JP2007281308A5 - - Google Patents

Claims (12)

An immersion exposure apparatus that fills a space between a final optical element of a projection optical system and a substrate, and projects and exposes a pattern of an original onto the substrate,
A stage that holds and moves the substrate;
The liquid immersion gap between the final optical element and the substrate is maintained at a first distance during an exposure period in which the pattern is exposed to the substrate, and the liquid is removed from the final optical in a non-exposure period other than the exposure period. Control means for performing at least part of the movement of the stage performed while being held between an element and the substrate in a state in which the immersion gap is set to a second distance different from the first distance. An immersion exposure apparatus comprising:   The control means sets the immersion gap to the second distance when the stage continuously moves a distance longer than a predetermined length in the non-exposure period. The immersion exposure apparatus according to claim 1.   2. The immersion exposure according to claim 1, wherein the control means sets the immersion gap to the second distance when the stage moves between exposure shots accompanied by a change in the movement direction of the stage. 3. apparatus. The control means may further include at least one of movement of a stage for measuring a positional relationship between the projection optical system and the stage and movement of the stage for moving the substrate to an exposure start position after the measurement . The immersion exposure apparatus according to claim 1, wherein the immersion gap is set to the second distance.   The control means further sets the immersion gap to the second distance in a stage movement for exchanging the stage moving under the projection optical system with another stage. The immersion exposure apparatus according to 1.   The control means drives the stage so that the liquid immersion gap is set to the second distance immediately after the exposure period ends and the liquid immersion gap is returned to the first distance before the start of the next exposure period. The immersion exposure apparatus according to claim 1, wherein the immersion exposure apparatus is controlled.   The immersion exposure apparatus according to claim 1, wherein the second distance is smaller than the first distance.   The immersion exposure apparatus according to claim 1, wherein the second distance is greater than the first distance. The liquid immersion exposure apparatus according to claim 1, characterized in that said first distance is changed on the basis of the refractive index of the liquid. The control means tilts the stage so that a distance between the final optical element and the substrate increases in accordance with a moving direction of the stage when the immersion gap is set to the second distance. The immersion exposure apparatus according to claim 1, wherein: A method for controlling an immersion exposure apparatus in which a liquid is filled between a final optical element of a projection optical system and a substrate, and a pattern of an original is projected onto the substrate and exposed.
A first control step of moving a stage holding the substrate while maintaining a liquid immersion gap between the final optical element and the substrate at a first distance in an exposure period in which the pattern is exposed to the substrate;
In the non-exposure period other than the exposure period, at least part of the movement of the stage performed while the liquid is held between the final optical element and the substrate, the immersion gap is the first distance. And a second control step performed in a state where the second distance is different from that of the liquid immersion exposure apparatus. A step of exposing the substrate by the immersion exposure apparatus according to claim 1;
And developing the exposed substrate. A device manufacturing method comprising: