JP2007258634A5 - - Google Patents
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- Publication number
- JP2007258634A5 JP2007258634A5 JP2006084543A JP2006084543A JP2007258634A5 JP 2007258634 A5 JP2007258634 A5 JP 2007258634A5 JP 2006084543 A JP2006084543 A JP 2006084543A JP 2006084543 A JP2006084543 A JP 2006084543A JP 2007258634 A5 JP2007258634 A5 JP 2007258634A5
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- JP
- Japan
- Prior art keywords
- film
- sol
- gel
- ceramic
- samples
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000919 ceramic Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N oxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Images
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006084543A JP5014656B2 (ja) | 2006-03-27 | 2006-03-27 | プラズマ処理装置用部材およびその製造方法 |
CNA2007800109093A CN101432461A (zh) | 2006-03-27 | 2007-02-20 | 等离子体处理装置用构件及其制造方法 |
KR1020087025800A KR101030937B1 (ko) | 2006-03-27 | 2007-02-20 | 플라즈마 처리 장치용 부재 및 그 제조 방법 |
US12/224,784 US20090101070A1 (en) | 2006-03-27 | 2007-02-20 | Member for a Plasma Processing Apparatus and Method of Manufacturing the Same |
PCT/JP2007/053002 WO2007111058A1 (ja) | 2006-03-27 | 2007-02-20 | プラズマ処理装置用部材およびその製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006084543A JP5014656B2 (ja) | 2006-03-27 | 2006-03-27 | プラズマ処理装置用部材およびその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007258634A JP2007258634A (ja) | 2007-10-04 |
JP2007258634A5 true JP2007258634A5 (sv) | 2009-03-26 |
JP5014656B2 JP5014656B2 (ja) | 2012-08-29 |
Family
ID=38540991
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006084543A Expired - Fee Related JP5014656B2 (ja) | 2006-03-27 | 2006-03-27 | プラズマ処理装置用部材およびその製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20090101070A1 (sv) |
JP (1) | JP5014656B2 (sv) |
KR (1) | KR101030937B1 (sv) |
CN (1) | CN101432461A (sv) |
WO (1) | WO2007111058A1 (sv) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5411460B2 (ja) * | 2008-06-24 | 2014-02-12 | 一般財団法人ファインセラミックスセンター | バリア性能評価方法及びバリア性能評価装置 |
FR2988404B1 (fr) * | 2012-03-21 | 2015-02-13 | Centre Techn Ind Mecanique | Procede de depot d'un revetement anticorrosion |
JP6120430B2 (ja) * | 2013-03-28 | 2017-04-26 | オーエスジー株式会社 | 加工工具用硬質被膜および硬質被膜被覆金属加工工具 |
KR101290539B1 (ko) * | 2013-04-15 | 2013-07-31 | 와이엠씨 주식회사 | 아노다이징 필름 제조 방법 |
CN103639157B (zh) * | 2013-11-15 | 2016-06-08 | 广州福耀玻璃有限公司 | 玻璃附件的表面处理方法 |
TW201546007A (zh) * | 2014-06-11 | 2015-12-16 | Creating Nano Technologies Inc | 玻璃結構之製造方法與設備 |
TWI714965B (zh) * | 2018-02-15 | 2021-01-01 | 日商京瓷股份有限公司 | 電漿處理裝置用構件及具備其之電漿處理裝置 |
JP6813718B2 (ja) * | 2019-01-10 | 2021-01-13 | 日本碍子株式会社 | 複合部材 |
JP2020132947A (ja) * | 2019-02-20 | 2020-08-31 | 日本特殊陶業株式会社 | 膜付き部材及びその製造方法 |
CN115803469A (zh) * | 2021-06-28 | 2023-03-14 | 株式会社日立高新技术 | 内壁构件的再生方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3527839B2 (ja) * | 1998-01-28 | 2004-05-17 | 京セラ株式会社 | 半導体素子製造装置用部材 |
JP3510993B2 (ja) * | 1999-12-10 | 2004-03-29 | トーカロ株式会社 | プラズマ処理容器内部材およびその製造方法 |
TW593196B (en) * | 2001-11-01 | 2004-06-21 | Toray Industries | Photosensitive ceramics composition and multi-layer substrate using it |
SG107103A1 (en) * | 2002-05-24 | 2004-11-29 | Ntu Ventures Private Ltd | Process for producing nanocrystalline composites |
US7311797B2 (en) * | 2002-06-27 | 2007-12-25 | Lam Research Corporation | Productivity enhancing thermal sprayed yttria-containing coating for plasma reactor |
US7780786B2 (en) * | 2002-11-28 | 2010-08-24 | Tokyo Electron Limited | Internal member of a plasma processing vessel |
CN100418187C (zh) * | 2003-02-07 | 2008-09-10 | 东京毅力科创株式会社 | 等离子体处理装置、环形部件和等离子体处理方法 |
JP4486372B2 (ja) * | 2003-02-07 | 2010-06-23 | 東京エレクトロン株式会社 | プラズマ処理装置 |
JP4603254B2 (ja) * | 2003-10-23 | 2010-12-22 | 日本曹達株式会社 | 金属酸化物ゾル液の製造方法、結晶質金属複酸化物ゾルおよび金属酸化物膜 |
JP2005217350A (ja) * | 2004-02-02 | 2005-08-11 | Toto Ltd | 耐プラズマ性を有する半導体製造装置用部材およびその作製方法 |
US20080029032A1 (en) * | 2006-08-01 | 2008-02-07 | Sun Jennifer Y | Substrate support with protective layer for plasma resistance |
-
2006
- 2006-03-27 JP JP2006084543A patent/JP5014656B2/ja not_active Expired - Fee Related
-
2007
- 2007-02-20 US US12/224,784 patent/US20090101070A1/en not_active Abandoned
- 2007-02-20 KR KR1020087025800A patent/KR101030937B1/ko active IP Right Grant
- 2007-02-20 CN CNA2007800109093A patent/CN101432461A/zh active Pending
- 2007-02-20 WO PCT/JP2007/053002 patent/WO2007111058A1/ja active Application Filing
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