JP2007281308A - 液浸露光装置 - Google Patents

液浸露光装置 Download PDF

Info

Publication number
JP2007281308A
JP2007281308A JP2006108030A JP2006108030A JP2007281308A JP 2007281308 A JP2007281308 A JP 2007281308A JP 2006108030 A JP2006108030 A JP 2006108030A JP 2006108030 A JP2006108030 A JP 2006108030A JP 2007281308 A JP2007281308 A JP 2007281308A
Authority
JP
Japan
Prior art keywords
immersion
stage
substrate
exposure
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006108030A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007281308A5 (enExample
Inventor
Keiji Emoto
圭司 江本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006108030A priority Critical patent/JP2007281308A/ja
Publication of JP2007281308A publication Critical patent/JP2007281308A/ja
Publication of JP2007281308A5 publication Critical patent/JP2007281308A5/ja
Withdrawn legal-status Critical Current

Links

Images

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006108030A 2006-04-10 2006-04-10 液浸露光装置 Withdrawn JP2007281308A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006108030A JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006108030A JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Publications (2)

Publication Number Publication Date
JP2007281308A true JP2007281308A (ja) 2007-10-25
JP2007281308A5 JP2007281308A5 (enExample) 2009-05-28

Family

ID=38682432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006108030A Withdrawn JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Country Status (1)

Country Link
JP (1) JP2007281308A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
JP2011061199A (ja) * 2009-09-11 2011-03-24 Asml Netherlands Bv シャッター部材、リソグラフィ装置及びデバイス製造方法
JP2011159971A (ja) * 2010-02-02 2011-08-18 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP2014033024A (ja) * 2012-08-01 2014-02-20 Tokyo Seimitsu Co Ltd レーザダイシング装置及び方法並びにウェーハ処理方法
JP2016189491A (ja) * 2016-08-03 2016-11-04 株式会社東京精密 レーザダイシング装置及び方法
JP2016195265A (ja) * 2016-06-20 2016-11-17 株式会社東京精密 レーザダイシング装置及び方法

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
WO2009060585A1 (ja) * 2007-11-07 2009-05-14 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
US8797508B2 (en) 2007-11-07 2014-08-05 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
KR101470671B1 (ko) * 2007-11-07 2014-12-08 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
JP2011061199A (ja) * 2009-09-11 2011-03-24 Asml Netherlands Bv シャッター部材、リソグラフィ装置及びデバイス製造方法
CN102023490A (zh) * 2009-09-11 2011-04-20 Asml荷兰有限公司 遮蔽构件、光刻设备以及器件制造方法
US8599356B2 (en) 2009-09-11 2013-12-03 Asml Netherlands B.V. Shutter member, a lithographic apparatus and device manufacturing method
JP2011159971A (ja) * 2010-02-02 2011-08-18 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
US9618835B2 (en) 2010-02-02 2017-04-11 Asml Netherlands B.V. Lithographic apparatus and a device manufacturing method involving an elongate liquid supply opening or an elongate region of relatively high pressure
JP2014033024A (ja) * 2012-08-01 2014-02-20 Tokyo Seimitsu Co Ltd レーザダイシング装置及び方法並びにウェーハ処理方法
JP2016195265A (ja) * 2016-06-20 2016-11-17 株式会社東京精密 レーザダイシング装置及び方法
JP2016189491A (ja) * 2016-08-03 2016-11-04 株式会社東京精密 レーザダイシング装置及び方法

Similar Documents

Publication Publication Date Title
US8860922B2 (en) Lithographic apparatus and device manufacturing method
JP2006120674A (ja) 露光装置及び方法、デバイス製造方法
US20100097584A1 (en) Exposure apparatus and device fabrication method
JP4708876B2 (ja) 液浸露光装置
JP2006216733A (ja) 露光装置、光学素子の製造方法及びデバイス製造方法
JP5765415B2 (ja) 液浸露光装置、液浸露光方法及びデバイス製造方法
KR101197071B1 (ko) 노광 조건의 결정 방법, 노광 방법 및 노광 장치, 그리고디바이스 제조 방법
JP4797984B2 (ja) 露光装置及びデバイス製造方法
WO2007004552A1 (ja) 露光装置及び方法、露光装置のメンテナンス方法、並びにデバイス製造方法
JP4852951B2 (ja) 露光装置、露光方法及びデバイス製造方法
US20060209281A1 (en) Exposure apparatus, exposure method, and device manufacturing method
JP2007281308A (ja) 液浸露光装置
JP2005026649A (ja) 露光方法及び露光装置、デバイス製造方法
JP2008218653A (ja) 露光装置及びデバイス製造方法
JP2009094145A (ja) 露光装置、露光方法およびデバイス製造方法
JPWO2007083686A1 (ja) 露光装置
JP2006060016A (ja) 流体給排装置及びそれを有する露光装置
JP2008218595A (ja) 露光装置
JP2006073906A (ja) 露光装置、露光システム及びデバイス製造方法
JP2007115730A (ja) 露光装置
JP2009283485A (ja) 露光装置及びデバイス製造方法
US7894036B2 (en) Exposure apparatus
JP2006319065A (ja) 露光装置
JP2008262963A (ja) 液浸露光装置およびデバイス製造方法
JP2007012954A (ja) 露光装置

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090410

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090410

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20110216