JP2007281308A5 - - Google Patents

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Publication number
JP2007281308A5
JP2007281308A5 JP2006108030A JP2006108030A JP2007281308A5 JP 2007281308 A5 JP2007281308 A5 JP 2007281308A5 JP 2006108030 A JP2006108030 A JP 2006108030A JP 2006108030 A JP2006108030 A JP 2006108030A JP 2007281308 A5 JP2007281308 A5 JP 2007281308A5
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JP
Japan
Prior art keywords
distance
immersion
substrate
stage
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006108030A
Other languages
English (en)
Japanese (ja)
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JP2007281308A (ja
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Publication date
Application filed filed Critical
Priority to JP2006108030A priority Critical patent/JP2007281308A/ja
Priority claimed from JP2006108030A external-priority patent/JP2007281308A/ja
Publication of JP2007281308A publication Critical patent/JP2007281308A/ja
Publication of JP2007281308A5 publication Critical patent/JP2007281308A5/ja
Withdrawn legal-status Critical Current

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JP2006108030A 2006-04-10 2006-04-10 液浸露光装置 Withdrawn JP2007281308A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006108030A JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006108030A JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Publications (2)

Publication Number Publication Date
JP2007281308A JP2007281308A (ja) 2007-10-25
JP2007281308A5 true JP2007281308A5 (enExample) 2009-05-28

Family

ID=38682432

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006108030A Withdrawn JP2007281308A (ja) 2006-04-10 2006-04-10 液浸露光装置

Country Status (1)

Country Link
JP (1) JP2007281308A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8279399B2 (en) 2007-10-22 2012-10-02 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP4986185B2 (ja) 2007-11-07 2012-07-25 株式会社ニコン 露光装置及び露光方法、並びにデバイス製造方法
JP5507392B2 (ja) 2009-09-11 2014-05-28 エーエスエムエル ネザーランズ ビー．ブイ． シャッター部材、リソグラフィ装置及びデバイス製造方法
NL2005951A (en) * 2010-02-02 2011-08-03 Asml Netherlands Bv Lithographic apparatus and a device manufacturing method.
JP5983923B2 (ja) * 2012-08-01 2016-09-06 株式会社東京精密 レーザダイシング装置及び方法並びにウェーハ処理方法
JP6048713B2 (ja) * 2016-06-20 2016-12-21 株式会社東京精密 レーザダイシング装置及び方法
JP6044814B2 (ja) * 2016-08-03 2016-12-14 株式会社東京精密 レーザダイシング装置及び方法

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