A5 JP 2007500449 A5 JP2007500449 A5 JP 2007500449A5 JP 2006521952 A JP2006521952 A JP 2006521952A JP 2006521952 A JP2006521952 A JP 2006521952A JP 2007500449 A5 JP2007500449 A5 JP 2007500449A5
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JP
Japan
Prior art keywords
reflectance
reflectivity
passage
immersion
lithography system
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JP2006521952A
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English (en)
Japanese (ja)
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JP2007500449A (ja
JP4465356B2 (ja
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Priority claimed from US10/628,021 external-priority patent/US7006209B2/en
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Publication of JP2007500449A5 publication Critical patent/JP2007500449A5/ja
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Publication of JP4465356B2 publication Critical patent/JP4465356B2/ja
Anticipated expiration legal-status Critical
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JP2006521952A 2003-07-25 2004-07-23 浸漬リソグラフィシステムの監視・制御方法及び装置 Expired - Fee Related JP4465356B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/628,021 US7006209B2 (en) 2003-07-25 2003-07-25 Method and apparatus for monitoring and controlling imaging in immersion lithography systems
PCT/US2004/023876 WO2005013008A2 (en) 2003-07-25 2004-07-23 Method for monitoring and controlling imaging in immersion lithography systems

Publications (3)

Publication Number Publication Date
JP2007500449A JP2007500449A (ja) 2007-01-11
JP2007500449A5 true JP2007500449A5 (https=) 2009-05-28
JP4465356B2 JP4465356B2 (ja) 2010-05-19

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JP2006521952A Expired - Fee Related JP4465356B2 (ja) 2003-07-25 2004-07-23 浸漬リソグラフィシステムの監視・制御方法及び装置

Country Status (7)

Country Link
US (1) US7006209B2 (https=)
EP (1) EP1652008B1 (https=)
JP (1) JP4465356B2 (https=)
KR (1) KR101071966B1 (https=)
CN (1) CN100538523C (https=)
TW (1) TWI372947B (https=)
WO (1) WO2005013008A2 (https=)

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