JP2007224293A5 - - Google Patents

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Publication number
JP2007224293A5
JP2007224293A5 JP2007014523A JP2007014523A JP2007224293A5 JP 2007224293 A5 JP2007224293 A5 JP 2007224293A5 JP 2007014523 A JP2007014523 A JP 2007014523A JP 2007014523 A JP2007014523 A JP 2007014523A JP 2007224293 A5 JP2007224293 A5 JP 2007224293A5
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JP
Japan
Prior art keywords
meth
acrylate
weight
resin composition
compound
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Application number
JP2007014523A
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English (en)
Japanese (ja)
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JP5269323B2 (ja
JP2007224293A (ja
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Publication date
Priority claimed from KR1020060010503A external-priority patent/KR101348757B1/ko
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Publication of JP2007224293A publication Critical patent/JP2007224293A/ja
Publication of JP2007224293A5 publication Critical patent/JP2007224293A5/ja
Application granted granted Critical
Publication of JP5269323B2 publication Critical patent/JP5269323B2/ja
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JP2007014523A 2006-02-03 2007-01-25 有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板 Active JP5269323B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2006-0010503 2006-02-03
KR1020060010503A KR101348757B1 (ko) 2006-02-03 2006-02-03 유기 절연막용 수지 조성물 및 그 제조 방법, 상기 수지조성물을 포함하는 표시판

Publications (3)

Publication Number Publication Date
JP2007224293A JP2007224293A (ja) 2007-09-06
JP2007224293A5 true JP2007224293A5 (cg-RX-API-DMAC7.html) 2010-03-11
JP5269323B2 JP5269323B2 (ja) 2013-08-21

Family

ID=38334436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007014523A Active JP5269323B2 (ja) 2006-02-03 2007-01-25 有機絶縁膜用樹脂組成物及びその製造方法、前記樹脂組成物を含む表示板

Country Status (5)

Country Link
US (1) US7879961B2 (cg-RX-API-DMAC7.html)
JP (1) JP5269323B2 (cg-RX-API-DMAC7.html)
KR (1) KR101348757B1 (cg-RX-API-DMAC7.html)
CN (1) CN101058618B (cg-RX-API-DMAC7.html)
TW (1) TWI414555B (cg-RX-API-DMAC7.html)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5030562B2 (ja) * 2006-11-30 2012-09-19 富士フイルム株式会社 インクジェット用インク組成物、及び、インクジェット記録方法
KR101388519B1 (ko) 2007-07-23 2014-04-24 주식회사 동진쎄미켐 박막 트랜지스터 기판의 제조 방법 및 이에 사용되는감광성 수지 조성물
JP5187492B2 (ja) * 2007-11-22 2013-04-24 Jsr株式会社 硬化性樹脂組成物、保護膜および保護膜の形成方法
JP2009227838A (ja) * 2008-03-24 2009-10-08 Fujifilm Corp 膜形成用組成物、絶縁膜、及び、電子デバイス
US8251503B2 (en) 2008-04-04 2012-08-28 Konica Minolta Ij Technologies, Inc. Nonaqueous ink jet ink, process for producing nonaqueous ink jet ink, and ink jet recording method
KR101317601B1 (ko) * 2008-08-29 2013-10-11 주식회사 엘지화학 아크릴계 수지 및 이를 포함하는 감광성 수지 조성물
KR101297040B1 (ko) 2009-01-28 2013-08-14 히타치가세이가부시끼가이샤 프리프레그, 수지 부착 필름, 수지 부착 금속박, 금속박장 적층판 및 인쇄 배선판
CN102640292B (zh) 2009-11-27 2015-11-25 株式会社半导体能源研究所 半导体装置和及其制造方法
EP3550604A1 (en) 2009-12-25 2019-10-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
KR20130137596A (ko) * 2010-08-25 2013-12-17 다우 글로벌 테크놀로지스 엘엘씨 공중합체
KR20150118096A (ko) * 2013-02-12 2015-10-21 디아이씨 가부시끼가이샤 절연 재료용 수지 조성물, 절연 잉크, 절연막 및 그것을 사용한 유기 전계 효과 트랜지스터
CN105985486B (zh) * 2015-02-05 2020-11-10 中国石油化工股份有限公司 一种双环戊二烯-环戊烯共聚物及其制备方法
DE102015119939A1 (de) * 2015-11-18 2017-05-18 ALTANA Aktiengesellschaft Vernetzbare polymere Materialien für dielektrische Schichten in elektronischen Bauteilen

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FR2606775B1 (fr) * 1986-11-14 1989-07-07 Charbonnages Ste Chimique Copolymeres (meth)acryliques autoreticulables a basses temperatures
JPH03273006A (ja) 1990-03-22 1991-12-04 Toyo Eng Corp 重合体の精製方法
US5399604A (en) * 1992-07-24 1995-03-21 Japan Synthetic Rubber Co., Ltd. Epoxy group-containing resin compositions
GB9408725D0 (en) * 1994-05-03 1994-06-22 Zeneca Resins Bv Production of aqueous polymer compositions
JP3994429B2 (ja) * 1998-12-01 2007-10-17 Jsr株式会社 層間絶縁膜用感放射線性樹脂組成物
JP4019404B2 (ja) * 1999-08-05 2007-12-12 Jsr株式会社 保護膜および液晶表示素子
US6727314B2 (en) * 2001-12-13 2004-04-27 Basf Ag Crosslinking systems for acrylic latex films
JP3933966B2 (ja) * 2002-03-15 2007-06-20 日本ゼオン株式会社 ジエン系ゴム、その製造方法、ならびにゴム組成物、その製造方法および架橋物
KR20030097392A (ko) 2002-06-20 2003-12-31 건설화학공업(주) 난연성 비닐에스테르 수지의 조성물 및 그 제조방법
KR100923056B1 (ko) 2002-09-16 2009-10-22 삼성전자주식회사 표시 장치 및 이의 제조방법
KR100684365B1 (ko) * 2003-04-30 2007-02-20 주식회사 삼양이엠에스 음성 레지스트 조성물을 이용한 고개구율 박막 트랜지스터(tft) 액정표시소자의 유기절연막 형성방법
CN100358156C (zh) * 2003-05-06 2007-12-26 Pt普拉斯有限公司 用于lcd板和oeld板的存储电容器结构
TWI386714B (zh) 2004-05-06 2013-02-21 Dongjin Semichem Co Ltd Tft-lcd用層間有機絕緣膜、tft-lcd用層間有機絕緣膜用丙烯酸系共聚合體樹脂及其製造方法
KR20050113351A (ko) * 2004-05-27 2005-12-02 주식회사 동진쎄미켐 감광성 수지 조성물
KR20060084489A (ko) * 2005-01-19 2006-07-24 삼성전자주식회사 박막 트랜지스터 표시판
US7799509B2 (en) * 2005-06-04 2010-09-21 Samsung Electronics Co., Ltd. Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same

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