JP2007217216A - GaN結晶基板およびその製造方法、ならびに半導体デバイスの製造方法 - Google Patents
GaN結晶基板およびその製造方法、ならびに半導体デバイスの製造方法 Download PDFInfo
- Publication number
- JP2007217216A JP2007217216A JP2006038648A JP2006038648A JP2007217216A JP 2007217216 A JP2007217216 A JP 2007217216A JP 2006038648 A JP2006038648 A JP 2006038648A JP 2006038648 A JP2006038648 A JP 2006038648A JP 2007217216 A JP2007217216 A JP 2007217216A
- Authority
- JP
- Japan
- Prior art keywords
- gan crystal
- crystal substrate
- substrate
- back surface
- gan
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000013078 crystal Substances 0.000 title claims abstract description 292
- 239000000758 substrate Substances 0.000 title claims abstract description 271
- 239000004065 semiconductor Substances 0.000 title claims abstract description 97
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 230000003746 surface roughness Effects 0.000 claims abstract description 76
- 150000004767 nitrides Chemical class 0.000 claims abstract description 19
- 238000005498 polishing Methods 0.000 claims description 36
- 238000005530 etching Methods 0.000 claims description 31
- 238000000227 grinding Methods 0.000 claims description 30
- 238000012545 processing Methods 0.000 claims description 13
- 238000005520 cutting process Methods 0.000 claims description 9
- 238000006073 displacement reaction Methods 0.000 description 106
- 238000005259 measurement Methods 0.000 description 64
- 238000000034 method Methods 0.000 description 62
- 239000006061 abrasive grain Substances 0.000 description 31
- 230000000052 comparative effect Effects 0.000 description 28
- 238000009826 distribution Methods 0.000 description 23
- 238000004364 calculation method Methods 0.000 description 21
- 230000002093 peripheral effect Effects 0.000 description 21
- 238000010521 absorption reaction Methods 0.000 description 11
- 238000009499 grossing Methods 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 238000005457 optimization Methods 0.000 description 10
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 235000019592 roughness Nutrition 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- 238000010606 normalization Methods 0.000 description 5
- 238000007405 data analysis Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000002248 hydride vapour-phase epitaxy Methods 0.000 description 4
- 238000007517 polishing process Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000011259 mixed solution Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 230000001174 ascending effect Effects 0.000 description 1
- 239000013256 coordination polymer Substances 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- CEJLBZWIKQJOAT-UHFFFAOYSA-N dichloroisocyanuric acid Chemical compound ClN1C(=O)NC(=O)N(Cl)C1=O CEJLBZWIKQJOAT-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000004556 laser interferometry Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N nickel(II) oxide Inorganic materials [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 230000033116 oxidation-reduction process Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005424 photoluminescence Methods 0.000 description 1
- 239000012286 potassium permanganate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02019—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02024—Mirror polishing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/30604—Chemical etching
- H01L21/30612—Etching of AIIIBV compounds
- H01L21/30617—Anisotropic liquid etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Weting (AREA)
- Led Devices (AREA)
Abstract
【解決手段】本GaN結晶基板は、結晶成長面10cの反対側の面である裏面10rの反りw(R)が−50μm≦w≦50μmであり、裏面10rの面粗さRa(R)をRa(R)≦10μm、裏面10rの面粗さRy(R)をRy(R)≦75μmとすることができる。また、本半導体デバイスの製造方法は、基板として上記GaN結晶基板10を選択し、このGaN結晶基板10の結晶成長面10c側に少なくとも1層のIII族窒化物結晶層20を成長させる工程を含む。
【選択図】図1
Description
本発明にかかるGaN結晶基板の一実施形態は、図1を参照して、結晶成長面10cの反対側の面である裏面10rの反りw(R)が−50μm≦w(R)≦50μmである。ここで、図1(a)に示すような裏面10rが凹状となる反りを正(+の記号で示す)とし、図1(b)に示すような裏面10rが凸状となる反りを負(−の記号で示す)とする。また、反りw(R)は裏面10rにおける最凸部の変位値zPと最凹部の変位値zVとの高低差と定義される。
本発明にかかるGaN結晶基板の製造方法は、図8を参照して、実施形態1のGaN結晶基板の製造方法であって、GaN結晶1からGaN結晶基板10を切り出す工程(図8(a)を参照)およびGaN結晶基板10の裏面10rを処理する工程(図8(b)を参照)とを含み、GaN結晶基板10の裏面10rを処理する工程は、裏面10rを研削する工程、裏面10rを研磨する工程および裏面10rをエッチングする工程の少なくともいずれかの工程を含む。
本発明にかかる半導体デバイスの製造方法の一実施形態は、図9を参照して、基板としてのGaN結晶基板10を選択し、GaN結晶基板10の結晶成長面10c側に少なくとも1層のIII族窒化物結晶層20を成長させる工程を含む。かかる製造方法により、GaN結晶基板10の結晶成長面10c側に、半導体層として均一なIII族窒化物結晶層20を安定して成長させることができ、特性のよい半導体デバイス99が得られる。
1.GaN結晶基板の製造
図8(a)を参照して、HVPE法により成長させたGaN結晶10から直径5.08cm(2インチ)×厚さ550μmのGaN結晶基板10を切り出し、図8(b)を参照して、GaN結晶基板10の裏面10rおよび結晶成長面10cを以下のようにして処理した。裏面の処理は、粒径125μmのCBN砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、粒径24μmのダイヤモンド砥粒を用いて研磨し(研磨工程)、30質量%のアンモニア水と、40質量%の過酸化水素水と純水とを体積比で1:1:2で混合させたNH3およびH2O2の混合水溶液を用いてエッチングすること(エッチング工程)により行なった。また、結晶成長面の処理は、平均粒径125μmのCBN砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、平均粒径20μm、10μmおよび5μmのSiC砥粒を順次用いて研磨し(研磨工程)、30質量%のNaOH水溶液を用いてエッチングし(エッチング工程)、平均粒径1μmのTiO2砥粒を含むpH=12、ORP=450mVのスラリーを用いてCMPすること(微研磨工程)により行なった。
図1を参照して、上記の処理がされたGaN結晶基板10の裏面10rの反りw(R)を、レーザフォーカス方式のレーザ変位計(キーエンス社製LT−9010(レーザ出力部)およびLT−9500(レーザ制御部))、XYポジションコントローラ(コムス社製CP−500)および高速アナログ電圧データ収集装置(コムス社製CA−800)を用いて以下のように測定した。このレーザ変位計には、レーザ波長670nmの赤色半導体レーザが用いられていた。
図9(a)を参照して、上記のGaN結晶基板10の結晶成長面10c上に、MOVPE法により、III族窒化物結晶層20として、厚さ5μmのn型GaN層21、厚さ3nmのIn0.2Ga0.8N層22、厚さ60nmのAl0.2Ga0.8N層23、厚さ150nmのp型GaN層24を順次成長させて半導体積層ウエハ80を得た。得られた半導体積層ウエハ80の発光強度の分布をフォトルミネッセンス法(以下、PL法という)により評価した。
GaN結晶基板の製造の際の裏面の処理において、粒径84μmのCBN砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、粒径12μmのSiC砥粒を用いて研磨し(研磨工程)、85質量%のリン酸水溶液と90質量%の硫酸水溶液とを体積比で1:1で混合させたH3PO4およびH2SO4の混合水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は−22.8μm、面粗さRa(R)は10.2μm、面粗さRy(R)は78.5μmであった。なお、このGaN結晶基板の結晶成長面の反りw(C)は−17.4であり、面粗さRa(C)およびRy(C)はいずれも比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
GaN結晶基板の製造の際の裏面の処理において、粒径63μmのAl2O3砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、粒径8μmのAl2O3砥粒を用いて研磨し(研磨工程)、25質量%のKOH水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は−19.1μm、面粗さRa(R)は6.8μm、面粗さRy(R)は55μmであった。なお、GaN結晶基板の結晶成長面の反りw(C)は−16.7μmであり、面粗さRa(C)およびRy(C)はいずれも比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
GaN結晶基板の製造の際の裏面の処理において、粒径32μmのダイヤモンド砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、25質量%のKOHの水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は−3.4μm、面粗さRa(R)は4.9μm、面粗さRy(R)は31.9μmであった。なお、GaN結晶基板の結晶成長面の反りw(C)は−4.6μmであり、面粗さRa(C)およびRy(C)はいずれも比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
GaN結晶基板の製造の際の裏面の処理において、粒径30μmのSiC砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、粒径6μmのダイヤモンド砥粒を用いて研磨し(研磨工程)、30質量%のアンモニア水と、40質量%の過酸化水素水と純水とを体積比で1:1:6で混合させたNH3およびH2O2の混合水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は4.8μm、面粗さRa(R)は3.8μm、面粗さRy(R)は23.8μmであった。なお、GaN結晶基板の結晶成長面の反りw(C)は2.8μmであり、面粗さRa(C)およびRy(C)はそれぞれ比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
GaN結晶基板の製造の際の裏面の処理において、粒径37μmのSiC砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、25質量%のKOH水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は9.9μm、面粗さRa(R)は5.5μm、面粗さRy(R)は38.7μmであった。なお、GaN結晶基板の結晶成長面の反りw(C)は10.4μmであり、面粗さRa(C)およびRy(C)はそれぞれ比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
GaN結晶基板の製造の際の裏面の処理において、粒径74μmのダイヤモンド砥粒をボンドで固定した固定砥粒を用いて研削し(研削工程)、粒径15μmのCBN砥粒を用いて研磨し(研磨工程)、85質量%のH3PO4の水溶液を用いてエッチングすること(エッチング工程)により行なったこと以外は、比較例1と同様にして、GaN結晶基板を製造して、このGaN結晶基板の裏面および結晶成長面の反りならびに面粗さを測定した。得られたGaN結晶基板の裏面の反りw(R)は19.3μm、面粗さRa(R)は10.8μm、面粗さRy(R)は81.9μmであった。なお、GaN結晶基板の結晶成長面の反りw(C)は23.0μmであり、面粗さRa(C)およびRy(C)はそれぞれ比較例1と同様であった。また、このGaN結晶基板のピーク波長が450nm〜550nmの光の吸収係数、熱伝導率および熱膨張係数は、いずれも比較例1と同様であった。
Claims (6)
- 結晶成長面の反対側の面である裏面の反りw(R)が、−50μm≦w≦50μmであるGaN結晶基板。
- 前記裏面の面粗さRa(R)が、Ra(R)≦10μmである請求項1に記載のGaN結晶基板。
- 前記裏面の面粗さRy(R)が、Ry(R)≦75μmである請求項1または請求項2に記載のGaN結晶基板。
- 前記結晶成長面の反りw(C)が−50μm≦w(C)≦50μm、結晶成長面の面粗さRa(C)がRa(C)≦10nm、結晶成長面の面粗さRy(C)がRy(C)≦60nmである請求項1から請求項3までのいずれかに記載のGaN結晶基板。
- 請求項1から請求項4までのいずれかのGaN結晶基板の製造方法であって、
成長させたGaN結晶からGaN結晶基板を切り出す工程および前記GaN結晶基板の裏面を処理する工程とを含み、
前記GaN結晶基板の裏面を処理する工程は、前記裏面を研削する工程、前記裏面を研磨する工程および前記裏面をエッチングする工程の少なくともいずれかの工程を含むGaN結晶基板の製造方法。 - 基板として請求項1から請求項4までのいずれかのGaN結晶基板を選択し、前記GaN結晶基板の前記結晶成長面側に少なくとも1層のIII族窒化物結晶層を成長させる工程を含む半導体デバイスの製造方法。
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006038648A JP4301251B2 (ja) | 2006-02-15 | 2006-02-15 | GaN結晶基板 |
TW102115169A TWI458866B (zh) | 2006-02-15 | 2007-01-05 | GaN結晶基板及其製造方法以及半導體裝置之製造方法 |
TW096100502A TWI447272B (zh) | 2006-02-15 | 2007-01-05 | GaN結晶基板及其製造方法以及半導體裝置之製造方法 |
EP07000261.3A EP1821339B1 (en) | 2006-02-15 | 2007-01-08 | GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device |
KR1020070008201A KR101340822B1 (ko) | 2006-02-15 | 2007-01-26 | GaN 결정 기판 및 그 제조 방법 및 반도체 장치의 제조방법 |
CNA2007100053418A CN101037807A (zh) | 2006-02-15 | 2007-02-14 | GaN晶体衬底及其制造方法以及制造半导体器件的方法 |
CN2011103939130A CN102492992A (zh) | 2006-02-15 | 2007-02-14 | GaN晶体衬底及其制造方法 |
US11/706,413 US20070261633A1 (en) | 2006-02-15 | 2007-02-15 | GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device |
US12/887,925 US20110012127A1 (en) | 2006-02-15 | 2010-09-22 | GaN CRYSTAL SUBSTRATE AND METHOD OF MANUFACTURING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006038648A JP4301251B2 (ja) | 2006-02-15 | 2006-02-15 | GaN結晶基板 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009013402A Division JP4380791B2 (ja) | 2009-01-23 | 2009-01-23 | GaN結晶基板およびその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2007217216A true JP2007217216A (ja) | 2007-08-30 |
JP2007217216A5 JP2007217216A5 (ja) | 2009-02-05 |
JP4301251B2 JP4301251B2 (ja) | 2009-07-22 |
Family
ID=38050999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006038648A Active JP4301251B2 (ja) | 2006-02-15 | 2006-02-15 | GaN結晶基板 |
Country Status (6)
Country | Link |
---|---|
US (2) | US20070261633A1 (ja) |
EP (1) | EP1821339B1 (ja) |
JP (1) | JP4301251B2 (ja) |
KR (1) | KR101340822B1 (ja) |
CN (2) | CN101037807A (ja) |
TW (2) | TWI447272B (ja) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010248021A (ja) * | 2009-04-13 | 2010-11-04 | Hitachi Cable Ltd | 窒化物半導体基板 |
JP2011121803A (ja) * | 2009-12-09 | 2011-06-23 | Mitsubishi Chemicals Corp | Iii族窒化物結晶半導体基板の製造方法、及びiii族窒化物結晶半導体基板 |
JP2013032278A (ja) * | 2008-09-08 | 2013-02-14 | Sumitomo Electric Ind Ltd | 基板の製造方法 |
US8586998B2 (en) | 2011-07-29 | 2013-11-19 | Sumitomo Electric Industries, Ltd. | Silicon carbide substrate manufacturing method and silicon carbide substrate |
US8728622B2 (en) | 2010-01-15 | 2014-05-20 | Mitsubishi Chemical Corporation | Single-crystal substrate, group-III nitride crystal obtained using the same, and process for producing group-III nitride crystal |
JP2014526138A (ja) * | 2011-06-30 | 2014-10-02 | ジルトロニック アクチエンゲゼルシャフト | 積層半導体基板およびその製造方法 |
JP2016044094A (ja) * | 2014-08-21 | 2016-04-04 | 三菱化学株式会社 | 非極性または半極性GaN基板 |
WO2016194931A1 (ja) * | 2015-06-02 | 2016-12-08 | 並木精密宝石株式会社 | 基板の反りのin-situ観察装置及び結晶成長装置 |
US10066319B2 (en) | 2014-01-17 | 2018-09-04 | Mitsubishi Chemical Corporation | GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device |
US10475887B2 (en) | 2013-08-08 | 2019-11-12 | Mitsubishi Chemical Corporation | Self-standing GaN substrate, GaN crystal, method for producing GaN single crystal, and method for producing semiconductor device |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4930081B2 (ja) * | 2006-04-03 | 2012-05-09 | 住友電気工業株式会社 | GaN結晶基板 |
JP2008010835A (ja) * | 2006-05-31 | 2008-01-17 | Sumitomo Electric Ind Ltd | 窒化物結晶の表面処理方法、窒化物結晶基板、エピタキシャル層付窒化物結晶基板および半導体デバイス、ならびにエピタキシャル層付窒化物結晶基板および半導体デバイスの製造方法 |
US7585772B2 (en) * | 2006-07-26 | 2009-09-08 | Freiberger Compound Materials Gmbh | Process for smoothening III-N substrates |
JP5181885B2 (ja) * | 2007-10-05 | 2013-04-10 | 住友電気工業株式会社 | GaN基板の製造方法、エピウエハの製造方法、半導体素子の製造方法およびエピウエハ |
EP2045374A3 (en) * | 2007-10-05 | 2011-02-16 | Sumitomo Electric Industries, Ltd. | Method of manufacturing a GaN substrate and a GaN epitaxial wafer |
JP2010269970A (ja) * | 2009-05-21 | 2010-12-02 | Hitachi Cable Ltd | 窒化物半導体基板 |
KR101396232B1 (ko) * | 2010-02-05 | 2014-05-19 | 한양대학교 산학협력단 | 상변화 물질 연마용 슬러리 및 이를 이용한 상변화 소자 제조 방법 |
KR20140014625A (ko) * | 2012-07-25 | 2014-02-06 | 서울바이오시스 주식회사 | 질화갈륨계 반도체 소자를 제조하는 방법 |
JP5828993B1 (ja) * | 2013-12-18 | 2015-12-09 | 日本碍子株式会社 | 複合基板および機能素子 |
KR101951902B1 (ko) | 2016-04-12 | 2019-02-26 | 주식회사 루미스탈 | 복수의 공극을 포함한 질화물 반도체 기판 및 그 제조 방법 |
JP6266742B1 (ja) * | 2016-12-20 | 2018-01-24 | 古河機械金属株式会社 | Iii族窒化物半導体基板、及び、iii族窒化物半導体基板の製造方法 |
CN108253927A (zh) * | 2018-01-18 | 2018-07-06 | 华南农业大学 | 一种检测形变秧盘的方法及系统 |
JP6768028B2 (ja) * | 2018-05-08 | 2020-10-14 | 朝旭實業股▲ふん▼有限公司 | ベッドサイドテーブル |
SE1930124A1 (sv) * | 2019-04-12 | 2020-10-13 | Epiluvac Ab | Anordning och förfarande för att tillförsäkra planhet hos wafer under tillväxt |
CN114413799B (zh) * | 2022-04-02 | 2022-06-28 | 季华实验室 | 一种芯片基板翘曲检测方法、系统、装置及电子设备 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW417315B (en) * | 1998-06-18 | 2001-01-01 | Sumitomo Electric Industries | GaN single crystal substrate and its manufacture method of the same |
US6596079B1 (en) * | 2000-03-13 | 2003-07-22 | Advanced Technology Materials, Inc. | III-V nitride substrate boule and method of making and using the same |
JP3631724B2 (ja) * | 2001-03-27 | 2005-03-23 | 日本電気株式会社 | Iii族窒化物半導体基板およびその製造方法 |
JP2003063897A (ja) * | 2001-08-28 | 2003-03-05 | Sony Corp | 窒化物系iii−v族化合物半導体基板およびその製造方法ならびに半導体発光素子の製造方法ならびに半導体装置の製造方法 |
US7354477B2 (en) * | 2001-10-09 | 2008-04-08 | Sumitomo Electric Industries, Ltd. | Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate |
US7098487B2 (en) * | 2002-12-27 | 2006-08-29 | General Electric Company | Gallium nitride crystal and method of making same |
AU2003299899A1 (en) * | 2002-12-27 | 2004-07-29 | General Electric Company | Gallium nitride crystal, homoepitaxial gallium-nitride-based devices and method for producing same |
KR100550491B1 (ko) * | 2003-05-06 | 2006-02-09 | 스미토모덴키고교가부시키가이샤 | 질화물 반도체 기판 및 질화물 반도체 기판의 가공 방법 |
JP4232605B2 (ja) * | 2003-10-30 | 2009-03-04 | 住友電気工業株式会社 | 窒化物半導体基板の製造方法と窒化物半導体基板 |
JP4333466B2 (ja) | 2004-04-22 | 2009-09-16 | 日立電線株式会社 | 半導体基板の製造方法及び自立基板の製造方法 |
-
2006
- 2006-02-15 JP JP2006038648A patent/JP4301251B2/ja active Active
-
2007
- 2007-01-05 TW TW096100502A patent/TWI447272B/zh active
- 2007-01-05 TW TW102115169A patent/TWI458866B/zh active
- 2007-01-08 EP EP07000261.3A patent/EP1821339B1/en active Active
- 2007-01-26 KR KR1020070008201A patent/KR101340822B1/ko active IP Right Grant
- 2007-02-14 CN CNA2007100053418A patent/CN101037807A/zh active Pending
- 2007-02-14 CN CN2011103939130A patent/CN102492992A/zh active Pending
- 2007-02-15 US US11/706,413 patent/US20070261633A1/en not_active Abandoned
-
2010
- 2010-09-22 US US12/887,925 patent/US20110012127A1/en not_active Abandoned
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013032278A (ja) * | 2008-09-08 | 2013-02-14 | Sumitomo Electric Ind Ltd | 基板の製造方法 |
JP2010248021A (ja) * | 2009-04-13 | 2010-11-04 | Hitachi Cable Ltd | 窒化物半導体基板 |
JP2011121803A (ja) * | 2009-12-09 | 2011-06-23 | Mitsubishi Chemicals Corp | Iii族窒化物結晶半導体基板の製造方法、及びiii族窒化物結晶半導体基板 |
US8728622B2 (en) | 2010-01-15 | 2014-05-20 | Mitsubishi Chemical Corporation | Single-crystal substrate, group-III nitride crystal obtained using the same, and process for producing group-III nitride crystal |
US9428386B2 (en) | 2010-01-15 | 2016-08-30 | Mitsubishi Chemical Corporation | Process for producing a group-III nitride crystal and process for producing a light-emitting semiconductor element or a semiconductor device comprising a group-III nitride crystal |
JP2014526138A (ja) * | 2011-06-30 | 2014-10-02 | ジルトロニック アクチエンゲゼルシャフト | 積層半導体基板およびその製造方法 |
US8586998B2 (en) | 2011-07-29 | 2013-11-19 | Sumitomo Electric Industries, Ltd. | Silicon carbide substrate manufacturing method and silicon carbide substrate |
US11031475B2 (en) | 2013-08-08 | 2021-06-08 | Mitsubishi Chemical Corporation | Self-standing GaN substrate, GaN crystal, method for producing GaN single crystal, and method for producing semiconductor device |
US11664428B2 (en) | 2013-08-08 | 2023-05-30 | Mitsubishi Chemical Corporation | Self-standing GaN substrate, GaN crystal, method for producing GaN single crystal, and method for producing semiconductor device |
US11038024B2 (en) | 2013-08-08 | 2021-06-15 | Mitsubishi Chemical Corporation | Self-standing GaN substrate, GaN crystal, method for producing GaN single crystal, and method for producing semiconductor device |
US10475887B2 (en) | 2013-08-08 | 2019-11-12 | Mitsubishi Chemical Corporation | Self-standing GaN substrate, GaN crystal, method for producing GaN single crystal, and method for producing semiconductor device |
US10066319B2 (en) | 2014-01-17 | 2018-09-04 | Mitsubishi Chemical Corporation | GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device |
US10655244B2 (en) | 2014-01-17 | 2020-05-19 | Mitsubishi Chemical Corporation | GaN substrate, method for producing GaN substrate, method for producing GaN crystal, and method for manufacturing semiconductor device |
JP2016044094A (ja) * | 2014-08-21 | 2016-04-04 | 三菱化学株式会社 | 非極性または半極性GaN基板 |
WO2016194931A1 (ja) * | 2015-06-02 | 2016-12-08 | 並木精密宝石株式会社 | 基板の反りのin-situ観察装置及び結晶成長装置 |
Also Published As
Publication number | Publication date |
---|---|
CN101037807A (zh) | 2007-09-19 |
US20070261633A1 (en) | 2007-11-15 |
TW200741043A (en) | 2007-11-01 |
KR101340822B1 (ko) | 2013-12-11 |
US20110012127A1 (en) | 2011-01-20 |
JP4301251B2 (ja) | 2009-07-22 |
TWI447272B (zh) | 2014-08-01 |
KR20070082508A (ko) | 2007-08-21 |
CN102492992A (zh) | 2012-06-13 |
TW201335448A (zh) | 2013-09-01 |
EP1821339A1 (en) | 2007-08-22 |
TWI458866B (zh) | 2014-11-01 |
EP1821339B1 (en) | 2016-10-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4301251B2 (ja) | GaN結晶基板 | |
JP4380791B2 (ja) | GaN結晶基板およびその製造方法 | |
JP7315677B2 (ja) | 結晶材料を切り分けるためのレーザ・アシスト法 | |
JP7320130B2 (ja) | 緩和された正の湾曲を有する炭化ケイ素ウェーハを処理するための方法 | |
KR101654440B1 (ko) | SiC 에피택셜 웨이퍼 및 그의 제조 방법 | |
JP6708972B2 (ja) | 単結晶ダイヤモンドおよびその製造方法、単結晶ダイヤモンドを含む工具、ならびに単結晶ダイヤモンドを含む部品 | |
WO2021132491A1 (ja) | Iii族窒化物単結晶基板およびその製造方法 | |
JP6856356B2 (ja) | 窒化アルミニウム単結晶基板及び、該単結晶基板の製造方法 | |
JP2006294774A (ja) | 半導体ウエーハの評価方法及び評価装置並びに半導体ウエーハの製造方法 | |
CN109148260B (zh) | 激光标记的刻印方法、带激光标记的硅晶片及其制造方法 | |
WO2021111835A1 (ja) | 炭化珪素基板および炭化珪素基板の製造方法 | |
JP2008010818A (ja) | 基板、基板検査方法、素子および基板の製造方法 | |
CN113169034B (zh) | 带激光标记的硅晶圆的制造方法 | |
JP2022028362A (ja) | ウェーハ、ウェーハの製造方法、及びデバイスチップの製造方法 | |
JP5846223B2 (ja) | 基板および発光素子 | |
JP5589339B2 (ja) | 基板の研磨方法 | |
KR20070093824A (ko) | 질화갈륨계 기판, 질화갈륨계 기판의 평가 방법 및질화갈륨계 기판의 제조 방법 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20080822 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20081211 |
|
A871 | Explanation of circumstances concerning accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A871 Effective date: 20081211 |
|
A975 | Report on accelerated examination |
Free format text: JAPANESE INTERMEDIATE CODE: A971005 Effective date: 20081217 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20081224 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090123 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090210 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090312 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090331 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120501 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 4301251 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090413 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130501 Year of fee payment: 4 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20140501 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |