JP2007221142A - 半導体発光素子及びその製造方法 - Google Patents
半導体発光素子及びその製造方法 Download PDFInfo
- Publication number
- JP2007221142A JP2007221142A JP2007033773A JP2007033773A JP2007221142A JP 2007221142 A JP2007221142 A JP 2007221142A JP 2007033773 A JP2007033773 A JP 2007033773A JP 2007033773 A JP2007033773 A JP 2007033773A JP 2007221142 A JP2007221142 A JP 2007221142A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- semiconductor
- emitting device
- light emitting
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Led Devices (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20060014241A KR100887067B1 (ko) | 2006-02-14 | 2006-02-14 | 나노 패턴 구조를 지닌 반도체 발광 소자의 제조 방법 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2007221142A true JP2007221142A (ja) | 2007-08-30 |
Family
ID=38498010
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007033773A Pending JP2007221142A (ja) | 2006-02-14 | 2007-02-14 | 半導体発光素子及びその製造方法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2007221142A (ko) |
KR (1) | KR100887067B1 (ko) |
CN (1) | CN101022146A (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014082496A (ja) * | 2012-10-17 | 2014-05-08 | Lg Innotek Co Ltd | 発光素子 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100889569B1 (ko) * | 2007-09-14 | 2009-03-23 | 우리엘에스티 주식회사 | 질화물계 발광소자 및 그 제조방법 |
US8460949B2 (en) | 2008-12-30 | 2013-06-11 | Chang Hee Hong | Light emitting device with air bars and method of manufacturing the same |
KR101060975B1 (ko) * | 2008-12-30 | 2011-08-31 | 전북대학교산학협력단 | 에어갭을 구비하는 발광소자 및 그 제조방법 |
CN102299225B (zh) * | 2010-06-22 | 2013-08-28 | 联胜光电股份有限公司 | 具有高反射与低缺陷密度的发光二极管结构 |
KR101227373B1 (ko) | 2011-01-28 | 2013-01-30 | 전북대학교산학협력단 | 마이크로 패턴을 갖는 발광소자 및 그 제조방법 |
US9236533B2 (en) | 2011-12-23 | 2016-01-12 | Seoul Viosys Co., Ltd. | Light emitting diode and method for manufacturing same |
FR2985609B1 (fr) * | 2012-01-05 | 2014-02-07 | Commissariat Energie Atomique | Substrat structure pour leds a forte extraction de lumiere |
KR20130090149A (ko) * | 2012-02-03 | 2013-08-13 | 서울옵토디바이스주식회사 | 반도체 발광소자 및 그 제조방법 |
CN103378249A (zh) * | 2012-04-13 | 2013-10-30 | 璨圆光电股份有限公司 | 发光二极管的具有介电材料层的半导体层及其制作方法 |
KR101399460B1 (ko) | 2012-10-23 | 2014-05-28 | 한국기계연구원 | 이종 재료 나노패턴이 내장된 기판 제조방법 |
KR102042437B1 (ko) * | 2013-04-25 | 2019-11-08 | 엘지이노텍 주식회사 | 발광소자 및 이를 구비하는 조명 시스템 |
CN103560079A (zh) * | 2013-09-24 | 2014-02-05 | 西安神光皓瑞光电科技有限公司 | 一种通过缺陷钝化减少GaN外延缺陷的方法 |
KR101403539B1 (ko) * | 2013-12-13 | 2014-06-03 | 부경대학교 산학협력단 | 나노입자 배열방법 |
CN104505444B (zh) * | 2014-12-09 | 2018-03-06 | 西安神光安瑞光电科技有限公司 | 一种减少外延层缺陷密度的外延生长方法 |
KR20210018731A (ko) * | 2019-08-09 | 2021-02-18 | 현대자동차주식회사 | 트레일러 장착 차량의 주행 지원 장치, 그를 포함한 시스템 및 그 방법 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09199759A (ja) * | 1996-01-19 | 1997-07-31 | Toyoda Gosei Co Ltd | 3族窒化物半導体の製造方法及び半導体素子 |
JP2002217116A (ja) * | 2001-01-18 | 2002-08-02 | Sony Corp | 結晶膜、結晶基板および半導体装置の製造方法 |
JP2002217115A (ja) * | 2001-01-18 | 2002-08-02 | Sony Corp | 結晶膜、結晶基板および半導体装置 |
JP2003142414A (ja) * | 2001-11-02 | 2003-05-16 | Nichia Chem Ind Ltd | 窒化物半導体の成長方法 |
JP2004153089A (ja) * | 2002-10-31 | 2004-05-27 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子及びその製造方法 |
JP2004193619A (ja) * | 2002-12-11 | 2004-07-08 | Lumileds Lighting Us Llc | 光散乱を強化した発光素子 |
JP2005535143A (ja) * | 2002-07-31 | 2005-11-17 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | GaNベースの発光薄膜半導体素子 |
JP2006013500A (ja) * | 2004-06-24 | 2006-01-12 | Shogen Koden Kofun Yugenkoshi | 発光装置 |
JP2006165582A (ja) * | 2004-12-08 | 2006-06-22 | Samsung Electro Mech Co Ltd | 凹凸構造を含む発光素子及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100581831B1 (ko) * | 2004-02-05 | 2006-05-23 | 엘지전자 주식회사 | 발광 다이오드 |
KR101079415B1 (ko) * | 2004-02-27 | 2011-11-02 | 엘지전자 주식회사 | 반도체 발광소자 및 그 제조방법 |
KR100568300B1 (ko) * | 2004-03-31 | 2006-04-05 | 삼성전기주식회사 | 질화물 반도체 발광소자 및 그 제조방법 |
KR100616596B1 (ko) * | 2004-07-09 | 2006-08-28 | 삼성전기주식회사 | 질화물 반도체 소자 및 제조방법 |
-
2006
- 2006-02-14 KR KR20060014241A patent/KR100887067B1/ko not_active IP Right Cessation
-
2007
- 2007-02-14 CN CN 200710005377 patent/CN101022146A/zh active Pending
- 2007-02-14 JP JP2007033773A patent/JP2007221142A/ja active Pending
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09199759A (ja) * | 1996-01-19 | 1997-07-31 | Toyoda Gosei Co Ltd | 3族窒化物半導体の製造方法及び半導体素子 |
JP2002217116A (ja) * | 2001-01-18 | 2002-08-02 | Sony Corp | 結晶膜、結晶基板および半導体装置の製造方法 |
JP2002217115A (ja) * | 2001-01-18 | 2002-08-02 | Sony Corp | 結晶膜、結晶基板および半導体装置 |
JP2003142414A (ja) * | 2001-11-02 | 2003-05-16 | Nichia Chem Ind Ltd | 窒化物半導体の成長方法 |
JP2005535143A (ja) * | 2002-07-31 | 2005-11-17 | オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング | GaNベースの発光薄膜半導体素子 |
JP2004153089A (ja) * | 2002-10-31 | 2004-05-27 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体発光素子及びその製造方法 |
JP2004193619A (ja) * | 2002-12-11 | 2004-07-08 | Lumileds Lighting Us Llc | 光散乱を強化した発光素子 |
JP2006013500A (ja) * | 2004-06-24 | 2006-01-12 | Shogen Koden Kofun Yugenkoshi | 発光装置 |
JP2006165582A (ja) * | 2004-12-08 | 2006-06-22 | Samsung Electro Mech Co Ltd | 凹凸構造を含む発光素子及びその製造方法 |
JP4970782B2 (ja) * | 2004-12-08 | 2012-07-11 | サムソン エルイーディー カンパニーリミテッド. | 凹凸構造を含む発光素子及びその製造方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014082496A (ja) * | 2012-10-17 | 2014-05-08 | Lg Innotek Co Ltd | 発光素子 |
Also Published As
Publication number | Publication date |
---|---|
CN101022146A (zh) | 2007-08-22 |
KR100887067B1 (ko) | 2009-03-04 |
KR20070081934A (ko) | 2007-08-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4970782B2 (ja) | 凹凸構造を含む発光素子及びその製造方法 | |
JP2007221142A (ja) | 半導体発光素子及びその製造方法 | |
US7935554B2 (en) | Semiconductor light emitting device and method of manufacturing the same | |
JP4970783B2 (ja) | 高効率半導体発光素子及びその製造方法 | |
TWI521734B (zh) | A III-V nitride semiconductor epitaxial wafer, a device comprising the epitaxial wafer, and a method for preparing the same | |
KR101316120B1 (ko) | 양극 알루미늄산화를 이용한 산란 중심을 구비하는 발광 소자 제조방법 및 그 발광 소자 | |
KR20080040359A (ko) | 수직형 발광 소자 및 그 제조방법 | |
JP2008047860A (ja) | 表面凹凸の形成方法及びそれを利用した窒化ガリウム系発光ダイオード素子の製造方法 | |
JP2006332383A (ja) | 半導体発光素子およびその製造方法 | |
JP2006191072A (ja) | 凹凸構造を含む発光素子及びその製造方法 | |
KR100663016B1 (ko) | 수직형 발광 다이오드 및 그 제조방법 | |
TWI585999B (zh) | 金屬顆粒層之製備及使用其所製造之發光裝置 | |
KR101457202B1 (ko) | 나노 로드를 포함하는 투명 전극층을구비하는 발광다이오드 및 그 제조방법 | |
JP2017017265A (ja) | 発光装置 | |
CN110838538B (zh) | 一种发光二极管元件及其制备方法 | |
KR101518858B1 (ko) | 반도체 발광소자 및 그 제조방법 | |
US20140011311A1 (en) | Nitride semiconductor light emitting device and method for manufacturing the same | |
KR100604562B1 (ko) | 발광 다이오드 및 그 제조방법 | |
KR101054229B1 (ko) | 표면 거칠기를 갖는 ⅲ―ⅴ족 화합물 반도체 발광소자의 제조방법 | |
Lin et al. | GaN-based LEDs grown on cone-shaped patterned sapphire substrates with peripheral air voids by lateral etching | |
KR20120031994A (ko) | 발광 다이오드 및 그 제조방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100204 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20100930 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101021 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20101028 |
|
RD02 | Notification of acceptance of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7422 Effective date: 20101111 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101116 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101116 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120110 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120111 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120410 |
|
A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A712 Effective date: 20120813 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20121120 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20130321 |